WO2004074942A1 - 凸版印刷用水現像性印刷版の製造方法 - Google Patents
凸版印刷用水現像性印刷版の製造方法 Download PDFInfo
- Publication number
- WO2004074942A1 WO2004074942A1 PCT/JP2004/001681 JP2004001681W WO2004074942A1 WO 2004074942 A1 WO2004074942 A1 WO 2004074942A1 JP 2004001681 W JP2004001681 W JP 2004001681W WO 2004074942 A1 WO2004074942 A1 WO 2004074942A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- resin
- plate
- exposure
- printing
- water
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
- G03F7/2024—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure of the already developed image
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
Abstract
Description
Claims
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005502700A JP3933675B2 (ja) | 2003-02-19 | 2004-02-17 | 凸版印刷用水現像性印刷版の製造方法 |
AU2004214123A AU2004214123B2 (en) | 2003-02-19 | 2004-02-17 | Process for producing water development printing plate for relief printing |
US10/546,589 US20060144272A1 (en) | 2003-02-19 | 2004-02-17 | Process for producing water-development printing plate for relief printing |
MXPA05008777A MXPA05008777A (es) | 2003-02-19 | 2004-02-17 | Proceso para producir placa de impresion revelable con agua para el uso en implesion en relieve. |
BRPI0407536-6A BRPI0407536A (pt) | 2003-02-19 | 2004-02-17 | processo para produção de uma placa de impressão revelável em água para uso na impressão em relevo |
EP04711697A EP1596253A4 (en) | 2003-02-19 | 2004-02-17 | PROCESS FOR PRODUCING A WATER-DEVELOPING PRINTING PLATE FOR HIGH PRINTING |
CA002516495A CA2516495A1 (en) | 2003-02-19 | 2004-02-17 | Process for producing water-developable printing plate for use in relief printing |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003041650 | 2003-02-19 | ||
JP2003-041650 | 2003-02-19 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2004074942A1 true WO2004074942A1 (ja) | 2004-09-02 |
Family
ID=32905294
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2004/001681 WO2004074942A1 (ja) | 2003-02-19 | 2004-02-17 | 凸版印刷用水現像性印刷版の製造方法 |
Country Status (10)
Country | Link |
---|---|
US (1) | US20060144272A1 (ja) |
EP (1) | EP1596253A4 (ja) |
JP (1) | JP3933675B2 (ja) |
KR (1) | KR100725570B1 (ja) |
CN (1) | CN100529971C (ja) |
AU (1) | AU2004214123B2 (ja) |
BR (1) | BRPI0407536A (ja) |
CA (1) | CA2516495A1 (ja) |
MX (1) | MXPA05008777A (ja) |
WO (1) | WO2004074942A1 (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007087786A (ja) * | 2005-09-22 | 2007-04-05 | Toppan Printing Co Ltd | 有機エレクトロルミネッセンスインキ及びこれを用いた有機エレクトロルミネッセンス素子の製造方法 |
US20070160933A1 (en) * | 2003-12-26 | 2007-07-12 | Naoyuki Onoda | Water-developable photopolymer plate for letterpress printing |
JP2008216949A (ja) * | 2007-02-06 | 2008-09-18 | Toppan Printing Co Ltd | 感光性樹脂版用露光装置、および有機el素子の製造方法 |
JP2016091021A (ja) * | 2014-10-31 | 2016-05-23 | 東京応化工業株式会社 | レジストパターン形成装置およびレジストパターン形成方法 |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101192004B (zh) * | 2006-11-27 | 2010-05-12 | 乐凯集团第二胶片厂 | 适合于uv-ctp的阴图感光组成物和用其制作的平印版及平印版制作方法 |
US8236479B2 (en) * | 2008-01-23 | 2012-08-07 | E I Du Pont De Nemours And Company | Method for printing a pattern on a substrate |
US20090191482A1 (en) * | 2008-01-30 | 2009-07-30 | E.I. Du Pont De Nemours And Company | Device and method for preparing relief printing form |
US8241835B2 (en) * | 2008-01-30 | 2012-08-14 | E I Du Pont De Nemours And Company | Device and method for preparing relief printing form |
EP2448764B1 (en) | 2009-07-02 | 2016-03-02 | E. I. du Pont de Nemours and Company | Method for preparing a relief printing form and use thereof in a method for printing a material onto a substrate |
CN102540709B (zh) * | 2010-12-30 | 2014-05-07 | 乐凯华光印刷科技有限公司 | 红外线敏感的免化学处理感光组成物和用其制作的平印版 |
US9069252B2 (en) | 2011-08-26 | 2015-06-30 | E I Du Pont De Nemours And Company | Method for preparing a relief printing form |
US9097974B2 (en) | 2012-08-23 | 2015-08-04 | E I Du Pont De Nemours And Company | Method for preparing a relief printing form |
EP3432070A4 (en) * | 2016-03-16 | 2019-09-25 | Toyobo Co., Ltd. | PHOTOSENSITIVE RESIN COMPOSITION FOR FLEXOGRAPHIC PRINTING FOR WATER DEVELOPMENT, AND ORIGINAL PLATE OF PHOTOSENSITIVE RESIN FOR FLEXOGRAPHIC PRINTING OBTAINED BY USING THE SAME |
WO2019049786A1 (ja) * | 2017-09-05 | 2019-03-14 | 東洋紡株式会社 | 水現像可能なフレキソ印刷用感光性樹脂組成物、及びそれから得られるフレキソ印刷用感光性樹脂原版 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5095001A (ja) * | 1973-12-25 | 1975-07-29 | ||
JPH03196042A (ja) * | 1989-12-25 | 1991-08-27 | Toyobo Co Ltd | 感光性樹脂印刷原版および印刷版 |
JPH08286361A (ja) * | 1996-03-08 | 1996-11-01 | Asahi Chem Ind Co Ltd | 印刷版の製造方法およびこの方法で得られた印刷版 |
JPH1078657A (ja) * | 1996-09-03 | 1998-03-24 | Toyobo Co Ltd | 感光性樹脂組成物 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS585798B2 (ja) * | 1977-06-30 | 1983-02-01 | 富士写真フイルム株式会社 | 平版印刷版用不感脂化液およびそれを用いる平版印刷版の製造方法 |
JPS5897043A (ja) | 1981-12-04 | 1983-06-09 | Teijin Ltd | 液中後露光法 |
JPS60191237A (ja) * | 1984-03-13 | 1985-09-28 | Asahi Chem Ind Co Ltd | 露光硬化後非粘着性感光性樹脂組成物 |
US4806506A (en) * | 1987-09-14 | 1989-02-21 | E. I. Du Pont De Nemours And Company | Process for detackifying photopolymer flexographic printing plates |
GB2235927B (en) * | 1989-09-14 | 1992-10-21 | Asahi Chemical Ind | A sulfonic acid group-containing polyurethane and a photosensitive resin composition containing the same |
US5348844A (en) * | 1990-12-03 | 1994-09-20 | Napp Systems, Inc. | Photosensitive polymeric printing medium and water developable printing plates |
US5798019A (en) * | 1995-09-29 | 1998-08-25 | E. I. Du Pont De Nemours And Company | Methods and apparatus for forming cylindrical photosensitive elements |
DE69704969T2 (de) * | 1996-02-20 | 2002-04-04 | Asahi Chemical Ind | Verfahren zur Herstellung einer photoempfinflichen Kunstoffdruckplatte |
JPH1090892A (ja) * | 1996-09-13 | 1998-04-10 | Toyobo Co Ltd | 感光性樹脂組成物 |
JP2001337445A (ja) * | 2000-05-29 | 2001-12-07 | Toyobo Co Ltd | フレキソ印刷用水現像型感光性原版用感光性樹脂組成物、フレキソ印刷用水現像型感光性原版およびフレキソ印刷版 |
EP1343049B1 (en) * | 2000-11-28 | 2014-11-19 | Asahi Kasei Kabushiki Kaisha | Improved water-developable photosensitive resin for flexography |
-
2004
- 2004-02-17 MX MXPA05008777A patent/MXPA05008777A/es active IP Right Grant
- 2004-02-17 KR KR1020057015162A patent/KR100725570B1/ko not_active IP Right Cessation
- 2004-02-17 EP EP04711697A patent/EP1596253A4/en not_active Withdrawn
- 2004-02-17 CA CA002516495A patent/CA2516495A1/en not_active Abandoned
- 2004-02-17 CN CNB2004800046404A patent/CN100529971C/zh not_active Expired - Fee Related
- 2004-02-17 AU AU2004214123A patent/AU2004214123B2/en not_active Ceased
- 2004-02-17 WO PCT/JP2004/001681 patent/WO2004074942A1/ja active IP Right Grant
- 2004-02-17 BR BRPI0407536-6A patent/BRPI0407536A/pt not_active IP Right Cessation
- 2004-02-17 JP JP2005502700A patent/JP3933675B2/ja not_active Expired - Lifetime
- 2004-02-17 US US10/546,589 patent/US20060144272A1/en not_active Abandoned
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5095001A (ja) * | 1973-12-25 | 1975-07-29 | ||
JPH03196042A (ja) * | 1989-12-25 | 1991-08-27 | Toyobo Co Ltd | 感光性樹脂印刷原版および印刷版 |
JPH08286361A (ja) * | 1996-03-08 | 1996-11-01 | Asahi Chem Ind Co Ltd | 印刷版の製造方法およびこの方法で得られた印刷版 |
JPH1078657A (ja) * | 1996-09-03 | 1998-03-24 | Toyobo Co Ltd | 感光性樹脂組成物 |
Non-Patent Citations (1)
Title |
---|
See also references of EP1596253A4 * |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20070160933A1 (en) * | 2003-12-26 | 2007-07-12 | Naoyuki Onoda | Water-developable photopolymer plate for letterpress printing |
US8445180B2 (en) * | 2003-12-26 | 2013-05-21 | Asahi Kasei Chemicals Corporation | Water-developable photopolymer plate for letterpress printing |
JP2007087786A (ja) * | 2005-09-22 | 2007-04-05 | Toppan Printing Co Ltd | 有機エレクトロルミネッセンスインキ及びこれを用いた有機エレクトロルミネッセンス素子の製造方法 |
JP2008216949A (ja) * | 2007-02-06 | 2008-09-18 | Toppan Printing Co Ltd | 感光性樹脂版用露光装置、および有機el素子の製造方法 |
JP2016091021A (ja) * | 2014-10-31 | 2016-05-23 | 東京応化工業株式会社 | レジストパターン形成装置およびレジストパターン形成方法 |
Also Published As
Publication number | Publication date |
---|---|
MXPA05008777A (es) | 2005-10-18 |
KR100725570B1 (ko) | 2007-06-08 |
AU2004214123A1 (en) | 2004-09-02 |
US20060144272A1 (en) | 2006-07-06 |
CA2516495A1 (en) | 2004-09-02 |
EP1596253A1 (en) | 2005-11-16 |
KR20050113607A (ko) | 2005-12-02 |
AU2004214123B2 (en) | 2007-06-28 |
CN100529971C (zh) | 2009-08-19 |
JP3933675B2 (ja) | 2007-06-20 |
JPWO2004074942A1 (ja) | 2006-06-01 |
EP1596253A4 (en) | 2010-02-03 |
BRPI0407536A (pt) | 2006-02-14 |
CN1751274A (zh) | 2006-03-22 |
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