DE69127760D1 - Vorsensibilisierte Platte zur Herstellung einer lithographischen Druckplatte - Google Patents

Vorsensibilisierte Platte zur Herstellung einer lithographischen Druckplatte

Info

Publication number
DE69127760D1
DE69127760D1 DE69127760T DE69127760T DE69127760D1 DE 69127760 D1 DE69127760 D1 DE 69127760D1 DE 69127760 T DE69127760 T DE 69127760T DE 69127760 T DE69127760 T DE 69127760T DE 69127760 D1 DE69127760 D1 DE 69127760D1
Authority
DE
Germany
Prior art keywords
plate
production
lithographic printing
presensitized
printing plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69127760T
Other languages
English (en)
Other versions
DE69127760T2 (de
Inventor
Masanori Imai
Kiuo Kawauchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of DE69127760D1 publication Critical patent/DE69127760D1/de
Application granted granted Critical
Publication of DE69127760T2 publication Critical patent/DE69127760T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
DE69127760T 1990-02-19 1991-02-05 Vorsensibilisierte Platte zur Herstellung einer lithographischen Druckplatte Expired - Fee Related DE69127760T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2037786A JP2627565B2 (ja) 1990-02-19 1990-02-19 感光性平版印刷版

Publications (2)

Publication Number Publication Date
DE69127760D1 true DE69127760D1 (de) 1997-11-06
DE69127760T2 DE69127760T2 (de) 1998-01-15

Family

ID=12507170

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69127760T Expired - Fee Related DE69127760T2 (de) 1990-02-19 1991-02-05 Vorsensibilisierte Platte zur Herstellung einer lithographischen Druckplatte

Country Status (5)

Country Link
US (1) US5476754A (de)
EP (1) EP0443742B1 (de)
JP (1) JP2627565B2 (de)
CA (1) CA2036471C (de)
DE (1) DE69127760T2 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5250393A (en) * 1990-12-20 1993-10-05 Fuji Photo Film Co., Ltd. Method for developing presensitized plate for use in making lithographic printing plate
JP3278286B2 (ja) * 1994-04-25 2002-04-30 富士写真フイルム株式会社 感光性平版印刷版
EP0871070B1 (de) * 1997-04-08 2003-11-12 Fuji Photo Film Co., Ltd. Positiv arbeitende photosensitive lithographische Druckplatte
JP3978255B2 (ja) * 1997-06-24 2007-09-19 Ａｚエレクトロニックマテリアルズ株式会社 リソグラフィー用洗浄剤
US6014929A (en) * 1998-03-09 2000-01-18 Teng; Gary Ganghui Lithographic printing plates having a thin releasable interlayer overlying a rough substrate
JP3635203B2 (ja) * 1998-10-06 2005-04-06 富士写真フイルム株式会社 平版印刷版用原版
US6558873B1 (en) 1999-10-05 2003-05-06 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor
JP4152559B2 (ja) 2000-03-06 2008-09-17 富士フイルム株式会社 ネガ型感光性平版印刷版
US6887642B2 (en) * 2002-04-05 2005-05-03 Kodak Polychrome Graphies Llc Multi-layer negative working imageable element

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2679498A (en) * 1954-05-25 Atent office
DE596731C (de) * 1932-05-23 1934-05-09 Kalle & Co Akt Ges Verfahren zur Darstellung von hoehermolekularen Diazoverbindungen
US3867147A (en) * 1969-05-20 1975-02-18 Hoechst Co American Light-sensitive diazo compounds and reproduction material employing the same
JPS56444B2 (de) * 1972-05-16 1981-01-08
US4079041A (en) * 1975-06-18 1978-03-14 Ciba-Geigy Corporation Crosslinkable polymeric compounds
DE2626795A1 (de) * 1975-06-18 1976-12-30 Ciba Geigy Ag Imidylverbindungen
LU75749A1 (de) * 1976-09-08 1978-04-27
JPS5953836A (ja) * 1982-09-21 1984-03-28 Fuji Photo Film Co Ltd 感光性平版印刷版
DE3311435A1 (de) * 1983-03-29 1984-10-04 Hoechst Ag, 6230 Frankfurt Lichtempfindliches, diazoniumgruppen enthaltendes polykondensationsprodukt, verfahren zu seiner herstellung und lichtempfindliches aufzeichnungsmaterial, das dieses polykondensationsprodukt enthaelt
JPS6278544A (ja) * 1985-10-01 1987-04-10 Fuji Photo Film Co Ltd 感光性組成物
JPH061380B2 (ja) * 1986-01-30 1994-01-05 富士写真フイルム株式会社 感光性組成物
JPS62175729A (ja) * 1986-01-30 1987-08-01 Fuji Photo Film Co Ltd 感光性組成物
DE3644160A1 (de) * 1986-12-23 1988-07-14 Hoechst Ag Lichtempfindliches aufzeichnungsmaterial mit einer lichtempfindlichen zwischenschicht
JPH01102457A (ja) * 1987-10-15 1989-04-20 Konica Corp 感光性組成物
JP2810998B2 (ja) * 1987-10-15 1998-10-15 コニカ 株式会社 感光性組成物
JP2657516B2 (ja) * 1988-04-05 1997-09-24 コニカ株式会社 感光性組成物

Also Published As

Publication number Publication date
JPH03240061A (ja) 1991-10-25
EP0443742A2 (de) 1991-08-28
US5476754A (en) 1995-12-19
CA2036471C (en) 2001-07-03
JP2627565B2 (ja) 1997-07-09
CA2036471A1 (en) 1991-08-20
EP0443742B1 (de) 1997-10-01
DE69127760T2 (de) 1998-01-15
EP0443742A3 (en) 1992-06-03

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP

8339 Ceased/non-payment of the annual fee