JPS5732441A - Photosensitive resin composition - Google Patents
Photosensitive resin compositionInfo
- Publication number
- JPS5732441A JPS5732441A JP10862980A JP10862980A JPS5732441A JP S5732441 A JPS5732441 A JP S5732441A JP 10862980 A JP10862980 A JP 10862980A JP 10862980 A JP10862980 A JP 10862980A JP S5732441 A JPS5732441 A JP S5732441A
- Authority
- JP
- Japan
- Prior art keywords
- resin composition
- water soluble
- soluble polyamide
- 100pts
- water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
PURPOSE:To obtain the titled composition causing slight swelling in water after photosetting and enabling water development by blending water soluble polyamide with a vinyl alcohol polymer, a polymerizing vinyl monomer and a photoreaction initiator. CONSTITUTION:To 100pts.wt. water soluble polyamide (A) such as water soluble polyamide having sulfonic acid or sulfonate in each molecule are added 0.5- 100pts.wt. vinyl alcohol polymer (B) preferably having >=50 polymn. degree and >=50mol% saponification degree, a polymerizing vinyl monomer such as bisacrylamide of diamine or bis(alpha-alkyl)acrylamide by about 5-100wt% to 100wt% of the total amount of the components A, B, and a photoreaction initiator (D) such as benzophenone or benzoin by about 0.01-10wt% to the amount of the total resin composition. The resulting resin composition is formed into a film or a sheet having a desired thickness.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10862980A JPS5732441A (en) | 1980-08-06 | 1980-08-06 | Photosensitive resin composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10862980A JPS5732441A (en) | 1980-08-06 | 1980-08-06 | Photosensitive resin composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5732441A true JPS5732441A (en) | 1982-02-22 |
JPS6412378B2 JPS6412378B2 (en) | 1989-02-28 |
Family
ID=14489633
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10862980A Granted JPS5732441A (en) | 1980-08-06 | 1980-08-06 | Photosensitive resin composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5732441A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59170835A (en) * | 1983-03-17 | 1984-09-27 | Toray Ind Inc | Photosensitive resin composition |
JPS59195235A (en) * | 1983-04-20 | 1984-11-06 | Toray Ind Inc | Photosensitive resin composition |
JPS60133445A (en) * | 1983-11-26 | 1985-07-16 | チバ―ガイギー アクチエンゲゼルシヤフト | Photoresist composition |
JPS6147741A (en) * | 1984-08-13 | 1986-03-08 | Nippon Synthetic Chem Ind Co Ltd:The | Curable resin composition |
JPS6147742A (en) * | 1984-08-13 | 1986-03-08 | Nippon Synthetic Chem Ind Co Ltd:The | Curable resin composition |
US5688632A (en) * | 1993-07-20 | 1997-11-18 | Toray Industries, Inc. | Photosensitive polymer composition containing a soluble polymer of islands-in-a-sea structure, a photopolymerizable polymer, and a photopolymerization initiator |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5017146A (en) * | 1973-05-01 | 1975-02-22 |
-
1980
- 1980-08-06 JP JP10862980A patent/JPS5732441A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5017146A (en) * | 1973-05-01 | 1975-02-22 |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59170835A (en) * | 1983-03-17 | 1984-09-27 | Toray Ind Inc | Photosensitive resin composition |
JPS59195235A (en) * | 1983-04-20 | 1984-11-06 | Toray Ind Inc | Photosensitive resin composition |
JPS60133445A (en) * | 1983-11-26 | 1985-07-16 | チバ―ガイギー アクチエンゲゼルシヤフト | Photoresist composition |
JPH0424694B2 (en) * | 1983-11-26 | 1992-04-27 | Ciba Geigy | |
JPS6147741A (en) * | 1984-08-13 | 1986-03-08 | Nippon Synthetic Chem Ind Co Ltd:The | Curable resin composition |
JPS6147742A (en) * | 1984-08-13 | 1986-03-08 | Nippon Synthetic Chem Ind Co Ltd:The | Curable resin composition |
JPH0558006B2 (en) * | 1984-08-13 | 1993-08-25 | Nippon Synthetic Chem Ind | |
US5688632A (en) * | 1993-07-20 | 1997-11-18 | Toray Industries, Inc. | Photosensitive polymer composition containing a soluble polymer of islands-in-a-sea structure, a photopolymerizable polymer, and a photopolymerization initiator |
Also Published As
Publication number | Publication date |
---|---|
JPS6412378B2 (en) | 1989-02-28 |
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