DE69705283T2 - Strahlungsempfindliche Zusammensetzung - Google Patents
Strahlungsempfindliche ZusammensetzungInfo
- Publication number
- DE69705283T2 DE69705283T2 DE69705283T DE69705283T DE69705283T2 DE 69705283 T2 DE69705283 T2 DE 69705283T2 DE 69705283 T DE69705283 T DE 69705283T DE 69705283 T DE69705283 T DE 69705283T DE 69705283 T2 DE69705283 T2 DE 69705283T2
- Authority
- DE
- Germany
- Prior art keywords
- radiation sensitive
- sensitive composition
- composition
- radiation
- sensitive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28429396A JP3376222B2 (ja) | 1996-10-25 | 1996-10-25 | 放射線感応性組成物 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69705283D1 DE69705283D1 (de) | 2001-07-26 |
DE69705283T2 true DE69705283T2 (de) | 2001-10-31 |
Family
ID=17676662
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69705283T Expired - Fee Related DE69705283T2 (de) | 1996-10-25 | 1997-10-22 | Strahlungsempfindliche Zusammensetzung |
Country Status (7)
Country | Link |
---|---|
US (1) | US5962187A (de) |
EP (1) | EP0838727B1 (de) |
JP (1) | JP3376222B2 (de) |
KR (1) | KR100509884B1 (de) |
CN (1) | CN1180849A (de) |
DE (1) | DE69705283T2 (de) |
SG (1) | SG102525A1 (de) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4019403B2 (ja) * | 1999-03-08 | 2007-12-12 | Jsr株式会社 | レジストパターンの形成方法 |
JP3894477B2 (ja) * | 2002-02-27 | 2007-03-22 | Azエレクトロニックマテリアルズ株式会社 | 感光性樹脂組成物 |
JP3986927B2 (ja) * | 2002-08-22 | 2007-10-03 | 富士通株式会社 | 半導体装置の製造方法 |
JP2004341431A (ja) * | 2003-05-19 | 2004-12-02 | Tokyo Ohka Kogyo Co Ltd | ポジ型レジスト組成物およびレジストパターンの形成方法 |
JP4647418B2 (ja) * | 2005-07-19 | 2011-03-09 | ダイセル化学工業株式会社 | レジスト組成物 |
JP2007101715A (ja) * | 2005-09-30 | 2007-04-19 | Fujifilm Corp | パターン形成方法及びそれに用いるレジスト組成物 |
US8182975B2 (en) * | 2007-03-28 | 2012-05-22 | Fujifilm Corporation | Positive resist composition and pattern forming method using the same |
JP6650696B2 (ja) * | 2014-09-08 | 2020-02-19 | 信越化学工業株式会社 | ドライフィルム積層体の製造方法 |
CN105600943A (zh) * | 2015-12-28 | 2016-05-25 | 上海亘卓生物工程有限公司 | 一种利用微生物有效降低发酵废水中bod、cod水平的方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3924812A1 (de) * | 1989-07-27 | 1991-01-31 | Hoechst Ag | Loesemittelgemisch und beschichtungsloesung fuer die herstellung negativ arbeitender lichtempfindlicher aufzeichnungsmaterialien |
JPH049063A (ja) * | 1990-04-07 | 1992-01-13 | Konica Corp | 感光性組成物 |
JPH0748805B2 (ja) * | 1990-05-28 | 1995-05-24 | 三菱電機株式会社 | オート・トラッキング・モニタのs字補正コンデンサ切替装置 |
US5426017A (en) * | 1990-05-31 | 1995-06-20 | Hoechst Celanese Corporation | Composition and method for removing photoresist composition from substrates surfaces |
KR920005780B1 (ko) * | 1990-06-16 | 1992-07-18 | 제일합섬 주식회사 | 내열성이 우수한 포토레지스트 조성물 |
JPH0692909A (ja) * | 1992-04-10 | 1994-04-05 | Sumitomo Chem Co Ltd | 炭酸エステル環状化合物、その製造方法及びそれを用いてなるポジ型フォトレジスト組成物 |
US5612303B1 (en) * | 1993-06-15 | 2000-07-18 | Nitto Chemical Industry Co Ltd | Solvent composition |
JPH0736189A (ja) * | 1993-07-15 | 1995-02-07 | Japan Synthetic Rubber Co Ltd | レジスト塗布組成物 |
KR960015081A (ko) * | 1993-07-15 | 1996-05-22 | 마쯔모또 에이이찌 | 화학증폭형 레지스트 조성물 |
JP2906960B2 (ja) * | 1993-11-29 | 1999-06-21 | 信越化学工業株式会社 | ポジ型フォトレジスト組成物 |
US5458921A (en) * | 1994-10-11 | 1995-10-17 | Morton International, Inc. | Solvent system for forming films of photoimageable compositions |
-
1996
- 1996-10-25 JP JP28429396A patent/JP3376222B2/ja not_active Expired - Lifetime
-
1997
- 1997-10-16 SG SG9703757A patent/SG102525A1/en unknown
- 1997-10-21 US US08/955,453 patent/US5962187A/en not_active Expired - Lifetime
- 1997-10-22 DE DE69705283T patent/DE69705283T2/de not_active Expired - Fee Related
- 1997-10-22 EP EP97118353A patent/EP0838727B1/de not_active Expired - Lifetime
- 1997-10-24 CN CN97119096A patent/CN1180849A/zh active Pending
- 1997-10-24 KR KR1019970054585A patent/KR100509884B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP0838727A1 (de) | 1998-04-29 |
US5962187A (en) | 1999-10-05 |
SG102525A1 (en) | 2004-03-26 |
KR19980033124A (ko) | 1998-07-25 |
JPH10133363A (ja) | 1998-05-22 |
KR100509884B1 (ko) | 2005-11-16 |
DE69705283D1 (de) | 2001-07-26 |
EP0838727B1 (de) | 2001-06-20 |
JP3376222B2 (ja) | 2003-02-10 |
CN1180849A (zh) | 1998-05-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |