DE69413762D1 - Fotoempfindliche Polymer-Zusammensetzung - Google Patents

Fotoempfindliche Polymer-Zusammensetzung

Info

Publication number
DE69413762D1
DE69413762D1 DE69413762T DE69413762T DE69413762D1 DE 69413762 D1 DE69413762 D1 DE 69413762D1 DE 69413762 T DE69413762 T DE 69413762T DE 69413762 T DE69413762 T DE 69413762T DE 69413762 D1 DE69413762 D1 DE 69413762D1
Authority
DE
Germany
Prior art keywords
polymer composition
photosensitive polymer
photosensitive
composition
polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69413762T
Other languages
English (en)
Other versions
DE69413762T2 (de
Inventor
Shigetora Kashio
Katsutoshi Sasashita
Tomio Adachi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Application granted granted Critical
Publication of DE69413762D1 publication Critical patent/DE69413762D1/de
Publication of DE69413762T2 publication Critical patent/DE69413762T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
DE69413762T 1993-07-20 1994-07-19 Fotoempfindliche Polymer-Zusammensetzung Expired - Fee Related DE69413762T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17884993 1993-07-20

Publications (2)

Publication Number Publication Date
DE69413762D1 true DE69413762D1 (de) 1998-11-12
DE69413762T2 DE69413762T2 (de) 1999-03-04

Family

ID=16055754

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69413762T Expired - Fee Related DE69413762T2 (de) 1993-07-20 1994-07-19 Fotoempfindliche Polymer-Zusammensetzung

Country Status (4)

Country Link
US (1) US5688632A (de)
EP (1) EP0636940B1 (de)
AU (1) AU681664B2 (de)
DE (1) DE69413762T2 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69528429T2 (de) * 1994-04-13 2003-07-03 Toray Industries, Inc. Lichtempfindliche kunststoffzusammensetzung für druckplatten und druckplattenmaterial mit solch einer zusammensetzung
JP3471990B2 (ja) * 1995-09-27 2003-12-02 富士写真フイルム株式会社 ポジ型感光性平版印刷版およびその製造方法
JP3912705B2 (ja) * 1998-03-05 2007-05-09 東京応化工業株式会社 ネガ型感光性樹脂組成物およびこれを用いた感光性樹脂版
JP3238369B2 (ja) * 1998-04-10 2001-12-10 ソニーケミカル株式会社 フォトレジスト用組成物、及びフレキシブルプリント配線板の製造方法
US6558870B1 (en) * 1999-06-23 2003-05-06 Toyo Boseki Kabushiki Kaisha Water-washable photosensitive flexo plate and printing plate
JP2005526163A (ja) * 2002-05-14 2005-09-02 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー 塗料用途のための架橋性ポリアミド組成物、かかる組成物を用いる方法およびかかる組成物から製造された物品
JP2005054145A (ja) * 2003-08-07 2005-03-03 Mitsubishi Gas Chem Co Inc ガスバリア性（メタ）アクリレート樹脂硬化物および塗料、接着剤、フィルム
MX343573B (es) * 2008-03-06 2016-10-26 Bayer Materialscience Llc Recubrimientos acuosos para suelos basados en dispersiones de poliuretano curable por uv.
JP5305793B2 (ja) * 2008-03-31 2013-10-02 富士フイルム株式会社 レリーフ印刷版及びレリーフ印刷版の製造方法
CN103059292B (zh) * 2013-02-05 2015-08-26 苏州瀚海化学有限公司 水溶性共聚酰胺及其制备方法
EP3605224B1 (de) 2017-03-31 2021-06-30 Toyobo Co., Ltd. Lichtempfindliche ctp-flexodruckplatte

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS516562B2 (de) * 1971-12-15 1976-02-28
US3898087A (en) * 1974-06-14 1975-08-05 Ball Corp Photopolymerizable compositions containing aminimides
JPS5636511A (en) * 1979-09-04 1981-04-09 Toray Ind Inc Photosensitive polyamide resin composition
JPS5732441A (en) * 1980-08-06 1982-02-22 Unitika Ltd Photosensitive resin composition
JPS5745535A (en) * 1980-09-02 1982-03-15 Unitika Ltd Photosensitive resin composition
CA2016919C (en) * 1989-05-18 2003-07-29 Masaru Nanpei Photosensitive resin compositions
JPH0341459A (ja) * 1989-07-07 1991-02-21 Bando Chem Ind Ltd 下引き層を有する積層型有機感光体
JPH0342671A (ja) * 1989-07-10 1991-02-22 Bando Chem Ind Ltd 下引き層を有する積層型有機感光体
US5238783A (en) * 1990-04-16 1993-08-24 Toray Industries, Inc. Photosensitive polymer composition for water developable flexographic printing plate
CA2084369A1 (en) * 1991-12-11 1993-06-12 Brent T. Speelman Water-borne photoimageable compositions
JP2745928B2 (ja) * 1992-01-30 1998-04-28 東レ株式会社 感光性樹脂印刷版

Also Published As

Publication number Publication date
AU681664B2 (en) 1997-09-04
DE69413762T2 (de) 1999-03-04
US5688632A (en) 1997-11-18
AU6755694A (en) 1995-02-02
EP0636940A1 (de) 1995-02-01
EP0636940B1 (de) 1998-10-07

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee