DE69629617D1 - Fotoempfindliche Zusammensetzung und fotoempfindliche Flachdruckplatte - Google Patents

Fotoempfindliche Zusammensetzung und fotoempfindliche Flachdruckplatte

Info

Publication number
DE69629617D1
DE69629617D1 DE69629617T DE69629617T DE69629617D1 DE 69629617 D1 DE69629617 D1 DE 69629617D1 DE 69629617 T DE69629617 T DE 69629617T DE 69629617 T DE69629617 T DE 69629617T DE 69629617 D1 DE69629617 D1 DE 69629617D1
Authority
DE
Germany
Prior art keywords
photosensitive
printing plate
planographic printing
composition
photosensitive composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69629617T
Other languages
English (en)
Other versions
DE69629617T2 (de
Inventor
Yasuhiro Ishizuka
Maru Aburano
Eiji Hayakawa
Koji Oe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kodak Graphic Communications Japan Ltd
Original Assignee
Kodak Graphic Communications Japan Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP1991296A external-priority patent/JP3583217B2/ja
Priority claimed from JP1991196A external-priority patent/JP3556756B2/ja
Application filed by Kodak Graphic Communications Japan Ltd filed Critical Kodak Graphic Communications Japan Ltd
Publication of DE69629617D1 publication Critical patent/DE69629617D1/de
Application granted granted Critical
Publication of DE69629617T2 publication Critical patent/DE69629617T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE69629617T 1995-04-11 1996-04-10 Fotoempfindliche Zusammensetzung und fotoempfindliche Flachdruckplatte Expired - Lifetime DE69629617T2 (de)

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
JP8534695 1995-04-11
JP8534595 1995-04-11
JP8534595 1995-04-11
JP8534695 1995-04-11
JP1991296A JP3583217B2 (ja) 1995-04-11 1996-02-06 感光性組成物及び感光性平版印刷版
JP1991296 1996-02-06
JP1991196 1996-02-06
JP1991196A JP3556756B2 (ja) 1995-04-11 1996-02-06 感光性組成物及び感光性平版印刷版

Publications (2)

Publication Number Publication Date
DE69629617D1 true DE69629617D1 (de) 2003-10-02
DE69629617T2 DE69629617T2 (de) 2004-02-19

Family

ID=27457277

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69629617T Expired - Lifetime DE69629617T2 (de) 1995-04-11 1996-04-10 Fotoempfindliche Zusammensetzung und fotoempfindliche Flachdruckplatte

Country Status (4)

Country Link
US (1) US5731127A (de)
EP (1) EP0737896B1 (de)
CA (1) CA2173638A1 (de)
DE (1) DE69629617T2 (de)

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10171108A (ja) * 1996-10-07 1998-06-26 Konica Corp 画像形成材料及び画像形成方法
TW473653B (en) * 1997-05-27 2002-01-21 Clariant Japan Kk Composition for anti-reflective film or photo absorption film and compound used therein
US6573022B1 (en) 1997-10-17 2003-06-03 Fuji Photo Film Co., Ltd. Positive type photosensitive image-forming material for an infrared laser and a positive type photosensitive composition for an infrared laser
US6534238B1 (en) * 1998-06-23 2003-03-18 Kodak Polychrome Graphics, Llc Thermal digital lithographic printing plate
US6358669B1 (en) 1998-06-23 2002-03-19 Kodak Polychrome Graphics Llc Thermal digital lithographic printing plate
DE60014536T2 (de) 1999-08-02 2005-03-24 Kodak Polychrome Graphics Gmbh Strahlungsempfindliche Zusammensetzungen für Druckplatten mit verbesserter chemischer Beständigkeit und Entwickler-Beständigkeit und mit diesen Zusammensetzungen hergestellte Druckplatten
EP1077392A1 (de) * 1999-08-16 2001-02-21 Fuji Photo Film Co., Ltd. Lichtempfindliche lithographische Druckplatte
US6294311B1 (en) * 1999-12-22 2001-09-25 Kodak Polychrome Graphics Llc Lithographic printing plate having high chemical resistance
US6541560B1 (en) 2000-03-15 2003-04-01 Graphic Packaging Corporation Control of volatile carbonyl compound in compositions used in printing, printing methods and resulting printed structure
JP2001264979A (ja) * 2000-03-22 2001-09-28 Fuji Photo Film Co Ltd ポジ型感光性平版印刷版
US6555291B1 (en) 2000-08-14 2003-04-29 Kodak Polychrome Graphics, Llc Thermal digital lithographic printing plate
US6660445B2 (en) * 2000-10-13 2003-12-09 Fuji Photo Film Co., Ltd. Photosensitive composition comprising a vinyl copolymer and an o-naphthoquinone diazide compound
US6548215B2 (en) 2001-02-09 2003-04-15 Kodak Polychrome Graphics Llc Method for the production of a printing plate using the dual-feed technology
US6706454B2 (en) 2001-07-05 2004-03-16 Kodak Polychrome Graphics Llc Method for the production of a printing plate using particle growing acceleration by an additive polymer
US6723490B2 (en) 2001-11-15 2004-04-20 Kodak Polychrome Graphics Llc Minimization of ablation in thermally imageable elements
JP3863422B2 (ja) * 2001-12-13 2006-12-27 コダックポリクロームグラフィックス株式会社 感光性組成物および感光性平版印刷版
JP4184813B2 (ja) * 2002-02-19 2008-11-19 コダックグラフィックコミュニケーションズ株式会社 感光性組成物、感光性平版印刷版およびこれを用いた平版印刷版の作製方法
US6645689B2 (en) 2002-03-13 2003-11-11 Kodak Polychrome Graphics Llc Solvent resistant polymers with improved bakeability features
US20040023160A1 (en) * 2002-07-30 2004-02-05 Kevin Ray Method of manufacturing imaging compositions
US6849372B2 (en) * 2002-07-30 2005-02-01 Kodak Polychrome Graphics Method of manufacturing imaging compositions
US6858359B2 (en) 2002-10-04 2005-02-22 Kodak Polychrome Graphics, Llp Thermally sensitive, multilayer imageable element
US7060416B2 (en) 2004-04-08 2006-06-13 Eastman Kodak Company Positive-working, thermally sensitive imageable element
DE102004029501A1 (de) * 2004-06-18 2006-01-12 Kodak Polychrome Graphics Gmbh Modifizierte Polymere und ihre Verwendung bei der Herstellung von Lithographie-Druckplattenvorläufern
US6969579B1 (en) 2004-12-21 2005-11-29 Eastman Kodak Company Solvent resistant imageable element
US20060210917A1 (en) * 2005-03-18 2006-09-21 Kodak Polychrome Graphics Llc Positive-working, thermally sensitive imageable element
US7291440B2 (en) * 2005-05-16 2007-11-06 Eastman Kodak Company Bakeable multi-layer imageable element
EP1920537B1 (de) * 2005-08-11 2015-06-24 Semiconductor Energy Laboratory Co., Ltd. Spannungsgesteuerter oszillator und phasenregelkreis
US7144661B1 (en) 2005-11-01 2006-12-05 Eastman Kodak Company Multilayer imageable element with improved chemical resistance
US7223506B1 (en) 2006-03-30 2007-05-29 Eastman Kodak Company Imageable members with improved chemical resistance
JPWO2007145059A1 (ja) * 2006-06-13 2009-10-29 コニカミノルタエムジー株式会社 平版印刷版材料
JP5376289B2 (ja) * 2008-03-28 2013-12-25 富士フイルム株式会社 ネガ型平版印刷版原版及びそれを用いる平版印刷方法
EP2194429A1 (de) 2008-12-02 2010-06-09 Eastman Kodak Company Gummierzusammensetzungen mit Nanoteilchen zur Verbesserung der Kratzempfindlichkeit in Bild- und Nicht-Bild-Bereichen von lithografischen Druckplatten
CN101762982B (zh) * 2008-12-24 2013-03-13 成都新图新材料股份有限公司 一种红外阳图热敏平版印刷版
US20100227269A1 (en) 2009-03-04 2010-09-09 Simpson Christopher D Imageable elements with colorants
EP2284005B1 (de) 2009-08-10 2012-05-02 Eastman Kodak Company Lithografische Druckplattenvorläufer mit Betahydroxy-Alkylamid-Vernetzern
US8383319B2 (en) 2009-08-25 2013-02-26 Eastman Kodak Company Lithographic printing plate precursors and stacks
EP2293144B1 (de) 2009-09-04 2012-11-07 Eastman Kodak Company Verfahren zum Trocknen von Lithographiedruckplatten nach einer Einstufenverarbeitung
US20110097666A1 (en) 2009-10-27 2011-04-28 Celin Savariar-Hauck Lithographic printing plate precursors

