DE602006003365D1 - Leitfähige Dickschichtzusammensetzung(en), Elektrode(n) und daraus hergestellte Halbleitervorrichtung(en) - Google Patents

Leitfähige Dickschichtzusammensetzung(en), Elektrode(n) und daraus hergestellte Halbleitervorrichtung(en)

Info

Publication number
DE602006003365D1
DE602006003365D1 DE602006003365T DE602006003365T DE602006003365D1 DE 602006003365 D1 DE602006003365 D1 DE 602006003365D1 DE 602006003365 T DE602006003365 T DE 602006003365T DE 602006003365 T DE602006003365 T DE 602006003365T DE 602006003365 D1 DE602006003365 D1 DE 602006003365D1
Authority
DE
Germany
Prior art keywords
electrode
semiconductor device
thick film
film composition
produced therefrom
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602006003365T
Other languages
English (en)
Inventor
Yueli L Wang
Kenneth Warren Hang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=36688102&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE602006003365(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of DE602006003365D1 publication Critical patent/DE602006003365D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/062Glass compositions containing silica with less than 40% silica by weight
    • C03C3/064Glass compositions containing silica with less than 40% silica by weight containing boron
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C14/00Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix
    • C03C14/006Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix the non-glass component being in the form of microcrystallites, e.g. of optically or electrically active material
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/062Glass compositions containing silica with less than 40% silica by weight
    • C03C3/064Glass compositions containing silica with less than 40% silica by weight containing boron
    • C03C3/066Glass compositions containing silica with less than 40% silica by weight containing boron containing zinc
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/02Frit compositions, i.e. in a powdered or comminuted form
    • C03C8/04Frit compositions, i.e. in a powdered or comminuted form containing zinc
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/14Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions
    • C03C8/18Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions containing free metals
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20Conductive material dispersed in non-conductive organic material
    • H01B1/22Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0224Electrodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0224Electrodes
    • H01L31/022408Electrodes for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/022425Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2214/00Nature of the non-vitreous component
    • C03C2214/08Metals
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2214/00Nature of the non-vitreous component
    • C03C2214/16Microcrystallites, e.g. of optically or electrically active material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/09Use of materials for the conductive, e.g. metallic pattern
    • H05K1/092Dispersed materials, e.g. conductive pastes or inks
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/542Dye sensitized solar cells

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Geochemistry & Mineralogy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Dispersion Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Power Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Sustainable Energy (AREA)
  • Sustainable Development (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Conductive Materials (AREA)
  • Photovoltaic Devices (AREA)
  • Electrodes Of Semiconductors (AREA)
DE602006003365T 2005-04-14 2006-04-13 Leitfähige Dickschichtzusammensetzung(en), Elektrode(n) und daraus hergestellte Halbleitervorrichtung(en) Active DE602006003365D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/106,262 US7494607B2 (en) 2005-04-14 2005-04-14 Electroconductive thick film composition(s), electrode(s), and semiconductor device(s) formed therefrom

Publications (1)

Publication Number Publication Date
DE602006003365D1 true DE602006003365D1 (de) 2008-12-11

Family

ID=36688102

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602006003365T Active DE602006003365D1 (de) 2005-04-14 2006-04-13 Leitfähige Dickschichtzusammensetzung(en), Elektrode(n) und daraus hergestellte Halbleitervorrichtung(en)

Country Status (8)

Country Link
US (4) US7494607B2 (de)
EP (1) EP1713094B1 (de)
JP (1) JP2006313744A (de)
KR (1) KR100890866B1 (de)
CN (1) CN101055776B (de)
AU (1) AU2006201557A1 (de)
DE (1) DE602006003365D1 (de)
TW (1) TW200727503A (de)

Families Citing this family (189)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6444617A (en) * 1987-08-12 1989-02-17 Seiko Epson Corp Protecting circuit
US20030148024A1 (en) * 2001-10-05 2003-08-07 Kodas Toivo T. Low viscosity precursor compositons and methods for the depositon of conductive electronic features
US7732002B2 (en) * 2001-10-19 2010-06-08 Cabot Corporation Method for the fabrication of conductive electronic features
KR101190921B1 (ko) * 2004-07-22 2012-10-12 도레이 카부시키가이샤 감광성 페이스트 및 디스플레이 패널용 부재의 제조 방법
US7494607B2 (en) * 2005-04-14 2009-02-24 E.I. Du Pont De Nemours And Company Electroconductive thick film composition(s), electrode(s), and semiconductor device(s) formed therefrom
US20060231802A1 (en) * 2005-04-14 2006-10-19 Takuya Konno Electroconductive thick film composition, electrode, and solar cell formed therefrom
US7824579B2 (en) * 2005-06-07 2010-11-02 E. I. Du Pont De Nemours And Company Aluminum thick film composition(s), electrode(s), semiconductor device(s) and methods of making thereof
US7771623B2 (en) * 2005-06-07 2010-08-10 E.I. du Pont de Nemours and Company Dupont (UK) Limited Aluminum thick film composition(s), electrode(s), semiconductor device(s) and methods of making thereof
US7718092B2 (en) * 2005-10-11 2010-05-18 E.I. Du Pont De Nemours And Company Aluminum thick film composition(s), electrode(s), semiconductor device(s) and methods of making thereof
WO2007060744A1 (ja) * 2005-11-28 2007-05-31 Mitsubishi Denki Kabushiki Kaisha 太陽電池セルおよびその製造方法
JP2009542006A (ja) * 2006-06-19 2009-11-26 キャボット コーポレイション 光起電力導電性機能物及びその形成方法
CN101512778B (zh) 2006-08-31 2012-05-09 信越半导体股份有限公司 半导体基板、形成电极的方法、及太阳能电池的制造方法
JP5219355B2 (ja) * 2006-10-27 2013-06-26 京セラ株式会社 太陽電池素子の製造方法
US20100066779A1 (en) 2006-11-28 2010-03-18 Hanan Gothait Method and system for nozzle compensation in non-contact material deposition
US20080230119A1 (en) * 2007-03-22 2008-09-25 Hideki Akimoto Paste for back contact-type solar cell
CN101663711B (zh) * 2007-04-25 2013-02-27 费罗公司 含银和镍或银和镍合金的厚膜导体配方及由其制成的太阳能电池
TWI370552B (en) * 2007-06-08 2012-08-11 Gigastorage Corp Solar cell
DE102007027999A1 (de) * 2007-06-14 2008-12-18 Leonhard Kurz Gmbh & Co. Kg Heißprägen von Strukturen
US7704416B2 (en) * 2007-06-29 2010-04-27 E.I. Du Pont De Nemours And Company Conductor paste for ceramic substrate and electric circuit
US8309844B2 (en) * 2007-08-29 2012-11-13 Ferro Corporation Thick film pastes for fire through applications in solar cells
CN101778684B (zh) * 2007-09-07 2015-11-25 E.I.内穆尔杜邦公司 包含银以及至少两种含非银的单质的多元素合金粉末
TW200926210A (en) * 2007-09-27 2009-06-16 Murata Manufacturing Co Ag electrode paste, solar battery cell, and process for producing the solar battery cell
JP2011502330A (ja) * 2007-10-18 2011-01-20 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー 鉛フリーの伝導性組成物、および半導体デバイスの製造における使用方法:Mg含有添加剤
JP2009129600A (ja) * 2007-11-21 2009-06-11 Toyo Aluminium Kk ペースト組成物と太陽電池素子
US8383011B2 (en) * 2008-01-30 2013-02-26 Basf Se Conductive inks with metallo-organic modifiers
US8308993B2 (en) * 2008-01-30 2012-11-13 Basf Se Conductive inks
US7736546B2 (en) 2008-01-30 2010-06-15 Basf Se Glass frits
US20090211626A1 (en) * 2008-02-26 2009-08-27 Hideki Akimoto Conductive paste and grid electrode for silicon solar cells
EP2295383A4 (de) * 2008-04-18 2012-10-10 Nippon Electric Glass Co Glaszusammensetzung für farbstoffsensibilisierte solarzelle und material für farbstoffsensibilisierte solarzelle
KR100961226B1 (ko) 2008-05-26 2010-06-03 주식회사 나노신소재 환경친화형 태양전지 전극용 페이스트 및 이를 이용한태양전지
CN102017014A (zh) * 2008-05-28 2011-04-13 E.I.内穆尔杜邦公司 包含光伏电池导体中所用的亚微米颗粒的组合物
US8008179B2 (en) * 2008-05-28 2011-08-30 E.I. Du Pont De Nemours And Company Methods using silver compositions for micro-deposition direct writing silver conductor lines on photovoltaic wafers
US8158504B2 (en) 2008-05-30 2012-04-17 E. I. Du Pont De Nemours And Company Conductive compositions and processes for use in the manufacture of semiconductor devices—organic medium components
ES2427615T3 (es) 2008-05-30 2013-10-31 E. I. Du Pont De Nemours And Company Composiciones conductoras y procedimientos para uso en la fabricación de dispositivos semiconductores
WO2009154314A1 (ja) * 2008-06-17 2009-12-23 日本電気硝子株式会社 太陽電池用基板および色素増感型太陽電池用酸化物半導体電極
US8207444B2 (en) * 2008-07-01 2012-06-26 Sunpower Corporation Front contact solar cell with formed electrically conducting layers on the front side and backside
DE102008032784A1 (de) 2008-07-02 2010-03-18 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Zusammensetzung mit pastöser Konsistenz für die Ausbildung elektrischer Kontakte auf einem Silicium-Solarwafer und damit hergestellter Kontakt
CN101339821B (zh) * 2008-08-15 2010-09-01 深圳市圣龙特电子有限公司 无铅无镉铜浆及其制造方法
JP5717043B2 (ja) * 2008-09-04 2015-05-13 日本電気硝子株式会社 電極形成用ガラス組成物および電極形成材料
US7976734B2 (en) * 2008-09-10 2011-07-12 E.I. Du Pont De Nemours And Company Solar cell electrodes
KR101509757B1 (ko) * 2008-09-26 2015-04-06 엘지이노텍 주식회사 태양전지의 제조방법 및 태양전지
EP2187444A1 (de) * 2008-11-13 2010-05-19 Gigastorage Corporation Elektrisch leitfähige Pastenzusammensetzung, Elektrode und diese aufweisende Solarzelle
WO2010061394A1 (en) 2008-11-30 2010-06-03 Xjet Ltd. Method and system for applying materials on a substrate
US20100167032A1 (en) 2008-12-29 2010-07-01 E.I.Du Pont De Nemours And Company Front electrode for pdp
KR101716397B1 (ko) * 2009-03-06 2017-03-14 도요 알루미늄 가부시키가이샤 도전성 페이스트 조성물 및 그를 이용하여 형성된 도전성 막
CN102356434A (zh) 2009-03-19 2012-02-15 E.I.内穆尔杜邦公司 用于太阳能电池电极的导体浆料
KR20110137826A (ko) * 2009-04-09 2011-12-23 이 아이 듀폰 디 네모아 앤드 캄파니 광전지용 전도체에 사용되는 유리 조성물
US20100258166A1 (en) * 2009-04-09 2010-10-14 E.I. Du Pont De Nemours And Company Glass compositions used in conductors for photovoltaic cells
WO2010118198A1 (en) * 2009-04-09 2010-10-14 E. I. Du Pont De Nemours And Company Glass compositions used in conductors for photovoltaic cells
JP5796270B2 (ja) * 2009-04-16 2015-10-21 日本電気硝子株式会社 電極形成材料
JP5241595B2 (ja) * 2009-04-30 2013-07-17 三菱電機株式会社 太陽電池の電極形成方法および太陽電池の製造方法
EP2432640B1 (de) 2009-05-18 2024-04-03 Xjet Ltd. Verfahren und vorrichtung zum drucken auf erwärmten substraten
US20100301479A1 (en) * 2009-05-28 2010-12-02 E. I. Du Pont De Nemours And Company Devices containing silver compositions deposited by micro-deposition direct writing silver conductor lines
TW201115592A (en) 2009-06-19 2011-05-01 Du Pont Glass compositions used in conductors for photovoltaic cells
KR101144810B1 (ko) * 2009-07-06 2012-05-11 엘지전자 주식회사 태양전지용 전극 페이스트, 이를 이용한 태양전지, 및 태양전지의 제조방법
JP2011044426A (ja) 2009-07-24 2011-03-03 Nippon Electric Glass Co Ltd 太陽電池用導電膜付ガラス基板
JP5649290B2 (ja) 2009-07-30 2015-01-07 株式会社ノリタケカンパニーリミテド 太陽電池電極用無鉛導電性組成物
KR101139459B1 (ko) 2009-08-27 2012-04-30 엘지전자 주식회사 태양전지 및 그 제조방법
JP5984671B2 (ja) * 2009-09-04 2016-09-06 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se 電極を印刷するための組成物
TW201133509A (en) * 2009-09-08 2011-10-01 Du Pont Conductors for photovoltaic cells
KR102071006B1 (ko) * 2009-11-11 2020-01-30 삼성전자주식회사 도전성 페이스트 및 태양 전지
EP2325848B1 (de) * 2009-11-11 2017-07-19 Samsung Electronics Co., Ltd. Leitfähige Paste und Solarzelle
US9012766B2 (en) * 2009-11-12 2015-04-21 Silevo, Inc. Aluminum grid as backside conductor on epitaxial silicon thin film solar cells
US8999203B2 (en) * 2009-11-25 2015-04-07 E I Du Pont De Nemours And Company Aluminum pastes and use thereof in the production of passivated emitter and rear contact silicon solar cells
US20170077324A9 (en) * 2009-11-25 2017-03-16 E I Du Pont De Nemours And Company Aluminum pastes and use thereof in the production of passivated emitter and rear contact silicon solar cells
US20110315210A1 (en) 2009-12-18 2011-12-29 E. I. Du Pont De Nemours And Company Glass compositions used in conductors for photovoltaic cells
US8252204B2 (en) 2009-12-18 2012-08-28 E I Du Pont De Nemours And Company Glass compositions used in conductors for photovoltaic cells
US20110209751A1 (en) * 2010-01-25 2011-09-01 Hitachi Chemical Company, Ltd. Paste composition for electrode and photovoltaic cell
JP5633286B2 (ja) * 2010-01-25 2014-12-03 日立化成株式会社 電極用ペースト組成物および太陽電池
US20110180139A1 (en) * 2010-01-25 2011-07-28 Hitachi Chemical Company, Ltd. Paste composition for electrode and photovoltaic cell
US20110180138A1 (en) * 2010-01-25 2011-07-28 Hitachi Chemical Company, Ltd. Paste composition for electrode and photovoltaic cell
JP5633285B2 (ja) 2010-01-25 2014-12-03 日立化成株式会社 電極用ペースト組成物及び太陽電池
US9390829B2 (en) 2010-01-25 2016-07-12 Hitachi Chemical Company, Ltd. Paste composition for electrode and photovoltaic cell
US8535971B2 (en) * 2010-02-12 2013-09-17 Heraeus Precious Metals North America Conshohocken Llc Method for applying full back surface field and silver busbar to solar cell
WO2011138729A2 (en) 2010-05-02 2011-11-10 Xjet Ltd. Printing system with self-purge, sediment prevention and fumes removal arrangements
TWI498308B (zh) 2010-05-04 2015-09-01 Du Pont 含有鉛-碲-鋰-鈦-氧化物之厚膜膏及其在半導體裝置之製造中的用途
US9214576B2 (en) 2010-06-09 2015-12-15 Solarcity Corporation Transparent conducting oxide for photovoltaic devices
US20120160314A1 (en) * 2010-06-24 2012-06-28 E. I. Du Pont De Nemours And Company Process for the formation of a silver back anode of a silicon solar cell
JP2013539405A (ja) 2010-07-22 2013-10-24 エックスジェット・リミテッド 印刷ヘッドノズル評価
KR101181190B1 (ko) * 2010-07-30 2012-09-18 엘지이노텍 주식회사 태양 전지 및 이의 후면 전극용 페이스트 조성물
US20120031484A1 (en) 2010-08-06 2012-02-09 E. I. Du Pont De Nemours And Company Conductive paste for a solar cell electrode
KR20120014821A (ko) 2010-08-10 2012-02-20 엘지이노텍 주식회사 고효율 실리콘 태양전지의 후면전극 형성용 페이스트 조성물 및 그 제조방법과 이를 포함하는 실리콘 태양전지
US8987586B2 (en) 2010-08-13 2015-03-24 Samsung Electronics Co., Ltd. Conductive paste and electronic device and solar cell including an electrode formed using the conductive paste
CN102376379B (zh) * 2010-08-13 2016-04-20 三星电子株式会社 导电糊料及包含用其形成的电极的电子器件和太阳能电池
CN103068761A (zh) * 2010-08-17 2013-04-24 日本电气硝子株式会社 电极形成用玻璃及使用其的电极形成材料
US9773928B2 (en) 2010-09-10 2017-09-26 Tesla, Inc. Solar cell with electroplated metal grid
KR101200967B1 (ko) * 2010-09-14 2012-11-13 이원배 세라믹글래스를 이용한 면상발열체
US9800053B2 (en) 2010-10-08 2017-10-24 Tesla, Inc. Solar panels with integrated cell-level MPPT devices
KR102000098B1 (ko) 2010-10-18 2019-07-15 엑스제트 엘티디. 잉크젯 헤드 저장 및 청소
EP2629910A1 (de) * 2010-10-20 2013-08-28 Robert Bosch GmbH Ausgangswerkstoff und verfahren zur herstellung einer sinterverbindung
EP2448003A3 (de) 2010-10-27 2012-08-08 Samsung Electronics Co., Ltd. Leitfähige Paste enthaltend ein leitfähiges Pulver und ein metallisches Glas zur Herstellung einer Solarzellenelektrode
JP2012129407A (ja) * 2010-12-16 2012-07-05 Kyocera Corp 太陽電池素子の製造方法
US9129725B2 (en) 2010-12-17 2015-09-08 E I Du Pont De Nemours And Company Conductive paste composition containing lithium, and articles made therefrom
US9105370B2 (en) 2011-01-12 2015-08-11 Samsung Electronics Co., Ltd. Conductive paste, and electronic device and solar cell including an electrode formed using the same
US8940195B2 (en) 2011-01-13 2015-01-27 Samsung Electronics Co., Ltd. Conductive paste, and electronic device and solar cell including an electrode formed using the same
US20130049148A1 (en) 2011-02-22 2013-02-28 E I Du Pont De Nemours And Company Conductive paste composition and semiconductor devices made therewith
US20130061919A1 (en) * 2011-03-18 2013-03-14 E I Du Pont Nemours And Company Method of manufacturing solar cell electrode
US20130074917A1 (en) * 2011-03-24 2013-03-28 E. I. Du Pont De Nemours And Company Process for the production of a mwt silicon solar cell
TW201245361A (en) 2011-03-24 2012-11-16 Du Pont Conductive paste composition and semiconductor devices made therewith
US20130074916A1 (en) * 2011-03-24 2013-03-28 E. I. Du Pont De Nemours And Company Process for the production of a mwt silicon solar cell
KR102011477B1 (ko) 2011-03-29 2019-08-16 썬 케미칼 코포레이션 왁스 요변체를 함유하는 고-종횡비 스크린 인쇄성 후막 페이스트 조성물
US20120255605A1 (en) * 2011-04-06 2012-10-11 E. I. Du Pont De Nemours And Company Method of manufacturing solar cell electrode
US9224517B2 (en) 2011-04-07 2015-12-29 Hitachi Chemical Company, Ltd. Paste composition for electrode and photovoltaic cell
JP5120477B2 (ja) 2011-04-07 2013-01-16 日立化成工業株式会社 電極用ペースト組成物及び太陽電池
JP5768455B2 (ja) 2011-04-14 2015-08-26 日立化成株式会社 電極用ペースト組成物及び太陽電池素子
US9054256B2 (en) 2011-06-02 2015-06-09 Solarcity Corporation Tunneling-junction solar cell with copper grid for concentrated photovoltaic application
US20120312368A1 (en) * 2011-06-13 2012-12-13 E I Du Pont De Nemours And Company Thick film paste containing bismuth-based oxide and its use in the manufacture of semiconductor devices
US20120312369A1 (en) * 2011-06-13 2012-12-13 E I Du Pont De Nemours And Company Thick film paste containing bismuth-based oxide and its use in the manufacture of semiconductor devices
US20130004659A1 (en) * 2011-06-30 2013-01-03 E I Du Pont De Nemours And Company Thick film paste and use thereof
US9783874B2 (en) * 2011-06-30 2017-10-10 E I Du Pont De Nemours And Company Thick film paste and use thereof
CN103890960A (zh) * 2011-07-25 2014-06-25 日立化成株式会社 元件及太阳能电池
JP5708807B2 (ja) 2011-07-25 2015-04-30 日立化成株式会社 素子及び太陽電池
US20130192670A1 (en) * 2011-08-11 2013-08-01 E I Du Pont De Nemours And Company Aluminum paste and use thereof in the production of passivated emitter and rear contact silicon solar cells
US20130192671A1 (en) * 2011-08-11 2013-08-01 E I Du Pont De Nemours And Company Conductive metal paste and use thereof
US20130056060A1 (en) * 2011-09-07 2013-03-07 E I Du Pont De Nemours And Company Process for the production of lfc-perc silicon solar cells
JP6068474B2 (ja) * 2011-09-09 2017-01-25 ヘレウス プレシャス メタルズ ノース アメリカ コンショホーケン エルエルシー 銀製の太陽電池接点
JP2013081966A (ja) * 2011-10-06 2013-05-09 Fujitsu Ltd 導電性接合材料、並びに導体の接合方法、及び半導体装置の製造方法
US9023254B2 (en) * 2011-10-20 2015-05-05 E I Du Pont De Nemours And Company Thick film silver paste and its use in the manufacture of semiconductor devices
CN103975392B (zh) * 2011-10-27 2017-09-08 上海匡宇电子技术有限公司 用于形成半导体电极的导电组合物
TWI432551B (zh) * 2011-11-11 2014-04-01 Eternal Chemical Co Ltd 太陽能電池用之導電膠組成物及其應用
KR20150125956A (ko) 2011-11-14 2015-11-10 히타치가세이가부시끼가이샤 전극용 페이스트 조성물, 태양 전지 소자 및 태양 전지
KR101648918B1 (ko) * 2011-12-06 2016-08-18 주식회사 엘지화학 은 페이스트 조성물을 이용한 후면 전극의 제조방법 및 실리콘 태양전지의 제조방법
US9039942B2 (en) 2011-12-21 2015-05-26 E I Du Pont De Nemours And Company Lead-free conductive paste composition and semiconductor devices made therewith
DE102012221334B4 (de) 2011-12-22 2018-10-25 Schott Ag Lötpaste und deren Verwendung zur Front- oder Rückseitenkontaktierung von siliziumbasierten Solarzellen
EP2607327A1 (de) * 2011-12-23 2013-06-26 Heraeus Precious Metals GmbH & Co. KG Dickfilmzusammensetzung mit Antimonoxid und ihre Verwendung bei der Herstellung von Halbleiterbauelementen
