ATE118225T1 - Novolakharze aus aldehydgemischen und daraus hergestellte hochkontrastreiche und hochtemperaturbeständige positive photoresists. - Google Patents

Novolakharze aus aldehydgemischen und daraus hergestellte hochkontrastreiche und hochtemperaturbeständige positive photoresists.

Info

Publication number
ATE118225T1
ATE118225T1 AT89302864T AT89302864T ATE118225T1 AT E118225 T1 ATE118225 T1 AT E118225T1 AT 89302864 T AT89302864 T AT 89302864T AT 89302864 T AT89302864 T AT 89302864T AT E118225 T1 ATE118225 T1 AT E118225T1
Authority
AT
Austria
Prior art keywords
contrast
temperature
novolak resins
positive photoresists
aldehyde mixtures
Prior art date
Application number
AT89302864T
Other languages
English (en)
Inventor
Richard Michael Lazarus
Randall William Kautz
Sunit Suresh Dixit
Original Assignee
Hoechst Celanese Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US07/227,404 external-priority patent/US4920028A/en
Application filed by Hoechst Celanese Corp filed Critical Hoechst Celanese Corp
Application granted granted Critical
Publication of ATE118225T1 publication Critical patent/ATE118225T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
    • C08G8/10—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with phenol
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Gas-Filled Discharge Tubes (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
AT89302864T 1988-03-31 1989-03-22 Novolakharze aus aldehydgemischen und daraus hergestellte hochkontrastreiche und hochtemperaturbeständige positive photoresists. ATE118225T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US17547388A 1988-03-31 1988-03-31
US29782888A 1988-04-22 1988-04-22
US07/227,404 US4920028A (en) 1988-03-31 1988-08-02 High contrast high thermal stability positive photoresists with mixed cresol and hydroxybenzaldehyde prepared novolak and photosensitive diazoquinone

Publications (1)

Publication Number Publication Date
ATE118225T1 true ATE118225T1 (de) 1995-02-15

Family

ID=27390543

Family Applications (1)

Application Number Title Priority Date Filing Date
AT89302864T ATE118225T1 (de) 1988-03-31 1989-03-22 Novolakharze aus aldehydgemischen und daraus hergestellte hochkontrastreiche und hochtemperaturbeständige positive photoresists.

Country Status (10)

Country Link
EP (1) EP0336604B1 (de)
JP (1) JPH0776254B2 (de)
KR (1) KR930006913B1 (de)
AT (1) ATE118225T1 (de)
AU (1) AU3235289A (de)
DE (1) DE68921017T2 (de)
DK (1) DK155089A (de)
HK (1) HK158995A (de)
IL (1) IL89648A (de)
NO (1) NO891063L (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5182184A (en) * 1990-02-05 1993-01-26 Morton International, Inc. Novolak resins of lowered hydroxyl content and high contrast high thermal stability positive photoresists prepared therefrom
JPH03253860A (ja) * 1990-03-05 1991-11-12 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
JPH03294861A (ja) * 1990-04-13 1991-12-26 Mitsubishi Petrochem Co Ltd ポジ型フォトレジスト組成物
JPH05323605A (ja) * 1992-05-27 1993-12-07 Sumitomo Chem Co Ltd ポジ型レジスト組成物
JP3319092B2 (ja) * 1993-11-08 2002-08-26 住友化学工業株式会社 ポジ型レジスト組成物
EP0660186A1 (de) * 1993-12-20 1995-06-28 Mitsubishi Chemical Corporation Lichtempfindliche Harzzusammensetzung und Verfahren zur Bildherstellung damit
JP3424341B2 (ja) * 1994-04-11 2003-07-07 住友化学工業株式会社 感光性樹脂組成物
JP3635598B2 (ja) * 1995-07-13 2005-04-06 富士写真フイルム株式会社 ポジ型フォトレジスト組成物
US5709977A (en) * 1995-07-13 1998-01-20 Fuji Photo Film Co., Ltd. Positive working photoresist composition
JP2006010779A (ja) * 2004-06-22 2006-01-12 Nagase Chemtex Corp 有機膜組成物及びレジストパターン形成方法
KR101324645B1 (ko) * 2006-05-08 2013-11-01 주식회사 동진쎄미켐 포토레지스트 조성물
JP5581046B2 (ja) * 2009-01-09 2014-08-27 昭和電工株式会社 ノボラック樹脂の製造方法およびノボラック樹脂
CN102577712A (zh) * 2012-03-16 2012-07-18 广西钦州力顺机械有限公司 可于甘蔗蔗种下方施肥的甘蔗种植机
JP6070020B2 (ja) * 2012-09-28 2017-02-01 明和化成株式会社 ノボラック型フェノール樹脂の製造方法、ノボラック型フェノール樹脂、及びフォトレジスト組成物
JPWO2014069091A1 (ja) * 2012-10-30 2016-09-08 住友ベークライト株式会社 感光性樹脂組成物、硬化膜、保護膜、絶縁膜および電子装置
KR101759624B1 (ko) 2012-12-26 2017-07-20 샌트랄 글래스 컴퍼니 리미티드 헥사플루오로이소프로판올기를 포함하는 노볼락 수지 및 그 제조 방법과 그 조성물
JP6555975B2 (ja) * 2015-08-07 2019-08-07 群栄化学工業株式会社 新規イミン基含有樹脂

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58134631A (ja) * 1982-01-08 1983-08-10 Konishiroku Photo Ind Co Ltd 感光性組成物
JPS62123444A (ja) * 1985-08-07 1987-06-04 Japan Synthetic Rubber Co Ltd ポジ型感放射線性樹脂組成物
JPH0654381B2 (ja) * 1985-12-24 1994-07-20 日本合成ゴム株式会社 集積回路作製用ポジ型レジスト
EP0227487B1 (de) * 1985-12-27 1992-07-15 Japan Synthetic Rubber Co., Ltd. Strahlungsempfindliche positiv arbeitende Kunststoffzusammensetzung
JPS62198852A (ja) * 1986-02-27 1987-09-02 Japan Synthetic Rubber Co Ltd ポジ型感放射線性樹脂組成物
JPH0654389B2 (ja) * 1986-06-23 1994-07-20 日本合成ゴム株式会社 ポジ型感放射線性樹脂組成物

Also Published As

Publication number Publication date
NO891063D0 (no) 1989-03-13
EP0336604B1 (de) 1995-02-08
IL89648A (en) 1993-01-31
JPH0284414A (ja) 1990-03-26
IL89648A0 (en) 1989-09-28
KR930006913B1 (ko) 1993-07-24
DK155089D0 (da) 1989-03-30
DE68921017T2 (de) 1995-06-01
AU3235289A (en) 1989-10-05
KR890014613A (ko) 1989-10-24
JPH0776254B2 (ja) 1995-08-16
EP0336604A3 (en) 1990-07-25
DK155089A (da) 1989-10-01
HK158995A (en) 1995-10-20
NO891063L (no) 1989-10-02
EP0336604A2 (de) 1989-10-11
DE68921017D1 (de) 1995-03-23

Similar Documents

Publication Publication Date Title
ATE118225T1 (de) Novolakharze aus aldehydgemischen und daraus hergestellte hochkontrastreiche und hochtemperaturbeständige positive photoresists.
EP0735424A3 (de) Fotoresist-enthaltende Mischungen aus fotoaktiven Verbindungen
KR890005563A (ko) 포지티브 감광성내식막용 노볼락 수지
EP0273026A3 (de) Lösungsmittel für Photolack-Zusammensetzungen
FI900575A0 (fi) Med resorcinol modifierat fenolhartsbindemedel i haerdplaster.
AR240464A1 (es) Una resina fenolica de resol modificada, la resina fenolica obtenida por dicho procedimiento y material granular para fundicion y mezcla refractaria que comprende dicha resina.
AU582950B2 (en) Photopolymerizable mixture, photosensitive recording element containing this mixture, and the production of lithographic printing plate using this photosensitive recording element
DE58907866D1 (de) Photopolymerisierbare, zur Herstellung von Druckformen geeignete Druckplatte.
BR9204527A (pt) Composto processo para sua preparacao e formulacao farmaceutica
PT798324E (pt) Resinas "novolac" de fenol/dieno, processo para a sua preparacao e composicoes a base de borracha contendo as referidas resinas
KR900011838A (ko) 독립기포 구조를 가진 경질 페놀 폼(foam) 및 그의 제조방법
DE3887098T2 (de) Polyaminobisimid-Harze.
FR2651874B1 (fr) Dispositif de sechage par micro-ondes de pieces de bois notamment de pieces de bois composites collees.
KR900010465A (ko) 양성 레지스트 조성물의 제조방법
ATE72061T1 (de) Lichtempfindliche 1,2-naphthochinondiazid-4sulfons|uremonoester und lichtempfindliche zusammensetzungen damit.
JPS642034A (en) Photoresist composition
JPS55127553A (en) Photosensitive composition
JPS53127550A (en) Phenolic resin composition
JPS52112694A (en) Manufacture of fibers of films of phenolic resins
ES2079600T3 (es) Resinas novolacas a base de para-alquilfenoles, su procedimiento de preparacion.
ES2050642T3 (es) Solucion acuosa de resol, procedimiento para su preparacion y su utilizacion.
JPS52146494A (en) Preparation of phenolic resin
JPS5342239A (en) Molding materials of phenolic resin
ES2027532A6 (es) Procedimiento catalitico para la preparacion de resinas fenolicas de tipo novolaca
JPS649442A (en) Pattern forming material

Legal Events

Date Code Title Description
UEP Publication of translation of european patent specification
REN Ceased due to non-payment of the annual fee