JPS5732441A - Photosensitive resin composition - Google Patents

Photosensitive resin composition

Info

Publication number
JPS5732441A
JPS5732441A JP10862980A JP10862980A JPS5732441A JP S5732441 A JPS5732441 A JP S5732441A JP 10862980 A JP10862980 A JP 10862980A JP 10862980 A JP10862980 A JP 10862980A JP S5732441 A JPS5732441 A JP S5732441A
Authority
JP
Japan
Prior art keywords
resin composition
water soluble
soluble polyamide
100pts
water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10862980A
Other languages
Japanese (ja)
Other versions
JPS6412378B2 (en
Inventor
Takashi Okamoto
Minoru Mitsui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Unitika Ltd
Original Assignee
Unitika Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Unitika Ltd filed Critical Unitika Ltd
Priority to JP10862980A priority Critical patent/JPS5732441A/en
Publication of JPS5732441A publication Critical patent/JPS5732441A/en
Publication of JPS6412378B2 publication Critical patent/JPS6412378B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/037Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

PURPOSE:To obtain the titled composition causing slight swelling in water after photosetting and enabling water development by blending water soluble polyamide with a vinyl alcohol polymer, a polymerizing vinyl monomer and a photoreaction initiator. CONSTITUTION:To 100pts.wt. water soluble polyamide (A) such as water soluble polyamide having sulfonic acid or sulfonate in each molecule are added 0.5- 100pts.wt. vinyl alcohol polymer (B) preferably having >=50 polymn. degree and >=50mol% saponification degree, a polymerizing vinyl monomer such as bisacrylamide of diamine or bis(alpha-alkyl)acrylamide by about 5-100wt% to 100wt% of the total amount of the components A, B, and a photoreaction initiator (D) such as benzophenone or benzoin by about 0.01-10wt% to the amount of the total resin composition. The resulting resin composition is formed into a film or a sheet having a desired thickness.
JP10862980A 1980-08-06 1980-08-06 Photosensitive resin composition Granted JPS5732441A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10862980A JPS5732441A (en) 1980-08-06 1980-08-06 Photosensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10862980A JPS5732441A (en) 1980-08-06 1980-08-06 Photosensitive resin composition

Publications (2)

Publication Number Publication Date
JPS5732441A true JPS5732441A (en) 1982-02-22
JPS6412378B2 JPS6412378B2 (en) 1989-02-28

Family

ID=14489633

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10862980A Granted JPS5732441A (en) 1980-08-06 1980-08-06 Photosensitive resin composition

Country Status (1)

Country Link
JP (1) JPS5732441A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59170835A (en) * 1983-03-17 1984-09-27 Toray Ind Inc Photosensitive resin composition
JPS59195235A (en) * 1983-04-20 1984-11-06 Toray Ind Inc Photosensitive resin composition
JPS60133445A (en) * 1983-11-26 1985-07-16 チバ―ガイギー アクチエンゲゼルシヤフト Photoresist composition
JPS6147741A (en) * 1984-08-13 1986-03-08 Nippon Synthetic Chem Ind Co Ltd:The Curable resin composition
JPS6147742A (en) * 1984-08-13 1986-03-08 Nippon Synthetic Chem Ind Co Ltd:The Curable resin composition
US5688632A (en) * 1993-07-20 1997-11-18 Toray Industries, Inc. Photosensitive polymer composition containing a soluble polymer of islands-in-a-sea structure, a photopolymerizable polymer, and a photopolymerization initiator

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5017146A (en) * 1973-05-01 1975-02-22

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5017146A (en) * 1973-05-01 1975-02-22

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59170835A (en) * 1983-03-17 1984-09-27 Toray Ind Inc Photosensitive resin composition
JPS59195235A (en) * 1983-04-20 1984-11-06 Toray Ind Inc Photosensitive resin composition
JPS60133445A (en) * 1983-11-26 1985-07-16 チバ―ガイギー アクチエンゲゼルシヤフト Photoresist composition
JPH0424694B2 (en) * 1983-11-26 1992-04-27 Ciba Geigy
JPS6147741A (en) * 1984-08-13 1986-03-08 Nippon Synthetic Chem Ind Co Ltd:The Curable resin composition
JPS6147742A (en) * 1984-08-13 1986-03-08 Nippon Synthetic Chem Ind Co Ltd:The Curable resin composition
JPH0558006B2 (en) * 1984-08-13 1993-08-25 Nippon Synthetic Chem Ind
US5688632A (en) * 1993-07-20 1997-11-18 Toray Industries, Inc. Photosensitive polymer composition containing a soluble polymer of islands-in-a-sea structure, a photopolymerizable polymer, and a photopolymerization initiator

Also Published As

Publication number Publication date
JPS6412378B2 (en) 1989-02-28

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