DE69705283D1 - Strahlungsempfindliche Zusammensetzung - Google Patents

Strahlungsempfindliche Zusammensetzung

Info

Publication number
DE69705283D1
DE69705283D1 DE69705283T DE69705283T DE69705283D1 DE 69705283 D1 DE69705283 D1 DE 69705283D1 DE 69705283 T DE69705283 T DE 69705283T DE 69705283 T DE69705283 T DE 69705283T DE 69705283 D1 DE69705283 D1 DE 69705283D1
Authority
DE
Germany
Prior art keywords
radiation sensitive
sensitive composition
composition
radiation
sensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69705283T
Other languages
English (en)
Other versions
DE69705283T2 (de
Inventor
Takashi Takeda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Clariant Finance BVI Ltd
Original Assignee
Clariant Finance BVI Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Clariant Finance BVI Ltd filed Critical Clariant Finance BVI Ltd
Publication of DE69705283D1 publication Critical patent/DE69705283D1/de
Application granted granted Critical
Publication of DE69705283T2 publication Critical patent/DE69705283T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
DE69705283T 1996-10-25 1997-10-22 Strahlungsempfindliche Zusammensetzung Expired - Fee Related DE69705283T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28429396A JP3376222B2 (ja) 1996-10-25 1996-10-25 放射線感応性組成物

Publications (2)

Publication Number Publication Date
DE69705283D1 true DE69705283D1 (de) 2001-07-26
DE69705283T2 DE69705283T2 (de) 2001-10-31

Family

ID=17676662

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69705283T Expired - Fee Related DE69705283T2 (de) 1996-10-25 1997-10-22 Strahlungsempfindliche Zusammensetzung

Country Status (7)

Country Link
US (1) US5962187A (de)
EP (1) EP0838727B1 (de)
JP (1) JP3376222B2 (de)
KR (1) KR100509884B1 (de)
CN (1) CN1180849A (de)
DE (1) DE69705283T2 (de)
SG (1) SG102525A1 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4019403B2 (ja) * 1999-03-08 2007-12-12 Ｊｓｒ株式会社 レジストパターンの形成方法
JP3894477B2 (ja) * 2002-02-27 2007-03-22 Ａｚエレクトロニックマテリアルズ株式会社 感光性樹脂組成物
JP3986927B2 (ja) * 2002-08-22 2007-10-03 富士通株式会社 半導体装置の製造方法
JP2004341431A (ja) * 2003-05-19 2004-12-02 Tokyo Ohka Kogyo Co Ltd ポジ型レジスト組成物およびレジストパターンの形成方法
JP4647418B2 (ja) * 2005-07-19 2011-03-09 ダイセル化学工業株式会社 レジスト組成物
JP2007101715A (ja) * 2005-09-30 2007-04-19 Fujifilm Corp パターン形成方法及びそれに用いるレジスト組成物
US8182975B2 (en) * 2007-03-28 2012-05-22 Fujifilm Corporation Positive resist composition and pattern forming method using the same
JP6650696B2 (ja) * 2014-09-08 2020-02-19 信越化学工業株式会社 ドライフィルム積層体の製造方法
CN105600943A (zh) * 2015-12-28 2016-05-25 上海亘卓生物工程有限公司 一种利用微生物有效降低发酵废水中bod、cod水平的方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3924812A1 (de) * 1989-07-27 1991-01-31 Hoechst Ag Loesemittelgemisch und beschichtungsloesung fuer die herstellung negativ arbeitender lichtempfindlicher aufzeichnungsmaterialien
JPH049063A (ja) * 1990-04-07 1992-01-13 Konica Corp 感光性組成物
JPH0748805B2 (ja) * 1990-05-28 1995-05-24 三菱電機株式会社 オート・トラッキング・モニタのｓ字補正コンデンサ切替装置
US5426017A (en) * 1990-05-31 1995-06-20 Hoechst Celanese Corporation Composition and method for removing photoresist composition from substrates surfaces
KR920005780B1 (ko) * 1990-06-16 1992-07-18 제일합섬 주식회사 내열성이 우수한 포토레지스트 조성물
JPH0692909A (ja) * 1992-04-10 1994-04-05 Sumitomo Chem Co Ltd 炭酸エステル環状化合物、その製造方法及びそれを用いてなるポジ型フォトレジスト組成物
US5612303B1 (en) * 1993-06-15 2000-07-18 Nitto Chemical Industry Co Ltd Solvent composition
JPH0736189A (ja) * 1993-07-15 1995-02-07 Japan Synthetic Rubber Co Ltd レジスト塗布組成物
KR960015081A (ko) * 1993-07-15 1996-05-22 마쯔모또 에이이찌 화학증폭형 레지스트 조성물
JP2906960B2 (ja) * 1993-11-29 1999-06-21 信越化学工業株式会社 ポジ型フォトレジスト組成物
US5458921A (en) * 1994-10-11 1995-10-17 Morton International, Inc. Solvent system for forming films of photoimageable compositions

Also Published As

Publication number Publication date
KR100509884B1 (ko) 2005-11-16
JP3376222B2 (ja) 2003-02-10
SG102525A1 (en) 2004-03-26
EP0838727A1 (de) 1998-04-29
EP0838727B1 (de) 2001-06-20
JPH10133363A (ja) 1998-05-22
CN1180849A (zh) 1998-05-06
KR19980033124A (ko) 1998-07-25
DE69705283T2 (de) 2001-10-31
US5962187A (en) 1999-10-05

Similar Documents

Publication Publication Date Title
DE69728366D1 (de) Strahlungsempfindliche Harzzusammensetzung
DE69703902T2 (de) Strahlungsempfindliche Zusammensetzung
DE69813113T2 (de) Strahlungsempfindliche Harzzusammensetzung
DE69719150D1 (de) Strahlungsempfindliche Harzzusammensetzung
DE69802038T2 (de) Strahlungsempfindliche Harzzusammensetzung
DE69517547D1 (de) Strahlungsempfindliche Mischung
DE69518196D1 (de) Verbesserungen von Strahlungsthermometern
DE69408761T2 (de) Strahlungsempfindliche Zusammensetzung
DE69326184D1 (de) Strahlungsempfindliche Zusammensetzungen
DE69724017D1 (de) Temperaturdetektor
DE69736849D1 (de) Objekt-Detektor
DE69506999T2 (de) Strahlungsempfindliche Zusammensetzung
DE69836721D1 (de) Strahlungspyrometer
DE69827211D1 (de) Strahlungsempfindliche Harzzusammensetzung
DE59813628D1 (de) Röntgendetektor
DE69515139T2 (de) Strahlungsdetektor
DE69705283D1 (de) Strahlungsempfindliche Zusammensetzung
DE69805364D1 (de) Strahlungsempfindliche Harzzusammensetzung
DE69727739D1 (de) Belichtungsgerät
DE69718113T2 (de) Strahlungsempfindliche Harzzusammensetzung
DE69911687D1 (de) Lichtempfindliche zusammensetzung
DE69827429D1 (de) Strahlungsempfindliche Polymerzusammensetzung
DE69519781T2 (de) Strahlungsempfindliche Harzzusammensetzung
DE69706029T2 (de) Strahlungsempfindliche Harzzusammensetzung
DE69821304D1 (de) Strahlungsempfindliche Harzzusammensetzung

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee