DE69622218D1 - Fotoempfindliche Zusammensetzung und fotoempfindliche Gummiplatte - Google Patents

Fotoempfindliche Zusammensetzung und fotoempfindliche Gummiplatte

Info

Publication number
DE69622218D1
DE69622218D1 DE69622218T DE69622218T DE69622218D1 DE 69622218 D1 DE69622218 D1 DE 69622218D1 DE 69622218 T DE69622218 T DE 69622218T DE 69622218 T DE69622218 T DE 69622218T DE 69622218 D1 DE69622218 D1 DE 69622218D1
Authority
DE
Germany
Prior art keywords
photosensitive
rubber plate
composition
photosensitive composition
photosensitive rubber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69622218T
Other languages
English (en)
Other versions
DE69622218T2 (de
Inventor
Fusayoshi Sakurai
Haruo Ueno
Takao Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zeon Corp
Original Assignee
Zeon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeon Corp filed Critical Zeon Corp
Publication of DE69622218D1 publication Critical patent/DE69622218D1/de
Application granted granted Critical
Publication of DE69622218T2 publication Critical patent/DE69622218T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Graft Or Block Polymers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
DE69622218T 1995-04-26 1996-04-26 Fotoempfindliche Zusammensetzung und fotoempfindliche Gummiplatte Expired - Lifetime DE69622218T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12570695 1995-04-26

Publications (2)

Publication Number Publication Date
DE69622218D1 true DE69622218D1 (de) 2002-08-14
DE69622218T2 DE69622218T2 (de) 2002-12-12

Family

ID=14916720

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69622218T Expired - Lifetime DE69622218T2 (de) 1995-04-26 1996-04-26 Fotoempfindliche Zusammensetzung und fotoempfindliche Gummiplatte

Country Status (3)

Country Link
US (1) US5863704A (de)
EP (1) EP0740214B1 (de)
DE (1) DE69622218T2 (de)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1031303A (ja) * 1994-09-29 1998-02-03 Nippon Zeon Co Ltd 感光性組成物及び感光性ゴム版
DE19639767A1 (de) * 1996-09-27 1998-04-02 Du Pont Deutschland Flexographische Druckformen für UV härtbare Druckfarben
SG55445A1 (en) * 1997-01-07 1998-12-21 Denki Kagaku Kogyo Kabushili K Block copolymer block copolymer compostion and heat shrinkable films made thereof
JP3197282B2 (ja) * 1997-08-26 2001-08-13 旭化成株式会社 水現像型版材梱包体
EP1060085A1 (de) * 1998-02-23 2000-12-20 Minnesota Mining And Manufacturing Company Aufzeichnungsblatt für tintenstrahldruckverfahren
WO2000000546A1 (en) 1998-06-29 2000-01-06 Shell Internationale Research Maatschappij B.V. Photo-curable polymer composition and flexographic printing plates containing the same
DE19859623A1 (de) * 1998-12-23 2000-08-24 Basf Drucksysteme Gmbh Photopolymerisierbare Druckformen mit Oberschicht zur Herstellung von Reliefdruckformen
US6326127B1 (en) 1998-12-31 2001-12-04 Kraton Polymers U.S. Llc Photo-curable polymer composition and flexographic printing plates containing the same
US6228543B1 (en) 1999-09-09 2001-05-08 3M Innovative Properties Company Thermal transfer with a plasticizer-containing transfer layer
JP4230085B2 (ja) * 2000-03-16 2009-02-25 旭化成ケミカルズ株式会社 改良されたフレキソ印刷版用感光性構成体
TW562997B (en) * 2000-09-27 2003-11-21 Hitachi Chemical Co Ltd Photoresist mask pattern, and preparing method and use thereof
JP4539561B2 (ja) * 2003-09-25 2010-09-08 日本ゼオン株式会社 感光性フレキソ版用ブロック共重合体組成物
KR100883254B1 (ko) * 2004-11-11 2009-02-10 아사히 가세이 케미칼즈 가부시키가이샤 플렉소 인쇄용 감광성 수지 조성물
US20060154180A1 (en) 2005-01-07 2006-07-13 Kannurpatti Anandkumar R Imaging element for use as a recording element and process of using the imaging element
US7674388B2 (en) 2005-08-10 2010-03-09 The Regents Of The University Of California Photopolymer serum separator
US7673758B2 (en) 2005-08-10 2010-03-09 The Regents Of The University Of California Collection tubes apparatus, systems, and methods
EP2026132B1 (de) 2007-08-16 2013-03-13 E. I. Du Pont de Nemours and Company Verfahren zur Herstellung eines zylindrisch geformten lichtempfindlichen Elements zur Verwendung als Druckform
US8470518B2 (en) * 2007-09-14 2013-06-25 E I Du Pont De Nemours And Company Photosensitive element having reinforcing particles and method for preparing a printing form from the element
US8236479B2 (en) 2008-01-23 2012-08-07 E I Du Pont De Nemours And Company Method for printing a pattern on a substrate
EP2085820B1 (de) 2008-01-30 2015-02-25 E. I. du Pont de Nemours and Company Vorrichtung und Verfahren zur Herstellung einer Reliefdruckform
US8241835B2 (en) 2008-01-30 2012-08-14 E I Du Pont De Nemours And Company Device and method for preparing relief printing form
EP2154572B1 (de) 2008-08-15 2017-05-03 E. I. du Pont de Nemours and Company Verfahren zur Herstellung eines zylinderförmigen lichtempfindlichen Elements zur Verwendung als Druckform
US8883399B2 (en) 2008-12-18 2014-11-11 Asahi Kasei E-Materials Corporation Ablation layer, photosensitive resin structure, and method for producing relief printing plate using the photosensitive resin structure
JP5778141B2 (ja) 2009-07-02 2015-09-16 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニーＥ．Ｉ．Ｄｕ Ｐｏｎｔ Ｄｅ Ｎｅｍｏｕｒｓ Ａｎｄ Ｃｏｍｐａｎｙ 基板上に材料を印刷するための方法
US8771926B2 (en) * 2011-06-27 2014-07-08 Kyle P. Baldwin Slip film for relief image printing element
JP6133866B2 (ja) 2011-08-26 2017-05-24 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニーＥ．Ｉ．Ｄｕ Ｐｏｎｔ Ｄｅ Ｎｅｍｏｕｒｓ Ａｎｄ Ｃｏｍｐａｎｙ 凸版印刷フォームの調製方法
US20130139714A1 (en) 2011-12-02 2013-06-06 E.I. Du Pont De Nemours And Company Method for making flexographic printing forms by welding edges of photosensitive elements with microwave energy
US9097974B2 (en) 2012-08-23 2015-08-04 E I Du Pont De Nemours And Company Method for preparing a relief printing form
US9669405B2 (en) 2012-10-22 2017-06-06 The Regents Of The University Of California Sterilizable photopolymer serum separator
EP3732243B1 (de) 2017-12-26 2024-09-18 Bridgestone Corporation Synthese von verjüngten styrol-butadien-copolymeren mit niedrigem molekulargewicht und ihre verwendung in reifen
JP2021042282A (ja) * 2019-09-09 2021-03-18 ジェイエスアール クレイトン エラストマー株式会社 柔軟性と耐摩耗性を両立した感光性印刷版材用ブロック共重合体及びその製造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4243500A (en) * 1978-12-04 1981-01-06 International Coatings, Co., Inc. Pressure sensitive adhesives
JPS60211451A (ja) * 1984-04-05 1985-10-23 Asahi Chem Ind Co Ltd 感光性エラストマ−組成物
JPH0495960A (ja) * 1990-08-08 1992-03-27 Hayakawa Rubber Co Ltd 感光性フレキソ印刷版組成物
US5348844A (en) * 1990-12-03 1994-09-20 Napp Systems, Inc. Photosensitive polymeric printing medium and water developable printing plates
JP2793068B2 (ja) * 1991-04-24 1998-09-03 日本ペイント株式会社 感光性樹脂組成物
JPH06202331A (ja) * 1992-12-28 1994-07-22 Nippon Zeon Co Ltd 感光性エラストマー組成物及びそれを用いた感光性フレキソ版
DE69426298T2 (de) * 1993-03-31 2001-07-12 Nippon Zeon Co., Ltd. Lichtempfindliche zusammensetzung, lichtempfindliche kautschukplatte und verfahren zur herstellung dieser platte, flexografische platte und verfahren zur herstellung dieser platte
US5496684A (en) * 1993-09-17 1996-03-05 Chase Elastomer Corporation Photosensitive compositions and elements for flexographic printing
JPH1031303A (ja) * 1994-09-29 1998-02-03 Nippon Zeon Co Ltd 感光性組成物及び感光性ゴム版

Also Published As

Publication number Publication date
EP0740214A2 (de) 1996-10-30
EP0740214B1 (de) 2002-07-10
EP0740214A3 (de) 1998-07-15
DE69622218T2 (de) 2002-12-12
US5863704A (en) 1999-01-26

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition