DE69712273D1 - Lichtempfindliche Zusammensetzung und lithographische Druckplatte unter Verwendung derselben - Google Patents

Lichtempfindliche Zusammensetzung und lithographische Druckplatte unter Verwendung derselben

Info

Publication number
DE69712273D1
DE69712273D1 DE69712273T DE69712273T DE69712273D1 DE 69712273 D1 DE69712273 D1 DE 69712273D1 DE 69712273 T DE69712273 T DE 69712273T DE 69712273 T DE69712273 T DE 69712273T DE 69712273 D1 DE69712273 D1 DE 69712273D1
Authority
DE
Germany
Prior art keywords
same
printing plate
lithographic printing
photosensitive composition
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69712273T
Other languages
English (en)
Inventor
Kimihiko Okubo
Noritaka Nakayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Application granted granted Critical
Publication of DE69712273D1 publication Critical patent/DE69712273D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/117Free radical
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/12Nitrogen compound containing
    • Y10S430/121Nitrogen in heterocyclic ring
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/122Sulfur compound containing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/122Sulfur compound containing
    • Y10S430/123Sulfur in heterocyclic ring
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/127Spectral sensitizer containing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/148Light sensitive titanium compound containing

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polymerisation Methods In General (AREA)
DE69712273T 1996-07-24 1997-07-23 Lichtempfindliche Zusammensetzung und lithographische Druckplatte unter Verwendung derselben Expired - Lifetime DE69712273D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19467596A JP3470253B2 (ja) 1996-07-24 1996-07-24 光開始剤、光重合組成物、ラジカル発生方法、平版印刷版作成用感光材料及び平版印刷版の作成方法

Publications (1)

Publication Number Publication Date
DE69712273D1 true DE69712273D1 (de) 2002-06-06

Family

ID=16328433

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69712273T Expired - Lifetime DE69712273D1 (de) 1996-07-24 1997-07-23 Lichtempfindliche Zusammensetzung und lithographische Druckplatte unter Verwendung derselben

Country Status (4)

Country Link
US (1) US5965324A (de)
EP (1) EP0821276B1 (de)
JP (1) JP3470253B2 (de)
DE (1) DE69712273D1 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6740466B1 (en) 1999-11-15 2004-05-25 Fuji Photo Film Co., Ltd. Photopolymerizable composition and recording material using the same
US6664025B2 (en) 2002-02-12 2003-12-16 Kodak Polychrome Graphics Llc Visible radiation sensitive composition
US7659046B2 (en) * 2002-04-10 2010-02-09 Eastman Kodak Company Water-developable infrared-sensitive printing plate
US7074546B2 (en) 2002-06-24 2006-07-11 Konica Corporation Light sensitive planographic printing plate precursor and its processing method
US7084191B2 (en) * 2002-12-20 2006-08-01 Avery Dennison Corporation Ink composition resistant to solvent evaporation
US7521155B2 (en) * 2003-06-10 2009-04-21 Dai Nippon Printing Co., Ltd. Volume hologram layer and volume hologram transfer foil
JP4125669B2 (ja) * 2003-12-22 2008-07-30 大日本印刷株式会社 体積型ホログラム製造方法
WO2010035697A1 (ja) * 2008-09-24 2010-04-01 富士フイルム株式会社 平版印刷版の作製方法
US20150018262A1 (en) * 2013-07-11 2015-01-15 Zep Ip Holding Llc Aluminum-Safe Surface Presoak Cleaner and Process
JP7373490B2 (ja) * 2018-01-31 2023-11-02 スリーエム イノベイティブ プロパティズ カンパニー 光解離性バルビツール酸系化合物

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4713401A (en) * 1984-12-20 1987-12-15 Martin Riediker Titanocenes and a radiation-polymerizable composition containing these titanocenes
US4636459A (en) * 1985-03-06 1987-01-13 Fuji Photo Film Co., Ltd. Photopolymerizable compositions
CA1308852C (en) * 1987-01-22 1992-10-13 Masami Kawabata Photopolymerizable composition
JP2552550B2 (ja) * 1989-07-24 1996-11-13 富士写真フイルム株式会社 感光性組成物
JP2632069B2 (ja) * 1990-04-17 1997-07-16 富士写真フイルム株式会社 光重合性組成物
DE69210846T2 (de) * 1991-01-29 1996-10-02 National Starch And Chemical Investment Holding Corp., Wilmington, Del. Photopolymerisierbare Zusammensetzungen
JP2860737B2 (ja) * 1992-09-29 1999-02-24 富士写真フイルム株式会社 感光性組成物
JPH0867866A (ja) * 1994-06-20 1996-03-12 Canon Inc 光重合剤及び/又は光架橋剤に対する可視光増感剤、感光性組成物及びホログラム記録媒体
US5738974A (en) * 1994-09-05 1998-04-14 Mitsubishi Chemical Corporation Photopolymerizable composition and photosensitive lithographic printing plate
JPH0943843A (ja) * 1995-07-28 1997-02-14 Mitsubishi Chem Corp 光重合性組成物

Also Published As

Publication number Publication date
JPH1039499A (ja) 1998-02-13
JP3470253B2 (ja) 2003-11-25
EP0821276B1 (de) 2002-05-02
EP0821276A1 (de) 1998-01-28
US5965324A (en) 1999-10-12

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Legal Events

Date Code Title Description
8332 No legal effect for de