DE3723411C2 - - Google Patents

Info

Publication number
DE3723411C2
DE3723411C2 DE3723411A DE3723411A DE3723411C2 DE 3723411 C2 DE3723411 C2 DE 3723411C2 DE 3723411 A DE3723411 A DE 3723411A DE 3723411 A DE3723411 A DE 3723411A DE 3723411 C2 DE3723411 C2 DE 3723411C2
Authority
DE
Germany
Prior art keywords
phenol
mixture
parts
weight
component
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE3723411A
Other languages
German (de)
English (en)
Other versions
DE3723411A1 (de
Inventor
Shingo Fujisawa Kanagawa Jp Asaumi
Hidekatsu Chigasaki Kanagawa Jp Kohara
Hatsuyuki Kanagawa Jp Tanaka
Toshimasa Hiratsuka Kanagawa Jp Nakayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of DE3723411A1 publication Critical patent/DE3723411A1/de
Application granted granted Critical
Publication of DE3723411C2 publication Critical patent/DE3723411C2/de
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
    • G03C1/06—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
    • G03C1/08—Sensitivity-increasing substances
    • G03C1/10—Organic substances
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/22—Exposing sequentially with the same light pattern different positions of the same surface

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
DE19873723411 1986-07-18 1987-07-15 Hitzebestaendige, positiv-arbeitende photoresistzusammensetzung, verfahren zu ihrer herstellung und ihre verwendung Granted DE3723411A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61167896A JPH0654390B2 (ja) 1986-07-18 1986-07-18 高耐熱性ポジ型ホトレジスト組成物

Publications (2)

Publication Number Publication Date
DE3723411A1 DE3723411A1 (de) 1988-01-28
DE3723411C2 true DE3723411C2 (es) 1990-09-13

Family

ID=15858070

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19873723411 Granted DE3723411A1 (de) 1986-07-18 1987-07-15 Hitzebestaendige, positiv-arbeitende photoresistzusammensetzung, verfahren zu ihrer herstellung und ihre verwendung

Country Status (5)

Country Link
US (1) US4804612A (es)
JP (1) JPH0654390B2 (es)
KR (1) KR900005849B1 (es)
DE (1) DE3723411A1 (es)
GB (1) GB2192636B (es)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3812326A1 (de) * 1988-04-14 1989-10-26 Basf Ag Positiv arbeitendes, strahlungsempfindliches gemisch auf basis von saeurespaltbaren und photochemisch saeurebildenden verbindungen und verfahren zur herstellung von reliefmustern und reliefbildern
US5356758A (en) * 1988-12-28 1994-10-18 Texas Instruments Incorporated Method and apparatus for positively patterning a surface-sensitive resist on a semiconductor wafer
DE59010728D1 (de) * 1989-04-24 1997-07-31 Siemens Ag Verfahren zur Erzeugung ätzresistenter Strukturen
IL96551A0 (en) * 1989-12-18 1991-09-16 Rohm & Haas Preparation of high glass transition temperature novolak resins useful in high resolution photoresist compositions
US5391795A (en) * 1994-02-18 1995-02-21 General Electric Company Silylated agents useful for absorbing ultraviolet light
EP0786701A4 (en) * 1994-10-13 1998-08-12 Nippon Zeon Co PHOTO PAINT COMPOSITION
GB2350616B (en) * 1999-05-04 2003-07-30 Swan Thomas & Co Ltd Novolak resins used as bonding agents
KR100557543B1 (ko) * 2000-06-30 2006-03-03 주식회사 하이닉스반도체 신규한 포토레지스트 단량체, 그의 중합체 및 이를함유하는 포토레지스트 조성물
EP2221666B1 (en) * 2007-11-12 2013-09-18 Hitachi Chemical Company, Ltd. Positive-type photosensitive resin composition, method for production of resist pattern, and semiconductor device
KR102615912B1 (ko) * 2014-02-24 2023-12-19 도쿄엘렉트론가부시키가이샤 감광화된 화학적 증폭 레지스트 화학물질을 사용하는 방법과 기술 및 프로세스
US10429745B2 (en) 2016-02-19 2019-10-01 Osaka University Photo-sensitized chemically amplified resist (PS-CAR) simulation
US10048594B2 (en) 2016-02-19 2018-08-14 Tokyo Electron Limited Photo-sensitized chemically amplified resist (PS-CAR) model calibration
JP6909374B2 (ja) 2016-05-13 2021-07-28 東京エレクトロン株式会社 光増感化学又は感光性化学増幅レジストを用いた限界寸法制御
WO2017197288A1 (en) 2016-05-13 2017-11-16 Tokyo Electron Limited Critical dimension control by use of a photo agent
KR20220046598A (ko) 2019-08-16 2022-04-14 도쿄엘렉트론가부시키가이샤 확률 중심 결함 교정을 위한 방법 및 공정
CN111538211B (zh) * 2020-05-25 2023-04-21 苏州理硕科技有限公司 一种酚醛树脂光刻胶组合物及其制备方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4289838A (en) * 1972-12-14 1981-09-15 Polychrome Corporation Diazo-unsaturated monomer light sensitive compositions
JPS5723253B2 (es) * 1974-03-25 1982-05-18
AU3870478A (en) * 1977-08-09 1980-02-14 Somar Mfg High energy radiation cruable resist material
CA1119447A (en) * 1978-09-06 1982-03-09 John P. Vikesland Positive-acting photoresist composition containing a crosslinked urethane resin, a cured epoxy resin and a photosensitizer
DE3071155D1 (en) * 1979-12-22 1985-11-07 Ciba Geigy Ag Compositions containing acrylate and their polymerisation
EP0054258B1 (en) * 1980-12-17 1986-03-05 Konica Corporation Photosensitive compositions
US4529682A (en) * 1981-06-22 1985-07-16 Philip A. Hunt Chemical Corporation Positive photoresist composition with cresol-formaldehyde novolak resins
US4435496A (en) * 1982-09-22 1984-03-06 American Hoechst Corporation Photopolymer cleavage imaging system
JPS6095536A (ja) * 1983-10-31 1985-05-28 Asahi Chem Ind Co Ltd 電離放射線感応レジスト
DD239283A1 (de) * 1985-07-08 1986-09-17 Akad Wissenschaften Ddr Verfahren zur herstellung von fotokopierlacken fuer trockenaetzbestaendige positivresistbilder

Also Published As

Publication number Publication date
US4804612A (en) 1989-02-14
GB8714145D0 (en) 1987-07-22
JPS6325646A (ja) 1988-02-03
DE3723411A1 (de) 1988-01-28
JPH0654390B2 (ja) 1994-07-20
KR880002050A (ko) 1988-04-28
GB2192636B (en) 1989-08-23
GB2192636A (en) 1988-01-20
KR900005849B1 (ko) 1990-08-13

Similar Documents

Publication Publication Date Title
DE3626578C2 (es)
DE3603372C2 (de) Positiv wirkendes lichtempfindliches Gemisch
DE3723411C2 (es)
EP0164620B1 (de) Positiv-arbeitende strahlungsempfindliche Beschichtungslösung
DE69702422T2 (de) Grundbeschichtungszusammensetzung für photolithographischen Resist
EP0244762B1 (de) Positiv-arbeitendes lichtempfindliches Gemisch und daraus hergestelltes lichtempfindliches Aufzeichnungsmaterial
DE3720017C2 (es)
DE3714577C2 (es)
DE3939186A1 (de) Mit elektronenstrahlen haertbare lichtempfindliche zusammensetzung und ihre verwendung zur herstellung von feinen bildmustern
EP0243964B1 (de) Positiv-arbeitendes lichtempfindliches Gemisch und daraus hergestelltes lichtempfindliches Aufzeichnungsmaterial
DE3626582C2 (es)
DE68921017T2 (de) Novolakharze aus Aldehydgemischen und daraus hergestellte hochkontrastreiche und hochtemperaturbeständige positive Photoresists.
EP0525627A1 (de) Oligomere Verbindungen mit säurelabilen Schutzgruppen und damit hergestelltes positiv arbeitendes strahlungsempfindliches Gemisch
DE69121001T2 (de) Positiv arbeitende Fotolackzusammensetzung
EP0176871A2 (de) Verfahren zur Herstellung eines Photoresists
DE69130745T2 (de) Novolakharze und daraus hergestellte Positiv-Fotoresists
DE4231875A1 (de) Lichtempfindliche harzmasse und verfahren zur erzeugung eines musters unter verwendung der masse
KR910004844B1 (ko) 포지티브-워킹 포토레지스트 조성물
EP0244763B1 (de) Positiv-arbeitendes lichtempfindliches Gemisch und daraus hergestelltes lichtempfindliches Aufzeichnungsmaterial
DE3927693C2 (de) Entwicklerlösung für positiv wirkende strahlungsempfindliche Gemische
DE69805364T2 (de) Strahlungsempfindliche Harzzusammensetzung
DE69729541T2 (de) Verwendung eines Lösungsmittelgemisches zur Walzenbeschichtung einer strahlungsempfindlichen Zusammensetzung
DE3842896C2 (de) Positiv arbeitende lichtempfindliche Zusammensetzung
DE68909084T2 (de) Hochempfindlicher Resist für das mittlere und tiefe UV.
DE69032830T2 (de) Strahlungsempfindliche positiv-arbeitende Resistmasse

Legal Events

Date Code Title Description
8110 Request for examination paragraph 44
D2 Grant after examination
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee