DE69501486D1 - Photolithographische Druckplatte - Google Patents

Photolithographische Druckplatte

Info

Publication number
DE69501486D1
DE69501486D1 DE69501486T DE69501486T DE69501486D1 DE 69501486 D1 DE69501486 D1 DE 69501486D1 DE 69501486 T DE69501486 T DE 69501486T DE 69501486 T DE69501486 T DE 69501486T DE 69501486 D1 DE69501486 D1 DE 69501486D1
Authority
DE
Germany
Prior art keywords
printing plate
photolithographic printing
photolithographic
plate
printing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69501486T
Other languages
English (en)
Other versions
DE69501486T2 (de
Inventor
Yasuo Okamoto
Syunichi Kondo
Hiroyuki Nagase
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of DE69501486D1 publication Critical patent/DE69501486D1/de
Application granted granted Critical
Publication of DE69501486T2 publication Critical patent/DE69501486T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
DE69501486T 1994-08-03 1995-08-02 Photolithographische Druckplatte Expired - Lifetime DE69501486T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP18253994 1994-08-03
JP6193357A JPH08101498A (ja) 1994-08-03 1994-08-17 感光性平版印刷版

Publications (2)

Publication Number Publication Date
DE69501486D1 true DE69501486D1 (de) 1998-02-26
DE69501486T2 DE69501486T2 (de) 1998-04-30

Family

ID=26501302

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69501486T Expired - Lifetime DE69501486T2 (de) 1994-08-03 1995-08-02 Photolithographische Druckplatte

Country Status (4)

Country Link
US (1) US5698372A (de)
EP (1) EP0695971B1 (de)
JP (1) JPH08101498A (de)
DE (1) DE69501486T2 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19933139A1 (de) 1999-07-19 2001-01-25 Agfa Gevaert Ag Stabile Pigmentdispersion und damit hergestelltes strahlungsempfindliches Aufzeichnungsmaterial
JP2001183511A (ja) * 1999-12-22 2001-07-06 Toppan Printing Co Ltd カラーフィルタおよびその製法
JP3878451B2 (ja) 2001-10-22 2007-02-07 富士フイルムホールディングス株式会社 感光性樹脂転写材料、画像形成方法、カラーフィルターとその製造方法、フォトマスクとその製造方法
JP2006526678A (ja) * 2003-06-03 2006-11-24 チバ　スペシャルティ　ケミカルズ　ホールディング　インコーポレーテッド 放射線硬化性コーティングにおいて用いるための顔料濃厚物の製造方法
JP4526346B2 (ja) * 2004-03-08 2010-08-18 三菱製紙株式会社 感光性平版印刷版材料
US8080608B2 (en) 2008-06-03 2011-12-20 3M Innovative Properties Company Optical films comprising phenyl ethylene (meth)acrylate monomers

