DE60042353D1 - Zusammensetzungen für eine planarisierende Antireflexschicht - Google Patents

Zusammensetzungen für eine planarisierende Antireflexschicht

Info

Publication number
DE60042353D1
DE60042353D1 DE60042353T DE60042353T DE60042353D1 DE 60042353 D1 DE60042353 D1 DE 60042353D1 DE 60042353 T DE60042353 T DE 60042353T DE 60042353 T DE60042353 T DE 60042353T DE 60042353 D1 DE60042353 D1 DE 60042353D1
Authority
DE
Germany
Prior art keywords
compositions
antireflective layer
planarizing
planarizing antireflective
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60042353T
Other languages
German (de)
English (en)
Inventor
Edward K Pavelchek
Timothy G Adams
Manuel Docanto
Suzanne Coley
George G Barclay
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shipley Co Inc
Original Assignee
Shipley Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=23004401&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE60042353(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Shipley Co Inc filed Critical Shipley Co Inc
Application granted granted Critical
Publication of DE60042353D1 publication Critical patent/DE60042353D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/151—Matting or other surface reflectivity altering material

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Laminated Bodies (AREA)
  • Paints Or Removers (AREA)
DE60042353T 1999-03-08 2000-02-29 Zusammensetzungen für eine planarisierende Antireflexschicht Expired - Lifetime DE60042353D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/264,061 US6316165B1 (en) 1999-03-08 1999-03-08 Planarizing antireflective coating compositions

Publications (1)

Publication Number Publication Date
DE60042353D1 true DE60042353D1 (de) 2009-07-23

Family

ID=23004401

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60042353T Expired - Lifetime DE60042353D1 (de) 1999-03-08 2000-02-29 Zusammensetzungen für eine planarisierende Antireflexschicht

Country Status (6)

Country Link
US (2) US6316165B1 (enExample)
EP (1) EP1035442B1 (enExample)
JP (1) JP4789300B2 (enExample)
KR (1) KR100869484B1 (enExample)
DE (1) DE60042353D1 (enExample)
TW (1) TWI253544B (enExample)

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EP1035442A3 (en) 2001-05-02
JP4789300B2 (ja) 2011-10-12
TWI253544B (en) 2006-04-21
KR20010006699A (ko) 2001-01-26
EP1035442A2 (en) 2000-09-13
US6316165B1 (en) 2001-11-13
US6855466B2 (en) 2005-02-15
EP1035442B1 (en) 2009-06-10
US20020022196A1 (en) 2002-02-21
JP2000294504A (ja) 2000-10-20
KR100869484B1 (ko) 2008-11-19

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