DE69528069D1 - Fotoempfindliche zusammensetzung und fotoempfindliche gummiplatte - Google Patents
Fotoempfindliche zusammensetzung und fotoempfindliche gummiplatteInfo
- Publication number
- DE69528069D1 DE69528069D1 DE69528069T DE69528069T DE69528069D1 DE 69528069 D1 DE69528069 D1 DE 69528069D1 DE 69528069 T DE69528069 T DE 69528069T DE 69528069 T DE69528069 T DE 69528069T DE 69528069 D1 DE69528069 D1 DE 69528069D1
- Authority
- DE
- Germany
- Prior art keywords
- photo sensitive
- rubber plate
- composition
- sensitive composition
- photo
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Graft Or Block Polymers (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6259158A JPH1031303A (ja) | 1994-09-29 | 1994-09-29 | 感光性組成物及び感光性ゴム版 |
PCT/JP1995/001923 WO1996010218A1 (fr) | 1994-09-29 | 1995-09-25 | Composition photosensible et plaque en caoutchouc photosensible |
Publications (1)
Publication Number | Publication Date |
---|---|
DE69528069D1 true DE69528069D1 (de) | 2002-10-10 |
Family
ID=17330157
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69528069T Expired - Lifetime DE69528069D1 (de) | 1994-09-29 | 1995-09-25 | Fotoempfindliche zusammensetzung und fotoempfindliche gummiplatte |
Country Status (5)
Country | Link |
---|---|
US (1) | US6025098A (de) |
EP (1) | EP0784232B1 (de) |
JP (1) | JPH1031303A (de) |
DE (1) | DE69528069D1 (de) |
WO (1) | WO1996010218A1 (de) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3044689B2 (ja) * | 1994-10-14 | 2000-05-22 | 日本ゼオン株式会社 | 感光性エラストマー組成物及び感光性ゴム版 |
US5863704A (en) * | 1995-04-26 | 1999-01-26 | Nippon Zeon Company, Ltd. | Photosensitive composition and photosensitive rubber plate |
US5889116A (en) * | 1995-12-06 | 1999-03-30 | Nippon Zeon Co., Ltd. | Photosensitive composition from copolymers of ethylenic phosphorous monomer(s) and elastomer |
WO1998004407A1 (fr) * | 1996-07-30 | 1998-02-05 | Hitachi Chemical Co., Ltd. | Fabrication d'une couche mince stratifiee et d'une carte a circuit imprime |
US5902714A (en) * | 1997-07-30 | 1999-05-11 | Polyfibron Technologies, Inc. | Latex-based, aqueous developable photopolymers and use thereof in printing plates |
DE19811330A1 (de) | 1998-03-16 | 1999-09-23 | Du Pont Deutschland | Entwickler und Verfahren zur Herstellung von flexographischen Druckformen |
WO2000039640A1 (fr) | 1998-12-25 | 2000-07-06 | Asahi Kasei Kabushiki Kaisha | Cliche flexographique et planche originale pour ce dernier |
US6506542B1 (en) | 1999-03-16 | 2003-01-14 | E.I. Du Pont De Nemours And Company | Developer and process for preparing flexographic printing forms |
JP4230085B2 (ja) * | 2000-03-16 | 2009-02-25 | 旭化成ケミカルズ株式会社 | 改良されたフレキソ印刷版用感光性構成体 |
WO2002027407A1 (fr) * | 2000-09-27 | 2002-04-04 | Hitachi Chemical Co., Ltd. | Motif de reserve, procede de production et d'utilisation dudit motif |
JP4839525B2 (ja) | 2000-09-29 | 2011-12-21 | 大日本印刷株式会社 | 感光性樹脂組成物および液晶ディスプレイ用カラーフィルタ |
DE10227189A1 (de) * | 2002-06-18 | 2004-01-08 | Basf Drucksysteme Gmbh | Verfahren zur Herstellung von Flexdruckformen mittels Laser-Direktgravur |
JP4069389B2 (ja) * | 2003-03-07 | 2008-04-02 | ジェイエスアール クレイトン エラストマー株式会社 | アスファルト改質用ブロック共重合体組成物、その製造方法、およびアスファルト組成物 |
JP4539561B2 (ja) * | 2003-09-25 | 2010-09-08 | 日本ゼオン株式会社 | 感光性フレキソ版用ブロック共重合体組成物 |
CA2569749A1 (en) * | 2004-06-11 | 2005-12-22 | Asahi Kasei Chemicals Corporation | Photosensitive resin for flexographic printing plate |
JP4798333B2 (ja) * | 2004-10-06 | 2011-10-19 | ジェイエスアール クレイトン エラストマー株式会社 | 感光性印刷版材用ブロック共重合体およびその組成物およびそれを用いた感光性エラストマー組成物 |
JP4675334B2 (ja) * | 2004-11-11 | 2011-04-20 | 旭化成イーマテリアルズ株式会社 | フレキソ印刷用感光性樹脂組成物 |
US20060154180A1 (en) | 2005-01-07 | 2006-07-13 | Kannurpatti Anandkumar R | Imaging element for use as a recording element and process of using the imaging element |
BRPI0614073A2 (pt) * | 2005-05-11 | 2016-11-01 | Asahi Kasei Chemicals Corp | composição de resina fotossensível, e, placa bruta para flexografia |
US20090155721A1 (en) * | 2005-11-21 | 2009-06-18 | Kazuyoshi Yamazawa | Flexographic printing plate |
US7704676B2 (en) * | 2007-09-04 | 2010-04-27 | Kraton Polymers U.S. Llc | Block copolymers having distinct isoprene and butadiene midblocks, method for making same, and uses for such block copolymers |
US8470518B2 (en) | 2007-09-14 | 2013-06-25 | E I Du Pont De Nemours And Company | Photosensitive element having reinforcing particles and method for preparing a printing form from the element |
DE102007046641A1 (de) * | 2007-09-27 | 2009-04-09 | Carl Freudenberg Kg | Strahlungs-härtbare Elastomermischung |
JP2010185128A (ja) * | 2008-04-23 | 2010-08-26 | Fujifilm Corp | めっき用感光性樹脂組成物、積層体、それを用いた表面金属膜材料の作製方法、表面金属膜材料、金属パターン材料の作製方法、金属パターン材料、及び配線基板 |
JP6397194B2 (ja) * | 2014-02-21 | 2018-09-26 | 旭化成株式会社 | 印刷版用感光性樹脂組成物、印刷版用感光性樹脂構成体、及び印刷版 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1101586A (en) * | 1971-05-17 | 1981-05-19 | Arnel D. Potter | Photosensitive compositions |
JPS59100433A (ja) * | 1982-11-30 | 1984-06-09 | Hitachi Chem Co Ltd | 難燃型感光性樹脂組成物 |
JPH027055A (ja) * | 1988-06-27 | 1990-01-11 | Konica Corp | 感光性平版印刷版の処理方法 |
DE4022978C1 (de) * | 1990-07-19 | 1991-08-08 | Du Pont De Nemours (Deutschland) Gmbh, 6380 Bad Homburg, De | |
US5135837A (en) * | 1990-09-05 | 1992-08-04 | E. I. Du Pont De Nemours And Company | Photosensitive elastomeric element having improved solvent resistance |
US5348844A (en) * | 1990-12-03 | 1994-09-20 | Napp Systems, Inc. | Photosensitive polymeric printing medium and water developable printing plates |
WO1992015046A1 (fr) * | 1991-02-15 | 1992-09-03 | Asahi Kasei Kogyo Kabushiki Kaisha | Composition elastomere photosensible |
JP2793068B2 (ja) * | 1991-04-24 | 1998-09-03 | 日本ペイント株式会社 | 感光性樹脂組成物 |
JPH05165216A (ja) * | 1991-12-13 | 1993-07-02 | Mitsubishi Petrochem Co Ltd | 感光性樹脂組成物 |
JPH05232698A (ja) * | 1991-12-26 | 1993-09-10 | Nippon Zeon Co Ltd | リン含有親水性共重合体の製造方法及び該共重合体を用いた水現像用感光性組成物 |
JPH06202331A (ja) * | 1992-12-28 | 1994-07-22 | Nippon Zeon Co Ltd | 感光性エラストマー組成物及びそれを用いた感光性フレキソ版 |
DE69426298T2 (de) * | 1993-03-31 | 2001-07-12 | Nippon Zeon Co | Lichtempfindliche zusammensetzung, lichtempfindliche kautschukplatte und verfahren zur herstellung dieser platte, flexografische platte und verfahren zur herstellung dieser platte |
EP0675412B1 (de) * | 1994-03-30 | 2001-01-17 | Japan Synthetic Rubber Co., Ltd. | Fotoempfindliche Harzzusammensetzung |
US5422225A (en) * | 1994-06-23 | 1995-06-06 | Shell Oil Company | Photopolymerizable recording composition for water-washable printing plates containing a water-dispersible elastomeric polymer blend |
US5863704A (en) * | 1995-04-26 | 1999-01-26 | Nippon Zeon Company, Ltd. | Photosensitive composition and photosensitive rubber plate |
-
1994
- 1994-09-29 JP JP6259158A patent/JPH1031303A/ja active Pending
-
1995
- 1995-09-25 EP EP95932218A patent/EP0784232B1/de not_active Expired - Lifetime
- 1995-09-25 WO PCT/JP1995/001923 patent/WO1996010218A1/ja active IP Right Grant
- 1995-09-25 DE DE69528069T patent/DE69528069D1/de not_active Expired - Lifetime
- 1995-09-25 US US08/809,369 patent/US6025098A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US6025098A (en) | 2000-02-15 |
JPH1031303A (ja) | 1998-02-03 |
WO1996010218A1 (fr) | 1996-04-04 |
EP0784232A1 (de) | 1997-07-16 |
EP0784232B1 (de) | 2002-09-04 |
EP0784232A4 (de) | 1998-10-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8327 | Change in the person/name/address of the patent owner |
Owner name: ZEON CORP., TOKIO/TOKYO, JP |
|
8332 | No legal effect for de |