JPS6433543A - Pattern forming method - Google Patents

Pattern forming method

Info

Publication number
JPS6433543A
JPS6433543A JP62141678A JP14167887A JPS6433543A JP S6433543 A JPS6433543 A JP S6433543A JP 62141678 A JP62141678 A JP 62141678A JP 14167887 A JP14167887 A JP 14167887A JP S6433543 A JPS6433543 A JP S6433543A
Authority
JP
Japan
Prior art keywords
light
photosensitive resin
around
solvent
apply
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62141678A
Other languages
Japanese (ja)
Other versions
JPH0697341B2 (en
Inventor
Masataka Endo
Masaru Sasako
Kazufumi Ogawa
Yoshiyuki Tani
Hideo Tomioka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP62141678A priority Critical patent/JPH0697341B2/en
Publication of JPS6433543A publication Critical patent/JPS6433543A/en
Publication of JPH0697341B2 publication Critical patent/JPH0697341B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To form a resist pattern with high contrast, high resolution, and high accuracy, by applying photosensitive resin and a specific material on a substrate, exposing it, and developing the photosensitive resin at the same time of removing those materials. CONSTITUTION:The titled method includes a process to apply the photosensitive resin 2 on the substrate 1, a process to apply a polymer soluble a water group solvent and hard to be absorbed by a beam of light of around 249nm, a light reaction reagent which generates reaction by the beam of light of around 249nm, and a material which includes the solvent to dissolve both the polymer and the light reaction reagent and soluble entirely by a water group solvent in spite of the existence of photoirradiation, a process to expose the beam of light of around 249nm selectively, and a process to remove the material 3 and simultaneously develop the photosensitive resin 2. In such a way, it shows a contrast enhanced effect for far ultraviolet radiation, especially, 249nm excimer laser light 4.
JP62141678A 1986-06-06 1987-06-05 Pattern formation method Expired - Fee Related JPH0697341B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62141678A JPH0697341B2 (en) 1986-06-06 1987-06-05 Pattern formation method

Applications Claiming Priority (11)

Application Number Priority Date Filing Date Title
JP13227186 1986-06-06
JP61-132314 1987-04-10
JP61-312038 1987-04-10
JP62-89445 1987-04-10
JP62-89452 1987-04-10
JP62-89451 1987-04-10
JP61-132271 1987-04-10
JP62-89453 1987-04-10
JP61-187133 1987-04-10
JP62-89447 1987-04-10
JP62141678A JPH0697341B2 (en) 1986-06-06 1987-06-05 Pattern formation method

Publications (2)

Publication Number Publication Date
JPS6433543A true JPS6433543A (en) 1989-02-03
JPH0697341B2 JPH0697341B2 (en) 1994-11-30

Family

ID=26466897

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62141678A Expired - Fee Related JPH0697341B2 (en) 1986-06-06 1987-06-05 Pattern formation method

Country Status (1)

Country Link
JP (1) JPH0697341B2 (en)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01124849A (en) * 1986-08-08 1989-05-17 Matsushita Electric Ind Co Ltd Pattern forming method
JPH01152451A (en) * 1987-12-08 1989-06-14 Matsushita Electric Ind Co Ltd Photosensitive material and process for forming pattern by using the photosensitive material
JPH02101462A (en) * 1988-10-11 1990-04-13 Matsushita Electric Ind Co Ltd Pattern forming material
JPH02210355A (en) * 1988-10-28 1990-08-21 Matsushita Electric Ind Co Ltd Pattern forming method
US5260108A (en) * 1992-03-10 1993-11-09 International Business Machines Corporation Selective seeding of Pd by excimer laser radiation through the liquid
US5272036A (en) * 1988-10-28 1993-12-21 Matsushita Electronic Industrial Co., Ltd. Pattern forming contrast enhanced material utilizing water soluble photosensitive diazo compound and pattern forming method
JPH0657376A (en) * 1992-08-11 1994-03-01 Kobe Steel Ltd High strength hot-rolled steel plate good in workability and having 730n/mm2 or higher strength and its production
JP2010230995A (en) * 2009-03-27 2010-10-14 Sumitomo Chemical Co Ltd Photosensitive composition for optical decoloring layer
US8080364B2 (en) 2003-05-09 2011-12-20 Panasonic Corporation Pattern formation method
JP2012030579A (en) * 2010-06-28 2012-02-16 Canon Inc Method for producing structure and method for producing liquid discharge head
WO2012091089A1 (en) * 2010-12-28 2012-07-05 日産化学工業株式会社 Coating solution for forming functional polymer film, and method for forming functional polymer film

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6184644A (en) * 1984-09-04 1986-04-30 マイクロサイ，インコーポレイテッド Photoengraving and combination containing barrier layer
JPS61122644A (en) * 1984-11-19 1986-06-10 Yokogawa Hewlett Packard Ltd Photolithographic method
JPS6329753A (en) * 1986-07-23 1988-02-08 Japan Synthetic Rubber Co Ltd Method for storing radiation sensitive resin composition
JPS6336235A (en) * 1986-07-31 1988-02-16 Japan Synthetic Rubber Co Ltd Radiation sensitive composition

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6184644A (en) * 1984-09-04 1986-04-30 マイクロサイ，インコーポレイテッド Photoengraving and combination containing barrier layer
JPS61122644A (en) * 1984-11-19 1986-06-10 Yokogawa Hewlett Packard Ltd Photolithographic method
JPS6329753A (en) * 1986-07-23 1988-02-08 Japan Synthetic Rubber Co Ltd Method for storing radiation sensitive resin composition
JPS6336235A (en) * 1986-07-31 1988-02-16 Japan Synthetic Rubber Co Ltd Radiation sensitive composition

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01124849A (en) * 1986-08-08 1989-05-17 Matsushita Electric Ind Co Ltd Pattern forming method
JPH01152451A (en) * 1987-12-08 1989-06-14 Matsushita Electric Ind Co Ltd Photosensitive material and process for forming pattern by using the photosensitive material
JPH02101462A (en) * 1988-10-11 1990-04-13 Matsushita Electric Ind Co Ltd Pattern forming material
JPH02210355A (en) * 1988-10-28 1990-08-21 Matsushita Electric Ind Co Ltd Pattern forming method
US5272036A (en) * 1988-10-28 1993-12-21 Matsushita Electronic Industrial Co., Ltd. Pattern forming contrast enhanced material utilizing water soluble photosensitive diazo compound and pattern forming method
US5260108A (en) * 1992-03-10 1993-11-09 International Business Machines Corporation Selective seeding of Pd by excimer laser radiation through the liquid
JPH0657376A (en) * 1992-08-11 1994-03-01 Kobe Steel Ltd High strength hot-rolled steel plate good in workability and having 730n/mm2 or higher strength and its production
US8080364B2 (en) 2003-05-09 2011-12-20 Panasonic Corporation Pattern formation method
JP2010230995A (en) * 2009-03-27 2010-10-14 Sumitomo Chemical Co Ltd Photosensitive composition for optical decoloring layer
JP2012030579A (en) * 2010-06-28 2012-02-16 Canon Inc Method for producing structure and method for producing liquid discharge head
WO2012091089A1 (en) * 2010-12-28 2012-07-05 日産化学工業株式会社 Coating solution for forming functional polymer film, and method for forming functional polymer film
JP5896164B2 (en) * 2010-12-28 2016-03-30 日産化学工業株式会社 Functional polymer film forming coating solution and functional polymer film forming method

Also Published As

Publication number Publication date
JPH0697341B2 (en) 1994-11-30

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees