DE69329357T2 - Verfahren zur Herstellung von Leitern in Kontaktlöcher in vielschichtigen Keramiksubstraten - Google Patents

Verfahren zur Herstellung von Leitern in Kontaktlöcher in vielschichtigen Keramiksubstraten

Info

Publication number
DE69329357T2
DE69329357T2 DE69329357T DE69329357T DE69329357T2 DE 69329357 T2 DE69329357 T2 DE 69329357T2 DE 69329357 T DE69329357 T DE 69329357T DE 69329357 T DE69329357 T DE 69329357T DE 69329357 T2 DE69329357 T2 DE 69329357T2
Authority
DE
Germany
Prior art keywords
conductors
production
contact holes
multilayer ceramic
ceramic substrates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69329357T
Other languages
English (en)
Other versions
DE69329357D1 (de
Inventor
Minehiro Itagaki
Kazuyuki Okano
Suzushi Kimura
Seiichi Nakatani
Yoshihiro Bessho
Satoru Yuhaku
Yasuhiko Hakotani
Kazuhiro Miura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP4121610A external-priority patent/JPH05314810A/ja
Priority claimed from JP4252596A external-priority patent/JP3006310B2/ja
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Publication of DE69329357D1 publication Critical patent/DE69329357D1/de
Application granted granted Critical
Publication of DE69329357T2 publication Critical patent/DE69329357T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49866—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers characterised by the materials
    • H01L23/49883—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers characterised by the materials the conductive materials containing organic materials or pastes, e.g. for thick films
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/095—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00 with a principal constituent of the material being a combination of two or more materials provided in the groups H01L2924/013 - H01L2924/0715
    • H01L2924/097—Glass-ceramics, e.g. devitrified glass
    • H01L2924/09701—Low temperature co-fired ceramic [LTCC]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00—Stock material or miscellaneous articles
    • Y10S428/901—Printed circuit
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24917—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer
DE69329357T 1992-05-14 1993-04-30 Verfahren zur Herstellung von Leitern in Kontaktlöcher in vielschichtigen Keramiksubstraten Expired - Fee Related DE69329357T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP4121610A JPH05314810A (ja) 1992-05-14 1992-05-14 導体ペースト組成物
JP4252596A JP3006310B2 (ja) 1992-09-22 1992-09-22 導体ペースト組成物

Publications (2)

Publication Number Publication Date
DE69329357D1 DE69329357D1 (de) 2000-10-12
DE69329357T2 true DE69329357T2 (de) 2001-04-26

Family

ID=26458920

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69329357T Expired - Fee Related DE69329357T2 (de) 1992-05-14 1993-04-30 Verfahren zur Herstellung von Leitern in Kontaktlöcher in vielschichtigen Keramiksubstraten

Country Status (5)

Country Link
US (1) US5496619A (de)
EP (1) EP0569799B1 (de)
KR (1) KR970005710B1 (de)
DE (1) DE69329357T2 (de)
TW (1) TW304267B (de)

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US5599744A (en) * 1995-02-06 1997-02-04 Grumman Aerospace Corporation Method of forming a microcircuit via interconnect
JP3954177B2 (ja) * 1997-01-29 2007-08-08 日本碍子株式会社 金属部材とセラミックス部材との接合構造およびその製造方法
US6146743A (en) * 1997-02-21 2000-11-14 Medtronic, Inc. Barrier metallization in ceramic substrate for implantable medical devices
US5855995A (en) * 1997-02-21 1999-01-05 Medtronic, Inc. Ceramic substrate for implantable medical devices
US6300686B1 (en) 1997-10-02 2001-10-09 Matsushita Electric Industrial Co., Ltd. Semiconductor chip bonded to a thermal conductive sheet having a filled through hole for electrical connection
US6117367A (en) * 1998-02-09 2000-09-12 International Business Machines Corporation Pastes for improved substrate dimensional control
US6270601B1 (en) * 1998-11-02 2001-08-07 Coorstek, Inc. Method for producing filled vias in electronic components
JP2000244123A (ja) * 1999-02-19 2000-09-08 Hitachi Ltd 多層セラミック回路基板
US6432852B1 (en) 1999-12-17 2002-08-13 Keiko Hara Coated glass work and methods
AU2001238279A1 (en) * 2000-02-15 2001-08-27 Georgia Tech Research Corporation System for, and method of, providing gallium alloy for multichip module substrates
TW507484B (en) * 2000-03-15 2002-10-21 Matsushita Electric Ind Co Ltd Method of manufacturing multi-layer ceramic circuit board and conductive paste used for the same
US6749775B2 (en) * 2002-01-29 2004-06-15 Cts Corporation Conductive via composition
JP4579159B2 (ja) * 2003-05-30 2010-11-10 株式会社ヤスフクセラミックス 高周波用磁器組成物とその製造方法、および平面型高周波回路
US20050239947A1 (en) * 2004-02-27 2005-10-27 Greenhill David A Polymeric silver layer
JP4518885B2 (ja) * 2004-09-09 2010-08-04 京セラ株式会社 セラミック電子部品及びその製造方法
KR100997989B1 (ko) * 2008-08-28 2010-12-03 삼성전기주식회사 다층 세라믹 기판
US8698006B2 (en) * 2009-06-04 2014-04-15 Morgan Advanced Ceramics, Inc. Co-fired metal and ceramic composite feedthrough assemblies for use at least in implantable medical devices and methods for making the same
US9892816B2 (en) * 2013-06-27 2018-02-13 Heraeus Precious Metals North America Conshohocken Llc Platinum containing conductive paste
CN103413780B (zh) * 2013-08-20 2015-07-01 厦门大学 一种基于熔融玻璃骨架的三维通孔互联结构制作方法
US11222878B2 (en) 2019-04-30 2022-01-11 Ab Mikroelektronik Gesellschaft Mit Beschraenkter Haftung Electronic power module
CN114615798B (zh) * 2022-04-01 2022-11-29 广州三则电子材料有限公司 一种零收缩填孔导电浆料及其制备方法

