ATE119693T1 - Zusammensetzungen für aufzeichnungsmaterialien. - Google Patents

Zusammensetzungen für aufzeichnungsmaterialien.

Info

Publication number
ATE119693T1
ATE119693T1 AT89901179T AT89901179T ATE119693T1 AT E119693 T1 ATE119693 T1 AT E119693T1 AT 89901179 T AT89901179 T AT 89901179T AT 89901179 T AT89901179 T AT 89901179T AT E119693 T1 ATE119693 T1 AT E119693T1
Authority
AT
Austria
Prior art keywords
film
composition
soluble
polymeric binder
aqueous
Prior art date
Application number
AT89901179T
Other languages
English (en)
Inventor
Lincoln Junior Eramo
William J Winkler
Original Assignee
Morton Int Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Morton Int Inc filed Critical Morton Int Inc
Application granted granted Critical
Publication of ATE119693T1 publication Critical patent/ATE119693T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/025—Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C7/00—Multicolour photographic processes or agents therefor; Regeneration of such processing agents; Photosensitive materials for multicolour processes
    • G03C7/04—Additive processes using colour screens; Materials therefor; Preparing or processing such materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/28—Applying non-metallic protective coatings
    • H05K3/285—Permanent coating compositions
    • H05K3/287—Photosensitive compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Epoxy Resins (AREA)
  • Materials For Photolithography (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
AT89901179T 1987-12-07 1988-12-05 Zusammensetzungen für aufzeichnungsmaterialien. ATE119693T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US13003987A 1987-12-07 1987-12-07

Publications (1)

Publication Number Publication Date
ATE119693T1 true ATE119693T1 (de) 1995-03-15

Family

ID=22442767

Family Applications (1)

Application Number Title Priority Date Filing Date
AT89901179T ATE119693T1 (de) 1987-12-07 1988-12-05 Zusammensetzungen für aufzeichnungsmaterialien.

Country Status (8)

Country Link
EP (1) EP0345340B1 (de)
JP (1) JP2694037B2 (de)
KR (1) KR940007784B1 (de)
AT (1) ATE119693T1 (de)
AU (1) AU2912889A (de)
CA (1) CA1330175C (de)
DE (1) DE3853283T2 (de)
WO (1) WO1989005476A1 (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU615792B2 (en) * 1988-09-13 1991-10-10 Amp-Akzo Corporation Photoimageable permanent resist
US5070002A (en) * 1988-09-13 1991-12-03 Amp-Akzo Corporation Photoimageable permanent resist
IL94474A (en) * 1989-06-09 1993-07-08 Morton Int Inc Photoimageable compositions
DE3931467A1 (de) * 1989-09-21 1991-04-04 Hoechst Ag Durch strahlung polymerisierbares gemisch und verfahren zur herstellung einer loetstopmaske
JPH0450852A (ja) * 1990-06-14 1992-02-19 Hitachi Chem Co Ltd 感光性フイルム及びこれを用いたソルダマスクの形成法
EP0493317B2 (de) * 1990-12-18 2001-01-10 Ciba SC Holding AG Strahlungsempfindliche Zusammensetzung auf Basis von Wasser als Lösungsmittel
US5928839A (en) * 1992-05-15 1999-07-27 Morton International, Inc. Method of forming a multilayer printed circuit board and product thereof
DE4234072A1 (de) * 1992-10-09 1994-04-14 Morton Int Inc Durch Strahlung polymerisierbares Gemisch und Verfahren zur Herstellung einer Lötstoppmaske
US5405731A (en) * 1992-12-22 1995-04-11 E. I. Du Pont De Nemours And Company Aqueous processable, multilayer, photoimageable permanent coatings for printed circuits
US5458921A (en) * 1994-10-11 1995-10-17 Morton International, Inc. Solvent system for forming films of photoimageable compositions
US5925499A (en) * 1995-08-01 1999-07-20 Morton International, Inc. Epoxy-containing waterborne photoimageable composition
WO2002070616A1 (de) 2001-03-05 2002-09-12 Georg Gros Beschichtungsgemisch auf wasserbasis, verfahren zum aufbringen einer korrosionsschutzschicht mit diesem gemisch, derart beschichtete unterlage und deren verwendung
KR20050013537A (ko) 2002-04-20 2005-02-04 케메탈 게엠베하 저마모성으로 성형이 가능한 비부식성 폴리머 코팅을도포하기 위한 혼합물 및 그 혼합물의 제조방법
JP4481721B2 (ja) * 2004-05-18 2010-06-16 富士フイルム株式会社 感光性組成物及び感光性フィルム、並びに、永久パターン及びその形成方法
CN102804061A (zh) * 2009-05-08 2012-11-28 惠普开发有限公司 作为疏水性涂层的功能化全氟聚醚材料
JP7202282B2 (ja) * 2019-12-16 2023-01-11 株式会社タムラ製作所 感光性樹脂組成物及び感光性樹脂組成物を有するドライフィルム

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3776729A (en) * 1971-02-22 1973-12-04 Ibm Photosensitive dielectric composition and process of using the same
DE2406400B2 (de) * 1973-02-14 1977-04-28 Hitachi Chemical Co., Ltd., Tokio Lichtempfindliche harzzusammensetzungen auf der basis von verbindungen mit epoxy- bzw. photopolymerisierbaren acrylgruppen
US4025348A (en) * 1974-05-10 1977-05-24 Hitachi Chemical Company, Ltd. Photosensitive resin compositions
DE3114931A1 (de) * 1981-04-13 1982-10-28 Hoechst Ag, 6000 Frankfurt Durch strahlung polymerisierbares gemisch und daraus hergestelltes photopolymerisierbares kopiermaterial
JP2604173B2 (ja) * 1987-02-25 1997-04-30 東京応化工業株式会社 耐熱性感光性樹脂組成物

Also Published As

Publication number Publication date
CA1330175C (en) 1994-06-14
JPH02502587A (ja) 1990-08-16
JP2694037B2 (ja) 1997-12-24
KR900700918A (ko) 1990-08-17
EP0345340A1 (de) 1989-12-13
KR940007784B1 (ko) 1994-08-25
EP0345340B1 (de) 1995-03-08
DE3853283D1 (de) 1995-04-13
DE3853283T2 (de) 1995-07-13
AU2912889A (en) 1989-07-05
WO1989005476A1 (en) 1989-06-15

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Legal Events

Date Code Title Description
REN Ceased due to non-payment of the annual fee