ES2149754T3 - Metodo de grabado con mascara portadora de imagen y pelicula estratificada fotosensible para dicha mascara portadora de imagen. - Google Patents
Metodo de grabado con mascara portadora de imagen y pelicula estratificada fotosensible para dicha mascara portadora de imagen.Info
- Publication number
- ES2149754T3 ES2149754T3 ES90915189T ES90915189T ES2149754T3 ES 2149754 T3 ES2149754 T3 ES 2149754T3 ES 90915189 T ES90915189 T ES 90915189T ES 90915189 T ES90915189 T ES 90915189T ES 2149754 T3 ES2149754 T3 ES 2149754T3
- Authority
- ES
- Spain
- Prior art keywords
- image mask
- image carrier
- image
- laminate film
- carrier mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
- B24C1/00—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods
- B24C1/04—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods for treating only selected parts of a surface, e.g. for carving stone or glass
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
- G03F7/346—Imagewise removal by selective transfer, e.g. peeling away using photosensitive materials other than non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/11—Vinyl alcohol polymer or derivative
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Laminated Bodies (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Printing Plates And Materials Therefor (AREA)
Abstract
METODO DE GRABADO CON FILTRO DE IMAGEN Y PELICULA LAMINAR FOTOSENSIBLE PARA DICHO FILTRO DE IMAGEN. UNA PELICULA LAMINAR FOTOSENSIBLE (10) QUE COMPRENDE UNA LAMINA DE SOPORTE (11), UNA CAPA DE SUJECION DEL FILTRO DE IMAGEN (12) PEGADA A LA LAMINA DE SOPORTE Y UNA CAPA DE COMPOSICION DE RESINA SOLUBLE AL AGUA (13) DISPUESTA EN LA CAPA DE SUJECION DEL FILTRO DE IMAGEN (12), SIENDO DICHA CAPA (13) RETICULABLE POR LA LUZ. UN METODO DE GRABADO QUE COMPRENDE LAS FASES DE (A) IRRADIACION DE LA PELICULA LAMINAR CON LUZ DE DECORACION PARA FORMAR EN LA MISMA UN AREA RETICULABLE CORRESPONDIENTE AL MODELO DE LA CAPA DE COMPOSICION DE RESINA (13), (B) TRATAMIENTO DE LA CAPA DE COMPOSICION DE RESINA RESULTANTE (13) CON AGUA PARA DISOLVER UN AREA NO RETICULABLE Y DESARROLLAR UN FILTRO DE IMAGEN QUE COMPRENDA EL AREA RETICULABLE QUE PERMANECE EN LA CAPA DE SUJECION DEL FILTRO DE IMAGEN (12), (C) PEGADO DE FORMA QUE SE PUEDE DESPRENDER A UN MATERIAL PARA TRABAJAR LA PELICULA LAMINAR FOTOSENSIBLE (10) HABIENDO FORMADO EL FILTRO DE IMAGEN EN LA MISMA, (D) DESPRENDIMIENTO DE LA LAMINA DE SOPORTE (11) DE LA PELICULA LAMINAR (10) Y (E) GRABADO DEL FILTRO DE IMAGEN Y A CONTINUACION EL MATERIAL A TRAVES DEL FILTRO DE IMAGEN. LA CONSTITUCION ANTERIOR HACE POSIBLE CREAR UNA IMAGEN FINA, ELABORADA EN LA SUPERFICIE DE UN MATERIAL A TRABAJAR, COMO CRISTAL, METAL O PLASTICO.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP1990/001360 WO1992007303A1 (en) | 1990-10-22 | 1990-10-22 | Method of engraving with image mask and photosensitive laminate film for said image mask |
Publications (1)
Publication Number | Publication Date |
---|---|
ES2149754T3 true ES2149754T3 (es) | 2000-11-16 |
Family
ID=13986771
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES90915189T Expired - Lifetime ES2149754T3 (es) | 1990-10-22 | 1990-10-22 | Metodo de grabado con mascara portadora de imagen y pelicula estratificada fotosensible para dicha mascara portadora de imagen. |
Country Status (7)
Country | Link |
---|---|
US (1) | US5427890B1 (es) |
EP (1) | EP0506959B1 (es) |
AT (1) | ATE196200T1 (es) |
CA (1) | CA2041521C (es) |
DE (1) | DE69033623T2 (es) |
ES (1) | ES2149754T3 (es) |
WO (1) | WO1992007303A1 (es) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5629132B1 (en) * | 1991-03-28 | 2000-02-08 | Aicello Chemical | Method for engraving and/or etching with image-carrying mask and photo-sensitive laminate film for use in making the mask |
JP2901129B2 (ja) * | 1994-03-14 | 1999-06-07 | アイセロ化学株式会社 | サンドブラストレジストインキ |
NL1004603C2 (nl) * | 1996-11-22 | 1998-05-27 | Michael Van Gerwen | Werkwijze voor het vormen van een afbeelding op een door zandstralen te bewerken drager en een aldus verkregen drager voorzien van een foto. |
FR2770434A1 (fr) * | 1997-11-05 | 1999-05-07 | Jean Michel Hostein | Procede de gravure a l'aide d'un masque de sablage - masque obtenu selon le procede |
WO1999028535A1 (en) * | 1997-11-28 | 1999-06-10 | Gravutex Eschmann International Limited | Etching methods |
GB9725102D0 (en) * | 1997-11-28 | 1998-01-28 | Gravutex Limited | Rapid texture prototyping |
US6558496B1 (en) | 1997-11-28 | 2003-05-06 | Eschmann-Stahl Gmbh & Co., Kg | Rapid texture prototyping |
US6140006A (en) * | 1998-06-15 | 2000-10-31 | The Chromaline Corporation | Integral membrane layer formed from a photosensitive layer in an imageable photoresist laminate |
US6248498B1 (en) | 1998-12-08 | 2001-06-19 | The Chromaline Corporation | Photosensitive resin composition |
US6235449B1 (en) | 1999-11-16 | 2001-05-22 | Rayzist Photomask Inc. | Non-stick photoresist laminate |
US7074358B2 (en) | 2001-12-13 | 2006-07-11 | Alexander Sergeievich Gybin | Polymer casting method and apparatus |
US7211656B2 (en) * | 2002-01-30 | 2007-05-01 | Abbott Laboratories | Desaturase genes, enzymes encoded thereby, and uses thereof |
US7964335B2 (en) | 2002-01-30 | 2011-06-21 | Ikonics Corporation | Ink receptive photosensitive laminate |
US20040062896A1 (en) * | 2002-09-26 | 2004-04-01 | Picone Terrence F. | Fractionally-releasable bonding layer for use in photo-sensitive laminate films |
SG184460A1 (en) * | 2010-04-12 | 2012-11-29 | Ikonics Corp | Photoresist film and methods for abrasive etching and cutting |
WO2012008686A2 (en) * | 2010-07-15 | 2012-01-19 | Lg Innotek Co., Ltd. | Printing plate and method of manufacturing the same |
JP6742711B2 (ja) * | 2015-10-09 | 2020-08-19 | 株式会社アイセロ | 凹凸表面貼付用フィルムを用いた表面凹凸被処理物への微細パターン転写方法 |
US11707815B2 (en) * | 2019-07-09 | 2023-07-25 | General Electric Company | Creating 3D mark on protective coating on metal part using mask and metal part so formed |
DE102019211858A1 (de) * | 2019-08-07 | 2021-02-11 | Audi Ag | Verfahren zum Maskieren von zu mattierenden Oberflächen |
CN112264281A (zh) * | 2020-10-28 | 2021-01-26 | 哈尔滨电机厂有限责任公司 | 一种发电机组加工面喷砂防护方法 |
CN113829242A (zh) * | 2021-09-14 | 2021-12-24 | 杭州之芯半导体有限公司 | 一种晶圆基座表面喷砂加工工艺 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4530896A (en) * | 1970-03-03 | 1985-07-23 | Shipley Company Inc. | Photosensitive laminate |
JPS511550B1 (es) * | 1971-02-20 | 1976-01-19 | ||
JPS5420719A (en) * | 1977-07-15 | 1979-02-16 | Fuji Photo Film Co Ltd | Photosensitive material for image formation and image formation method |
US4272620A (en) * | 1978-08-09 | 1981-06-09 | Agency Of Industrial Science And Technology | Polyvinyl alcohol-styrylpyridinium photosensitive resins and method for manufacture thereof |
US4430416A (en) * | 1980-06-27 | 1984-02-07 | Asahi Kasei Kogyo Kabushiki Kaisha | Transfer element for sandblast carving |
US4444868A (en) * | 1981-08-06 | 1984-04-24 | Agency Of Industrial Science & Technology | Photosensitive composition |
JPS58159530A (ja) * | 1982-03-12 | 1983-09-21 | Nippon Synthetic Chem Ind Co Ltd:The | 画像形成方法 |
JPS60104939A (ja) * | 1983-11-14 | 1985-06-10 | Asahi Chem Ind Co Ltd | サンドブラスト用マスク転写材 |
JPS60104938A (ja) * | 1982-05-13 | 1985-06-10 | Asahi Chem Ind Co Ltd | 固体表面加工用マスク転写材 |
JPS58196971A (ja) * | 1982-05-13 | 1983-11-16 | Asahi Chem Ind Co Ltd | サンドブラスト用マスクの製造方法 |
US4587186A (en) * | 1982-05-13 | 1986-05-06 | Asahi Kasei Kogyo Kabushiki Kaisha | Mask element for selective sandblasting and a method |
JPS61160748A (ja) * | 1985-01-10 | 1986-07-21 | Asahi Chem Ind Co Ltd | 感光性樹脂版の製版方法 |
US4764449A (en) * | 1985-11-01 | 1988-08-16 | The Chromaline Corporation | Adherent sandblast photoresist laminate |
JPH07113773B2 (ja) * | 1986-07-04 | 1995-12-06 | 株式会社日立製作所 | パタ−ン形成方法 |
JP2618719B2 (ja) * | 1989-10-11 | 1997-06-11 | 富士写真フイルム株式会社 | 画像形成材料 |
US5057394A (en) * | 1989-11-01 | 1991-10-15 | Sanyo-Kokusaku Pulp Co., Ltd. | Method of forming an image |
-
1990
- 1990-10-22 DE DE69033623T patent/DE69033623T2/de not_active Expired - Lifetime
- 1990-10-22 AT AT90915189T patent/ATE196200T1/de not_active IP Right Cessation
- 1990-10-22 ES ES90915189T patent/ES2149754T3/es not_active Expired - Lifetime
- 1990-10-22 EP EP90915189A patent/EP0506959B1/en not_active Expired - Lifetime
- 1990-10-22 WO PCT/JP1990/001360 patent/WO1992007303A1/ja active IP Right Grant
-
1991
- 1991-04-30 CA CA002041521A patent/CA2041521C/en not_active Expired - Lifetime
-
1993
- 1993-09-03 US US08116277 patent/US5427890B1/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US5427890A (en) | 1995-06-27 |
WO1992007303A1 (en) | 1992-04-30 |
DE69033623D1 (de) | 2000-10-12 |
CA2041521A1 (en) | 1992-04-23 |
ATE196200T1 (de) | 2000-09-15 |
EP0506959A1 (en) | 1992-10-07 |
EP0506959B1 (en) | 2000-09-06 |
US5427890B1 (en) | 2000-02-01 |
CA2041521C (en) | 1998-10-27 |
DE69033623T2 (de) | 2001-05-23 |
EP0506959A4 (en) | 1993-03-31 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
ES2149754T3 (es) | Metodo de grabado con mascara portadora de imagen y pelicula estratificada fotosensible para dicha mascara portadora de imagen. | |
CN107278278B (zh) | 通过用uv-led多次曝光制造柔版印刷版的方法 | |
ATE168791T1 (de) | Methode zur herstellung eines lithographischen musters in einem verfahren zur herstellung von halbleitervorrichtungen | |
DE59209004D1 (de) | Verfahren zur Herstellung eines walzenförmigen Prägewerkzeugs | |
DE59209953D1 (de) | Verfahren zur Herstellung einer Siebdruckschablone | |
DE50200222D1 (de) | Verfahren zur Herstellung einer Prägewalze aus Silikonkautschuk zum kontinuierlichen Prägen der Oberfläche einer thermoplastischen Folie | |
MX165505B (es) | Mejoras en metodo para crear un diseño en relieve en un substrato duro y liso, y aparato para ser usado en el metodo | |
FR2224287A2 (en) | Vinyl-asbestos or asphalt floor tiles - with clear, photopolymerised abrasion and scratch-resistant coating | |
ES2123304T3 (es) | Metodo y aparato para la produccion de una plantilla de impresion. | |
JPS6433543A (en) | Pattern forming method | |
US4286051A (en) | Methods of engraving workpiece surfaces by etching | |
ATE221466T1 (de) | Vorläufige fiche, vorrichtung und verfahren zum herstellen von dokumenten mit wechselende aufschriften | |
US5185225A (en) | Letterpress for transferring and method of transferring by use of the letterpress for transferring | |
NL7504118A (nl) | Werkwijze voor het aanbrengen van naast elkaar liggende, dicht aan elkaar aansluitende, ver- schillende lagen op een transparante onderlaag. | |
JP2740205B2 (ja) | パターン形成方法 | |
JPS6049437B2 (ja) | 蝕刻による図柄作成方法 | |
ATE176059T1 (de) | Verfahren zur herstellung von siebdruckplatten und einrichtung dafür | |
KR950009364A (ko) | 패널 노광방법 및 장치 | |
JPS56121787A (en) | Engraving method for seal | |
JPH01134361A (ja) | フォトマスク | |
JPS6421478A (en) | Curved surface hologram | |
JPS58175632A (ja) | 立体物への彫加工方法 | |
JPS5744150A (en) | Photomask | |
JPS57112745A (en) | Formation of image | |
ITMI911815A0 (it) | Composizione polimerica fotosensibile, particolarmente fotoemulsione, adatta alla realizzazione di quadri piani per stampa serigrafica mediante incisione a raggi laser. |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
FG2A | Definitive protection |
Ref document number: 506959 Country of ref document: ES |