ATE196200T1 - Gravierverfahren mit bildmaske und lichtempfindlicher laminatfilm für besagte bildmaske - Google Patents
Gravierverfahren mit bildmaske und lichtempfindlicher laminatfilm für besagte bildmaskeInfo
- Publication number
- ATE196200T1 ATE196200T1 AT90915189T AT90915189T ATE196200T1 AT E196200 T1 ATE196200 T1 AT E196200T1 AT 90915189 T AT90915189 T AT 90915189T AT 90915189 T AT90915189 T AT 90915189T AT E196200 T1 ATE196200 T1 AT E196200T1
- Authority
- AT
- Austria
- Prior art keywords
- image mask
- laminate film
- image
- layer
- resin composition
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
- B24C1/00—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods
- B24C1/04—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods for treating only selected parts of a surface, e.g. for carving stone or glass
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
- G03F7/346—Imagewise removal by selective transfer, e.g. peeling away using photosensitive materials other than non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/11—Vinyl alcohol polymer or derivative
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP1990/001360 WO1992007303A1 (en) | 1990-10-22 | 1990-10-22 | Method of engraving with image mask and photosensitive laminate film for said image mask |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE196200T1 true ATE196200T1 (de) | 2000-09-15 |
Family
ID=13986771
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT90915189T ATE196200T1 (de) | 1990-10-22 | 1990-10-22 | Gravierverfahren mit bildmaske und lichtempfindlicher laminatfilm für besagte bildmaske |
Country Status (7)
Country | Link |
---|---|
US (1) | US5427890B1 (de) |
EP (1) | EP0506959B1 (de) |
AT (1) | ATE196200T1 (de) |
CA (1) | CA2041521C (de) |
DE (1) | DE69033623T2 (de) |
ES (1) | ES2149754T3 (de) |
WO (1) | WO1992007303A1 (de) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5629132B1 (en) * | 1991-03-28 | 2000-02-08 | Aicello Chemical | Method for engraving and/or etching with image-carrying mask and photo-sensitive laminate film for use in making the mask |
JP2901129B2 (ja) * | 1994-03-14 | 1999-06-07 | アイセロ化学株式会社 | サンドブラストレジストインキ |
NL1004603C2 (nl) * | 1996-11-22 | 1998-05-27 | Michael Van Gerwen | Werkwijze voor het vormen van een afbeelding op een door zandstralen te bewerken drager en een aldus verkregen drager voorzien van een foto. |
FR2770434A1 (fr) * | 1997-11-05 | 1999-05-07 | Jean Michel Hostein | Procede de gravure a l'aide d'un masque de sablage - masque obtenu selon le procede |
GB9725102D0 (en) * | 1997-11-28 | 1998-01-28 | Gravutex Limited | Rapid texture prototyping |
US6558496B1 (en) | 1997-11-28 | 2003-05-06 | Eschmann-Stahl Gmbh & Co., Kg | Rapid texture prototyping |
WO1999028535A1 (en) * | 1997-11-28 | 1999-06-10 | Gravutex Eschmann International Limited | Etching methods |
US6140006A (en) * | 1998-06-15 | 2000-10-31 | The Chromaline Corporation | Integral membrane layer formed from a photosensitive layer in an imageable photoresist laminate |
US6248498B1 (en) | 1998-12-08 | 2001-06-19 | The Chromaline Corporation | Photosensitive resin composition |
US6235449B1 (en) | 1999-11-16 | 2001-05-22 | Rayzist Photomask Inc. | Non-stick photoresist laminate |
US7074358B2 (en) | 2001-12-13 | 2006-07-11 | Alexander Sergeievich Gybin | Polymer casting method and apparatus |
US7211656B2 (en) * | 2002-01-30 | 2007-05-01 | Abbott Laboratories | Desaturase genes, enzymes encoded thereby, and uses thereof |
US7964335B2 (en) | 2002-01-30 | 2011-06-21 | Ikonics Corporation | Ink receptive photosensitive laminate |
US20040062896A1 (en) * | 2002-09-26 | 2004-04-01 | Picone Terrence F. | Fractionally-releasable bonding layer for use in photo-sensitive laminate films |
EP2558908B1 (de) * | 2010-04-12 | 2015-06-03 | Ikonics Corporation | Fotolackfolie und verfahren für abrasionsätzen und schneiden |
WO2012008686A2 (en) * | 2010-07-15 | 2012-01-19 | Lg Innotek Co., Ltd. | Printing plate and method of manufacturing the same |
JP6742711B2 (ja) * | 2015-10-09 | 2020-08-19 | 株式会社アイセロ | 凹凸表面貼付用フィルムを用いた表面凹凸被処理物への微細パターン転写方法 |
US11707815B2 (en) | 2019-07-09 | 2023-07-25 | General Electric Company | Creating 3D mark on protective coating on metal part using mask and metal part so formed |
DE102019211858A1 (de) * | 2019-08-07 | 2021-02-11 | Audi Ag | Verfahren zum Maskieren von zu mattierenden Oberflächen |
CN112264281A (zh) * | 2020-10-28 | 2021-01-26 | 哈尔滨电机厂有限责任公司 | 一种发电机组加工面喷砂防护方法 |
CN113829242A (zh) * | 2021-09-14 | 2021-12-24 | 杭州之芯半导体有限公司 | 一种晶圆基座表面喷砂加工工艺 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4530896A (en) * | 1970-03-03 | 1985-07-23 | Shipley Company Inc. | Photosensitive laminate |
JPS511550B1 (de) * | 1971-02-20 | 1976-01-19 | ||
JPS5420719A (en) * | 1977-07-15 | 1979-02-16 | Fuji Photo Film Co Ltd | Photosensitive material for image formation and image formation method |
US4272620A (en) * | 1978-08-09 | 1981-06-09 | Agency Of Industrial Science And Technology | Polyvinyl alcohol-styrylpyridinium photosensitive resins and method for manufacture thereof |
US4430416A (en) * | 1980-06-27 | 1984-02-07 | Asahi Kasei Kogyo Kabushiki Kaisha | Transfer element for sandblast carving |
US4444868A (en) * | 1981-08-06 | 1984-04-24 | Agency Of Industrial Science & Technology | Photosensitive composition |
JPS58159530A (ja) * | 1982-03-12 | 1983-09-21 | Nippon Synthetic Chem Ind Co Ltd:The | 画像形成方法 |
JPS58196971A (ja) * | 1982-05-13 | 1983-11-16 | Asahi Chem Ind Co Ltd | サンドブラスト用マスクの製造方法 |
JPS60104939A (ja) * | 1983-11-14 | 1985-06-10 | Asahi Chem Ind Co Ltd | サンドブラスト用マスク転写材 |
JPS60104938A (ja) * | 1982-05-13 | 1985-06-10 | Asahi Chem Ind Co Ltd | 固体表面加工用マスク転写材 |
US4587186A (en) * | 1982-05-13 | 1986-05-06 | Asahi Kasei Kogyo Kabushiki Kaisha | Mask element for selective sandblasting and a method |
JPS61160748A (ja) * | 1985-01-10 | 1986-07-21 | Asahi Chem Ind Co Ltd | 感光性樹脂版の製版方法 |
US4764449A (en) * | 1985-11-01 | 1988-08-16 | The Chromaline Corporation | Adherent sandblast photoresist laminate |
JPH07113773B2 (ja) * | 1986-07-04 | 1995-12-06 | 株式会社日立製作所 | パタ−ン形成方法 |
JP2618719B2 (ja) * | 1989-10-11 | 1997-06-11 | 富士写真フイルム株式会社 | 画像形成材料 |
US5057394A (en) * | 1989-11-01 | 1991-10-15 | Sanyo-Kokusaku Pulp Co., Ltd. | Method of forming an image |
-
1990
- 1990-10-22 ES ES90915189T patent/ES2149754T3/es not_active Expired - Lifetime
- 1990-10-22 DE DE69033623T patent/DE69033623T2/de not_active Expired - Lifetime
- 1990-10-22 AT AT90915189T patent/ATE196200T1/de not_active IP Right Cessation
- 1990-10-22 WO PCT/JP1990/001360 patent/WO1992007303A1/ja active IP Right Grant
- 1990-10-22 EP EP90915189A patent/EP0506959B1/de not_active Expired - Lifetime
-
1991
- 1991-04-30 CA CA002041521A patent/CA2041521C/en not_active Expired - Lifetime
-
1993
- 1993-09-03 US US08116277 patent/US5427890B1/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
ES2149754T3 (es) | 2000-11-16 |
DE69033623D1 (de) | 2000-10-12 |
EP0506959A1 (de) | 1992-10-07 |
CA2041521C (en) | 1998-10-27 |
EP0506959B1 (de) | 2000-09-06 |
EP0506959A4 (en) | 1993-03-31 |
US5427890A (en) | 1995-06-27 |
WO1992007303A1 (en) | 1992-04-30 |
DE69033623T2 (de) | 2001-05-23 |
US5427890B1 (en) | 2000-02-01 |
CA2041521A1 (en) | 1992-04-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
UEP | Publication of translation of european patent specification | ||
EELA | Cancelled due to lapse of time |