DE69634768D1 - Vorrichtung zur Steuerung der Position eines Trägertisches, sowie Trägertischvorrichtung, Belichtungsgerät und Herstellungsverfahren unter Verwendung derselben - Google Patents

Vorrichtung zur Steuerung der Position eines Trägertisches, sowie Trägertischvorrichtung, Belichtungsgerät und Herstellungsverfahren unter Verwendung derselben

Info

Publication number
DE69634768D1
DE69634768D1 DE69634768T DE69634768T DE69634768D1 DE 69634768 D1 DE69634768 D1 DE 69634768D1 DE 69634768 T DE69634768 T DE 69634768T DE 69634768 T DE69634768 T DE 69634768T DE 69634768 D1 DE69634768 D1 DE 69634768D1
Authority
DE
Germany
Prior art keywords
support table
manufacturing
controlling
same
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69634768T
Other languages
English (en)
Other versions
DE69634768T2 (de
DE69634768T8 (de
Inventor
Nobushige Korenaga
Ryuichi Ebinuma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE69634768D1 publication Critical patent/DE69634768D1/de
Publication of DE69634768T2 publication Critical patent/DE69634768T2/de
Application granted granted Critical
Publication of DE69634768T8 publication Critical patent/DE69634768T8/de
Active legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems
    • G03F7/70358Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23QDETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q5/00Driving or feeding mechanisms; Control arrangements therefor
    • B23Q5/22Feeding members carrying tools or work
    • B23Q5/28Electric drives
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/70716Stages
    • G03F7/70725Stages control
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/70758Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/682Mask-wafer alignment
    • HELECTRICITY
    • H02GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02KDYNAMO-ELECTRIC MACHINES
    • H02K41/00Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
    • H02K41/02Linear motors; Sectional motors
    • H02K41/03Synchronous motors; Motors moving step by step; Reluctance motors
    • H02K41/031Synchronous motors; Motors moving step by step; Reluctance motors of the permanent magnet type
    • HELECTRICITY
    • H02GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02KDYNAMO-ELECTRIC MACHINES
    • H02K41/00Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
    • H02K41/02Linear motors; Sectional motors
    • H02K41/035DC motors; Unipolar motors
    • H02K41/0352Unipolar motors
    • H02K41/0354Lorentz force motors, e.g. voice coil motors
    • H02K41/0356Lorentz force motors, e.g. voice coil motors moving along a straight path
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202Movement
    • H01J2237/20221Translation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202Movement
    • H01J2237/20278Motorised movement
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30Electron or ion beam tubes for processing objects
    • H01J2237/317Processing objects on a microscale
    • H01J2237/3175Lithography

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Electromagnetism (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Mechanical Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Machine Tool Units (AREA)
DE69634768T 1995-10-09 1996-10-04 Vorrichtung zur Steuerung der Position eines Trägertisches, sowie Trägertischvorrichtung, Belichtungsgerät und Herstellungsverfahren unter Verwendung derselben Active DE69634768T8 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP28634595 1995-10-09
JP28634595 1995-10-09
JP19692496 1996-07-09
JP19692496A JP3815750B2 (ja) 1995-10-09 1996-07-09 ステージ装置、ならびに前記ステージ装置を用いた露光装置およびデバイス製造方法

Publications (3)

Publication Number Publication Date
DE69634768D1 true DE69634768D1 (de) 2005-06-30
DE69634768T2 DE69634768T2 (de) 2006-02-02
DE69634768T8 DE69634768T8 (de) 2006-04-27

Family

ID=26510067

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69634768T Active DE69634768T8 (de) 1995-10-09 1996-10-04 Vorrichtung zur Steuerung der Position eines Trägertisches, sowie Trägertischvorrichtung, Belichtungsgerät und Herstellungsverfahren unter Verwendung derselben

Country Status (5)

Country Link
US (2) US5841250A (de)
EP (2) EP1536290A3 (de)
JP (1) JP3815750B2 (de)
KR (1) KR100242923B1 (de)
DE (1) DE69634768T8 (de)

Families Citing this family (73)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3501559B2 (ja) * 1995-06-27 2004-03-02 キヤノン株式会社 リニア・モータ装置
US6128069A (en) * 1997-03-13 2000-10-03 Canon Kabushiki Kaisha Stage mechanism for exposure apparatus
JP3890136B2 (ja) * 1997-03-25 2007-03-07 キヤノン株式会社 露光装置とこれを用いたデバイス製造方法、ならびにステージ装置
JP3155936B2 (ja) 1997-06-26 2001-04-16 キヤノン株式会社 リニアモータとステージ装置及びこれを用いた走査型露光装置やデバイス製造方法
JPH1198811A (ja) * 1997-09-24 1999-04-09 Canon Inc リニアモータ、これを用いたステージ装置や露光装置、ならびにデバイス製造方法
JP3630964B2 (ja) 1997-12-26 2005-03-23 キヤノン株式会社 ステージ装置、およびこれを用いた露光装置ならびにデバイス製造方法
JPH11191585A (ja) 1997-12-26 1999-07-13 Canon Inc ステージ装置、およびこれを用いた露光装置、ならびにデバイス製造方法
JP3526202B2 (ja) * 1998-02-03 2004-05-10 キヤノン株式会社 ステージ装置、およびこれを用いた露光装置、ならびにデバイス製造方法
JPH11287880A (ja) * 1998-04-01 1999-10-19 Canon Inc ステージ装置、およびこれを用いた露光装置ならびにデバイス製造方法
JP3869938B2 (ja) 1998-06-05 2007-01-17 キヤノン株式会社 ステージ装置、露光装置、およびデバイス製造方法
JP3745167B2 (ja) * 1998-07-29 2006-02-15 キヤノン株式会社 ステージ装置、露光装置およびデバイス製造方法ならびにステージ駆動方法
JP3907357B2 (ja) 1998-11-12 2007-04-18 キヤノン株式会社 段差付きコイル製造方法
US20040222708A1 (en) * 1998-11-13 2004-11-11 Barry Reginald Hobson Electric oscillatory machine
US6590355B1 (en) * 1999-06-07 2003-07-08 Nikon Corporation Linear motor device, stage device, and exposure apparatus
JP2001230305A (ja) 2000-02-18 2001-08-24 Canon Inc 支持装置
US6405659B1 (en) 2000-05-01 2002-06-18 Nikon Corporation Monolithic stage
US6496060B2 (en) * 2000-06-15 2002-12-17 Nikon Corporation Hybridized, high performance PWM amplifier
TW475314B (en) * 2000-07-11 2002-02-01 Hiwin Mikrosystem Corp Coreless type linear motor
KR100416791B1 (ko) * 2001-03-19 2004-01-31 삼성전자주식회사 반도체 웨이퍼 검사용 현미경장치 및 그 검사방법
US6989887B2 (en) * 2001-06-06 2006-01-24 Nikon Corporation Dual force mode fine stage apparatus
JP2003022960A (ja) * 2001-07-09 2003-01-24 Canon Inc ステージ装置及びその駆動方法
EP1300932B1 (de) * 2001-10-05 2013-12-18 Canon Kabushiki Kaisha Linearmotor, Trägersystem und Belichtungssystem mit einem solchen Linearmotor
JP3963426B2 (ja) 2001-11-28 2007-08-22 キヤノン株式会社 ステージ装置および露光装置
JP2003189589A (ja) * 2001-12-21 2003-07-04 Canon Inc 可動磁石型リニアモータ、露光装置及びデバイス製造方法
JP3977086B2 (ja) * 2002-01-18 2007-09-19 キヤノン株式会社 ステージシステム
US7813634B2 (en) 2005-02-28 2010-10-12 Tessera MEMS Technologies, Inc. Autofocus camera
JP4323759B2 (ja) * 2002-05-27 2009-09-02 キヤノン株式会社 露光装置およびデバイス製造方法
JP3849932B2 (ja) * 2002-08-12 2006-11-22 キヤノン株式会社 移動ステージ装置
JP3826087B2 (ja) * 2002-08-30 2006-09-27 キヤノン株式会社 位置決め装置、荷電粒子線露光装置
JP3762401B2 (ja) 2002-09-30 2006-04-05 キヤノン株式会社 位置決め装置及び露光装置並びにデバイスの製造方法
JP2004172557A (ja) 2002-11-22 2004-06-17 Canon Inc ステージ装置及びその制御方法
JP4227452B2 (ja) * 2002-12-27 2009-02-18 キヤノン株式会社 位置決め装置、及びその位置決め装置を利用した露光装置
JP4194383B2 (ja) * 2003-02-13 2008-12-10 キヤノン株式会社 リニアモータ
JP4143438B2 (ja) * 2003-02-24 2008-09-03 キヤノン株式会社 支持装置、露光装置、デバイス製造方法
JP4539045B2 (ja) * 2003-07-16 2010-09-08 株式会社安川電機 ムービングマグネット形リニアアクチュエータ
JP2005142501A (ja) * 2003-11-10 2005-06-02 Canon Inc ステージ装置および露光装置ならびにデバイス製造方法
US20050128449A1 (en) * 2003-12-12 2005-06-16 Nikon Corporation, A Japanese Corporation Utilities transfer system in a lithography system
US7230312B2 (en) * 2003-12-31 2007-06-12 Micron Technology, Inc. Transistor having vertical junction edge and method of manufacturing the same
US20050174551A1 (en) * 2004-02-11 2005-08-11 Nikon Corporation Position control and heat dissipation for photolithography systems