US20130160835A1 (en) * 2011-12-27 2013-06-27 E. I. Du Pont De Nemours And Company Back-side electrode of p-type solar cell and method for forming the same
CN102426875B (zh) * 2011-12-31 2014-04-16 四川虹欧显示器件有限公司 导电浆料、制备方法及由其制得的电极
US20130183795A1 (en) 2012-01-16 2013-07-18 E I Du Pont De Nemours And Company Solar cell back side electrode
JP5598739B2 (ja) 2012-05-18 2014-10-01 株式会社マテリアル・コンセプト 導電性ペースト
WO2013179282A1 (en) * 2012-05-28 2013-12-05 Xjet Ltd. Solar cell electrically conductive structure and method
JP2015528178A (ja) * 2012-06-12 2015-09-24 ヘレウス プレシャス メタルズ ノース アメリカ コンショホーケン エルエルシー 接着促進剤を有する導電性ペースト
US8900488B2 (en) 2012-09-06 2014-12-02 E I Du Pont De Nemours And Company Conductive paste composition and semiconductor devices made therewith
US9236161B2 (en) 2012-09-06 2016-01-12 E I Du Pont De Nemours And Company Conductive paste composition and semiconductor devices made therewith
US9153712B2 (en) 2012-09-27 2015-10-06 Sunpower Corporation Conductive contact for solar cell
WO2014055781A1 (en) 2012-10-04 2014-04-10 Silevo, Inc. Photovoltaic devices with electroplated metal grids
US9865754B2 (en) 2012-10-10 2018-01-09 Tesla, Inc. Hole collectors for silicon photovoltaic cells
US9245663B2 (en) * 2012-10-10 2016-01-26 E I Du Pont De Nemours And Company Thick film silver paste and its use in the manufacture of semiconductor devices
WO2014061765A1 (ja) * 2012-10-19 2014-04-24 ナミックス株式会社 導電性ペースト
US9281436B2 (en) 2012-12-28 2016-03-08 Solarcity Corporation Radio-frequency sputtering system with rotary target for fabricating solar cells
EP2750141B1 (de) * 2012-12-28 2018-02-07 Heraeus Deutschland GmbH & Co. KG Elektrisch leitende Paste mit einer vanadiumhaltigen Verbindung bei der Herstellung von Elektroden in MWT-Solarzellen
EP2749545B1 (de) 2012-12-28 2018-10-03 Heraeus Deutschland GmbH & Co. KG Binäre Glasfritten zur Verwendung in der Herstellung von N-Typ-Solarzellen
US10074755B2 (en) 2013-01-11 2018-09-11 Tesla, Inc. High efficiency solar panel
US9412884B2 (en) 2013-01-11 2016-08-09 Solarcity Corporation Module fabrication of solar cells with low resistivity electrodes
US9219174B2 (en) 2013-01-11 2015-12-22 Solarcity Corporation Module fabrication of solar cells with low resistivity electrodes
US10117265B2 (en) * 2013-01-14 2018-10-30 Telefonaktiebolaget Lm Ericsson (Publ) Resource scheduling in a wireless communication network
US9236155B2 (en) * 2013-02-04 2016-01-12 E I Du Pont De Nemours And Company Copper paste composition and its use in a method for forming copper conductors on substrates
JP6449788B2 (ja) * 2013-02-25 2019-01-09 サン−ゴバン グラス フランス 有機発光ダイオードを有するデバイスのための基材
US20140261662A1 (en) * 2013-03-18 2014-09-18 E I Du Pont De Nemours And Company Method of manufacturing a solar cell electrode
JP6184731B2 (ja) 2013-04-25 2017-08-23 Dowaエレクトロニクス株式会社 銀−ビスマス粉末、導電性ペースト及び導電膜
KR102032280B1 (ko) * 2013-04-25 2019-10-15 엘지전자 주식회사 태양 전지의 전극용 페이스트 조성물
KR20160007508A (ko) 2013-05-13 2016-01-20 히타치가세이가부시끼가이샤 전극 형성용 조성물, 태양 전지 소자 및 태양 전지
US9624595B2 (en) 2013-05-24 2017-04-18 Solarcity Corporation Electroplating apparatus with improved throughput
RU2531519C1 (ru) * 2013-05-27 2014-10-20 Закрытое акционерное общество "Монокристалл" ЗАО "Монокристалл" Алюминиевая паста для кремниевых солнечных элементов
DE102013216191B4 (de) * 2013-08-14 2021-10-21 Faurecia Innenraum Systeme Gmbh Verfahren zur Herstellung eines Trägerelements und Trägerelement für ein Transportmittel
CN105492548A (zh) * 2013-09-16 2016-04-13 贺利氏贵金属北美康舍霍肯有限责任公司 具有促粘玻璃的导电浆料
EP2848657A1 (de) * 2013-09-16 2015-03-18 Heraeus Precious Metals North America Conshohocken LLC Elektrisch leitende Paste mit haftungsförderndem Glas
