DE602008004080D1 - Beschichtungsvorrichtung und verfahren zur herstellung einer folie mithilfe der beschichtungsvorrichtung - Google Patents

Beschichtungsvorrichtung und verfahren zur herstellung einer folie mithilfe der beschichtungsvorrichtung

Info

Publication number
DE602008004080D1
DE602008004080D1 DE602008004080T DE602008004080T DE602008004080D1 DE 602008004080 D1 DE602008004080 D1 DE 602008004080D1 DE 602008004080 T DE602008004080 T DE 602008004080T DE 602008004080 T DE602008004080 T DE 602008004080T DE 602008004080 D1 DE602008004080 D1 DE 602008004080D1
Authority
DE
Germany
Prior art keywords
substrate
vapor deposition
vapor
zone
coating device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602008004080T
Other languages
English (en)
Inventor
Sadayuki Okazaki
Kazuyoshi Honda
Tomofumi Yanagi
Shoichi Imashiku
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Original Assignee
Panasonic Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Panasonic Corp filed Critical Panasonic Corp
Publication of DE602008004080D1 publication Critical patent/DE602008004080D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/225—Oblique incidence of vaporised material on substrate
    • C23C14/226—Oblique incidence of vaporised material on substrate in order to form films with columnar structure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00—Electrodes
    • H01M4/02—Electrodes composed of, or comprising, active material
    • H01M4/04—Processes of manufacture in general
    • H01M4/0402—Methods of deposition of the material
    • H01M4/0421—Methods of deposition of the material involving vapour deposition
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00—Electrodes
    • H01M4/02—Electrodes composed of, or comprising, active material
    • H01M4/13—Electrodes for accumulators with non-aqueous electrolyte, e.g. for lithium-accumulators; Processes of manufacture thereof
    • H01M4/139—Processes of manufacture
    • H01M4/1395—Processes of manufacture of electrodes based on metals, Si or alloys
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M10/00—Secondary cells; Manufacture thereof
    • H01M10/05—Accumulators with non-aqueous electrolyte
    • H01M10/052—Li-accumulators
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10—Energy storage using batteries
DE602008004080T 2007-03-09 2008-03-10 Beschichtungsvorrichtung und verfahren zur herstellung einer folie mithilfe der beschichtungsvorrichtung Active DE602008004080D1 (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2007059442 2007-03-09
JP2007103622 2007-04-11
JP2007103621 2007-04-11
JP2007273922 2007-10-22
PCT/JP2008/000519 WO2008111306A1 (ja) 2007-03-09 2008-03-10 蒸着装置および蒸着装置を用いた膜の製造方法

Publications (1)

Publication Number Publication Date
DE602008004080D1 true DE602008004080D1 (de) 2011-02-03

Family

ID=39759249

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602008004080T Active DE602008004080D1 (de) 2007-03-09 2008-03-10 Beschichtungsvorrichtung und verfahren zur herstellung einer folie mithilfe der beschichtungsvorrichtung

Country Status (8)

Country Link
US (2) US8241699B2 (de)
EP (1) EP2088220B1 (de)
JP (2) JP4324239B2 (de)
KR (1) KR101478844B1 (de)
CN (1) CN101542008B (de)
AT (1) ATE492662T1 (de)
DE (1) DE602008004080D1 (de)
WO (1) WO2008111306A1 (de)

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JP2010280943A (ja) * 2009-06-04 2010-12-16 Sony Corp 蒸着装置及び蒸着方法
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US9048373B2 (en) * 2013-06-13 2015-06-02 Tsmc Solar Ltd. Evaporation apparatus and method
US9869013B2 (en) * 2014-04-25 2018-01-16 Applied Materials, Inc. Ion assisted deposition top coat of rare-earth oxide
TW201616467A (zh) * 2014-10-31 2016-05-01 中華映管股份有限公司 曲面裝飾板以及曲面顯示裝置的製作方法
US10415960B2 (en) 2015-04-06 2019-09-17 Worldvu Satellites Limited Elevation angle estimating system and method for user terminal placement
US10012503B2 (en) 2015-06-12 2018-07-03 Worldvu Satellites Limited Elevation angle estimating device and method for user terminal placement
JP6318188B2 (ja) * 2016-03-30 2018-04-25 株式会社日立国際電気 半導体装置の製造方法、基板処理装置およびプログラム
KR102468497B1 (ko) * 2017-11-10 2022-11-17 주식회사 엘지에너지솔루션 산화물 반도체 층을 갖는 보호막을 포함하는 리튬-황 이차전지
TWI642808B (zh) * 2017-11-14 2018-12-01 財團法人工業技術研究院 基板傳輸單元與鍍膜設備
CN111788330A (zh) * 2018-03-08 2020-10-16 堺显示器制品株式会社 成膜装置、蒸镀膜的成膜方法以及有机el显示装置的制造方法
CN109628886B (zh) * 2019-01-10 2021-01-19 云谷（固安）科技有限公司 一种蒸镀装置、蒸镀方法、混合层和显示面板
CN112368413B (zh) * 2019-03-12 2022-04-29 株式会社爱发科 真空蒸镀装置
CN112111707A (zh) * 2019-06-21 2020-12-22 合肥欣奕华智能机器有限公司 一种蒸发源及卷对卷蒸镀装置
DE102019007935B4 (de) * 2019-11-14 2023-06-29 Elfolion Gmbh Verfahren zum Bearbeiten flexibler Substrate und Vakuumbearbeitungsanlage zur Umsetzung des Verfahrens
KR102275410B1 (ko) * 2021-03-12 2021-07-09 (주)마루엘앤씨 초전도 선재 제조를 위한 플라즈마 보조 반응성 동시 증착 시스템
CN113684464B (zh) * 2021-08-27 2023-06-02 辽宁分子流科技有限公司 一种用于石墨烯复合薄膜制备的卷绕式设备

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Also Published As

Publication number Publication date
CN101542008B (zh) 2011-08-24
US20100075036A1 (en) 2010-03-25
US8241699B2 (en) 2012-08-14
EP2088220A1 (de) 2009-08-12
EP2088220A4 (de) 2009-12-09
KR101478844B1 (ko) 2015-01-02
US20130014699A1 (en) 2013-01-17
KR20090122171A (ko) 2009-11-26
ATE492662T1 (de) 2011-01-15
EP2088220B1 (de) 2010-12-22
JPWO2008111306A1 (ja) 2010-06-24
JP2009150000A (ja) 2009-07-09
JP4324239B2 (ja) 2009-09-02
WO2008111306A1 (ja) 2008-09-18
CN101542008A (zh) 2009-09-23

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