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS527364B2 (de) * 1973-07-23 1977-03-02
JPS5498614A (en) * 1978-01-09 1979-08-03 Konishiroku Photo Ind Co Ltd Photosensitive composition
JPS55527A (en) * 1978-06-16 1980-01-05 Fuji Photo Film Co Ltd Photosensitive planographic plate
US4248958A (en) * 1979-05-23 1981-02-03 Hoechst Aktiengesellschaft Photopolymerizable mixture containing polyurethanes
US4293635A (en) * 1980-05-27 1981-10-06 E. I. Du Pont De Nemours And Company Photopolymerizable composition with polymeric binder
JPS58189627A (ja) * 1982-04-30 1983-11-05 Japan Synthetic Rubber Co Ltd 感光材料
DE3536608C2 (de) * 1985-10-15 1998-01-29 Agfa Gevaert Ag Polymere Kuppler und lichtempfindliches fotografisches Silberhalogenidaufzeichnungsmaterial mit derartigen Kupplern
EP0243890A3 (de) * 1986-04-30 1988-08-03 EASTMAN KODAK COMPANY (a New Jersey corporation) Diolmonomere und deren Polymere
JP2549366B2 (ja) * 1986-10-03 1996-10-30 三菱化学株式会社 感光性平版印刷版
JPH0727208B2 (ja) * 1987-04-20 1995-03-29 富士写真フイルム株式会社 感光性組成物
CA2045292A1 (en) * 1990-07-26 1992-01-27 John A. Martens Flexographic printing plate compositions
JP2879390B2 (ja) * 1992-04-03 1999-04-05 富士写真フイルム株式会社 感光性組成物
JPH06214386A (ja) * 1993-01-20 1994-08-05 Japan Synthetic Rubber Co Ltd 感光性樹脂組成物
JPH06258828A (ja) * 1993-03-05 1994-09-16 Dainippon Ink & Chem Inc 高精細パターン形成材料
JPH06258829A (ja) * 1993-03-09 1994-09-16 Dainippon Ink & Chem Inc 感光性粘着レジスト組成物及びそれを用いたパターン形成方法
JP3071611B2 (ja) * 1993-07-23 2000-07-31 富士写真フイルム株式会社 感光性組成物
JP3272150B2 (ja) * 1994-06-06 2002-04-08 富士写真フイルム株式会社 感光性平版印刷版および感光性組成物

Also Published As

Publication number Publication date
CA2173638A1 (en) 1996-10-12
EP0737896A3 (de) 1997-05-07
US5731127A (en) 1998-03-24
EP0737896A2 (de) 1996-10-16
DE69629617T2 (de) 2004-02-19
EP0737896B1 (de) 2003-08-27

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Legal Events

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8364 No opposition during term of opposition