FI870768A0 - Fotopolymeriserbar blandning, denna innehaollande ljuskaensligt registreringselement samt foerfarande foer framstaellning av en plantrycksform medelst detta ljuskaensliga registreringselement. - Google Patents

Fotopolymeriserbar blandning, denna innehaollande ljuskaensligt registreringselement samt foerfarande foer framstaellning av en plantrycksform medelst detta ljuskaensliga registreringselement.

Info

Publication number
FI870768A0
FI870768A0 FI870768A FI870768A FI870768A0 FI 870768 A0 FI870768 A0 FI 870768A0 FI 870768 A FI870768 A FI 870768A FI 870768 A FI870768 A FI 870768A FI 870768 A0 FI870768 A0 FI 870768A0
Authority
FI
Finland
Prior art keywords
registreringselement
plantrycksform
ljuskaensligt
ljuskaensliga
fotopolymeriserbar
Prior art date
Application number
FI870768A
Other languages
English (en)
Other versions
FI88215C (fi
FI88215B (fi
FI870768A (fi
Inventor
Gerhard Hoffmann
Reiner Hofmann
Harald Lauke
Wilhelm Weber
Reinhold J Leyrer
Original Assignee
Basf Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Basf Ag filed Critical Basf Ag
Publication of FI870768A0 publication Critical patent/FI870768A0/fi
Publication of FI870768A publication Critical patent/FI870768A/fi
Application granted granted Critical
Publication of FI88215B publication Critical patent/FI88215B/fi
Publication of FI88215C publication Critical patent/FI88215C/fi

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/113—Binder containing with plasticizer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/124—Carbonyl compound containing
    • Y10S430/125—Carbonyl in heterocyclic compound

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Breeding Of Plants And Reproduction By Means Of Culturing (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
FI870768A 1986-02-26 1987-02-23 Fotopolymeriserbar blandning, denna innehaollande ljuskaensligt uppteckningselement samt foerfarande foer framstaellning av en plantrycksform medelst detta ljuskaensliga uppteckningselement FI88215C (fi)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19863606155 DE3606155A1 (de) 1986-02-26 1986-02-26 Photopolymerisierbares gemisch, dieses enthaltendes lichtempfindliches aufzeichnungselement sowie verfahren zur herstellung einer flachdruckform mittels dieses lichtempfindlichen aufzeichnungselements
DE3606155 1986-02-26

Publications (4)

Publication Number Publication Date
FI870768A0 true FI870768A0 (fi) 1987-02-23
FI870768A FI870768A (fi) 1987-08-27
FI88215B FI88215B (fi) 1992-12-31
FI88215C FI88215C (fi) 1993-04-13

Family

ID=6294959

Family Applications (1)

Application Number Title Priority Date Filing Date
FI870768A FI88215C (fi) 1986-02-26 1987-02-23 Fotopolymeriserbar blandning, denna innehaollande ljuskaensligt uppteckningselement samt foerfarande foer framstaellning av en plantrycksform medelst detta ljuskaensliga uppteckningselement

Country Status (8)

Country Link
US (1) US4935330A (fi)
EP (1) EP0234570B1 (fi)
JP (1) JP2702120B2 (fi)
AT (1) ATE75329T1 (fi)
AU (1) AU582950B2 (fi)
DE (2) DE3606155A1 (fi)
ES (1) ES2032195T3 (fi)
FI (1) FI88215C (fi)

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KR900700923A (ko) * 1988-02-17 1990-08-17 야마구찌 도시아끼 포토레지스트 조성물
JPH0820734B2 (ja) * 1988-08-11 1996-03-04 富士写真フイルム株式会社 感光性組成物及びそれを用いた光重合性組成物
JP2835728B2 (ja) * 1988-08-19 1998-12-14 富士写真フイルム株式会社 感光性平版印刷版
JP2835732B2 (ja) * 1988-12-26 1998-12-14 富士写真フイルム株式会社 感光性組成物
DE69128274T2 (de) * 1990-11-05 1998-04-23 Tokyo Ohka Kogyo Co Ltd Photopolymerisierbare Zusammensetzungen
DE4102173A1 (de) * 1991-01-25 1992-07-30 Basf Ag Lagerstabile loesung eines carboxylgruppenhaltigen copolymerisats sowie verfahren zur herstellung von photoempfindlichen lacken und offsetdruckplatten
US5330686A (en) * 1992-08-19 1994-07-19 Ppg Industries, Inc. Temperature stable and sunlight protected photochromic articles
CA2158915A1 (en) * 1994-09-30 1996-03-31 Dekai Loo Liquid photoimageable resist
US5576146A (en) * 1995-01-17 1996-11-19 Imation Corp. Photosensitive polymer-containing systems with increased shelf-lives
GB2299585A (en) * 1995-04-06 1996-10-09 Coates Brothers Plc Coating compositions
US5561029A (en) * 1995-04-28 1996-10-01 Polaroid Corporation Low-volatility, substituted 2-phenyl-4,6-bis (halomethyl)-1,3,5-triazine for lithographic printing plates
DE19654103A1 (de) * 1996-12-23 1998-06-25 Du Pont Deutschland Verfahren zum Kantenverkleben von photopolymerisierbaren Druckplatten oder Photopolymerdruckformen für den Flexodruck
US6479706B1 (en) 1997-02-04 2002-11-12 Albemarle Corporation Aminobenzophenones and photopolymerizable compositions including the same
AU6140798A (en) * 1997-02-04 1998-08-25 John Gabriel Santobianco Aminobenzophenones and photopolymerizable compositions including same
US5837586A (en) * 1997-02-14 1998-11-17 Kodak Polychrome Graphics Company, Ltd. 4-(alkoxyhydroxy)styryl triazine photinitiators and photo sensitive composition
US6558787B1 (en) * 1999-12-27 2003-05-06 Kodak Polychrome Graphics Llc Relation to manufacture of masks and electronic parts
TW518787B (en) * 2000-09-29 2003-01-21 Pionics Co Ltd Lithium polymer secondary battery
EP1209528B1 (en) 2000-11-28 2015-07-22 Eternal Technology Corporation Photoresist composition
EP2465875A1 (en) * 2010-12-17 2012-06-20 Cytec Surface Specialties, S.A. Process for the preparation of radiation curable compositions
CN102250059A (zh) * 2011-04-26 2011-11-23 盐城工学院 含芳叔胺基和二羟基的硫杂蒽酮光引发剂及其制备方法

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DE2003122A1 (de) * 1969-01-29 1970-07-30 Ciba Geigy Phenyloxy-aliphatische Saeuren
US3641110A (en) * 1969-01-29 1972-02-08 Ciba Geigy Corp Phenoxy-aliphatic acids
US3708589A (en) * 1969-10-31 1973-01-02 Ciba Geigy Corp Hypocholesterolemic phenoxy-aliphatic acid compositions
US3709993A (en) * 1970-04-28 1973-01-09 Ciba Geigy Corp Hypocholesterolemic phenoxy-aliphatic acid compositions
US3657197A (en) * 1970-05-07 1972-04-18 Gaf Corp Photosensitive propargyl polymer derivatives
US3725064A (en) * 1970-05-07 1973-04-03 Gaf Corp Photosensitive propargyl polymer composition and method of using
US3708587A (en) * 1970-06-08 1973-01-02 Ciba Geigy Corp Hypocholesterolemic phenoxy-aliphatic acid compositions
US3759087A (en) * 1971-04-08 1973-09-18 Nippon Steel Corp Sampling apparatus for analyzing gas
US3954475A (en) * 1971-09-03 1976-05-04 Minnesota Mining And Manufacturing Company Photosensitive elements containing chromophore-substituted vinyl-halomethyl-s-triazines
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DE3464921D1 (en) * 1983-05-02 1987-08-27 Du Pont Constrained n-alkylamino aryl ketones as sensitizers for photopolymer compositions
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JPS60239436A (ja) * 1984-05-15 1985-11-28 Asahi Glass Co Ltd トリフルオロ酢酸の製造方法
JPS6261045A (ja) * 1985-09-11 1987-03-17 Fuji Photo Film Co Ltd 光重合性組成物
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Also Published As

Publication number Publication date
AU582950B2 (en) 1989-04-13
JPS62254141A (ja) 1987-11-05
FI88215C (fi) 1993-04-13
DE3606155A1 (de) 1987-08-27
ES2032195T3 (es) 1993-01-16
DE3778395D1 (de) 1992-05-27
ATE75329T1 (de) 1992-05-15
FI88215B (fi) 1992-12-31
JP2702120B2 (ja) 1998-01-21
FI870768A (fi) 1987-08-27
EP0234570B1 (de) 1992-04-22
EP0234570A2 (de) 1987-09-02
US4935330A (en) 1990-06-19
AU6923187A (en) 1987-08-27
EP0234570A3 (en) 1989-06-14

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Legal Events

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MM Patent lapsed

Owner name: BASF AKTIENGESELLSCHAFT