DE68921017T2 - Novolakharze aus Aldehydgemischen und daraus hergestellte hochkontrastreiche und hochtemperaturbeständige positive Photoresists. - Google Patents

Novolakharze aus Aldehydgemischen und daraus hergestellte hochkontrastreiche und hochtemperaturbeständige positive Photoresists.

Info

Publication number
DE68921017T2
DE68921017T2 DE68921017T DE68921017T DE68921017T2 DE 68921017 T2 DE68921017 T2 DE 68921017T2 DE 68921017 T DE68921017 T DE 68921017T DE 68921017 T DE68921017 T DE 68921017T DE 68921017 T2 DE68921017 T2 DE 68921017T2
Authority
DE
Germany
Prior art keywords
contrast
novolak resins
temperature resistant
positive photoresists
aldehyde mixtures
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68921017T
Other languages
English (en)
Other versions
DE68921017D1 (de
Inventor
Richard Michael Lazarus
Randall William Kautz
Sunit Suresh Dixit
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Clariant Finance BVI Ltd
Original Assignee
Hoechst Celanese Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US07/227,404 external-priority patent/US4920028A/en
Application filed by Hoechst Celanese Corp filed Critical Hoechst Celanese Corp
Publication of DE68921017D1 publication Critical patent/DE68921017D1/de
Application granted granted Critical
Publication of DE68921017T2 publication Critical patent/DE68921017T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
    • C08G8/10—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with phenol
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Gas-Filled Discharge Tubes (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
DE68921017T 1988-03-31 1989-03-22 Novolakharze aus Aldehydgemischen und daraus hergestellte hochkontrastreiche und hochtemperaturbeständige positive Photoresists. Expired - Fee Related DE68921017T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US17547388A 1988-03-31 1988-03-31
US29782888A 1988-04-22 1988-04-22
US07/227,404 US4920028A (en) 1988-03-31 1988-08-02 High contrast high thermal stability positive photoresists with mixed cresol and hydroxybenzaldehyde prepared novolak and photosensitive diazoquinone

Publications (2)

Publication Number Publication Date
DE68921017D1 DE68921017D1 (de) 1995-03-23
DE68921017T2 true DE68921017T2 (de) 1995-06-01

Family

ID=27390543

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68921017T Expired - Fee Related DE68921017T2 (de) 1988-03-31 1989-03-22 Novolakharze aus Aldehydgemischen und daraus hergestellte hochkontrastreiche und hochtemperaturbeständige positive Photoresists.

Country Status (10)

Country Link
EP (1) EP0336604B1 (de)
JP (1) JPH0776254B2 (de)
KR (1) KR930006913B1 (de)
AT (1) ATE118225T1 (de)
AU (1) AU3235289A (de)
DE (1) DE68921017T2 (de)
DK (1) DK155089A (de)
HK (1) HK158995A (de)
IL (1) IL89648A (de)
NO (1) NO891063L (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5182184A (en) * 1990-02-05 1993-01-26 Morton International, Inc. Novolak resins of lowered hydroxyl content and high contrast high thermal stability positive photoresists prepared therefrom
JPH03253860A (ja) * 1990-03-05 1991-11-12 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
JPH03294861A (ja) * 1990-04-13 1991-12-26 Mitsubishi Petrochem Co Ltd ポジ型フォトレジスト組成物
JPH05323605A (ja) * 1992-05-27 1993-12-07 Sumitomo Chem Co Ltd ポジ型レジスト組成物
JP3319092B2 (ja) * 1993-11-08 2002-08-26 住友化学工業株式会社 ポジ型レジスト組成物
EP0660186A1 (de) * 1993-12-20 1995-06-28 Mitsubishi Chemical Corporation Lichtempfindliche Harzzusammensetzung und Verfahren zur Bildherstellung damit
JP3424341B2 (ja) * 1994-04-11 2003-07-07 住友化学工業株式会社 感光性樹脂組成物
JP3635598B2 (ja) * 1995-07-13 2005-04-06 富士写真フイルム株式会社 ポジ型フォトレジスト組成物
US5709977A (en) * 1995-07-13 1998-01-20 Fuji Photo Film Co., Ltd. Positive working photoresist composition
JP2006010779A (ja) * 2004-06-22 2006-01-12 Nagase Chemtex Corp 有機膜組成物及びレジストパターン形成方法
KR101324645B1 (ko) * 2006-05-08 2013-11-01 주식회사 동진쎄미켐 포토레지스트 조성물
JP5876976B2 (ja) * 2009-01-09 2016-03-02 アイカＳｄｋフェノール株式会社 ノボラック樹脂および熱硬化性樹脂組成物
CN102577712A (zh) * 2012-03-16 2012-07-18 广西钦州力顺机械有限公司 可于甘蔗蔗种下方施肥的甘蔗种植机
JP6070020B2 (ja) * 2012-09-28 2017-02-01 明和化成株式会社 ノボラック型フェノール樹脂の製造方法、ノボラック型フェノール樹脂、及びフォトレジスト組成物
JPWO2014069091A1 (ja) * 2012-10-30 2016-09-08 住友ベークライト株式会社 感光性樹脂組成物、硬化膜、保護膜、絶縁膜および電子装置
CN104884489B (zh) 2012-12-26 2016-09-28 中央硝子株式会社 包含六氟异丙醇基的酚醛清漆树脂及其制造方法、以及它的组合物
JP6555975B2 (ja) * 2015-08-07 2019-08-07 群栄化学工業株式会社 新規イミン基含有樹脂

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58134631A (ja) * 1982-01-08 1983-08-10 Konishiroku Photo Ind Co Ltd 感光性組成物
JPS62123444A (ja) * 1985-08-07 1987-06-04 Japan Synthetic Rubber Co Ltd ポジ型感放射線性樹脂組成物
JPH0654381B2 (ja) * 1985-12-24 1994-07-20 日本合成ゴム株式会社 集積回路作製用ポジ型レジスト
DE3686032T2 (de) * 1985-12-27 1993-02-18 Japan Synthetic Rubber Co Ltd Strahlungsempfindliche positiv arbeitende kunststoffzusammensetzung.
JPS62198852A (ja) * 1986-02-27 1987-09-02 Japan Synthetic Rubber Co Ltd ポジ型感放射線性樹脂組成物
JPH0654389B2 (ja) * 1986-06-23 1994-07-20 日本合成ゴム株式会社 ポジ型感放射線性樹脂組成物

Also Published As

Publication number Publication date
DK155089D0 (da) 1989-03-30
NO891063D0 (no) 1989-03-13
HK158995A (en) 1995-10-20
IL89648A (en) 1993-01-31
KR930006913B1 (ko) 1993-07-24
KR890014613A (ko) 1989-10-24
NO891063L (no) 1989-10-02
JPH0284414A (ja) 1990-03-26
EP0336604A3 (en) 1990-07-25
DE68921017D1 (de) 1995-03-23
EP0336604B1 (de) 1995-02-08
EP0336604A2 (de) 1989-10-11
JPH0776254B2 (ja) 1995-08-16
AU3235289A (en) 1989-10-05
IL89648A0 (en) 1989-09-28
ATE118225T1 (de) 1995-02-15
DK155089A (da) 1989-10-01

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: CLARIANT FINANCE (BVI) LTD., ROAD TOWN, TORTOLA, V

8328 Change in the person/name/address of the agent

Free format text: SPOTT WEINMILLER & PARTNER, 80336 MUENCHEN

8339 Ceased/non-payment of the annual fee