ES2110987T3 - Composiciones fotopolimerizables. - Google Patents
Composiciones fotopolimerizables.Info
- Publication number
- ES2110987T3 ES2110987T3 ES91810833T ES91810833T ES2110987T3 ES 2110987 T3 ES2110987 T3 ES 2110987T3 ES 91810833 T ES91810833 T ES 91810833T ES 91810833 T ES91810833 T ES 91810833T ES 2110987 T3 ES2110987 T3 ES 2110987T3
- Authority
- ES
- Spain
- Prior art keywords
- photopolymerizable compositions
- alpha
- dialoxioxone
- benzoyloenzilalkane
- photopolymerization
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/117—Free radical
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/124—Carbonyl compound containing
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Polymerisation Methods In General (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
COMPUESTOS QUE COMPRENDEN UN POLIMERO DE BASE LINEAL, UN COMPUESTO POLIMERIZABLE POR ADICION, INSATURADO ETILENICAMENTE Y UNA COMBINACION DE (A) UN 1-BENZOILOENZILALKANO CON (B) UN (ALFA) -FENIL-(ALFA), (ALFA)-DIALKOXIACETOFENONA COMO INICIADORA DE LA FOTOPOLIMERIZACION IDONEAS PARA LA PRODUCCION DE PLACAS DE IMPRESION DE PELICULA GRUESA.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP29708890 | 1990-11-05 |
Publications (1)
Publication Number | Publication Date |
---|---|
ES2110987T3 true ES2110987T3 (es) | 1998-03-01 |
Family
ID=17842051
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES91810833T Expired - Lifetime ES2110987T3 (es) | 1990-11-05 | 1991-10-28 | Composiciones fotopolimerizables. |
Country Status (5)
Country | Link |
---|---|
US (2) | US5541038A (es) |
EP (1) | EP0485334B1 (es) |
JP (1) | JP2839974B2 (es) |
DE (1) | DE69128274T2 (es) |
ES (1) | ES2110987T3 (es) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0623688A1 (en) * | 1993-05-04 | 1994-11-09 | Nagoya Oilchemical Co., Ltd. | Decomposable masking member |
CA2134156A1 (en) * | 1993-11-22 | 1995-05-23 | Thomas P. Klun | Coatable compositions, abrasive articles made therefrom, and methods of making and using same |
DE19614267A1 (de) * | 1996-04-11 | 1997-10-16 | Atec Weiss Gmbh & Co Kg | Elastische, axial- und winkelbewegliche Kupplung |
TW452575B (en) * | 1996-12-06 | 2001-09-01 | Ciba Sc Holding Ag | New Α-aminoacetophenone photoinitiators and photopolymerizable compositions comprising these photoinitiators |
DE19855709B4 (de) | 1998-12-03 | 2008-01-24 | Helmut Hechinger Gmbh & Co. | Führungsstangen für eine Jacquard-Webeinrichtung |
CN1187388C (zh) | 2000-05-26 | 2005-02-02 | 阿克佐诺贝尔股份有限公司 | 光敏涂料组合物 |
KR100583095B1 (ko) * | 2000-06-30 | 2006-05-24 | 주식회사 하이닉스반도체 | 광산 발생제와 함께 광 라디칼 발생제(prg)를 포함하는포토레지스트 조성물 |
JP2004043433A (ja) * | 2002-04-26 | 2004-02-12 | Kitai Kagi Kofun Yugenkoshi | モルフォリノケトン誘導体及びその用途 |
US7632625B2 (en) * | 2004-05-25 | 2009-12-15 | Roberts David H | Method of pre-exposing relief image printing plate |
US7125650B2 (en) | 2004-07-20 | 2006-10-24 | Roberts David H | Method for bump exposing relief image printing plates |
PL2084198T3 (pl) * | 2006-11-20 | 2010-07-30 | Akzo Nobel Coatings Int Bv | Kompozycja powłokowa |
US7767383B2 (en) * | 2007-08-08 | 2010-08-03 | Roberts David H | Method of pre-exposing relief image printing plate |
US8236479B2 (en) * | 2008-01-23 | 2012-08-07 | E I Du Pont De Nemours And Company | Method for printing a pattern on a substrate |
US8241835B2 (en) * | 2008-01-30 | 2012-08-14 | E I Du Pont De Nemours And Company | Device and method for preparing relief printing form |
US20090191482A1 (en) * | 2008-01-30 | 2009-07-30 | E.I. Du Pont De Nemours And Company | Device and method for preparing relief printing form |
WO2011002967A1 (en) | 2009-07-02 | 2011-01-06 | E. I. Du Pont De Nemours And Company | Method for printing a material onto a substrate |
US8795950B2 (en) | 2010-06-30 | 2014-08-05 | Jonghan Choi | Method of improving print performance in flexographic printing plates |
JP6133866B2 (ja) | 2011-08-26 | 2017-05-24 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニーE.I.Du Pont De Nemours And Company | 凸版印刷フォームの調製方法 |
US9097974B2 (en) | 2012-08-23 | 2015-08-04 | E I Du Pont De Nemours And Company | Method for preparing a relief printing form |
US10108087B2 (en) * | 2016-03-11 | 2018-10-23 | Macdermid Graphics Solutions Llc | Method of improving light stability of flexographic printing plates featuring flat top dots |
WO2017168699A1 (ja) * | 2016-03-31 | 2017-10-05 | 日立化成株式会社 | 感光性樹脂組成物、感光性樹脂フィルム、硬化物の製造方法、積層体、及び電子部品 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4287367A (en) * | 1976-04-14 | 1981-09-01 | Basf Aktiengesellschaft | Manufacture of symmetrical or unsymmetrical monoacetals of aromatic 1,2-diketones |
IT1147805B (it) * | 1982-01-22 | 1986-11-26 | Lamberti Flli Spa | Metodo per la preparazione di monoacetali simmetrici degli 1,2-dichetoni aromatici a partire dai corrispondenti alfa idrossi chetoni |
JPS6063532A (ja) * | 1983-08-16 | 1985-04-11 | Fuji Photo Film Co Ltd | 光重合性組成物 |
JPS61185542A (ja) * | 1985-02-13 | 1986-08-19 | Denki Kagaku Kogyo Kk | 感光性組成物 |
JPH0658537B2 (ja) * | 1985-02-28 | 1994-08-03 | 富士写真フイルム株式会社 | 受像シ−ト |
DE3606155A1 (de) * | 1986-02-26 | 1987-08-27 | Basf Ag | Photopolymerisierbares gemisch, dieses enthaltendes lichtempfindliches aufzeichnungselement sowie verfahren zur herstellung einer flachdruckform mittels dieses lichtempfindlichen aufzeichnungselements |
ES2054861T3 (es) * | 1987-03-26 | 1994-08-16 | Ciba Geigy Ag | Nuevas alfa-aminoacetofenonas como fotoiniciadores. |
EP0287516B1 (de) * | 1987-04-14 | 1993-03-31 | Ciba-Geigy Ag | Klebstoffe |
EP0295944A3 (en) * | 1987-06-18 | 1989-09-06 | Napp Systems (Usa) Inc. | Photosensitive resin composition and printing plate prepared therefrom |
JPH02188756A (ja) * | 1989-01-18 | 1990-07-24 | Asahi Chem Ind Co Ltd | 感光性樹脂組成物 |
-
1991
- 1991-10-28 ES ES91810833T patent/ES2110987T3/es not_active Expired - Lifetime
- 1991-10-28 EP EP91810833A patent/EP0485334B1/en not_active Expired - Lifetime
- 1991-10-28 DE DE69128274T patent/DE69128274T2/de not_active Expired - Lifetime
- 1991-11-05 JP JP3315253A patent/JP2839974B2/ja not_active Expired - Lifetime
-
1995
- 1995-04-05 US US08/417,186 patent/US5541038A/en not_active Expired - Lifetime
-
1996
- 1996-04-22 US US08/635,814 patent/US5645974A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0485334A2 (en) | 1992-05-13 |
DE69128274D1 (de) | 1998-01-08 |
US5645974A (en) | 1997-07-08 |
EP0485334A3 (en) | 1992-12-30 |
EP0485334B1 (en) | 1997-11-26 |
JPH05249672A (ja) | 1993-09-28 |
JP2839974B2 (ja) | 1998-12-24 |
DE69128274T2 (de) | 1998-04-23 |
US5541038A (en) | 1996-07-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FG2A | Definitive protection |
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