US7319374B2 (en) * 2004-04-14 2008-01-15 Immersion Corporation Moving magnet actuator
WO2005122369A1 (ja) * 2004-05-14 2005-12-22 Kabushiki Kaisha Yaskawa Denki ムービングマグネット形リニアスライダ
US20060193620A1 (en) * 2005-02-28 2006-08-31 Darrell Harrington Lorentz actuator for miniature camera
DE102005013349A1 (de) * 2005-03-23 2006-10-05 Bosch Rexroth Aktiengesellschaft Linearmotor und Verfahren zum Betrieb eines Linearmotors
US7468589B2 (en) * 2006-01-13 2008-12-23 Asml Netherlands B.V. Lithographic apparatus having a controlled motor, and motor control system and method
JP2007312516A (ja) * 2006-05-18 2007-11-29 Canon Inc 駆動装置、露光装置及びデバイス製造方法
JP2008010643A (ja) * 2006-06-29 2008-01-17 Canon Inc ステージ装置
NL1032371C2 (nl) * 2006-08-28 2008-02-29 Assembleon Bv Verplaatsingsinrichting alsmede componentplaatsingsinrichting.
TWI590005B (zh) * 2006-08-31 2017-07-01 尼康股份有限公司 Exposure method and exposure apparatus, and device manufacturing method
US7847919B2 (en) * 2007-03-29 2010-12-07 Asml Netherlands B.V. Lithographic apparatus having feedthrough control system
WO2009060460A2 (en) * 2007-11-09 2009-05-14 Given Imaging Ltd. Apparatus and methods for capsule endoscopy of the esophagus
JP2009253090A (ja) * 2008-04-08 2009-10-29 Canon Inc 位置決めステージ装置、露光装置およびデバイス製造方法
KR100917499B1 (ko) * 2008-09-09 2009-09-16 충주대학교 산학협력단 비접촉 평면 스테이지 및 이의 제어방법
JP5641772B2 (ja) * 2009-06-04 2014-12-17 キヤノン株式会社 位置決め装置、及びそれを用いたリソグラフィ装置並びにデバイス製造方法
WO2011016254A1 (ja) * 2009-08-07 2011-02-10 株式会社ニコン 移動体装置、露光装置及び露光方法、並びにデバイス製造方法
US9081307B2 (en) 2010-07-09 2015-07-14 Asml Netherlands B.V. Variable reluctance device, stage apparatus, lithographic apparatus and device manufacturing method
KR101318211B1 (ko) 2011-05-31 2013-10-15 한국기계연구원 5 자유도 운동 오차 보정 기능을 갖는 능동 보정형 스테이지 및 그 운동 오차 보정 방법
NL2009827A (en) * 2011-12-22 2013-06-26 Asml Netherlands Bv A stage system and a lithographic apparatus.
CN103066894B (zh) * 2012-12-12 2015-05-20 清华大学 一种六自由度磁悬浮工件台
WO2014209309A1 (en) * 2013-06-27 2014-12-31 Otis Elevator Company Self-propelled elevator system having windings proportional to car velocity
CN103454864B (zh) * 2013-08-30 2016-02-03 清华大学 一种粗精动一体的磁浮掩膜台系统
CN104122759A (zh) 2014-04-28 2014-10-29 清华大学 一种平面电动机驱动的磁悬浮粗微动一体掩模台
CN104259869B (zh) * 2014-05-20 2017-03-22 大连日佳电子有限公司 一种双层双相反应式线性精密调整滑台
EP3029723B1 (de) 2014-12-05 2020-09-16 Robert Bosch GmbH Transportvorrichtung und Transportverfahren zum Transport eines zerbrechlichen Gegenstandes
CN105827034A (zh) * 2015-01-08 2016-08-03 鸿富锦精密工业(深圳)有限公司 电机
CN104578681B (zh) * 2015-01-21 2017-03-22 朱福善 一种触发式无刷直流直线电动机的构成及驱动方法
US9892837B2 (en) * 2015-05-21 2018-02-13 Adicep Technologies, Inc Energy efficient actuator
US10651718B2 (en) * 2015-07-20 2020-05-12 Motx Ltd. Transverse flux linear motor
WO2019051409A1 (en) * 2017-09-08 2019-03-14 Velocity Magnetics, Inc. NON-CAPTIVE OPTICAL SENSING LOCATION MONITORING SYSTEMS AND METHODS OF USING THE SAME
CN107845476A (zh) * 2017-10-30 2018-03-27 江苏昊昱科技咨询有限公司 一种便于安装的超声波磁杆
NL2022467B1 (en) * 2019-01-28 2020-08-18 Prodrive Tech Bv Position sensor for long stroke linear permanent magnet motor
WO2020170671A1 (ja) * 2019-02-22 2020-08-27 村田機械株式会社 蓋開閉装置
CN113328653B (zh) * 2021-05-31 2022-08-05 南京航空航天大学 一种新型抗磁悬浮电压感应式微驱动器及其控制方法
CN113885298B (zh) * 2021-09-22 2022-06-17 哈尔滨工业大学 一种磁悬浮式光刻机掩模台

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2052021A5 (de) * 1969-07-02 1971-04-09 Merlin Gerin
US3736880A (en) * 1971-04-19 1973-06-05 Rohr Industries Inc Feedback control circuit for magnetic suspension and propulsion system
US3803466A (en) * 1972-02-28 1974-04-09 Rockwell International Corp Linear motor propulsion system
US3958166A (en) * 1972-03-16 1976-05-18 National Research Development Corporation Speed adjusting apparatus
US3816777A (en) * 1972-12-27 1974-06-11 K Metzgar Electrodynamic force generator
US4059775A (en) * 1976-11-22 1977-11-22 Control Data Corporation Linear motor
JPS5827749B2 (ja) * 1978-04-20 1983-06-11 パイオニア株式会社 リニアモ−タ
JPS55166496A (en) * 1979-06-08 1980-12-25 Canon Inc Linear motor control method
JPS5911764A (ja) * 1982-07-12 1984-01-21 Nippon Soken Inc 電磁駆動装置
JP2631485B2 (ja) * 1988-01-28 1997-07-16 キヤノン株式会社 位置決め装置
GB8805420D0 (en) * 1988-03-08 1988-04-07 Framo Dev Ltd Electrically powered pump unit
EP0346815A3 (de) * 1988-06-13 1990-12-19 Asahi Glass Company Ltd. Vakuumbehandlungsvorrichtung und deren Transportsystem
US4857781A (en) * 1988-07-13 1989-08-15 Eastman Kodak Company High-speed non-contact linear motor with magnetic levitation
JPH0260451A (ja) * 1988-08-26 1990-02-28 Canon Inc リニアモータ装置
JP2777915B2 (ja) * 1989-08-30 1998-07-23 キヤノン株式会社 位置合わせ機構
ES2085367T3 (es) * 1990-04-09 1996-06-01 Nippon Conlux Co Ltd Motor lineal.
JP3182158B2 (ja) * 1991-02-25 2001-07-03 キヤノン株式会社 露光装置用のステージ支持装置
US5196745A (en) * 1991-08-16 1993-03-23 Massachusetts Institute Of Technology Magnetic positioning device
JP2714502B2 (ja) * 1991-09-18 1998-02-16 キヤノン株式会社 移動ステージ装置
US5684856A (en) * 1991-09-18 1997-11-04 Canon Kabushiki Kaisha Stage device and pattern transfer system using the same
US5402680A (en) * 1991-12-10 1995-04-04 Canon Kabushiki Kaisha Velocity sensor and semiconductor exposing apparatus using such a sensor
JP2908127B2 (ja) * 1992-07-29 1999-06-21 富士通株式会社 シャトル型プリンタ装置
DE69412719T2 (de) * 1993-06-24 1999-02-18 Canon Kk Steuerung für einen mehrphasigen Motor
KR0139039B1 (ko) * 1993-06-30 1998-06-01 미타라이 하지메 노광장치와 이것을 이용한 디바이스 제조방법
JP3282751B2 (ja) * 1993-07-14 2002-05-20 株式会社ニコン 走査型露光装置、及び該装置を用いる素子製造方法
JPH07115056A (ja) * 1993-10-15 1995-05-02 Canon Inc 縦型基板ステージ装置
JP3363662B2 (ja) * 1994-05-19 2003-01-08 キヤノン株式会社 走査ステージ装置およびこれを用いた露光装置
US5808381A (en) * 1994-08-09 1998-09-15 Hitachi Metals, Ltd. Linear motor

Also Published As

Publication number Publication date
EP0768705A2 (de) 1997-04-16
DE69634768T2 (de) 2006-02-02
EP0768705B1 (de) 2005-05-25
US5841250A (en) 1998-11-24
JP3815750B2 (ja) 2006-08-30
EP1536290A3 (de) 2005-07-06
JPH09167792A (ja) 1997-06-24
EP1536290A2 (de) 2005-06-01
US6037680A (en) 2000-03-14
KR100242923B1 (ko) 2000-03-02
EP0768705A3 (de) 1998-03-25
KR970023649A (ko) 1997-05-30
DE69634768T8 (de) 2006-04-27

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