ATE72061T1 - Lichtempfindliche 1,2-naphthochinondiazid-4sulfons|uremonoester und lichtempfindliche zusammensetzungen damit. - Google Patents

Lichtempfindliche 1,2-naphthochinondiazid-4sulfons|uremonoester und lichtempfindliche zusammensetzungen damit.

Info

Publication number
ATE72061T1
ATE72061T1 AT88305863T AT88305863T ATE72061T1 AT E72061 T1 ATE72061 T1 AT E72061T1 AT 88305863 T AT88305863 T AT 88305863T AT 88305863 T AT88305863 T AT 88305863T AT E72061 T1 ATE72061 T1 AT E72061T1
Authority
AT
Austria
Prior art keywords
light
sensitive
uremonoesters
naphthochinonediazide
4sulphones
Prior art date
Application number
AT88305863T
Other languages
English (en)
Inventor
Alfred Troth Jeffries Iii
Original Assignee
Ocg Microelectronic Materials
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ocg Microelectronic Materials filed Critical Ocg Microelectronic Materials
Application granted granted Critical
Publication of ATE72061T1 publication Critical patent/ATE72061T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
AT88305863T 1987-07-01 1988-06-28 Lichtempfindliche 1,2-naphthochinondiazid-4sulfons|uremonoester und lichtempfindliche zusammensetzungen damit. ATE72061T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/068,397 US4797345A (en) 1987-07-01 1987-07-01 Light-sensitive 1,2-naphthoquinone-2-diazide-4-sulfonic acid monoesters of cycloalkyl substituted phenol and their use in light-sensitive mixtures
EP88305863A EP0297825B1 (de) 1987-07-01 1988-06-28 Lichtempfindliche 1,2-naphthochinondiazid-4-sulfonsäuremonoester und lichtempfindliche Zusammensetzungen damit

Publications (1)

Publication Number Publication Date
ATE72061T1 true ATE72061T1 (de) 1992-02-15

Family

ID=22082313

Family Applications (1)

Application Number Title Priority Date Filing Date
AT88305863T ATE72061T1 (de) 1987-07-01 1988-06-28 Lichtempfindliche 1,2-naphthochinondiazid-4sulfons|uremonoester und lichtempfindliche zusammensetzungen damit.

Country Status (5)

Country Link
US (1) US4797345A (de)
EP (1) EP0297825B1 (de)
JP (1) JPH01104037A (de)
AT (1) ATE72061T1 (de)
DE (1) DE3867929D1 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0389353A (ja) * 1989-09-01 1991-04-15 Nippon Paint Co Ltd ポジ型感光性樹脂組成物
JP3319092B2 (ja) * 1993-11-08 2002-08-26 住友化学工業株式会社 ポジ型レジスト組成物
JP3224115B2 (ja) * 1994-03-17 2001-10-29 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
JP3278306B2 (ja) * 1994-10-31 2002-04-30 富士写真フイルム株式会社 ポジ型フォトレジスト組成物
TW201025701A (en) * 2008-12-22 2010-07-01 Taiwan Textile Res Inst Dye-sensitized solar cell, photo-sensitized cathode thereof, and method of manufacturing the same

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3046121A (en) * 1949-07-23 1962-07-24 Azoplate Corp Process for the manufacture of printing plates and light-sensitive material suttablefor use therein
US3046119A (en) * 1950-08-01 1962-07-24 Azoplate Corp Light sensitive material for printing and process for making printing plates
US3046112A (en) * 1951-06-30 1962-07-24 Azoplate Corp Quinone diazide printing plates
US2767092A (en) * 1951-12-06 1956-10-16 Azoplate Corp Light sensitive material for lithographic printing
DE938233C (de) * 1953-03-11 1956-01-26 Kalle & Co Ag Lichtempfindliches Material fuer die photomechanische Herstellung von Druckformen
NL247405A (de) * 1959-01-15
NL247588A (de) * 1959-01-21
DE1447015B2 (de) * 1963-10-03 1973-03-15 Kalle Ag, 6202 Wiesbaden-Biebrich Lichtempfindliche schichten zur herstellung von druckformen
DE1543721A1 (de) * 1966-07-27 1969-09-11 Kalle Ag Naphthochinondiazidsulfosaeureester und Verfahren zu seiner Herstellung und Verfahren zur Herstellung eines den Ester enthaltenden lagerfaehigen lichtempfindlichen Materials
US3823130A (en) * 1971-05-28 1974-07-09 Polychrome Corp Light sensitive esters of naphthoquinone-1,2-diazide-(2)-5-sulfonicacids with cyclohexylmethanol or secondary or tertiary alkanols of up to six carbon atoms
US3900325A (en) * 1972-06-12 1975-08-19 Shipley Co Light sensitive quinone diazide composition with n-3-oxohydrocarbon substituted acrylamide
US4551409A (en) * 1983-11-07 1985-11-05 Shipley Company Inc. Photoresist composition of cocondensed naphthol and phenol with formaldehyde in admixture with positive o-quinone diazide or negative azide
US4670372A (en) * 1984-10-15 1987-06-02 Petrarch Systems, Inc. Process of developing radiation imaged photoresist with alkaline developer solution including a carboxylated surfactant

Also Published As

Publication number Publication date
JPH0446947B2 (de) 1992-07-31
US4797345A (en) 1989-01-10
DE3867929D1 (de) 1992-03-05
EP0297825B1 (de) 1992-01-22
JPH01104037A (ja) 1989-04-21
EP0297825A1 (de) 1989-01-04

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Legal Events

Date Code Title Description
UEP Publication of translation of european patent specification
REN Ceased due to non-payment of the annual fee