US20150075597A1 (en) * 2013-09-16 2015-03-19 Heraeus Precious Metals North America Conshohocken Llc Electroconductive paste with adhension promoting glass
EP3685997A3 (de) 2013-10-17 2020-09-23 Xjet Ltd. Trägertinte für dreidimensionales (3d-)drucken
US9666731B2 (en) * 2013-10-21 2017-05-30 Samsung Sdi Co., Ltd. Composition for solar cell electrodes, electrode fabricated using the same, and solar cell having the electrode
TWI634825B (zh) 2013-11-28 2018-09-01 東洋鋁股份有限公司 Circuit board manufacturing method and circuit board
JP6046753B2 (ja) 2014-01-17 2016-12-21 ヘレウス プレシャス メタルズ ノース アメリカ コンショホーケン エルエルシー 改良された接着特性を有する鉛−ビスマス−テルル−ケイ酸塩無機反応系
TW201543505A (zh) * 2014-03-20 2015-11-16 Namics Corp 導電性膠、積層陶瓷零件、印刷配線板及電子裝置
JP6298152B2 (ja) * 2014-03-27 2018-03-20 京セラ株式会社 太陽電池およびこれを用いた太陽電池モジュール
US10309012B2 (en) 2014-07-03 2019-06-04 Tesla, Inc. Wafer carrier for reducing contamination from carbon particles and outgassing
US9899546B2 (en) 2014-12-05 2018-02-20 Tesla, Inc. Photovoltaic cells with electrodes adapted to house conductive paste
US9947822B2 (en) 2015-02-02 2018-04-17 Tesla, Inc. Bifacial photovoltaic module using heterojunction solar cells
WO2016126801A1 (en) 2015-02-04 2016-08-11 E I Du Pont De Nemours And Company Conductive paste composition and semiconductor devices made therewith
US10065894B2 (en) * 2015-08-05 2018-09-04 Ferro Corporation High-K LTCC dielectric compositions and devices
US10784383B2 (en) 2015-08-07 2020-09-22 E I Du Pont De Nemours And Company Conductive paste composition and semiconductor devices made therewith
US9761744B2 (en) 2015-10-22 2017-09-12 Tesla, Inc. System and method for manufacturing photovoltaic structures with a metal seed layer
JP7006593B2 (ja) * 2015-11-24 2022-01-24 昭和電工マテリアルズ株式会社 集積回路に使用するための焼成多層スタック及び太陽電池
US9842956B2 (en) 2015-12-21 2017-12-12 Tesla, Inc. System and method for mass-production of high-efficiency photovoltaic structures
US9496429B1 (en) 2015-12-30 2016-11-15 Solarcity Corporation System and method for tin plating metal electrodes
WO2017134784A1 (ja) * 2016-02-03 2017-08-10 三菱電機株式会社 太陽電池モジュール及びその製造方法
JP2017162636A (ja) * 2016-03-09 2017-09-14 ナミックス株式会社 導電性ペースト及び太陽電池
US10134925B2 (en) 2016-04-13 2018-11-20 E I Du Pont De Nemours And Company Conductive paste composition and semiconductor devices made therewith
DE102017003604A1 (de) 2016-04-13 2017-10-19 E.I. Du Pont De Nemours And Company Leitfähige Pastenzusammensetzung und damit angefertigte Halbleitervorrichtungen
US10115838B2 (en) 2016-04-19 2018-10-30 Tesla, Inc. Photovoltaic structures with interlocking busbars
JP6688500B2 (ja) 2016-06-29 2020-04-28 ナミックス株式会社 導電性ペースト及び太陽電池
EP3455877B1 (de) * 2016-08-03 2021-11-03 Ferro Corporation Passivierungsgläser für halbleiterbauelemente
US10741300B2 (en) 2016-10-07 2020-08-11 E I Du Pont De Nemours And Company Conductive paste composition and semiconductor devices made therewith
US10593439B2 (en) 2016-10-21 2020-03-17 Dupont Electronics, Inc. Conductive paste composition and semiconductor devices made therewith
CN110291386A (zh) * 2016-11-30 2019-09-27 美国圣戈班性能塑料公司 电极和用于制造电极的方法
TWI745562B (zh) 2017-04-18 2021-11-11 美商太陽帕斯特有限責任公司 導電糊料組成物及用其製成的半導體裝置
KR20200026189A (ko) * 2017-05-10 2020-03-10 히타치가세이가부시끼가이샤 슁글형 실리콘 태양 전지 어레이를 위한 다층 금속 필름 스택
US10672919B2 (en) 2017-09-19 2020-06-02 Tesla, Inc. Moisture-resistant solar cells for solar roof tiles
US11190128B2 (en) 2018-02-27 2021-11-30 Tesla, Inc. Parallel-connected solar roof tile modules
TWI688551B (zh) * 2018-06-25 2020-03-21 優陽材料科技股份有限公司 太陽能電池導電漿及其製造方法、以及高方阻太陽能電池電極的製造方法
US20210126141A1 (en) * 2019-10-25 2021-04-29 Dupont Electronics, Inc. Conductive paste for n-type solar cell, method for manufacturing n-type solar cell and n-type solar cell

Family Cites Families (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US302557A (en) * 1884-07-29 Walter k
GB1506450A (en) * 1974-09-18 1978-04-05 Siemens Ag Pastes for the production of thick-film conductor paths
US4256513A (en) 1978-10-19 1981-03-17 Matsushita Electric Industrial Co., Ltd. Photoelectric conversion device
US4414143A (en) * 1981-05-06 1983-11-08 E. I. Du Pont De Nemours & Co. Conductor compositions
JPS6249676A (ja) 1985-08-29 1987-03-04 Sharp Corp 太陽電池
US5302557A (en) * 1991-12-03 1994-04-12 E. I. Du Pont De Nemours And Company Automotive glass thick film conductor paste
US5378408A (en) * 1993-07-29 1995-01-03 E. I. Du Pont De Nemours And Company Lead-free thick film paste composition
US5439852A (en) * 1994-08-01 1995-08-08 E. I. Du Pont De Nemours And Company Cadmium-free and lead-free thick film conductor composition
JP3625081B2 (ja) * 1994-11-25 2005-03-02 株式会社村田製作所 太陽電池の製造方法
JP3211641B2 (ja) * 1995-09-22 2001-09-25 株式会社村田製作所 導電性組成物
JP3209089B2 (ja) * 1996-05-09 2001-09-17 昭栄化学工業株式会社 導電性ペースト
JP3510761B2 (ja) * 1997-03-26 2004-03-29 太陽インキ製造株式会社 アルカリ現像型光硬化性導電性ペースト組成物及びそれを用いて電極形成したプラズマディスプレイパネル
JP3920449B2 (ja) 1998-03-13 2007-05-30 太陽インキ製造株式会社 アルカリ現像型光硬化性組成物及びそれを用いて得られる焼成物パターン
JPH11329072A (ja) * 1998-05-13 1999-11-30 Murata Mfg Co Ltd 導電ペースト及びそれを用いた太陽電池
JP2000090733A (ja) * 1998-09-14 2000-03-31 Murata Mfg Co Ltd 導電性ペースト及びそれを用いた太陽電池
JP3430068B2 (ja) 1999-04-16 2003-07-28 シャープ株式会社 太陽電池の電極
JP4331827B2 (ja) 1999-06-29 2009-09-16 京セラ株式会社 太陽電池素子の製造方法
JP2001127317A (ja) 1999-10-28 2001-05-11 Kyocera Corp 太陽電池の製造方法
KR100369565B1 (ko) 1999-12-17 2003-01-29 대주정밀화학 주식회사 전기발열체용 저항 페이스트 조성물
JP2001243836A (ja) 1999-12-21 2001-09-07 Murata Mfg Co Ltd 導電性ペースト及びそれを用いた印刷配線板
WO2001056047A1 (fr) * 2000-01-28 2001-08-02 Tdk Corporation Reseau conducteur integre a une carte multicouche, carte multicouche a reseau conducteur integre et procede de fabrication de carte multicouche
JP2001313400A (ja) 2000-04-28 2001-11-09 Kyocera Corp 太陽電池素子の形成方法
JP2002141520A (ja) * 2000-10-31 2002-05-17 Kyocera Corp 太陽電池素子およびその製造方法
JP2002217434A (ja) * 2001-01-19 2002-08-02 Sharp Corp 太陽電池、太陽電池用インターコネクターおよびストリング
JP4668438B2 (ja) * 2001-03-08 2011-04-13 住友ゴム工業株式会社 電磁波シールド板及びその製造方法
GB0108886D0 (en) * 2001-04-09 2001-05-30 Du Pont Conductor composition II
WO2003031373A2 (en) * 2001-10-09 2003-04-17 E. I. Du Pont De Nemours And Company Thick film conductor compositions for use on aluminum nitride substrates
JP3910072B2 (ja) 2002-01-30 2007-04-25 東洋アルミニウム株式会社 ペースト組成物およびそれを用いた太陽電池
US20040055635A1 (en) 2002-09-19 2004-03-25 Hiroshi Nagakubo Conductive paste, method for manufacturing solar battery, and solar battery
JP2004146521A (ja) 2002-10-23 2004-05-20 Sharp Corp 銀電極用ペーストおよびそれを用いた太陽電池セル
JP4103672B2 (ja) 2003-04-28 2008-06-18 株式会社村田製作所 導電性ペーストおよびガラス回路構造物
US7138347B2 (en) * 2003-08-14 2006-11-21 E. I. Du Pont De Nemours And Company Thick-film conductor paste for automotive glass
US20060001009A1 (en) * 2004-06-30 2006-01-05 Garreau-Iles Angelique Genevie Thick-film conductive paste
WO2006003830A1 (ja) * 2004-07-01 2006-01-12 Toyo Aluminium Kabushiki Kaisha ペースト組成物およびそれを用いた太陽電池素子
US7569165B2 (en) * 2005-03-09 2009-08-04 E. I. Du Pont De Nemours And Company Black conductive compositions, black electrodes, and methods of forming thereof
US7494607B2 (en) * 2005-04-14 2009-02-24 E.I. Du Pont De Nemours And Company Electroconductive thick film composition(s), electrode(s), and semiconductor device(s) formed therefrom
US7824579B2 (en) * 2005-06-07 2010-11-02 E. I. Du Pont De Nemours And Company Aluminum thick film composition(s), electrode(s), semiconductor device(s) and methods of making thereof
US7771623B2 (en) * 2005-06-07 2010-08-10 E.I. du Pont de Nemours and Company Dupont (UK) Limited Aluminum thick film composition(s), electrode(s), semiconductor device(s) and methods of making thereof

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KR100890866B1 (ko) 2009-03-27

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