DE68917350T2 - Verfahren zur Herstellung einer alternierenden Folge monokristalliner Halbleiterschichten und Isolierschichten. - Google Patents

Verfahren zur Herstellung einer alternierenden Folge monokristalliner Halbleiterschichten und Isolierschichten.

Info

Publication number
DE68917350T2
DE68917350T2 DE68917350T DE68917350T DE68917350T2 DE 68917350 T2 DE68917350 T2 DE 68917350T2 DE 68917350 T DE68917350 T DE 68917350T DE 68917350 T DE68917350 T DE 68917350T DE 68917350 T2 DE68917350 T2 DE 68917350T2
Authority
DE
Germany
Prior art keywords
producing
alternating sequence
monocrystalline semiconductor
layers
insulating layers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE68917350T
Other languages
English (en)
Other versions
DE68917350D1 (de
Inventor
Didier Pribat
Leonidas Karapiperis
Christian Collet
Guy Garry
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
REMOTE ACCESS,LLC, LOS ALTOS, CALIF., US
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Application granted granted Critical
Publication of DE68917350D1 publication Critical patent/DE68917350D1/de
Publication of DE68917350T2 publication Critical patent/DE68917350T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76—Making of isolation regions between components
    • H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
    • H01L21/7624—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology
    • H01L21/76248—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology using lateral overgrowth techniques, i.e. ELO techniques
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02367—Substrates
    • H01L21/0237—Materials
    • H01L21/02373—Group 14 semiconducting materials
    • H01L21/02381—Silicon, silicon germanium, germanium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/02521—Materials
    • H01L21/02538—Group 13/15 materials
    • H01L21/02543—Phosphides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/02521—Materials
    • H01L21/02538—Group 13/15 materials
    • H01L21/02546—Arsenides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/02521—Materials
    • H01L21/02538—Group 13/15 materials
    • H01L21/02549—Antimonides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/0262—Reduction or decomposition of gaseous compounds, e.g. CVD
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/02636—Selective deposition, e.g. simultaneous growth of mono- and non-monocrystalline semiconductor materials
    • H01L21/02639—Preparation of substrate for selective deposition
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/164—Three dimensional processing
DE68917350T 1988-04-05 1989-04-04 Verfahren zur Herstellung einer alternierenden Folge monokristalliner Halbleiterschichten und Isolierschichten. Expired - Lifetime DE68917350T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8804437A FR2629636B1 (fr) 1988-04-05 1988-04-05 Procede de realisation d'une alternance de couches de materiau semiconducteur monocristallin et de couches de materiau isolant

Publications (2)

Publication Number Publication Date
DE68917350D1 DE68917350D1 (de) 1994-09-15
DE68917350T2 true DE68917350T2 (de) 1995-01-05

Family

ID=9364938

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68917350T Expired - Lifetime DE68917350T2 (de) 1988-04-05 1989-04-04 Verfahren zur Herstellung einer alternierenden Folge monokristalliner Halbleiterschichten und Isolierschichten.

Country Status (5)

Country Link
US (1) US4952526A (de)
EP (1) EP0336830B1 (de)
JP (1) JP2889588B2 (de)
DE (1) DE68917350T2 (de)
FR (1) FR2629636B1 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19845787A1 (de) * 1998-09-21 2000-03-23 Inst Halbleiterphysik Gmbh Bipolartransistor und Verfahren zu seiner Herstellung

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Publication number Priority date Publication date Assignee Title
DE19845787A1 (de) * 1998-09-21 2000-03-23 Inst Halbleiterphysik Gmbh Bipolartransistor und Verfahren zu seiner Herstellung

Also Published As

Publication number Publication date
FR2629636A1 (fr) 1989-10-06
US4952526A (en) 1990-08-28
JPH01300514A (ja) 1989-12-05
JP2889588B2 (ja) 1999-05-10
FR2629636B1 (fr) 1990-11-16
EP0336830A1 (de) 1989-10-11
EP0336830B1 (de) 1994-08-10
DE68917350D1 (de) 1994-09-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: THALES, PARIS, FR

8328 Change in the person/name/address of the agent

Representative=s name: BOEHMERT & BOEHMERT, 28209 BREMEN

8327 Change in the person/name/address of the patent owner

Owner name: REMOTE ACCESS,LLC, LOS ALTOS, CALIF., US