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DE1246134B (de) 1964-10-23 1967-08-03 Asea Ab Schwerwasserkernreaktor
DE1572136B1 (de) 1965-06-03 1969-09-18 Du Pont Fotopolymerisierbares Gemisch
JPS4420189B1 (de) 1965-06-03 1969-08-30
US3458311A (en) 1966-06-27 1969-07-29 Du Pont Photopolymerizable elements with solvent removable protective layers
JPS472528B1 (de) 1967-04-13 1972-01-24
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US3658662A (en) 1969-01-21 1972-04-25 Durolith Corp Corrosion resistant metallic plates particularly useful as support members for photo-lithographic plates and the like
US3615480A (en) 1969-02-24 1971-10-26 Du Pont Developer solutions for photopolymerized layers
DE2033769B2 (de) 1969-07-11 1980-02-21 Ppg Industries, Inc., Pittsburgh, Pa. (V.St.A.) Bis-<2-acryloxyäthyl)hexahydrophthalat enthaltende Gemische und Herstellungsverfahren
BE757124A (fr) 1969-10-09 1971-04-06 Kalle Ag Plaques d'impression a plat composee de feuilles
JPS4841708B1 (de) 1970-01-13 1973-12-07
DE2064080C3 (de) 1970-12-28 1983-11-03 Hoechst Ag, 6230 Frankfurt Lichtempfindliches Gemisch
JPS5324989B2 (de) 1971-12-09 1978-07-24
JPS5230490B2 (de) 1972-03-21 1977-08-09
JPS5549729B2 (de) 1973-02-07 1980-12-13
JPS5026601A (de) 1973-07-09 1975-03-19
US3929489A (en) * 1973-09-14 1975-12-30 Eastman Kodak Co Lithographic plates having radiation sensitive elements developable with aqueous alcohol
DE2363806B2 (de) 1973-12-21 1979-05-17 Hoechst Ag, 6000 Frankfurt Lichtempfindliches Gemisch
JPS5311314B2 (de) 1974-09-25 1978-04-20
ZA757984B (en) 1974-10-04 1976-12-29 Dynachem Corp Polymers for aqueous processed photoresists
JPS5177401A (ja) 1974-12-26 1976-07-05 Fuji Photo Film Co Ltd Genzoekisoseibutsu
JPS5230503A (en) 1975-09-01 1977-03-08 Mitsubishi Chem Ind Method of making aluminium plate material for lithographic printing
JPS5258602A (en) 1975-11-06 1977-05-14 Nippon Keikinzoku Sougou Kenki Method of producing aluminium roughened surfaced plate for offset printing
JPS5344202A (en) 1976-10-01 1978-04-20 Fuji Photo Film Co Ltd Developer composition and developing method
JPS5415102A (en) 1977-07-06 1979-02-03 Hitachi Ltd Balance correction of rotary armatures
JPS5492723A (en) 1977-12-30 1979-07-23 Somar Mfg Photosensitive material and use
US4195997A (en) * 1978-01-23 1980-04-01 E. I. Du Pont De Nemours And Company Photopolymerizable compositions containing selected cellulose acetate butyrate as a binder
US4177074A (en) * 1978-01-25 1979-12-04 E. I. Du Pont De Nemours And Company Butadiene/acrylonitrile photosensitive, elastomeric polymer compositions for flexographic printing plates
US4162162A (en) 1978-05-08 1979-07-24 E. I. Du Pont De Nemours And Company Derivatives of aryl ketones and p-dialkyl-aminoarylaldehydes as visible sensitizers of photopolymerizable compositions
JPS5628893A (en) 1979-08-16 1981-03-23 Fuji Photo Film Co Ltd Carrier for lithography plate and manufacture of said carrier
US4419437A (en) * 1981-02-11 1983-12-06 Eastman Kodak Company Image-forming compositions and elements containing ionic polyester dispersing agents
JPS5815503A (ja) 1981-07-20 1983-01-28 Fuji Photo Film Co Ltd 光重合性組成物
JPS5854241A (ja) 1981-09-29 1983-03-31 Hino Motors Ltd 繊維強化樹脂製板ばね
JPS591504A (ja) 1982-06-26 1984-01-06 Nippon Oil & Fats Co Ltd 光重合開始剤組成物
JPS5945303A (ja) 1982-09-07 1984-03-14 Nippon Oil & Fats Co Ltd 高感度光開始剤組成物
JPS5944615A (ja) 1982-09-07 1984-03-13 Furuno Electric Co Ltd ジヤイロ装置
JPS5953836A (ja) 1982-09-21 1984-03-28 Fuji Photo Film Co Ltd 感光性平版印刷版
JPS5971048A (ja) 1982-10-18 1984-04-21 Mitsubishi Chem Ind Ltd 光重合系感光性組成物
JPS59140203A (ja) 1983-02-01 1984-08-11 Nippon Oil & Fats Co Ltd 高感度光開始剤組成物
US4576975A (en) * 1983-03-03 1986-03-18 Minnesota Mining And Manufacturing Company Water soluble Michler's ketone analogs in combined photoinitiator composition and polymerizable composition
JPS59189340A (ja) 1983-04-13 1984-10-26 Nippon Oil & Fats Co Ltd 高感度光重合開始剤組成物
CA1270089A (en) 1985-08-01 1990-06-05 Masami Kawabata Photopolymerizable composition
US4772541A (en) 1985-11-20 1988-09-20 The Mead Corporation Photohardenable compositions containing a dye borate complex and photosensitive materials employing the same
CA1284740C (en) 1985-11-20 1991-06-11 Peter Gottschalk Photosensitive materials containing ionic dye compounds as initiators
US4637214A (en) 1985-12-17 1987-01-20 Westinghouse Electric Corp. Single-ended steam chest with improved support assembly
JPH0699496B2 (ja) 1987-01-16 1994-12-07 富士写真フイルム株式会社 光重合性組成物
JPH0699497B2 (ja) 1987-04-16 1994-12-07 富士写真フイルム株式会社 光重合性組成物
JPH089643B2 (ja) 1987-07-06 1996-01-31 富士写真フイルム株式会社 光重合性組成物
JPH07120036B2 (ja) 1987-07-06 1995-12-20 富士写真フイルム株式会社 光重合性組成物
JPS6413144A (en) 1987-07-06 1989-01-18 Fuji Photo Film Co Ltd Photopolymerizable composition
JPS6413142A (en) 1987-07-06 1989-01-18 Fuji Photo Film Co Ltd Photopolymerizable composition
JPS6413141A (en) 1987-07-06 1989-01-18 Fuji Photo Film Co Ltd Photopolymerizable composition
JPS6413143A (en) 1987-07-06 1989-01-18 Fuji Photo Film Co Ltd Photopolymerizable composition
JPS6417048A (en) 1987-07-10 1989-01-20 Fuji Photo Film Co Ltd Photopolymerizable composition
JPH0721633B2 (ja) 1987-07-10 1995-03-08 富士写真フイルム株式会社 感光材料
JPS6472150A (en) 1987-09-11 1989-03-17 Fuji Photo Film Co Ltd Photopolymerizable composition
JPH01229003A (ja) 1988-03-09 1989-09-12 Fuji Photo Film Co Ltd 光重合性組成物
US5262276A (en) 1988-05-11 1993-11-16 Fuji Photo Film Co., Ltd. Light-sensitive compositions
JP2547613B2 (ja) 1988-05-27 1996-10-23 富士写真フイルム株式会社 光重合性組成物
JP2571113B2 (ja) 1988-12-29 1997-01-16 富士写真フイルム株式会社 光重合性組成物
JP2631143B2 (ja) 1989-03-16 1997-07-16 富士写真フイルム株式会社 光重合性組成物
JPH0369949A (ja) * 1989-08-09 1991-03-26 Fuji Photo Film Co Ltd 感光性マイクロカプセル及び感光材料
US5011762A (en) * 1990-08-14 1991-04-30 Industrial Technology Research Institute Photosensitive compositions having enhanced photopolymerization rate
JPH04113362A (ja) * 1990-09-03 1992-04-14 Fuji Photo Film Co Ltd 光重合性組成物
JPH0695372A (ja) * 1992-09-11 1994-04-08 Fuji Photo Film Co Ltd 感光材料の製造方法

Also Published As

Publication number Publication date
JPH08101498A (ja) 1996-04-16
DE69501486T2 (de) 1998-04-30
US5698372A (en) 1997-12-16
EP0695971A1 (de) 1996-02-07
EP0695971B1 (de) 1998-01-21

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP