JPS6462359A - Radiation-sensitive composition - Google Patents

Radiation-sensitive composition

Info

Publication number
JPS6462359A
JPS6462359A JP21994687A JP21994687A JPS6462359A JP S6462359 A JPS6462359 A JP S6462359A JP 21994687 A JP21994687 A JP 21994687A JP 21994687 A JP21994687 A JP 21994687A JP S6462359 A JPS6462359 A JP S6462359A
Authority
JP
Japan
Prior art keywords
radiation
100pts
alkali
methyl
acid ester
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP21994687A
Other languages
Japanese (ja)
Inventor
Chozo Okuda
Hitoshi Oka
Takao Miura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Priority to JP21994687A priority Critical patent/JPS6462359A/en
Publication of JPS6462359A publication Critical patent/JPS6462359A/en
Pending legal-status Critical Current

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  • Compositions Of Macromolecular Compounds (AREA)

Abstract

PURPOSE:To provide the titled composition composed of an alkali-soluble polymer, a radiation-sensitive compound and a specific solvent, capable of providing a highly sensitive resist having excellent properties as resist without causing environmental and hygienic problems and suitable for the production of a semiconductor integrated circuit, etc. CONSTITUTION:(A) 100pts.wt. of an alkali-soluble polymer (e.g. novolak polymer) is compounded with (B) 5-100pts.wt., preferably 10-50pts.wt. of a radiation- sensitive compound (e.g. 1,2-benzoquinonediazido-4-sulfonic acid ester) and (C) a solvent containing 5-100wt.%, preferably 50-100wt.% of a 3-methyl-3- methoxybutanol carboxylic acid ester (e.g. 3-methyl-3-methoxybutyl acetate).
JP21994687A 1987-09-02 1987-09-02 Radiation-sensitive composition Pending JPS6462359A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21994687A JPS6462359A (en) 1987-09-02 1987-09-02 Radiation-sensitive composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21994687A JPS6462359A (en) 1987-09-02 1987-09-02 Radiation-sensitive composition

Publications (1)

Publication Number Publication Date
JPS6462359A true JPS6462359A (en) 1989-03-08

Family

ID=16743510

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21994687A Pending JPS6462359A (en) 1987-09-02 1987-09-02 Radiation-sensitive composition

Country Status (1)

Country Link
JP (1) JPS6462359A (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6139041A (en) * 1984-07-31 1986-02-25 Tokyo Ohka Kogyo Co Ltd Developing solution of positive type resist
JPS625237A (en) * 1985-06-28 1987-01-12 ヘキスト　アクチェンゲゼルシャフト Making of radiation-sensitive cover solution for use in electrostatic blowing cover and radiation sensitive resist layer on layer support body

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6139041A (en) * 1984-07-31 1986-02-25 Tokyo Ohka Kogyo Co Ltd Developing solution of positive type resist
JPS625237A (en) * 1985-06-28 1987-01-12 ヘキスト　アクチェンゲゼルシャフト Making of radiation-sensitive cover solution for use in electrostatic blowing cover and radiation sensitive resist layer on layer support body

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