DE69103119D1 - Verfahren und Vorrichtung zur Steuerung der Züchtung eines Kegelförmigen Teiles eines Einkristalles. - Google Patents
Verfahren und Vorrichtung zur Steuerung der Züchtung eines Kegelförmigen Teiles eines Einkristalles.Info
- Publication number
- DE69103119D1 DE69103119D1 DE69103119T DE69103119T DE69103119D1 DE 69103119 D1 DE69103119 D1 DE 69103119D1 DE 69103119 T DE69103119 T DE 69103119T DE 69103119 T DE69103119 T DE 69103119T DE 69103119 D1 DE69103119 D1 DE 69103119D1
- Authority
- DE
- Germany
- Prior art keywords
- growth
- controlling
- single crystal
- conical part
- conical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/20—Controlling or regulating
- C30B15/22—Stabilisation or shape controlling of the molten zone near the pulled crystal; Controlling the section of the crystal
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10S117/901—Levitation, reduced gravity, microgravity, space
- Y10S117/902—Specified orientation, shape, crystallography, or size of seed or substrate
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1004—Apparatus with means for measuring, testing, or sensing
- Y10T117/1008—Apparatus with means for measuring, testing, or sensing with responsive control means
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2274124A JPH0777996B2 (ja) | 1990-10-12 | 1990-10-12 | コーン部育成制御方法及び装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69103119D1 true DE69103119D1 (de) | 1994-09-01 |
DE69103119T2 DE69103119T2 (de) | 1995-01-12 |
Family
ID=17537359
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69103119T Expired - Lifetime DE69103119T2 (de) | 1990-10-12 | 1991-10-10 | Verfahren und Vorrichtung zur Steuerung der Züchtung eines Kegelförmigen Teiles eines Einkristalles. |
Country Status (4)
Country | Link |
---|---|
US (1) | US5223078A (de) |
EP (1) | EP0482438B1 (de) |
JP (1) | JPH0777996B2 (de) |
DE (1) | DE69103119T2 (de) |
Families Citing this family (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19529485A1 (de) * | 1995-08-10 | 1997-02-13 | Wacker Siltronic Halbleitermat | Verfahren und Vorrichtung zur Bestimmung des Durchmessers eines wachsenden Einkristalls |
JPH09221386A (ja) * | 1996-02-08 | 1997-08-26 | Komatsu Electron Metals Co Ltd | 単結晶引上装置 |
US6045610A (en) * | 1997-02-13 | 2000-04-04 | Samsung Electronics Co., Ltd. | Methods of manufacturing monocrystalline silicon ingots and wafers by controlling pull rate profiles in a hot zone furnance |
US6503594B2 (en) | 1997-02-13 | 2003-01-07 | Samsung Electronics Co., Ltd. | Silicon wafers having controlled distribution of defects and slip |
SG64470A1 (en) * | 1997-02-13 | 1999-04-27 | Samsung Electronics Co Ltd | Methods of manufacturing monocrystalline silicon ingots and wafers by controlling pull rate profiles in a hot zone furnace and ingots and wafers manufactured thereby |
US6485807B1 (en) | 1997-02-13 | 2002-11-26 | Samsung Electronics Co., Ltd. | Silicon wafers having controlled distribution of defects, and methods of preparing the same |
US6340392B1 (en) | 1997-10-24 | 2002-01-22 | Samsung Electronics Co., Ltd. | Pulling methods for manufacturing monocrystalline silicone ingots by controlling temperature at the center and edge of an ingot-melt interface |
US5968263A (en) * | 1998-04-01 | 1999-10-19 | Memc Electronic Materials, Inc. | Open-loop method and system for controlling growth of semiconductor crystal |
US6776840B1 (en) * | 1999-03-22 | 2004-08-17 | Memc Electronic Materials, Inc. | Method and apparatus for controlling diameter of a silicon crystal in a locked seed lift growth process |
US6241818B1 (en) | 1999-04-07 | 2001-06-05 | Memc Electronic Materials, Inc. | Method and system of controlling taper growth in a semiconductor crystal growth process |
US6203611B1 (en) | 1999-10-19 | 2001-03-20 | Memc Electronic Materials, Inc. | Method of controlling growth of a semiconductor crystal to automatically transition from taper growth to target diameter growth |
TW498402B (en) * | 2000-04-26 | 2002-08-11 | Mitsubishi Material Silicon | Method for simulating the shape of the solid-liquid interface between a single crystal and a molten liquid, and the distribution of point defect of a single crystal |
DE10025870A1 (de) | 2000-05-25 | 2001-12-06 | Wacker Siltronic Halbleitermat | Einkristallstab und Verfahren zur Herstellung desselben |
JP2002005745A (ja) * | 2000-06-26 | 2002-01-09 | Nec Corp | 温度測定装置、および温度測定方法 |
JP4380537B2 (ja) * | 2002-07-05 | 2009-12-09 | 株式会社Sumco | シリコン単結晶を製造する方法 |
US7282094B2 (en) * | 2003-05-28 | 2007-10-16 | Sumco Corporation | Method of simulation with respect to density distribution and size distribution of void defect within single crystal and oxygen precipitation nucleus within single crystal |
US8496765B2 (en) * | 2009-09-10 | 2013-07-30 | Sumco Phoenix Corporation | Method for correcting speed deviations between actual and nominal pull speed during crystal growth |
JP6954083B2 (ja) * | 2017-12-18 | 2021-10-27 | 信越半導体株式会社 | Fz用シリコン原料棒の製造方法およびfzシリコン単結晶の製造方法 |
CN109183141A (zh) * | 2018-10-29 | 2019-01-11 | 上海新昇半导体科技有限公司 | 一种晶体生长控制方法、装置、系统及计算机存储介质 |
JP7115252B2 (ja) * | 2018-11-28 | 2022-08-09 | 住友金属鉱山株式会社 | 酸化物単結晶の製造方法及び結晶育成装置 |
JP7077991B2 (ja) * | 2019-02-21 | 2022-05-31 | 信越半導体株式会社 | Czシリコン単結晶製造方法 |
CN110004492B (zh) * | 2019-04-25 | 2020-06-09 | 苏州新美光纳米科技有限公司 | 长晶炉内监测方法及长晶炉 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3761692A (en) * | 1971-10-01 | 1973-09-25 | Texas Instruments Inc | Automated crystal pulling system |
GB1465191A (en) * | 1974-03-29 | 1977-02-23 | Nat Res Dev | Automatically controlled crystal growth |
DE2446293C2 (de) * | 1974-04-03 | 1986-01-30 | National Research Development Corp., London | Vorrichtung zur Regelung des Stabquerschnitts beim Czochralski-Ziehen |
US3958129A (en) * | 1974-08-05 | 1976-05-18 | Motorola, Inc. | Automatic crystal diameter control for growth of semiconductor crystals |
US4710258A (en) * | 1984-11-30 | 1987-12-01 | General Signal Corporation | System for controlling the diameter of a crystal in a crystal growing furnace |
JPH0649631B2 (ja) * | 1986-10-29 | 1994-06-29 | 信越半導体株式会社 | 結晶径測定装置 |
JPS63242991A (ja) * | 1987-03-31 | 1988-10-07 | Shin Etsu Handotai Co Ltd | 結晶径制御方法 |
JPS63307186A (ja) * | 1987-06-05 | 1988-12-14 | Shin Etsu Handotai Co Ltd | 晶出結晶径制御装置 |
JPS6483595A (en) * | 1987-09-25 | 1989-03-29 | Shinetsu Handotai Kk | Device for measuring crystal diameter |
JP2678383B2 (ja) * | 1989-05-30 | 1997-11-17 | 信越半導体 株式会社 | 単結晶上装置 |
JPH0774117B2 (ja) * | 1989-10-20 | 1995-08-09 | 信越半導体株式会社 | ヒータの温度パターン作成方法及びこの温度パターンを用いたSi単結晶育成制御装置 |
-
1990
- 1990-10-12 JP JP2274124A patent/JPH0777996B2/ja not_active Expired - Fee Related
-
1991
- 1991-10-10 DE DE69103119T patent/DE69103119T2/de not_active Expired - Lifetime
- 1991-10-10 EP EP91117283A patent/EP0482438B1/de not_active Expired - Lifetime
- 1991-10-15 US US07/776,774 patent/US5223078A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0482438B1 (de) | 1994-07-27 |
DE69103119T2 (de) | 1995-01-12 |
US5223078A (en) | 1993-06-29 |
EP0482438A1 (de) | 1992-04-29 |
JPH0777996B2 (ja) | 1995-08-23 |
JPH04149092A (ja) | 1992-05-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |