ES2032195T3 - Mezcla fotopolimerizable, elemento de representacion sensible a la luz que le contiene asi como procedimiento para la obtencion de un molde de impresion plana por medio de este elemento de representacion sensible a la luz. - Google Patents
Mezcla fotopolimerizable, elemento de representacion sensible a la luz que le contiene asi como procedimiento para la obtencion de un molde de impresion plana por medio de este elemento de representacion sensible a la luz.Info
- Publication number
- ES2032195T3 ES2032195T3 ES198787102689T ES87102689T ES2032195T3 ES 2032195 T3 ES2032195 T3 ES 2032195T3 ES 198787102689 T ES198787102689 T ES 198787102689T ES 87102689 T ES87102689 T ES 87102689T ES 2032195 T3 ES2032195 T3 ES 2032195T3
- Authority
- ES
- Spain
- Prior art keywords
- light sensitive
- sensitive representation
- photopolymerisable
- procedure
- obtaining
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/113—Binder containing with plasticizer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
- Y10S430/121—Nitrogen in heterocyclic ring
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/124—Carbonyl compound containing
- Y10S430/125—Carbonyl in heterocyclic compound
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Polymerisation Methods In General (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Breeding Of Plants And Reproduction By Means Of Culturing (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
Abstract
EL INVENTO TRATA DE UNA MEZCLA FOTOPOLIMERIZADORA COMPRENDIENDO AL MENOS UNA ASOCIACION ETILENICA NO SATURADA FOTOPOLIMERIZADORA O FOTOTRAMADORA, ASI COMO UN INICIADOR DE FOTOPOLIMERIZACION, QUE COMPRENDE UNA COMBINACION DE UNA ASOCIACION DE CARBONIL AROMATICO EN LA FORMA DADA EN EL RECURSO 1, ASI COMO UN GRUPO DE METILO SUSTITUTIVO DE HALOGENO COMPRENDIENDO UNA ASOCIACION S-TRIAZINA. EL INVENTO TRATA TAMBIEN DE UN ELEMENTO DISEÑADOR SENSIBLE A LA LUZ CON UNA CAPA DE DISEÑO FOTOPOLIMIRADORA DE ESTA COMBINACION FOTOPOLIMERIZADORA, ASI COMO UN PROCEDIMIENTO PARA PRODUCCION DE FORMAS DE IMPRESION PLANAS MEDIANTE ESTE ELEMENTO DISEÑADOR.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19863606155 DE3606155A1 (de) | 1986-02-26 | 1986-02-26 | Photopolymerisierbares gemisch, dieses enthaltendes lichtempfindliches aufzeichnungselement sowie verfahren zur herstellung einer flachdruckform mittels dieses lichtempfindlichen aufzeichnungselements |
Publications (1)
Publication Number | Publication Date |
---|---|
ES2032195T3 true ES2032195T3 (es) | 1993-01-16 |
Family
ID=6294959
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES198787102689T Expired - Lifetime ES2032195T3 (es) | 1986-02-26 | 1987-02-25 | Mezcla fotopolimerizable, elemento de representacion sensible a la luz que le contiene asi como procedimiento para la obtencion de un molde de impresion plana por medio de este elemento de representacion sensible a la luz. |
Country Status (8)
Country | Link |
---|---|
US (1) | US4935330A (es) |
EP (1) | EP0234570B1 (es) |
JP (1) | JP2702120B2 (es) |
AT (1) | ATE75329T1 (es) |
AU (1) | AU582950B2 (es) |
DE (2) | DE3606155A1 (es) |
ES (1) | ES2032195T3 (es) |
FI (1) | FI88215C (es) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5212043A (en) * | 1988-02-17 | 1993-05-18 | Tosho Corporation | Photoresist composition comprising a non-aromatic resin having no aromatic structures derived from units of an aliphatic cyclic hydrocarbon and units of maleic anhydride and/or maleimide and a photosensitive agent |
JPH0820734B2 (ja) * | 1988-08-11 | 1996-03-04 | 富士写真フイルム株式会社 | 感光性組成物及びそれを用いた光重合性組成物 |
JP2835728B2 (ja) * | 1988-08-19 | 1998-12-14 | 富士写真フイルム株式会社 | 感光性平版印刷版 |
JP2835732B2 (ja) * | 1988-12-26 | 1998-12-14 | 富士写真フイルム株式会社 | 感光性組成物 |
ES2110987T3 (es) * | 1990-11-05 | 1998-03-01 | Tokyo Ohka Kogyo Co Ltd | Composiciones fotopolimerizables. |
DE4102173A1 (de) * | 1991-01-25 | 1992-07-30 | Basf Ag | Lagerstabile loesung eines carboxylgruppenhaltigen copolymerisats sowie verfahren zur herstellung von photoempfindlichen lacken und offsetdruckplatten |
US5330686A (en) * | 1992-08-19 | 1994-07-19 | Ppg Industries, Inc. | Temperature stable and sunlight protected photochromic articles |
CA2158915A1 (en) * | 1994-09-30 | 1996-03-31 | Dekai Loo | Liquid photoimageable resist |
US5576146A (en) * | 1995-01-17 | 1996-11-19 | Imation Corp. | Photosensitive polymer-containing systems with increased shelf-lives |
GB2299585A (en) * | 1995-04-06 | 1996-10-09 | Coates Brothers Plc | Coating compositions |
US5561029A (en) * | 1995-04-28 | 1996-10-01 | Polaroid Corporation | Low-volatility, substituted 2-phenyl-4,6-bis (halomethyl)-1,3,5-triazine for lithographic printing plates |
DE19654103A1 (de) * | 1996-12-23 | 1998-06-25 | Du Pont Deutschland | Verfahren zum Kantenverkleben von photopolymerisierbaren Druckplatten oder Photopolymerdruckformen für den Flexodruck |
US6479706B1 (en) | 1997-02-04 | 2002-11-12 | Albemarle Corporation | Aminobenzophenones and photopolymerizable compositions including the same |
WO1998033764A1 (en) * | 1997-02-04 | 1998-08-06 | First Chemical Corporation | Aminobenzophenones and photopolymerizable compositions including same |
US5837586A (en) * | 1997-02-14 | 1998-11-17 | Kodak Polychrome Graphics Company, Ltd. | 4-(alkoxyhydroxy)styryl triazine photinitiators and photo sensitive composition |
US6558787B1 (en) * | 1999-12-27 | 2003-05-06 | Kodak Polychrome Graphics Llc | Relation to manufacture of masks and electronic parts |
TW518787B (en) * | 2000-09-29 | 2003-01-21 | Pionics Co Ltd | Lithium polymer secondary battery |
EP1209528B1 (en) | 2000-11-28 | 2015-07-22 | Eternal Technology Corporation | Photoresist composition |
EP2465875A1 (en) * | 2010-12-17 | 2012-06-20 | Cytec Surface Specialties, S.A. | Process for the preparation of radiation curable compositions |
CN102250059A (zh) * | 2011-04-26 | 2011-11-23 | 盐城工学院 | 含芳叔胺基和二羟基的硫杂蒽酮光引发剂及其制备方法 |
Family Cites Families (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1090142A (en) * | 1965-02-26 | 1967-11-08 | Agfa Gevaert Nv | Photochemical insolubilisation of polymers |
US3558322A (en) * | 1968-10-30 | 1971-01-26 | Du Pont | Photoactivatable compositions and layers containing arylthioketones |
US3641110A (en) * | 1969-01-29 | 1972-02-08 | Ciba Geigy Corp | Phenoxy-aliphatic acids |
DE2003122A1 (de) * | 1969-01-29 | 1970-07-30 | Ciba Geigy | Phenyloxy-aliphatische Saeuren |
US3708589A (en) * | 1969-10-31 | 1973-01-02 | Ciba Geigy Corp | Hypocholesterolemic phenoxy-aliphatic acid compositions |
US3709993A (en) * | 1970-04-28 | 1973-01-09 | Ciba Geigy Corp | Hypocholesterolemic phenoxy-aliphatic acid compositions |
US3725064A (en) * | 1970-05-07 | 1973-04-03 | Gaf Corp | Photosensitive propargyl polymer composition and method of using |
US3657197A (en) * | 1970-05-07 | 1972-04-18 | Gaf Corp | Photosensitive propargyl polymer derivatives |
US3708587A (en) * | 1970-06-08 | 1973-01-02 | Ciba Geigy Corp | Hypocholesterolemic phenoxy-aliphatic acid compositions |
US3759087A (en) * | 1971-04-08 | 1973-09-18 | Nippon Steel Corp | Sampling apparatus for analyzing gas |
US3987037A (en) * | 1971-09-03 | 1976-10-19 | Minnesota Mining And Manufacturing Company | Chromophore-substituted vinyl-halomethyl-s-triazines |
US3954475A (en) * | 1971-09-03 | 1976-05-04 | Minnesota Mining And Manufacturing Company | Photosensitive elements containing chromophore-substituted vinyl-halomethyl-s-triazines |
US3926643A (en) * | 1974-05-16 | 1975-12-16 | Du Pont | Photopolymerizable compositions comprising initiator combinations comprising thioxanthenones |
FR2296658A1 (fr) * | 1975-01-03 | 1976-07-30 | Scm Corp | Compositions de revetement polymerisables et procede de fabrication |
CH628343A5 (en) * | 1977-03-24 | 1982-02-26 | Sandoz Ag | Process for preparing thioxanthones |
DE2718259C2 (de) * | 1977-04-25 | 1982-11-25 | Hoechst Ag, 6000 Frankfurt | Strahlungsempfindliches Gemisch |
JPS5928328B2 (ja) * | 1977-11-29 | 1984-07-12 | 富士写真フイルム株式会社 | 光重合性組成物 |
JPS6053300B2 (ja) * | 1978-08-29 | 1985-11-25 | 富士写真フイルム株式会社 | 感光性樹脂組成物 |
JPS5550001A (en) * | 1978-10-06 | 1980-04-11 | Fuji Photo Film Co Ltd | Photo-polymerizable composition |
CH640849A5 (de) * | 1979-05-18 | 1984-01-31 | Ciba Geigy Ag | Thioxanthoncarbonsaeureester, -thioester und -amide. |
JPS5651735A (en) * | 1979-10-03 | 1981-05-09 | Asahi Chem Ind Co Ltd | Photoreactive composition |
US4367324A (en) * | 1980-02-05 | 1983-01-04 | Ciba-Geigy Corporation | Photocrosslinkable polymers with thioxanthone and imidyl groupings in side chains |
CA1216998A (en) * | 1980-09-10 | 1987-01-20 | Donald P. Specht | Photopolymerization compositions comprising amine- substituted photosensitizers and n-heterocyclic compounds bearing an n-oxy substituent |
JPS57163377A (en) * | 1981-03-16 | 1982-10-07 | Nippon Kayaku Co Ltd | Dialkylthioxanthone compound, its preparation, and curing of photopolymerizable resin composition using it |
GB2108487B (en) * | 1981-11-03 | 1985-07-31 | Sericol Group Ltd | Water soluble thioxanthone photoinitiators |
JPS5978339A (ja) * | 1982-10-28 | 1984-05-07 | Fuji Photo Film Co Ltd | 光重合性組成物 |
JPS5989303A (ja) * | 1982-11-12 | 1984-05-23 | Fuji Photo Film Co Ltd | 光重合性組成物 |
EP0127762B1 (en) * | 1983-05-02 | 1987-07-22 | E.I. Du Pont De Nemours And Company | Constrained n-alkylamino aryl ketones as sensitizers for photopolymer compositions |
US4535052A (en) * | 1983-05-02 | 1985-08-13 | E. I. Du Pont De Nemours And Company | Constrained n-alkylamino aryl ketones as sensitizers for photopolymer compositions |
JPS6063532A (ja) * | 1983-08-16 | 1985-04-11 | Fuji Photo Film Co Ltd | 光重合性組成物 |
JPS60239436A (ja) * | 1984-05-15 | 1985-11-28 | Asahi Glass Co Ltd | トリフルオロ酢酸の製造方法 |
JPS6261045A (ja) * | 1985-09-11 | 1987-03-17 | Fuji Photo Film Co Ltd | 光重合性組成物 |
GB8529448D0 (en) * | 1985-11-29 | 1986-01-08 | Ward Blenkinsop & Co Ltd | Thioxanthone derivatives |
-
1986
- 1986-02-26 DE DE19863606155 patent/DE3606155A1/de not_active Withdrawn
-
1987
- 1987-02-23 JP JP62038145A patent/JP2702120B2/ja not_active Expired - Lifetime
- 1987-02-23 FI FI870768A patent/FI88215C/fi not_active IP Right Cessation
- 1987-02-25 AU AU69231/87A patent/AU582950B2/en not_active Ceased
- 1987-02-25 EP EP87102689A patent/EP0234570B1/de not_active Expired - Lifetime
- 1987-02-25 DE DE8787102689T patent/DE3778395D1/de not_active Expired - Lifetime
- 1987-02-25 ES ES198787102689T patent/ES2032195T3/es not_active Expired - Lifetime
- 1987-02-25 AT AT87102689T patent/ATE75329T1/de not_active IP Right Cessation
-
1989
- 1989-11-14 US US07/436,937 patent/US4935330A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0234570A2 (de) | 1987-09-02 |
FI88215C (fi) | 1993-04-13 |
DE3606155A1 (de) | 1987-08-27 |
AU582950B2 (en) | 1989-04-13 |
JPS62254141A (ja) | 1987-11-05 |
JP2702120B2 (ja) | 1998-01-21 |
DE3778395D1 (de) | 1992-05-27 |
FI88215B (fi) | 1992-12-31 |
EP0234570B1 (de) | 1992-04-22 |
ATE75329T1 (de) | 1992-05-15 |
US4935330A (en) | 1990-06-19 |
AU6923187A (en) | 1987-08-27 |
EP0234570A3 (en) | 1989-06-14 |
FI870768A (fi) | 1987-08-27 |
FI870768A0 (fi) | 1987-02-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FG2A | Definitive protection |
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