JPS6448849A - Photosensitive composition - Google Patents

Photosensitive composition

Info

Publication number
JPS6448849A
JPS6448849A JP62203831A JP20383187A JPS6448849A JP S6448849 A JPS6448849 A JP S6448849A JP 62203831 A JP62203831 A JP 62203831A JP 20383187 A JP20383187 A JP 20383187A JP S6448849 A JPS6448849 A JP S6448849A
Authority
JP
Japan
Prior art keywords
component
aldehyde
alkyl group
substituted phenol
fluorinated surfactant
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62203831A
Other languages
Japanese (ja)
Other versions
JPH0830140B2 (en
Inventor
Takeshi Yamamoto
Sei Goto
Norihito Suzuki
Hiroshi Tomiyasu
Yoshiko Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Kasei Corp
Konica Minolta Inc
Original Assignee
Mitsubishi Kasei Corp
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Kasei Corp, Konica Minolta Inc filed Critical Mitsubishi Kasei Corp
Priority to JP62203831A priority Critical patent/JPH0830140B2/en
Publication of JPS6448849A publication Critical patent/JPS6448849A/en
Publication of JPH0830140B2 publication Critical patent/JPH0830140B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

PURPOSE:To form the title composition improved in safelight property and ball-point pen suitability without detriment to its development latitude and sensitivity and suited for a positive photosensitive planographic plate, by mixing a condensation resin comprising an o-quinonediazide compound, a substituted phenol and an aldehyde with a fluorinated surfactant. CONSTITUTION:This photosensitive composition comprises a condensation resin comprising an o-quinonediazide compound (A), a substituted phenol of formula I (wherein R1 and R2 are each a hydrogen atom, an alkyl group or a halogen atom, and R3 is an alkyl group or a cycloalkyl group) and an aldehyde and/or an o-naphthoquinonediazidesulfonate compound thereof (B) and a fluorinated surfactant (C). The mixing ratio of the components of this composition is preferably such that component A is 5-60wt.%, component B is 0.05-15wt.%, and component C is 0.05-20wt.%.
JP62203831A 1987-08-17 1987-08-17 Photosensitive lithographic printing plate Expired - Fee Related JPH0830140B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62203831A JPH0830140B2 (en) 1987-08-17 1987-08-17 Photosensitive lithographic printing plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62203831A JPH0830140B2 (en) 1987-08-17 1987-08-17 Photosensitive lithographic printing plate

Publications (2)

Publication Number Publication Date
JPS6448849A true JPS6448849A (en) 1989-02-23
JPH0830140B2 JPH0830140B2 (en) 1996-03-27

Family

ID=16480427

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62203831A Expired - Fee Related JPH0830140B2 (en) 1987-08-17 1987-08-17 Photosensitive lithographic printing plate

Country Status (1)

Country Link
JP (1) JPH0830140B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02185556A (en) * 1989-01-11 1990-07-19 Japan Synthetic Rubber Co Ltd Radiation-sensitive resin composition
EP0664486A1 (en) * 1994-01-25 1995-07-26 Morton International, Inc. Waterborne photoresists having non-ionic fluorocarbon surfactants
WO2017126610A1 (en) * 2016-01-20 2017-07-27 日産化学工業株式会社 Positive photosensitive resin composition

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58105143A (en) * 1981-12-17 1983-06-22 Kanto Kagaku Kk Positive type photoresist composition

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58105143A (en) * 1981-12-17 1983-06-22 Kanto Kagaku Kk Positive type photoresist composition

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02185556A (en) * 1989-01-11 1990-07-19 Japan Synthetic Rubber Co Ltd Radiation-sensitive resin composition
EP0664486A1 (en) * 1994-01-25 1995-07-26 Morton International, Inc. Waterborne photoresists having non-ionic fluorocarbon surfactants
WO2017126610A1 (en) * 2016-01-20 2017-07-27 日産化学工業株式会社 Positive photosensitive resin composition

Also Published As

Publication number Publication date
JPH0830140B2 (en) 1996-03-27

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