DE69518107T2 - Lichtempfindliche lithographische Druckplatte - Google Patents

Lichtempfindliche lithographische Druckplatte

Info

Publication number
DE69518107T2
DE69518107T2 DE1995618107 DE69518107T DE69518107T2 DE 69518107 T2 DE69518107 T2 DE 69518107T2 DE 1995618107 DE1995618107 DE 1995618107 DE 69518107 T DE69518107 T DE 69518107T DE 69518107 T2 DE69518107 T2 DE 69518107T2
Authority
DE
Germany
Prior art keywords
printing plate
lithographic printing
photosensitive lithographic
photosensitive
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE1995618107
Other languages
English (en)
Other versions
DE69518107D1 (de
Inventor
Yuichi Shiraishi
Keitaro Aoshima
Shoichiro Aono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Application granted granted Critical
Publication of DE69518107D1 publication Critical patent/DE69518107D1/de
Publication of DE69518107T2 publication Critical patent/DE69518107T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE1995618107 1994-04-25 1995-03-16 Lichtempfindliche lithographische Druckplatte Expired - Fee Related DE69518107T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8681994A JP3278286B2 (ja) 1994-04-25 1994-04-25 感光性平版印刷版

Publications (2)

Publication Number Publication Date
DE69518107D1 DE69518107D1 (de) 2000-08-31
DE69518107T2 true DE69518107T2 (de) 2000-12-14

Family

ID=13897421

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1995618107 Expired - Fee Related DE69518107T2 (de) 1994-04-25 1995-03-16 Lichtempfindliche lithographische Druckplatte

Country Status (3)

Country Link
EP (1) EP0679950B1 (de)
JP (1) JP3278286B2 (de)
DE (1) DE69518107T2 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19847616C2 (de) * 1998-10-15 2001-05-10 Kodak Polychrome Graphics Gmbh Polyvinylacetale mit Imidogruppen sowie die Verwendung derselben in lichtempfindlichen Zusammensetzungen
DE60014536T2 (de) 1999-08-02 2005-03-24 Kodak Polychrome Graphics Gmbh Strahlungsempfindliche Zusammensetzungen für Druckplatten mit verbesserter chemischer Beständigkeit und Entwickler-Beständigkeit und mit diesen Zusammensetzungen hergestellte Druckplatten
DE19936333A1 (de) * 1999-08-02 2001-03-15 Kodak Polychrome Graphics Gmbh Strahlungsempfindliche Zusammensetzungen für Druckplatten zur Steigerung der Chemikalien- und Entwicklerresistenz
DE19936332A1 (de) * 1999-08-02 2001-03-15 Kodak Polychrome Graphics Gmbh Druckplatten mit hoher Chemikalien-Entwicklerresistenz
US6270938B1 (en) 2000-06-09 2001-08-07 Kodak Polychrome Graphics Llc Acetal copolymers and use thereof in photosensitive compositions
JP5630636B2 (ja) * 2010-02-25 2014-11-26 日立化成株式会社 感光性樹脂組成物、永久レジスト用感光性フィルム、レジストパターンの形成方法、プリント配線板及びその製造方法、表面保護膜並びに層間絶縁膜

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6278544A (ja) * 1985-10-01 1987-04-10 Fuji Photo Film Co Ltd 感光性組成物
EP0353873B1 (de) * 1988-07-11 1993-12-29 Konica Corporation Lichtempfindliche Zusammensetzung
US5112743A (en) * 1989-05-24 1992-05-12 Fuji Photo Film Co., Ltd. Light-sensitive composition and presensitized plate for use in making lithographic printing plates
JP2627565B2 (ja) * 1990-02-19 1997-07-09 富士写真フイルム株式会社 感光性平版印刷版
JP3150776B2 (ja) * 1992-08-21 2001-03-26 岡本化学工業株式会社 感光性組成物

Also Published As

Publication number Publication date
JPH07295212A (ja) 1995-11-10
JP3278286B2 (ja) 2002-04-30
EP0679950A3 (de) 1997-02-26
EP0679950B1 (de) 2000-07-26
DE69518107D1 (de) 2000-08-31
EP0679950A2 (de) 1995-11-02

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP

8339 Ceased/non-payment of the annual fee