DE602004015103D1 - Herstellung einer polymeren vorrichtung - Google Patents
Herstellung einer polymeren vorrichtungInfo
- Publication number
- DE602004015103D1 DE602004015103D1 DE602004015103T DE602004015103T DE602004015103D1 DE 602004015103 D1 DE602004015103 D1 DE 602004015103D1 DE 602004015103 T DE602004015103 T DE 602004015103T DE 602004015103 T DE602004015103 T DE 602004015103T DE 602004015103 D1 DE602004015103 D1 DE 602004015103D1
- Authority
- DE
- Germany
- Prior art keywords
- polymer
- crosslinking moiety
- preparation
- oligomer
- mol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/06—Luminescent, e.g. electroluminescent, chemiluminescent materials containing organic luminescent materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C247/00—Compounds containing azido groups
- C07C247/16—Compounds containing azido groups with azido groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C311/00—Amides of sulfonic acids, i.e. compounds having singly-bound oxygen atoms of sulfo groups replaced by nitrogen atoms, not being part of nitro or nitroso groups
- C07C311/30—Sulfonamides, the carbon skeleton of the acid part being further substituted by singly-bound nitrogen atoms, not being part of nitro or nitroso groups
- C07C311/37—Sulfonamides, the carbon skeleton of the acid part being further substituted by singly-bound nitrogen atoms, not being part of nitro or nitroso groups having the sulfur atom of at least one of the sulfonamide groups bound to a carbon atom of a six-membered aromatic ring
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
- G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/151—Copolymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/695—Compositions containing azides as the photosensitive substances
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having a potential-jump barrier or a surface barrier
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/468—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics
- H10K10/471—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics the gate dielectric comprising only organic materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
- H10K85/113—Heteroaromatic compounds comprising sulfur or selene, e.g. polythiophene
- H10K85/1135—Polyethylene dioxythiophene [PEDOT]; Derivatives thereof
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
- H10K85/114—Poly-phenylenevinylene; Derivatives thereof
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
- H10K85/115—Polyfluorene; Derivatives thereof
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/631—Amine compounds having at least two aryl rest on at least one amine-nitrogen atom, e.g. triphenylamine
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB0310858A GB0310858D0 (en) | 2003-05-12 | 2003-05-12 | Polymer transistor |
GB0315731A GB0315731D0 (en) | 2003-07-04 | 2003-07-04 | Manufacture of a polymer device |
GB0408539A GB0408539D0 (en) | 2004-04-16 | 2004-04-16 | Polymer transistor |
PCT/GB2004/002078 WO2004100282A2 (en) | 2003-05-12 | 2004-05-12 | Manufacture of a polymer device |
Publications (1)
Publication Number | Publication Date |
---|---|
DE602004015103D1 true DE602004015103D1 (de) | 2008-08-28 |
Family
ID=33436941
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE602004015103T Active DE602004015103D1 (de) | 2003-05-12 | 2004-05-12 | Herstellung einer polymeren vorrichtung |
Country Status (7)
Country | Link |
---|---|
US (1) | US8530269B2 (de) |
EP (1) | EP1631995B1 (de) |
JP (1) | JP4500304B2 (de) |
KR (1) | KR101172526B1 (de) |
AT (1) | ATE401672T1 (de) |
DE (1) | DE602004015103D1 (de) |
WO (1) | WO2004100282A2 (de) |
Families Citing this family (71)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1491568A1 (de) * | 2003-06-23 | 2004-12-29 | Covion Organic Semiconductors GmbH | Halbleitende Polymere |
DE10340711A1 (de) † | 2003-09-04 | 2005-04-07 | Covion Organic Semiconductors Gmbh | Elektronische Vorrichtung enthaltend organische Halbleiter |
EP1600471B1 (de) | 2004-05-28 | 2011-08-24 | Nippon Shokubai Co., Ltd. | Fluorhaltige Verbindung |
GB0423528D0 (en) * | 2004-10-22 | 2004-11-24 | Cambridge Display Tech Ltd | Monomer for making a crosslinked polymer |
US7321133B2 (en) * | 2004-11-17 | 2008-01-22 | Plextronics, Inc. | Heteroatomic regioregular poly(3-substitutedthiophenes) as thin film conductors in diodes which are not light emitting or photovoltaic |
KR101219035B1 (ko) | 2005-05-03 | 2013-01-07 | 삼성디스플레이 주식회사 | 유기 박막 트랜지스터 표시판 및 그 제조 방법 |
KR101102158B1 (ko) * | 2005-05-11 | 2012-01-02 | 삼성전자주식회사 | 신규한 유기 고분자 반도체, 이를 이용한 유기 고분자반도체 박막의 형성방법 및 이를 이용한 유기박막트랜지스터 |
KR20080007611A (ko) | 2005-05-17 | 2008-01-22 | 스미또모 가가꾸 가부시키가이샤 | 유기 전계 발광용 고분자 조성물 |
CA2511354A1 (en) | 2005-07-04 | 2007-01-04 | National University Of Singapore | Radiation crosslinkers |
WO2007063897A1 (ja) | 2005-11-30 | 2007-06-07 | Sumitomo Chemical Company, Limited | 白色有機エレクトロルミネッセンス素子 |
JP5125110B2 (ja) * | 2006-07-19 | 2013-01-23 | 東レ株式会社 | 電界効果型トランジスタ |
US7821637B1 (en) | 2007-02-22 | 2010-10-26 | J.A. Woollam Co., Inc. | System for controlling intensity of a beam of electromagnetic radiation and method for investigating materials with low specular reflectance and/or are depolarizing |
US20090122278A1 (en) * | 2007-11-13 | 2009-05-14 | Texas Instruments Incorporated | Non-specular folding mirror and a system of using the same |
GB0811199D0 (en) * | 2008-06-18 | 2008-07-23 | Cambridge Entpr Ltd | Electro-optic diode devices |
CN101904220B (zh) | 2008-09-19 | 2013-05-15 | 松下电器产业株式会社 | 有机电致发光元件及其制造方法 |
JP5138542B2 (ja) | 2008-10-24 | 2013-02-06 | パナソニック株式会社 | 有機エレクトロルミネッセンス素子及びその製造方法 |
WO2010092797A1 (ja) | 2009-02-10 | 2010-08-19 | パナソニック株式会社 | 発光素子、表示装置、および発光素子の製造方法 |
JP5357194B2 (ja) | 2009-02-10 | 2013-12-04 | パナソニック株式会社 | 発光素子、発光素子を備えた発光装置および発光素子の製造方法 |
CN102308671B (zh) | 2009-02-10 | 2015-01-21 | 松下电器产业株式会社 | 发光元件的制造方法和发光元件、以及发光装置的制造方法和发光装置 |
JP5437736B2 (ja) | 2009-08-19 | 2014-03-12 | パナソニック株式会社 | 有機el素子 |
KR101218844B1 (ko) | 2009-08-31 | 2013-01-21 | 파나소닉 주식회사 | 발광 소자와 그 제조 방법, 및 발광 장치 |
DE102009054023A1 (de) | 2009-11-19 | 2011-05-26 | Tu Darmstadt | Verfahren zur Herstellung von (elektro) lumineszierenden, photoaktiven und oder elektrisch (halb)leitenden Polymeren |
WO2011068482A1 (en) | 2009-12-04 | 2011-06-09 | National University Of Singapore | A cross-linking moiety |
US9689556B2 (en) | 2010-05-27 | 2017-06-27 | Merck Patent Gmbh | Down conversion array comprising quantum dots |
CN102473847B (zh) | 2010-06-24 | 2015-01-14 | 松下电器产业株式会社 | 有机el元件、显示装置以及发光装置 |
WO2011161727A1 (ja) | 2010-06-24 | 2011-12-29 | パナソニック株式会社 | 有機el素子の製造方法、表示装置、発光装置および紫外光照射装置 |
JP5624141B2 (ja) | 2010-07-30 | 2014-11-12 | パナソニック株式会社 | 有機el素子 |
JP5574456B2 (ja) | 2010-08-06 | 2014-08-20 | パナソニック株式会社 | 発光素子とその製造方法、および発光装置 |
WO2012017495A1 (ja) | 2010-08-06 | 2012-02-09 | パナソニック株式会社 | 有機el素子およびその製造方法 |
CN103038908B (zh) | 2010-08-06 | 2016-01-06 | 株式会社日本有机雷特显示器 | 发光元件、具备发光元件的发光装置以及发光元件的制造方法 |
WO2012017489A1 (ja) | 2010-08-06 | 2012-02-09 | パナソニック株式会社 | 有機el素子、表示装置および発光装置 |
WO2012017496A1 (ja) | 2010-08-06 | 2012-02-09 | パナソニック株式会社 | 発光素子、発光素子を備えた発光装置および発光素子の製造方法 |
JP5677434B2 (ja) | 2010-08-06 | 2015-02-25 | パナソニック株式会社 | 有機el素子 |
JP5677433B2 (ja) | 2010-08-06 | 2015-02-25 | パナソニック株式会社 | 有機el素子、表示装置および発光装置 |
WO2012017503A1 (ja) | 2010-08-06 | 2012-02-09 | パナソニック株式会社 | 有機el素子 |
WO2012017486A1 (ja) | 2010-08-06 | 2012-02-09 | パナソニック株式会社 | 発光素子の製造方法 |
WO2012017485A1 (ja) | 2010-08-06 | 2012-02-09 | パナソニック株式会社 | 有機el素子、表示装置および発光装置 |
CN103053042B (zh) | 2010-08-06 | 2016-02-24 | 株式会社日本有机雷特显示器 | 有机el元件及其制造方法 |
JP5612692B2 (ja) | 2010-08-06 | 2014-10-22 | パナソニック株式会社 | 有機el素子およびその製造方法 |
JP5677436B2 (ja) | 2010-08-06 | 2015-02-25 | パナソニック株式会社 | 有機el素子 |
WO2012017487A1 (ja) | 2010-08-06 | 2012-02-09 | パナソニック株式会社 | 発光素子、表示装置、および発光素子の製造方法 |
JP5658256B2 (ja) | 2010-08-06 | 2015-01-21 | パナソニック株式会社 | 発光素子とその製造方法、および発光装置 |
WO2012030942A1 (en) | 2010-09-02 | 2012-03-08 | Konarka Technologies, Inc. | Photovoltaic cell containing novel photoactive polymer |
WO2012098587A1 (ja) | 2011-01-21 | 2012-07-26 | パナソニック株式会社 | 有機el素子 |
JP5884224B2 (ja) | 2011-02-23 | 2016-03-15 | 株式会社Joled | 有機el表示パネルおよび有機el表示装置 |
WO2012114403A1 (ja) | 2011-02-25 | 2012-08-30 | パナソニック株式会社 | 有機el表示パネルおよび有機el表示装置 |
JP5866783B2 (ja) * | 2011-03-25 | 2016-02-17 | セイコーエプソン株式会社 | 回路基板の製造方法 |
KR101614780B1 (ko) * | 2011-04-21 | 2016-04-22 | 아리스토틀 유니버시티 오브 테살로니키 - 리서치 커미티 | 유기 전자소자 제조를 위한 인쇄 공정 중에 막 두께 및 품질을 인라인으로 측정하는 방법 |
CN102884650A (zh) | 2011-05-11 | 2013-01-16 | 松下电器产业株式会社 | 有机el显示面板及有机el显示装置 |
WO2012163464A1 (en) | 2011-06-01 | 2012-12-06 | Merck Patent Gmbh | Hybrid ambipolar tfts |
WO2013013754A1 (en) | 2011-07-25 | 2013-01-31 | Merck Patent Gmbh | Copolymers with functionalized side chains |
CA2940233A1 (en) | 2013-02-21 | 2014-08-28 | The Regents Of The University Of California | Universal scalable and cost-effective surface modifications |
JP6214768B2 (ja) * | 2013-07-08 | 2017-10-18 | ビーエーエスエフ ソシエタス・ヨーロピアBasf Se | アジド系架橋剤 |
JP6167018B2 (ja) * | 2013-10-31 | 2017-07-19 | 富士フイルム株式会社 | 積層体、有機半導体製造用キットおよび有機半導体製造用レジスト組成物 |
KR102293606B1 (ko) | 2014-10-21 | 2021-08-24 | 삼성전자주식회사 | 유기 광전 소자 및 이를 포함하는 이미지 센서와 전자 장치 |
WO2016083314A1 (en) * | 2014-11-24 | 2016-06-02 | Basf Se | Mono-azide compound for photo-induced cross-linking polymer strands |
WO2016140981A1 (en) * | 2015-03-02 | 2016-09-09 | Colonaryconcepts Llc | Compounds and methods for peg metabolite and peg breakdown product assays |
WO2016190936A1 (en) * | 2015-03-09 | 2016-12-01 | Massachusetts Institute Of Technology | Waveguide with dielectric light reflectors |
WO2017047644A1 (ja) * | 2015-09-18 | 2017-03-23 | 住友化学株式会社 | 高分子化合物及びそれを用いた発光素子 |
KR102546718B1 (ko) | 2016-09-27 | 2023-06-22 | 주식회사 클랩 | 개선된 가교능을 갖는 성상 및 삼블록 중합체 |
JP7161776B2 (ja) | 2016-12-01 | 2022-10-27 | ザ リージェンツ オブ ザ ユニバーシティ オブ カリフォルニア | エネルギー供給デバイス及びその用途 |
KR101999143B1 (ko) * | 2017-02-15 | 2019-07-11 | 한국과학기술연구원 | 다기능성 트랜지스터 소자 및 이의 제조 방법 |
JP7410865B2 (ja) | 2017-12-01 | 2024-01-10 | ザ リージェンツ オブ ザ ユニバーシティ オブ カリフォルニア | 耐生物付着コーティングならびにその作製及び使用方法 |
JP7046395B2 (ja) | 2018-03-07 | 2022-04-04 | クラップ カンパニー リミテッド | トップゲート・ボトムコンタクト有機電界効果トランジスタを製造するためのパターニング方法 |
CN112074548B (zh) | 2018-06-26 | 2023-07-25 | Clap有限公司 | 作为电介质的乙烯醚类聚合物 |
KR20200078804A (ko) * | 2018-12-21 | 2020-07-02 | 삼성디스플레이 주식회사 | 아지드 화합물, 이를 포함한 유기 발광 소자 및 이의 제조 방법 |
WO2020247629A1 (en) | 2019-06-05 | 2020-12-10 | The Regents Of The University Of California | Biofouling resistant coatings and methods of making and using the same |
KR102509099B1 (ko) * | 2020-06-10 | 2023-03-14 | 울산과학기술원 | 3차원 가교제용 조성물 및 이를 이용한 전자 소자 제조 방법 |
US11860536B2 (en) | 2020-06-10 | 2024-01-02 | Unist (Ulsan National Institute Of Science And Technology) | Three-dimensional crosslinker composition and method of manufacturing electronic devices using the same |
KR20230115753A (ko) * | 2022-01-27 | 2023-08-03 | 울산과학기술원 | 도전성 조성물, 도전체, 도전체를 포함한 전극 및 전자 소자 |
CN117858530A (zh) * | 2022-09-28 | 2024-04-09 | Tcl科技集团股份有限公司 | 光电器件及其制备方法 |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2637469B2 (ja) * | 1987-06-04 | 1997-08-06 | キヤノン株式会社 | 高分子液晶素子 |
GB8909011D0 (en) | 1989-04-20 | 1989-06-07 | Friend Richard H | Electroluminescent devices |
US5408109A (en) * | 1991-02-27 | 1995-04-18 | The Regents Of The University Of California | Visible light emitting diodes fabricated from soluble semiconducting polymers |
GB9215928D0 (en) | 1992-07-27 | 1992-09-09 | Cambridge Display Tech Ltd | Manufacture of electroluminescent devices |
US5531716A (en) * | 1993-09-29 | 1996-07-02 | Hercules Incorporated | Medical devices subject to triggered disintegration |
US5682043A (en) * | 1994-06-28 | 1997-10-28 | Uniax Corporation | Electrochemical light-emitting devices |
US5523555A (en) | 1994-09-14 | 1996-06-04 | Cambridge Display Technology | Photodetector device having a semiconductive conjugated polymer |
GB9423692D0 (en) | 1994-11-23 | 1995-01-11 | Philips Electronics Uk Ltd | A photoresponsive device |
DE69535080T2 (de) | 1994-12-28 | 2006-12-28 | Cambridge Display Technology Ltd. | Polymere für optische Vorrichtungen |
JP3865406B2 (ja) | 1995-07-28 | 2007-01-10 | 住友化学株式会社 | 2,7−アリール−9−置換フルオレン及び9−置換フルオレンオリゴマー及びポリマー |
JP3899566B2 (ja) | 1996-11-25 | 2007-03-28 | セイコーエプソン株式会社 | 有機el表示装置の製造方法 |
US6309763B1 (en) | 1997-05-21 | 2001-10-30 | The Dow Chemical Company | Fluorene-containing polymers and electroluminescent devices therefrom |
GB9808061D0 (en) * | 1998-04-16 | 1998-06-17 | Cambridge Display Tech Ltd | Polymer devices |
US6107452A (en) | 1998-10-09 | 2000-08-22 | International Business Machines Corporation | Thermally and/or photochemically crosslinked electroactive polymers in the manufacture of opto-electronic devices |
US6236774B1 (en) * | 1999-03-22 | 2001-05-22 | Gemfire Corporation | Optoelectronic and photonic devices formed of materials which inhibit degradation and failure |
JP2002170667A (ja) * | 2000-11-30 | 2002-06-14 | Hitachi Ltd | 有機エレクトロルミネッセンス素子、その製造方法及び画像表示装置 |
US7049044B2 (en) * | 2002-12-19 | 2006-05-23 | The University Of North Carolina At Charlotte | Nanocomposite negative resists for next generation lithographies |
EP1504075B1 (de) | 2002-05-10 | 2013-08-07 | Cambridge Display Technology Limited | Polymere, ihre herstellung und verwendung |
US20050146263A1 (en) * | 2003-09-25 | 2005-07-07 | Kelly Stephen M. | Lighting elements, devices and methods |
-
2004
- 2004-05-12 AT AT04732346T patent/ATE401672T1/de not_active IP Right Cessation
- 2004-05-12 WO PCT/GB2004/002078 patent/WO2004100282A2/en active IP Right Grant
- 2004-05-12 US US10/556,841 patent/US8530269B2/en active Active
- 2004-05-12 KR KR1020057021603A patent/KR101172526B1/ko active IP Right Grant
- 2004-05-12 DE DE602004015103T patent/DE602004015103D1/de active Active
- 2004-05-12 EP EP04732346A patent/EP1631995B1/de not_active Not-in-force
- 2004-05-12 JP JP2006506242A patent/JP4500304B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
JP4500304B2 (ja) | 2010-07-14 |
JP2007527542A (ja) | 2007-09-27 |
ATE401672T1 (de) | 2008-08-15 |
KR20060030025A (ko) | 2006-04-07 |
US8530269B2 (en) | 2013-09-10 |
EP1631995B1 (de) | 2008-07-16 |
US20070172978A1 (en) | 2007-07-26 |
WO2004100282A3 (en) | 2005-01-20 |
KR101172526B1 (ko) | 2012-08-13 |
WO2004100282A2 (en) | 2004-11-18 |
EP1631995A2 (de) | 2006-03-08 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE602004015103D1 (de) | Herstellung einer polymeren vorrichtung | |
ATE470166T1 (de) | Verfahren zur herstellung von einem anisotropen polymerfilm auf einem substrat mit einer strukturierten oberfläche | |
WO2004071644A3 (en) | Surface modification of substrates | |
WO2004043588A3 (en) | Production of polymeric microarrays | |
DE60314610D1 (de) | Verfahren zur herstellung von organischen optoelektronischen und elektronischen bauteilen sowie dadurch erhaltene bauteile | |
TW200510937A (en) | Antireflective film material, and antireflective film and pattern formation method using the same | |
DE602008001879D1 (de) | Verfahren zur herstellung leitfähiger folien sowie in diesem verfahren hergestellte artikel | |
DE50305687D1 (de) | Verfahren zur herstellung von polymerschichten | |
ATE273326T1 (de) | Verfahren zur herstellung von polymeren durch eine kontrollierte radikalischpolymerisation mit xanthaten | |
ATE371684T1 (de) | (teilweise) konjugiertes polymer, verfahren zu dessen herstellung und verwendung in elektrolumineszenten vorrichtungen | |
TW200732845A (en) | Silicon-containing film forming composition, silicon-containing film serving as etching mask, substrate processing intermediate, and substrate processing method | |
ATE464377T1 (de) | Verfahren zur herstellung einer verbindung durch polymerisierung einer modelldroge | |
DE69824624D1 (de) | Kombiniertes verfahren zur herstellung von kaskadepolymeroberflächen | |
ATE378379T1 (de) | Harzzusammensetzung mit exzellentem dielektrischem verhalten, verfahren zur herstellung einer harzzusammensetzung, mit der zusammensetzung hergestellter lack, verfahren zur herstellung des lacks, mit dem lack hergestellte schichtplatten sowie metallbeschichtetes laminat | |
KR860004072A (ko) | 전기회로 기판상의 실리레이티드 폴리머 절연층의 형성 및 저급알킬 폴리실세스 퀴옥산의 제조방법 | |
EP1229063A3 (de) | Polymerisches fluoreszentes Material, Verfahren zu seiner Herstellung und lumineszentes Polymergerät | |
BR0012095A (pt) | Banho de eletroimersão com (co)polìmeros de álcool polivinìlico hidrossolúveis | |
RU96109478A (ru) | Состав для нанесения покрытия на основе порошков, содержащих редиспергируемые в воде водорастворимый полимер и кремнийорганическое соединение, а также способ нанесения покрытия | |
ATE283301T1 (de) | Kombinatorisches verfahren zur herstellung von kaskadenpolymeroberflächen | |
BR0315557A (pt) | Substrato, uso de um polìmero hiper-ramificado que tem grupos uretano e/ou grupos uréia, e, processo para modificar as propriedades da superfìcie de substratos | |
WO2005022605A3 (en) | Thin films formed from multiple layers of poly(3,4-ethylenedioxythiophene) and its derivatives | |
DE60105620D1 (de) | Herstellungsverfahren von siliciumorganischen hybridcopolymeren durch kontrollierte radikalische polymerisation | |
ATE2624T1 (de) | Verfahren zur herstellung wasserloeslicher acryl- polymere oder -copolymere mit hohem molekulargewicht und niedrigem gehalt an nicht umgesetzten monomeren. | |
ATE434452T1 (de) | Verfahren zur immobilisierung von hydrogel- bildenden polymeren auf polymersubstratoberflaechen | |
ATE227931T1 (de) | Verfahren zur herstellung mikrobizider oberflächen durch immobilisierung inhärent mikrobizid wirksamer makromoleküle |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |