DE60034515D1 - Flachdruckplattenvorläufer und Verfahren zur Herstellung einer Flachdruckplatte - Google Patents
Flachdruckplattenvorläufer und Verfahren zur Herstellung einer FlachdruckplatteInfo
- Publication number
- DE60034515D1 DE60034515D1 DE60034515T DE60034515T DE60034515D1 DE 60034515 D1 DE60034515 D1 DE 60034515D1 DE 60034515 T DE60034515 T DE 60034515T DE 60034515 T DE60034515 T DE 60034515T DE 60034515 D1 DE60034515 D1 DE 60034515D1
- Authority
- DE
- Germany
- Prior art keywords
- printing plate
- planographic printing
- making
- plate precursor
- transmittance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000002243 precursor Substances 0.000 title abstract 2
- 238000004519 manufacturing process Methods 0.000 title 1
- -1 titanocene compound Chemical class 0.000 abstract 2
- 238000002834 transmittance Methods 0.000 abstract 2
- 150000001875 compounds Chemical class 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 230000003287 optical effect Effects 0.000 abstract 1
- 239000000049 pigment Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Polymerisation Methods In General (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20982299 | 1999-07-23 | ||
JP11209822A JP2001033961A (ja) | 1999-07-23 | 1999-07-23 | 感光性組成物および平版印刷版の製版方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60034515D1 true DE60034515D1 (de) | 2007-06-06 |
DE60034515T2 DE60034515T2 (de) | 2007-12-27 |
Family
ID=16579199
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60034515T Expired - Lifetime DE60034515T2 (de) | 1999-07-23 | 2000-07-21 | Flachdruckplattenvorläufer und Verfahren zur Herstellung einer Flachdruckplatte |
Country Status (5)
Country | Link |
---|---|
US (1) | US6423471B1 (de) |
EP (1) | EP1070990B1 (de) |
JP (1) | JP2001033961A (de) |
AT (1) | ATE360838T1 (de) |
DE (1) | DE60034515T2 (de) |
Families Citing this family (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6706462B2 (en) * | 2000-04-18 | 2004-03-16 | Fuji Photo Film Co., Ltd. | Photosensitive image-recording material |
US6806031B2 (en) * | 2000-05-15 | 2004-10-19 | Fuji Photo Film Co., Ltd. | Support for lithographic printing plate and presensitized plate |
US6686126B2 (en) | 2000-07-14 | 2004-02-03 | Fuji Photo Film Co., Ltd. | Developing solution for photosensitive lithographic printing plate, plate-making method of lithographic printing plate, and photosensitive lithographic printing plate |
JP2002244290A (ja) * | 2001-02-16 | 2002-08-30 | Mitsubishi Chemicals Corp | 光重合性組成物 |
US6878505B2 (en) | 2001-05-28 | 2005-04-12 | Fuji Photo Film Co., Ltd. | Photosensitive composition |
JP4230130B2 (ja) * | 2001-07-04 | 2009-02-25 | 富士フイルム株式会社 | 感光性平版印刷版用現像液及び平版印刷版の製版方法 |
JP2003021901A (ja) * | 2001-07-05 | 2003-01-24 | Fuji Photo Film Co Ltd | 感光性平版印刷版の光重合方法 |
JP2003098674A (ja) * | 2001-09-21 | 2003-04-04 | Fuji Photo Film Co Ltd | 光重合性平版印刷版 |
US7125467B2 (en) * | 2003-06-30 | 2006-10-24 | Hitachi Global Storage Technologies Netherlands B.V. | Slider processing system utilizing polyvinyl alcohol release layer |
JP2005122113A (ja) * | 2003-08-28 | 2005-05-12 | Fuji Photo Film Co Ltd | 光重合性組成物及び画像記録材料 |
WO2005029187A1 (en) | 2003-09-22 | 2005-03-31 | Agfa-Gevaert | Photopolymerizable composition. |
US20050153239A1 (en) * | 2004-01-09 | 2005-07-14 | Fuji Photo Film Co., Ltd. | Lithographic printing plate precursor and lithographic printing method using the same |
EP1589374B1 (de) * | 2004-02-26 | 2008-10-01 | FUJIFILM Corporation | Polymerisierbare Zusammensetzung und Verfahren zur Herstellung von lithographischen Druckplatten unter Verwendung der polymerisierbaren Zusammensetzung |
US20060001849A1 (en) * | 2004-07-01 | 2006-01-05 | Ray Kevin B | Imaging a violet sensitive printing plate using multiple low power light sources |
US7241557B2 (en) | 2004-07-30 | 2007-07-10 | Agfa Graphics Nv | Photopolymerizable composition |
JP2006213862A (ja) * | 2005-02-04 | 2006-08-17 | Fuji Photo Film Co Ltd | インク組成物、インクジェット記録方法、印刷物、平版印刷版の作製方法及び平版印刷版 |
US20070289468A1 (en) * | 2006-06-14 | 2007-12-20 | Gary Ganghui Teng | On-press imaging lithographic printing press and method |
US20070095232A1 (en) * | 2005-02-14 | 2007-05-03 | Teng Gary G | Lithographic printing press and method for on-press imaging lithographic printing plate |
US20080271627A1 (en) * | 2005-02-14 | 2008-11-06 | Gary Ganghui Teng | Lithographic printing press and method for on-press imaging laser sensitive lithographic plate |
WO2007016109A2 (en) | 2005-07-29 | 2007-02-08 | Anocoil Corporation | Imageable printing plate for on-press development |
JP4815270B2 (ja) * | 2005-08-18 | 2011-11-16 | 富士フイルム株式会社 | 平版印刷版の作製方法及び作製装置 |
EP1757981B1 (de) | 2005-08-26 | 2009-10-14 | Agfa Graphics N.V. | photopolymer Druckplattenvorläufer |
US7348132B2 (en) * | 2006-01-21 | 2008-03-25 | Gary Ganghui Teng | Laser sensitive lithographic printing plate having specific photopolymer composition |
GB0610606D0 (en) | 2006-05-30 | 2006-07-05 | Photocentric Ltd | Process and apparatus |
ATE482083T1 (de) * | 2006-07-25 | 2010-10-15 | Fujifilm Corp | Lithographiedruckplattenvorläufer und verfahren zur herstellung einer lithographiedruckplatte |
US7524615B2 (en) * | 2006-08-14 | 2009-04-28 | Gary Ganghui Teng | Negative laser sensitive lithographic printing plate having specific photosensitive composition |
JP4934386B2 (ja) * | 2006-09-29 | 2012-05-16 | 富士フイルム株式会社 | 光重合型感光性平版印刷版原版 |
US8445176B2 (en) | 2007-05-25 | 2013-05-21 | Agfa Graphics Nv | Lithographic printing plate precursor |
WO2009028324A1 (ja) * | 2007-08-30 | 2009-03-05 | Konica Minolta Medical & Graphic, Inc. | 感光性平版印刷版 |
JP4914864B2 (ja) * | 2008-03-31 | 2012-04-11 | 富士フイルム株式会社 | 平版印刷版の作製方法 |
US20100147173A1 (en) * | 2008-12-15 | 2010-06-17 | Gary Ganghui Teng | On-press development of lithographic plate utilizing plate holder for exposed plate |
US8034538B2 (en) | 2009-02-13 | 2011-10-11 | Eastman Kodak Company | Negative-working imageable elements |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0723167A3 (de) * | 1995-01-17 | 1997-04-02 | Mitsubishi Chem Corp | Photopolymerisierbare Zusammensetzung für Farbfilter |
US5800965A (en) * | 1996-02-29 | 1998-09-01 | Mitsubishi Chemical Corporation | Photopolymerizable composition for a photosensitive lithographic printing plate and photosensitive lithographic printing plate employing it |
JP3651713B2 (ja) | 1996-02-29 | 2005-05-25 | 富士写真フイルム株式会社 | 光重合性組成物 |
JPH10186654A (ja) | 1996-12-26 | 1998-07-14 | Hitachi Chem Co Ltd | 感光性組成物、感光材料、レリーフパターンの製造法及びポリイミドパターンの製造法 |
JP3770436B2 (ja) | 1997-12-15 | 2006-04-26 | 富士写真フイルム株式会社 | 光重合性組成物 |
-
1999
- 1999-07-23 JP JP11209822A patent/JP2001033961A/ja not_active Abandoned
-
2000
- 2000-07-20 US US09/620,990 patent/US6423471B1/en not_active Expired - Fee Related
- 2000-07-21 EP EP00115002A patent/EP1070990B1/de not_active Expired - Lifetime
- 2000-07-21 AT AT00115002T patent/ATE360838T1/de not_active IP Right Cessation
- 2000-07-21 DE DE60034515T patent/DE60034515T2/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JP2001033961A (ja) | 2001-02-09 |
DE60034515T2 (de) | 2007-12-27 |
EP1070990A1 (de) | 2001-01-24 |
ATE360838T1 (de) | 2007-05-15 |
US6423471B1 (en) | 2002-07-23 |
EP1070990B1 (de) | 2007-04-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |