BRPI0407536A - processo para produção de uma placa de impressão revelável em água para uso na impressão em relevo - Google Patents
processo para produção de uma placa de impressão revelável em água para uso na impressão em relevoInfo
- Publication number
- BRPI0407536A BRPI0407536A BRPI0407536-6A BRPI0407536A BRPI0407536A BR PI0407536 A BRPI0407536 A BR PI0407536A BR PI0407536 A BRPI0407536 A BR PI0407536A BR PI0407536 A BRPI0407536 A BR PI0407536A
- Authority
- BR
- Brazil
- Prior art keywords
- producing
- water
- printing plate
- embossing
- exposure
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
- G03F7/2024—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure of the already developed image
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
Abstract
"PROCESSO PARA PRODUçãO DE UMA PLACA DE IMPRESSãO REVELáVEL EM áGUA PARA USO NA IMPRESSãO EM RELEVO". A invenção refere-se a um processo para produção de uma placa de impressão revelável em água para impressão em relevo, compreendendo prover uma placa sólida feita de uma composição de resina fotosensitiva compreendendo pelo menos (a) uma resina hidrófila, (b) uma resina hidrófoba, (c) um composto insaturado fotopolimerizável e (d) um iniciador de fotopolimerização e sujeitar a placa sólida a pelo menos às etapas de exposição a raios actínicos, revelação e pós-exposição. No processo, a etapa de pós-exposição é realizada em uma atmosfera de baixa concentração de oxigênio.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003041650 | 2003-02-19 | ||
PCT/JP2004/001681 WO2004074942A1 (ja) | 2003-02-19 | 2004-02-17 | 凸版印刷用水現像性印刷版の製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
BRPI0407536A true BRPI0407536A (pt) | 2006-02-14 |
Family
ID=32905294
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BRPI0407536-6A BRPI0407536A (pt) | 2003-02-19 | 2004-02-17 | processo para produção de uma placa de impressão revelável em água para uso na impressão em relevo |
Country Status (10)
Country | Link |
---|---|
US (1) | US20060144272A1 (pt) |
EP (1) | EP1596253A4 (pt) |
JP (1) | JP3933675B2 (pt) |
KR (1) | KR100725570B1 (pt) |
CN (1) | CN100529971C (pt) |
AU (1) | AU2004214123B2 (pt) |
BR (1) | BRPI0407536A (pt) |
CA (1) | CA2516495A1 (pt) |
MX (1) | MXPA05008777A (pt) |
WO (1) | WO2004074942A1 (pt) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8445180B2 (en) * | 2003-12-26 | 2013-05-21 | Asahi Kasei Chemicals Corporation | Water-developable photopolymer plate for letterpress printing |
JP2007087786A (ja) * | 2005-09-22 | 2007-04-05 | Toppan Printing Co Ltd | 有機エレクトロルミネッセンスインキ及びこれを用いた有機エレクトロルミネッセンス素子の製造方法 |
CN101192004B (zh) * | 2006-11-27 | 2010-05-12 | 乐凯集团第二胶片厂 | 适合于uv-ctp的阴图感光组成物和用其制作的平印版及平印版制作方法 |
JP2008216949A (ja) * | 2007-02-06 | 2008-09-18 | Toppan Printing Co Ltd | 感光性樹脂版用露光装置、および有機el素子の製造方法 |
US8236479B2 (en) * | 2008-01-23 | 2012-08-07 | E I Du Pont De Nemours And Company | Method for printing a pattern on a substrate |
US8241835B2 (en) | 2008-01-30 | 2012-08-14 | E I Du Pont De Nemours And Company | Device and method for preparing relief printing form |
US20090191482A1 (en) * | 2008-01-30 | 2009-07-30 | E.I. Du Pont De Nemours And Company | Device and method for preparing relief printing form |
JP5778141B2 (ja) | 2009-07-02 | 2015-09-16 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニーE.I.Du Pont De Nemours And Company | 基板上に材料を印刷するための方法 |
CN102540709B (zh) * | 2010-12-30 | 2014-05-07 | 乐凯华光印刷科技有限公司 | 红外线敏感的免化学处理感光组成物和用其制作的平印版 |
EP2748678B1 (en) | 2011-08-26 | 2018-07-04 | E. I. du Pont de Nemours and Company | Method for preparing a relief printing form |
US9097974B2 (en) | 2012-08-23 | 2015-08-04 | E I Du Pont De Nemours And Company | Method for preparing a relief printing form |
TWI680358B (zh) * | 2014-10-31 | 2019-12-21 | 日商東京應化工業股份有限公司 | 光阻圖型形成裝置及光阻圖型形成方法 |
EP3432070A4 (en) * | 2016-03-16 | 2019-09-25 | Toyobo Co., Ltd. | PHOTOSENSITIVE RESIN COMPOSITION FOR FLEXOGRAPHIC PRINTING FOR WATER DEVELOPMENT, AND ORIGINAL PLATE OF PHOTOSENSITIVE RESIN FOR FLEXOGRAPHIC PRINTING OBTAINED BY USING THE SAME |
US11656551B2 (en) * | 2017-09-05 | 2023-05-23 | Toyobo Co., Ltd. | Water-developable photosensitive resin composition for flexographic printing and photosensitive resin original plate for flexographic printing obtained therefrom |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5248845B2 (pt) * | 1973-12-25 | 1977-12-13 | ||
JPS585798B2 (ja) * | 1977-06-30 | 1983-02-01 | 富士写真フイルム株式会社 | 平版印刷版用不感脂化液およびそれを用いる平版印刷版の製造方法 |
JPS5897043A (ja) | 1981-12-04 | 1983-06-09 | Teijin Ltd | 液中後露光法 |
JPS60191237A (ja) * | 1984-03-13 | 1985-09-28 | Asahi Chem Ind Co Ltd | 露光硬化後非粘着性感光性樹脂組成物 |
US4806506A (en) * | 1987-09-14 | 1989-02-21 | E. I. Du Pont De Nemours And Company | Process for detackifying photopolymer flexographic printing plates |
JP2940037B2 (ja) * | 1989-12-25 | 1999-08-25 | 東洋紡績株式会社 | 感光性樹脂印刷原版および印刷版 |
GB2235927B (en) * | 1989-09-14 | 1992-10-21 | Asahi Chemical Ind | A sulfonic acid group-containing polyurethane and a photosensitive resin composition containing the same |
US5348844A (en) * | 1990-12-03 | 1994-09-20 | Napp Systems, Inc. | Photosensitive polymeric printing medium and water developable printing plates |
US5798019A (en) * | 1995-09-29 | 1998-08-25 | E. I. Du Pont De Nemours And Company | Methods and apparatus for forming cylindrical photosensitive elements |
EP0791859B1 (en) * | 1996-02-20 | 2001-05-30 | Asahi Kasei Kabushiki Kaisha | Process for producing photosensitive resin printing plate |
JP2656767B2 (ja) * | 1996-03-08 | 1997-09-24 | 旭化成工業株式会社 | 印刷版の製造方法およびこの方法で得られた印刷版 |
JPH1078657A (ja) * | 1996-09-03 | 1998-03-24 | Toyobo Co Ltd | 感光性樹脂組成物 |
JPH1090892A (ja) * | 1996-09-13 | 1998-04-10 | Toyobo Co Ltd | 感光性樹脂組成物 |
JP2001337445A (ja) * | 2000-05-29 | 2001-12-07 | Toyobo Co Ltd | フレキソ印刷用水現像型感光性原版用感光性樹脂組成物、フレキソ印刷用水現像型感光性原版およびフレキソ印刷版 |
WO2002044813A1 (fr) * | 2000-11-28 | 2002-06-06 | Asahi Kasei Kabushiki Kaisha | Type amélioré de résine photosensible flexographique développable à l'eau |
-
2004
- 2004-02-17 BR BRPI0407536-6A patent/BRPI0407536A/pt not_active IP Right Cessation
- 2004-02-17 EP EP04711697A patent/EP1596253A4/en not_active Withdrawn
- 2004-02-17 CN CNB2004800046404A patent/CN100529971C/zh not_active Expired - Fee Related
- 2004-02-17 KR KR1020057015162A patent/KR100725570B1/ko not_active IP Right Cessation
- 2004-02-17 AU AU2004214123A patent/AU2004214123B2/en not_active Ceased
- 2004-02-17 MX MXPA05008777A patent/MXPA05008777A/es active IP Right Grant
- 2004-02-17 CA CA002516495A patent/CA2516495A1/en not_active Abandoned
- 2004-02-17 WO PCT/JP2004/001681 patent/WO2004074942A1/ja active IP Right Grant
- 2004-02-17 US US10/546,589 patent/US20060144272A1/en not_active Abandoned
- 2004-02-17 JP JP2005502700A patent/JP3933675B2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
MXPA05008777A (es) | 2005-10-18 |
JP3933675B2 (ja) | 2007-06-20 |
KR100725570B1 (ko) | 2007-06-08 |
AU2004214123B2 (en) | 2007-06-28 |
CN1751274A (zh) | 2006-03-22 |
EP1596253A4 (en) | 2010-02-03 |
JPWO2004074942A1 (ja) | 2006-06-01 |
WO2004074942A1 (ja) | 2004-09-02 |
KR20050113607A (ko) | 2005-12-02 |
EP1596253A1 (en) | 2005-11-16 |
AU2004214123A1 (en) | 2004-09-02 |
CA2516495A1 (en) | 2004-09-02 |
CN100529971C (zh) | 2009-08-19 |
US20060144272A1 (en) | 2006-07-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
B08L | Patent application lapsed because of non payment of annual fee [chapter 8.12 patent gazette] |
Free format text: REFERENTE AO NAO RECOLHIMENTO DAS 9A E 10A ANUIDADES. |
|
B08I | Application fees: publication cancelled [chapter 8.9 patent gazette] |
Free format text: ANULADA A PUBLICACAO CODIGO 8.12 NA RPI NO 2257 DE 08/04/2014 POR TER SIDO INDEVIDA. |
|
B08F | Application fees: application dismissed [chapter 8.6 patent gazette] |
Free format text: REFERENTE AS 9A, 10A, 11A, 12A, 13A, 14A, 15A E 16A ANUIDADES. |
|
B08K | Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette] |
Free format text: EM VIRTUDE DO ARQUIVAMENTO PUBLICADO NA RPI 2602 DE 17-11-2020 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDO O ARQUIVAMENTO DO PEDIDO DE PATENTE, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013. |