DE502006009414D1 - Elektrolyt und verfahren zur abscheidung einer matten metallschicht - Google Patents

Elektrolyt und verfahren zur abscheidung einer matten metallschicht

Info

Publication number
DE502006009414D1
DE502006009414D1 DE502006009414T DE502006009414T DE502006009414D1 DE 502006009414 D1 DE502006009414 D1 DE 502006009414D1 DE 502006009414 T DE502006009414 T DE 502006009414T DE 502006009414 T DE502006009414 T DE 502006009414T DE 502006009414 D1 DE502006009414 D1 DE 502006009414D1
Authority
DE
Germany
Prior art keywords
metal layer
electrolyte
separating
polyalkylene oxide
dispersion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE502006009414T
Other languages
English (en)
Inventor
Andreas Koenigshofen
Danica Elbick
Christoph Werner
Wolfgang Clauberg
Peter Pies
Andreas Moebius
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MacDermid Enthone Inc
Original Assignee
Enthone Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Enthone Inc filed Critical Enthone Inc
Publication of DE502006009414D1 publication Critical patent/DE502006009414D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D15/00—Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/38—Electroplating: Baths therefor from solutions of copper
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/58—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of copper
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Chemically Coating (AREA)
  • Manufacture And Refinement Of Metals (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Laminated Bodies (AREA)
DE502006009414T 2006-01-06 2006-01-06 Elektrolyt und verfahren zur abscheidung einer matten metallschicht Active DE502006009414D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2006/000076 WO2007076898A1 (de) 2006-01-06 2006-01-06 Elektrolyt und verfahren zur abscheidung einer matten metallschicht

Publications (1)

Publication Number Publication Date
DE502006009414D1 true DE502006009414D1 (de) 2011-06-09

Family

ID=36956125

Family Applications (1)

Application Number Title Priority Date Filing Date
DE502006009414T Active DE502006009414D1 (de) 2006-01-06 2006-01-06 Elektrolyt und verfahren zur abscheidung einer matten metallschicht

Country Status (10)

Country Link
US (2) US8192607B2 (de)
EP (1) EP1969160B1 (de)
JP (1) JP4811880B2 (de)
KR (1) KR101234429B1 (de)
CN (1) CN101400830B (de)
AT (1) ATE507327T1 (de)
DE (1) DE502006009414D1 (de)
ES (1) ES2361500T3 (de)
PL (1) PL1969160T3 (de)
WO (1) WO2007076898A1 (de)

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EP2143828B1 (de) * 2008-07-08 2016-12-28 Enthone, Inc. Elektrolyt und Verfahren zur Ablagerung einer matten Metallschicht
US7951600B2 (en) * 2008-11-07 2011-05-31 Xtalic Corporation Electrodeposition baths, systems and methods
EP2568063A1 (de) * 2011-09-09 2013-03-13 Rohm and Haas Electronic Materials LLC Kupfer-Elektroplattierverfahren mit geringer innerer Spannung
US20130220819A1 (en) * 2012-02-27 2013-08-29 Faraday Technology, Inc. Electrodeposition of chromium from trivalent chromium using modulated electric fields
US20160032479A1 (en) * 2013-03-15 2016-02-04 Enthone Inc. Electrodeposition of silver with fluoropolymer nanoparticles
CN103382564B (zh) * 2013-07-18 2016-10-05 华南理工大学 金属表面超疏水钴镀层及其制备方法
KR101636361B1 (ko) * 2014-07-31 2016-07-06 주식회사 에이피씨티 과불소화알킬 계면활성제를 함유하는 솔더범프용 주석합금 전기도금액
GB2534120A (en) * 2014-11-28 2016-07-20 Daido Ind Bearings Europe Ltd Bismuth-based composite coating for overlay applications in plain bearings
AT516876B1 (de) * 2015-03-09 2016-11-15 Ing W Garhöfer Ges M B H Abscheidung von dekorativen Palladium-Eisen-Legierungsbeschichtungen auf metallischen Substanzen
JP6631349B2 (ja) * 2015-03-26 2020-01-15 三菱マテリアル株式会社 アンモニウム塩を用いためっき液
CN105648490B (zh) * 2016-01-07 2017-08-15 东南大学 一种无低表面能物质改性的超疏水表面及其制备方法
CN105862093B (zh) * 2016-05-26 2018-03-06 安庆师范大学 一种离子液体中电镀Ni‑Cr‑PTFE复合镀层的方法
CN109680310B (zh) * 2019-01-04 2020-07-07 中国计量大学 一种镍锑电镀液及其制备方法
CN109652829B (zh) * 2019-01-04 2021-07-09 中国计量大学 一种无稀土Bi基磁性电镀液及其制备方法
FR3092589A1 (fr) * 2019-02-08 2020-08-14 Aveni Electrodéposition d’un alliage de cobalt et utilisation en microélectronique
CN110714212B (zh) * 2019-10-12 2021-04-30 常州大学 一种水溶液体系中由氯化镍一步法制备超疏水镍薄膜的方法
AT523922B1 (de) * 2020-09-08 2022-01-15 Iwg Ing W Garhoefer Ges M B H Elektrolytbad für Palladium-Ruthenium-Beschichtungen

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DE19540011C2 (de) * 1995-10-27 1998-09-10 Lpw Chemie Gmbh Verfahren zur galvanischen Abscheidung von blendfreien Nickel- oder Nickellegierungsniederschlägen
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JP4603812B2 (ja) 2003-05-12 2010-12-22 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． 改良されたスズめっき方法
CN100348780C (zh) * 2004-03-16 2007-11-14 天津大学 脉冲镀镍基纳米复合镀层的方法及设备
TW200632147A (de) * 2004-11-12 2006-09-16

Also Published As

Publication number Publication date
PL1969160T3 (pl) 2011-09-30
ATE507327T1 (de) 2011-05-15
WO2007076898A1 (de) 2007-07-12
US8192607B2 (en) 2012-06-05
KR101234429B1 (ko) 2013-02-18
CN101400830B (zh) 2012-07-04
EP1969160A1 (de) 2008-09-17
KR20080092399A (ko) 2008-10-15
ES2361500T3 (es) 2011-06-17
CN101400830A (zh) 2009-04-01
US20120298519A1 (en) 2012-11-29
US20080302668A1 (en) 2008-12-11
JP4811880B2 (ja) 2011-11-09
JP2009522441A (ja) 2009-06-11
EP1969160B1 (de) 2011-04-27

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