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US3640738A (en) * 1970-11-20 1972-02-08 Ibm Borosilicate glass composition
US4301324A (en) * 1978-02-06 1981-11-17 International Business Machines Corporation Glass-ceramic structures and sintered multilayer substrates thereof with circuit patterns of gold, silver or copper
US4234367A (en) * 1979-03-23 1980-11-18 International Business Machines Corporation Method of making multilayered glass-ceramic structures having an internal distribution of copper-based conductors
JPS5922385B2 (ja) * 1980-04-25 1984-05-26 日産自動車株式会社 セラミツク基板のスル−ホ−ル充填用導電体ペ−スト
JPS5729185U (de) * 1980-07-28 1982-02-16
US4419279A (en) * 1980-09-15 1983-12-06 Potters Industries, Inc. Conductive paste, electroconductive body and fabrication of same
JPS5817651A (ja) * 1981-07-24 1983-02-01 Hitachi Ltd 多層回路板とその製造方法
JPS5852900A (ja) * 1981-09-24 1983-03-29 株式会社日立製作所 セラミツク多層配線板の製造方法
JPS58124248A (ja) * 1982-01-20 1983-07-23 Hitachi Ltd 半導体装置
JPS6028296A (ja) * 1983-07-27 1985-02-13 株式会社日立製作所 セラミツク多層配線回路板
KR900004379B1 (ko) * 1983-09-16 1990-06-23 마쯔시다덴기산교 가부시기가이샤 세라믹 다층기판 및 그 제조방법
US4714570A (en) * 1984-07-17 1987-12-22 Matsushita Electric Industrial Co., Ltd. Conductor paste and method of manufacturing a multilayered ceramic body using the paste
JPS6248097A (ja) * 1985-08-28 1987-03-02 日本特殊陶業株式会社 多層回路基板の製造法
US4699888A (en) * 1985-09-16 1987-10-13 Technology Glass Corporation Die/attach composition
JPS6279691A (ja) * 1985-10-02 1987-04-13 日立化成工業株式会社 厚膜回路形成法
JPS6355807A (ja) * 1986-08-27 1988-03-10 古河電気工業株式会社 導電性ペ−スト
US4877555A (en) * 1987-04-13 1989-10-31 Matsushita Electric Industrial Co., Ltd. Conductor composition and method of manufacturing a ceramic multilayer structure using the same
US4874550A (en) * 1987-08-20 1989-10-17 General Electric Company Thick-film copper conductor inks
US4904415A (en) * 1988-08-22 1990-02-27 W. R. Grace & Co.-Conn. Oxide glasses having low glass transformation temperatures
DE68912932T2 (de) * 1989-05-12 1994-08-11 Ibm Deutschland Glas-Keramik-Gegenstand und Verfahren zu dessen Herstellung.
JPH0645593B2 (ja) * 1990-06-19 1994-06-15 三共株式会社 新規物質ｃｃ１２
US5118643A (en) * 1990-10-25 1992-06-02 Aluminum Company Of America Low dielectric inorganic composition for multilayer ceramic package containing titanium silicate glass
US5283104A (en) * 1991-03-20 1994-02-01 International Business Machines Corporation Via paste compositions and use thereof to form conductive vias in circuitized ceramic substrates
US5073180A (en) * 1991-03-20 1991-12-17 International Business Machines Corporation Method for forming sealed co-fired glass ceramic structures
US5925443A (en) * 1991-09-10 1999-07-20 International Business Machines Corporation Copper-based paste containing copper aluminate for microstructural and shrinkage control of copper-filled vias
JPH05235497A (ja) * 1992-02-20 1993-09-10 Murata Mfg Co Ltd 銅導電性ペースト
US5270268A (en) * 1992-09-23 1993-12-14 Aluminum Company Of America Aluminum borate devitrification inhibitor in low dielectric borosilicate glass

Also Published As

Publication number Publication date
EP0569799B1 (de) 2000-09-06
EP0569799A3 (de) 1994-01-05
DE69329357D1 (de) 2000-10-12
KR940006154A (ko) 1994-03-23
EP0569799A2 (de) 1993-11-18
US5496619A (en) 1996-03-05
KR970005710B1 (en) 1997-04-19
TW304267B (de) 1997-05-01

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: PANASONIC CORP., KADOMA, OSAKA, JP

8339 Ceased/non-payment of the annual fee