ES8503197A1 - Procedimiento para la creacion de imagenes - Google Patents
Procedimiento para la creacion de imagenesInfo
- Publication number
- ES8503197A1 ES8503197A1 ES532358A ES532358A ES8503197A1 ES 8503197 A1 ES8503197 A1 ES 8503197A1 ES 532358 A ES532358 A ES 532358A ES 532358 A ES532358 A ES 532358A ES 8503197 A1 ES8503197 A1 ES 8503197A1
- Authority
- ES
- Spain
- Prior art keywords
- layer
- free radical
- radical initiator
- activated
- heat
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 title abstract 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 abstract 2
- 150000001875 compounds Chemical class 0.000 abstract 2
- 239000003999 initiator Substances 0.000 abstract 2
- 239000000463 material Substances 0.000 abstract 2
- 150000003254 radicals Chemical class 0.000 abstract 2
- HSOOIVBINKDISP-UHFFFAOYSA-N 1-(2-methylprop-2-enoyloxy)butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(CCC)OC(=O)C(C)=C HSOOIVBINKDISP-UHFFFAOYSA-N 0.000 abstract 1
- FRIBMENBGGCKPD-UHFFFAOYSA-N 3-(2,3-dimethoxyphenyl)prop-2-enal Chemical compound COC1=CC=CC(C=CC=O)=C1OC FRIBMENBGGCKPD-UHFFFAOYSA-N 0.000 abstract 1
- 239000007788 liquid Substances 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 229920003986 novolac Polymers 0.000 abstract 1
- 238000006116 polymerization reaction Methods 0.000 abstract 1
- 230000005855 radiation Effects 0.000 abstract 1
- 239000002904 solvent Substances 0.000 abstract 1
- -1 triphenylsulfonium hexafluorophosphate Chemical compound 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/16—Two dimensionally sectional layer
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Epoxy Resins (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Abstract
PROCEDIMIENTO PARA LA CREACION DE IMAGENES.CONSISTE EN, A) CALENTAR (TERMOPOLIMERIZAR), UNA CAPA DE UNA MEZCLA LIQUIDA DE MATERIA, QUE SE APLICA SOBRE UN MATERIAL DE SOPORTE Y CONTIENE; A) UN COMPUESTO CON UN GRUPO INSATURADO ETILENICAMENTE Y TERMOPOLIMERIZABLE COMO UN ESTIRENO, UN COMPUESTO ALILICO Y OTROS; B) UN MATERIAL FOTOPOLIMERIZABLE COMO, UNA RESINA FENOLICA, UNA RESINA EPOXIDICA Y OTROS; Y C) UN INICIADOR DE RADICALES LIBRES, TERMOACTIVABLE PARA LA POLIMERIZACION DE A) COMO UN PEROXIDO ORGANICO, UN HIDROPEROXIDO ORGANICO Y OTROS, A UNA TEMPERATURA ENTRE 80 Y 150JC, PARA ACTIVAR AL INICIADOR (C), CON LO CUAL EL MATERIAL A) SE POLIMERIZA POR MEDIO DE SUS GRUPOS INSATURADOS ETILENICAMENTE Y TERMOPOLIMERIZABLES Y LA CAPA SE SOLIDIFICA, PERO SE MANTIENE FOTOPOLIMERIZABLE, B) IRRADIAR CON LUZ ACTINICA DE 200 A 600 MM DE LONGITUD DE ONDA LA CAPA SOLIDIFICADA EN UN MODELO PREDETERMINADO, PARA QUE LOS LUGARES DE LA CAPA EXPUESTOS SE FOTOPOLIMERICEN Y C) ELIMINAR LOS LUGARES DE LA CAPA NO FOTOPOLIMERIZADOS, POR TRATAMIENTO CON UN DISOLVENTE APROPIADO.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB838312879A GB8312879D0 (en) | 1983-05-11 | 1983-05-11 | Production of images |
GB838319218A GB8319218D0 (en) | 1983-05-11 | 1983-07-15 | Production of images |
Publications (2)
Publication Number | Publication Date |
---|---|
ES8503197A1 true ES8503197A1 (es) | 1985-02-01 |
ES532358A0 ES532358A0 (es) | 1985-02-01 |
Family
ID=26286083
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES532358A Granted ES532358A0 (es) | 1983-05-11 | 1984-05-10 | Procedimiento para la creacion de imagenes |
Country Status (5)
Country | Link |
---|---|
US (1) | US4572890A (es) |
EP (1) | EP0126029B1 (es) |
CA (1) | CA1217375A (es) |
DE (1) | DE3465637D1 (es) |
ES (1) | ES532358A0 (es) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4632891A (en) * | 1984-10-04 | 1986-12-30 | Ciba-Geigy Corporation | Process for the production of images |
US5194365A (en) * | 1985-06-19 | 1993-03-16 | Ciba-Geigy Corporation | Method for forming images |
CH678897A5 (es) * | 1986-05-10 | 1991-11-15 | Ciba Geigy Ag | |
GB8719589D0 (en) * | 1987-08-19 | 1987-09-23 | Ici Plc | Bismaleimide compositions |
US5006436A (en) * | 1988-09-20 | 1991-04-09 | Atochem North America, Inc. | UV curable compositions for making tentable solder mask coating |
GB8827847D0 (en) * | 1988-11-29 | 1988-12-29 | Ciba Geigy Ag | Method |
JPH02254450A (ja) * | 1989-03-29 | 1990-10-15 | Toshiba Corp | レジスト |
US5041358A (en) * | 1989-04-17 | 1991-08-20 | International Business Machines Corporation | Negative photoresist and use thereof |
IL94474A (en) * | 1989-06-09 | 1993-07-08 | Morton Int Inc | Photoimageable compositions |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4175963A (en) * | 1974-05-02 | 1979-11-27 | General Electric Company | Method of exposing and curing an epoxy composition containing an aromatic onium salt |
GB1518141A (en) * | 1974-05-02 | 1978-07-19 | Gen Electric | Polymerizable compositions |
US4058401A (en) * | 1974-05-02 | 1977-11-15 | General Electric Company | Photocurable compositions containing group via aromatic onium salts |
US4058400A (en) * | 1974-05-02 | 1977-11-15 | General Electric Company | Cationically polymerizable compositions containing group VIa onium salts |
US3885964A (en) * | 1974-05-31 | 1975-05-27 | Du Pont | Photoimaging process using nitroso dimer |
US4050942A (en) * | 1975-03-21 | 1977-09-27 | E. I. Du Pont De Nemours And Company | Nitroso-dimer-containing compositions and photoimaging process |
US4307177A (en) * | 1975-12-09 | 1981-12-22 | General Electric Company | Method of using polymerizable compositions containing onium salts |
US4193799A (en) * | 1976-07-09 | 1980-03-18 | General Electric Company | Method of making printing plates and printed circuit |
EP0008837B1 (en) * | 1978-09-07 | 1982-05-05 | Akzo N.V. | Radiation curable liquid coating composition based on an epoxy terminated compound and a process for coating a substrate with such a composition |
US4299938A (en) * | 1979-06-19 | 1981-11-10 | Ciba-Geigy Corporation | Photopolymerizable and thermally polymerizable compositions |
US4291118A (en) * | 1979-12-26 | 1981-09-22 | W. R. Grace & Co. | Relief imaging liquids |
US4339567A (en) * | 1980-03-07 | 1982-07-13 | Ciba-Geigy Corporation | Photopolymerization by means of sulphoxonium salts |
JPS56141321A (en) * | 1980-04-08 | 1981-11-05 | Mitsubishi Gas Chem Co Inc | Photosetting resin composition |
US4317858A (en) * | 1980-06-27 | 1982-03-02 | Westinghouse Electric Corp. | Ultraviolet curable solvent-free wire enamel blends |
US4383025A (en) * | 1980-07-10 | 1983-05-10 | Ciba-Geigy Corporation | Photopolymerization by means of sulfoxonium salts |
US4288527A (en) * | 1980-08-13 | 1981-09-08 | W. R. Grace & Co. | Dual UV/thermally curable acrylate compositions with pinacol |
US4352723A (en) * | 1980-08-13 | 1982-10-05 | W. R. Grace & Co. | Method of curing a dual UV/thermally curable acrylate composition |
US4416975A (en) * | 1981-02-04 | 1983-11-22 | Ciba-Geigy Corporation | Photopolymerization process employing compounds containing acryloyl groups and maleimide groups |
US4413052A (en) * | 1981-02-04 | 1983-11-01 | Ciba-Geigy Corporation | Photopolymerization process employing compounds containing acryloyl group and anthryl group |
US4389482A (en) * | 1981-12-14 | 1983-06-21 | International Business Machines Corporation | Process for forming photoresists with strong resistance to reactive ion etching and high sensitivity to mid- and deep UV-light |
-
1984
- 1984-05-01 US US06/605,952 patent/US4572890A/en not_active Expired - Fee Related
- 1984-05-07 EP EP84810216A patent/EP0126029B1/de not_active Expired
- 1984-05-07 DE DE8484810216T patent/DE3465637D1/de not_active Expired
- 1984-05-09 CA CA000453889A patent/CA1217375A/en not_active Expired
- 1984-05-10 ES ES532358A patent/ES532358A0/es active Granted
Also Published As
Publication number | Publication date |
---|---|
ES532358A0 (es) | 1985-02-01 |
CA1217375A (en) | 1987-02-03 |
EP0126029B1 (de) | 1987-08-26 |
EP0126029A2 (de) | 1984-11-21 |
US4572890A (en) | 1986-02-25 |
EP0126029A3 (en) | 1985-05-22 |
DE3465637D1 (en) | 1987-10-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
BR8500576A (pt) | Processo para a preparacao de uma camada de protecao ou de uma imagem de relevo | |
MY106633A (en) | Positive acting photoresists and method of producing same. | |
ES8700455A1 (es) | Un procedimiento para la produccion de imagenes | |
KR930702704A (ko) | 인쇄판 | |
SE8701902L (sv) | Reproduktionsforfarande | |
ES8701997A1 (es) | Un procedimiento para la produccion de una imagen | |
ES8405165A1 (es) | Procedimiento para la produccion de una imagen. | |
ES8503197A1 (es) | Procedimiento para la creacion de imagenes | |
ES8800449A1 (es) | Procedimiento para la formacion de imagenes por exposicion a radiacion actinica | |
JPS6435438A (en) | Image formation | |
JPS51111330A (en) | Negative plate of improved photo-sensitive resin composition | |
JPS5724945A (en) | Lithographic printing plate and its preparation | |
PT77266A (en) | Process for preparing photosensitive elastomeric polymer compo-sition for flexographic printing plates | |
JPS5651345A (en) | Formation of cured rubber film | |
KR910012819A (ko) | 감광성 수지 조성물 및 그의 사용방법 | |
JPS56140342A (en) | Image forming composition and formation of resist image | |
GB1293722A (en) | Photoresist process | |
JPS6488546A (en) | Method for exposing thick film resist | |
JPS5397047A (en) | Photosensitive resin composition | |
JPS5712522A (en) | Forming method of pattern | |
JPS5622428A (en) | Polyimide pattern forming method | |
JPS57208257A (en) | Ink jet head | |
JPH01128065A (ja) | 非固体状感光性樹脂へのパターン露光方法 | |
JPS5672444A (en) | Production of photomask | |
JPS5570847A (en) | Processing method of waterless lithographic printing plate |