BR8500576A - Processo para a preparacao de uma camada de protecao ou de uma imagem de relevo - Google Patents

Processo para a preparacao de uma camada de protecao ou de uma imagem de relevo

Info

Publication number
BR8500576A
BR8500576A BR8500576A BR8500576A BR8500576A BR 8500576 A BR8500576 A BR 8500576A BR 8500576 A BR8500576 A BR 8500576A BR 8500576 A BR8500576 A BR 8500576A BR 8500576 A BR8500576 A BR 8500576A
Authority
BR
Brazil
Prior art keywords
protective layer
relief image
preparing
radiation
substrate
Prior art date
Application number
BR8500576A
Other languages
English (en)
Inventor
Hans Dr Zweifel
Dra Sigrid Bauer
Kurt Dr Meier
Original Assignee
Ciba Geigy Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=4191510&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=BR8500576(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Ciba Geigy Ag filed Critical Ciba Geigy Ag
Publication of BR8500576A publication Critical patent/BR8500576A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0385—Macromolecular compounds which are rendered insoluble or differentially wettable using epoxidised novolak resin
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0079—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the method of application or removal of the mask

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Organic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Epoxy Resins (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
  • Laminated Bodies (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Materials For Photolithography (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
BR8500576A 1984-02-10 1985-02-08 Processo para a preparacao de uma camada de protecao ou de uma imagem de relevo BR8500576A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH63184 1984-02-10

Publications (1)

Publication Number Publication Date
BR8500576A true BR8500576A (pt) 1985-09-24

Family

ID=4191510

Family Applications (1)

Application Number Title Priority Date Filing Date
BR8500576A BR8500576A (pt) 1984-02-10 1985-02-08 Processo para a preparacao de uma camada de protecao ou de uma imagem de relevo

Country Status (12)

Country Link
US (1) US4624912A (pt)
EP (1) EP0153904B1 (pt)
JP (1) JPS60186838A (pt)
KR (1) KR910008710B1 (pt)
AT (1) ATE37242T1 (pt)
AU (1) AU575118B2 (pt)
BR (1) BR8500576A (pt)
CA (1) CA1287769C (pt)
DE (1) DE3565013D1 (pt)
HK (1) HK34591A (pt)
SG (1) SG30191G (pt)
ZA (1) ZA85972B (pt)

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JPS56155789A (en) * 1980-05-06 1981-12-02 Nissha Printing Co Ltd Transferring material and transferring method
US4383025A (en) * 1980-07-10 1983-05-10 Ciba-Geigy Corporation Photopolymerization by means of sulfoxonium salts
US4398014A (en) * 1980-11-04 1983-08-09 Ciba-Geigy Corporation Sulfoxonium salts and their use as polymerization catalysts
JPS5818288A (ja) * 1981-07-28 1983-02-02 Dainippon Printing Co Ltd 繊維強化プラスチツクの化粧法
DE3134123A1 (de) * 1981-08-28 1983-03-17 Hoechst Ag, 6000 Frankfurt Durch strahlung polymerisierbares gemisch und daraushergestelltes photopolymerisierbares kopiermaterial
DE3369398D1 (en) * 1982-05-19 1987-02-26 Ciba Geigy Ag Curable compositions containing metallocen complexes, activated primers obtained therefrom and their use
DE3366408D1 (en) * 1982-05-19 1986-10-30 Ciba Geigy Ag Photopolymerisation with organometal salts
DE3231145A1 (de) * 1982-08-21 1984-02-23 Basf Ag, 6700 Ludwigshafen Negativ arbeitendes verfahren zur herstellung von reliefbildern oder resistmustern
US4482679A (en) * 1982-09-18 1984-11-13 Ciba-Geigy Corporation Heat-curable epoxy compositions containing diaryliodosyl salts
GB2137626B (en) * 1983-03-31 1986-10-15 Sericol Group Ltd Water based photopolymerisable compositions and their use
GB8312879D0 (en) * 1983-05-11 1983-06-15 Ciba Geigy Ag Production of images

Also Published As

Publication number Publication date
ATE37242T1 (de) 1988-09-15
JPS60186838A (ja) 1985-09-24
KR850005911A (ko) 1985-09-26
ZA85972B (en) 1985-11-27
HK34591A (en) 1991-05-10
US4624912A (en) 1986-11-25
KR910008710B1 (ko) 1991-10-19
EP0153904A2 (de) 1985-09-04
SG30191G (en) 1991-09-13
AU3855085A (en) 1985-08-15
AU575118B2 (en) 1988-07-21
EP0153904B1 (de) 1988-09-14
EP0153904A3 (en) 1987-03-25
DE3565013D1 (en) 1988-10-20
CA1287769C (en) 1991-08-20

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