ES8404702A1 - Un procedimiento para la formacion de una imagen sobre un substrato. - Google Patents

Un procedimiento para la formacion de una imagen sobre un substrato.

Info

Publication number
ES8404702A1
ES8404702A1 ES519144A ES519144A ES8404702A1 ES 8404702 A1 ES8404702 A1 ES 8404702A1 ES 519144 A ES519144 A ES 519144A ES 519144 A ES519144 A ES 519144A ES 8404702 A1 ES8404702 A1 ES 8404702A1
Authority
ES
Spain
Prior art keywords
curing
radiation
epoxide resin
acid
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES519144A
Other languages
English (en)
Other versions
ES519144A0 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Publication of ES519144A0 publication Critical patent/ES519144A0/es
Publication of ES8404702A1 publication Critical patent/ES8404702A1/es
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/115—Cationic or anionic
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/122—Sulfur compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/126—Halogen compound containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Epoxy Resins (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)

Abstract

PROCEDIMIENTO PARA LA FORMACION DE UNA IMAGEN SOBRE UN SUSTRATO, UTILIZANDO COMPOSICIONES FOTOPOLIMERIZABLES. COMPRENDE LAS SIGUIENTES OPERACIONES: PRIMERA, SE EXPONE CON IMAGEN A READIACION ACTINICA UNA CAPA DE UNA COMPOSICION DE FOTORRESISTO UNA RESINA EPOXIDICA Y UNA CANTIDAD EFECTIVA DE UNA POLIAMIDA BENCENOIDE O DE UN COMPUESTO AROMATICO QUE LIBERA UN ACIDO EN LA EXPOSICION A RADIACION ACTINICA; SEGUNDA, SE CALIENTA LA COMPOSICION SOBRE EL SUSTRATO DE MODO QUE LA PARTE O PARTES DE LA COMPOSICION QUE SE HAN BATIDO POR LA RADIACION SON CURADAS SUSTANCIALMENTE, MIENTRAS QUE LA PARTE QUE NO HAN SIDO BATIDAS PERMANECEN SIN CURAR; Y POR ULTIMO, SE TRATA LA COMPOSICION SOBRE EL SUSTRATO CON UN REVELADOR DE DISOLVENTE, PARA SEPARAR LAS PARTES DE LA COMPOSICION QUE PERMANECEN SIN CURAR.
ES519144A 1982-01-21 1983-01-20 Un procedimiento para la formacion de una imagen sobre un substrato. Expired ES8404702A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB8201726 1982-01-21

Publications (2)

Publication Number Publication Date
ES519144A0 ES519144A0 (es) 1984-05-16
ES8404702A1 true ES8404702A1 (es) 1984-05-16

Family

ID=10527781

Family Applications (1)

Application Number Title Priority Date Filing Date
ES519144A Expired ES8404702A1 (es) 1982-01-21 1983-01-20 Un procedimiento para la formacion de una imagen sobre un substrato.

Country Status (6)

Country Link
US (1) US4439517A (es)
EP (1) EP0085024B1 (es)
JP (1) JPS58136028A (es)
CA (1) CA1183038A (es)
DE (1) DE3372549D1 (es)
ES (1) ES8404702A1 (es)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4504372A (en) * 1982-03-12 1985-03-12 Ciba-Geigy Corporation Acid-curable composition containing a masked curing catalyst, and a process for its preparation
NO173574C (no) * 1984-06-01 1993-12-29 Rohm & Haas Fremgangsmaate til fremstilling av et termisk stabilt, positivt eller negativt bilde paa en underlagsflate
US4554342A (en) * 1984-07-30 1985-11-19 Shell Oil Company Heat-curable compositions comprising an epoxy resin, an amine and a sulfonium salt
CA1267378A (en) * 1984-12-07 1990-04-03 Jer-Ming Yang Top imaged and organosilicon treated polymer layer developable with plasma
JPS61205931A (ja) * 1985-03-09 1986-09-12 Japan Synthetic Rubber Co Ltd 溶剤現像用放射線感応性レジスト
DE3621477A1 (de) * 1985-06-26 1987-01-08 Canon Kk Durch strahlen mit wirksamer energie haertbare harzmischung
US4737463A (en) * 1985-10-09 1988-04-12 Lifelines Technology, Inc. Photoactivatable time-temperature indicator
CA1308596C (en) * 1986-01-13 1992-10-13 Rohm And Haas Company Microplastic structures and method of manufacture
JPH01201654A (ja) * 1988-02-06 1989-08-14 Nippon Oil Co Ltd ポジ型フォトレジスト材料
JP2817173B2 (ja) * 1988-03-15 1998-10-27 住友化学工業株式会社 硬化性樹脂組成物
EP0502819A1 (de) * 1991-03-01 1992-09-09 Ciba-Geigy Ag Säurekatalytisch vernetzbare Copolymere
US5206116A (en) * 1991-03-04 1993-04-27 Shipley Company Inc. Light-sensitive composition for use as a soldermask and process
US5262280A (en) * 1992-04-02 1993-11-16 Shipley Company Inc. Radiation sensitive compositions
US5266444A (en) * 1992-09-10 1993-11-30 International Business Machines Corporation Method and composition for obtaining image reversal in epoxy formulations based upon photoinhibition
EP0659781A3 (de) * 1993-12-21 1995-09-27 Ciba Geigy Ag Maleinimidcopolymere, insbesonder für Photoresists.
TW550268B (en) * 1999-04-30 2003-09-01 Sumitomo Chemical Co A negative type resist composition
JP4339988B2 (ja) * 2000-08-02 2009-10-07 コニカミノルタビジネステクノロジーズ株式会社 カラーマッチング方法およびカラーマッチング装置ならびにカラーマッチングプログラムを記録したコンピュータ読み取り可能な記録媒体
US7423096B2 (en) * 2004-09-29 2008-09-09 Intel Corporation Underfill of resin and sulfonic acid-releasing thermally cleavable compound
US20070284412A1 (en) * 2006-05-31 2007-12-13 Prakash Anna M Solder flux composition
US20080156852A1 (en) * 2006-12-29 2008-07-03 Prakash Anna M Solder flux composition and process of using same
MX2015005866A (es) * 2012-11-08 2016-02-05 Basf Se Eteres de diglicidilo de derivados de 2-fenil-1, 3-propandiol y oligomeros de estos como resinas epoxi curables.
JP6466253B2 (ja) * 2014-12-26 2019-02-06 群栄化学工業株式会社 樹脂、樹脂組成物、硬化物及びフォトレジスト
EP3688059B1 (de) * 2017-09-29 2021-11-10 Basf Se Thermoplastische polyoxazolidone aus diisocyanten und diglycidylether von 2-phenyl-1,3-propandiol-derivaten

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB733409A (en) * 1952-12-10 1955-07-13 Kalle & Co Ag Light-sensitive material for photomechanical reproduction and process of making images
US3074869A (en) * 1960-12-23 1963-01-22 Minnesota Mining & Mfg Photo-sensitive compositions and articles therefrom
JPS4748360B1 (es) * 1967-06-19 1972-12-05
DE1919678A1 (de) * 1969-04-18 1970-11-05 Bayer Ag Alpha-Methylol-benzoin-sulfonsaeureester
US3692560A (en) * 1969-09-18 1972-09-19 Bayer Ag Acid hardening resins which can be activated by ultraviolet light
US3709861A (en) * 1970-12-14 1973-01-09 Shell Oil Co Process for light-induced curing of epoxy resins in presence of cyclopentadienylmanganese tricarbonyl compounds
US3691133A (en) * 1971-03-25 1972-09-12 Union Carbon Corp Polyepoxide compositions containing dicyandiamide and an iodonium, phosphonium, or sulfonium salt
IT951496B (it) * 1971-06-28 1973-06-30 Ibm Composizione fotoresistente posi tiva a base epossidica partico larmente per la stampa di micro circuiti
US3726679A (en) * 1971-06-30 1973-04-10 Ibm Light sensitive epoxy formulation
US4035189A (en) * 1972-02-25 1977-07-12 Hitachi Chemical Company, Ltd. Image forming curable resin compositions
GB1526923A (en) * 1974-09-18 1978-10-04 Ici Ltd Photopolymerisable compositions
JPS5337120B2 (es) * 1974-12-20 1978-10-06
GB1539192A (en) * 1975-01-27 1979-01-31 Ici Ltd Photopolymerisable compositions
US4256828A (en) * 1975-09-02 1981-03-17 Minnesota Mining And Manufacturing Company Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials
GB1508951A (en) * 1976-02-19 1978-04-26 Ciba Geigy Ag Epoxide resin based prepregs
GB1587536A (en) * 1977-07-05 1981-04-08 Ciba Geigy Ag Expoxide resin-impregnated composites
GB1587159A (en) * 1977-07-05 1981-04-01 Ciba Geigy Ag Film adhesives containing an epoxide resin
JPS55118030A (en) * 1979-03-06 1980-09-10 Fuji Photo Film Co Ltd Photopolymerizable composition
US4339567A (en) * 1980-03-07 1982-07-13 Ciba-Geigy Corporation Photopolymerization by means of sulphoxonium salts
NL8001885A (nl) * 1980-03-31 1981-11-02 Akzo Nv Intiator-systeem voor door straling hardbare composities.
US4383025A (en) * 1980-07-10 1983-05-10 Ciba-Geigy Corporation Photopolymerization by means of sulfoxonium salts

Also Published As

Publication number Publication date
CA1183038A (en) 1985-02-26
JPS58136028A (ja) 1983-08-12
DE3372549D1 (en) 1987-08-20
ES519144A0 (es) 1984-05-16
EP0085024A3 (en) 1984-09-26
US4439517A (en) 1984-03-27
EP0085024B1 (de) 1987-07-15
EP0085024A2 (de) 1983-08-03

Similar Documents

Publication Publication Date Title
ES8404702A1 (es) Un procedimiento para la formacion de una imagen sobre un substrato.
EP0555749B1 (en) Radiation sensitive compositions and processes
MY106633A (en) Positive acting photoresists and method of producing same.
ES8303486A1 (es) Mejoras introducidas en un procedimiento para la formacion de estructuras en relieve sobre dispositivos electricos.
AU575118B2 (en) Production of protective layer or a relief image
BR8405909A (pt) Foto-resistor positivo,filme de superficie,foto-resistor de multicamada,processo para a formacao de uma imagem sobre uma superficie e solvente viavel do foto-resistor
US3738835A (en) Electrophoretic photoresist composition and a method of forming etch resistant masks
IL42978A (en) The manufacture of printed multi-layer circuits
JPS56162744A (en) Formation of fine pattern
US3752669A (en) Method of producing positive images from epoxy compositions and compositions therefor
EP0917000A3 (en) Positive resist composition and method for forming a resist pattern
KR910009126A (ko) 금속 패턴(pattern)의 제조방법
DE69131647D1 (de) Verfahren zur bilderzeugung
EP0211350A3 (en) Photoresist composition and method of applying same
JPS5651345A (en) Formation of cured rubber film
JPS57183030A (en) Manufacture of semiconductor device
DE3664824D1 (en) Process for producing a positive photoresist
JPS561934A (en) Manufacture of resist image
JPS56140342A (en) Image forming composition and formation of resist image
JPS5646530A (en) Preparation of resist pattern
JPS60115626A (ja) 感光性樹脂組成物
CN112114497B (zh) 高耐热正性光刻胶以及形成光刻胶图案的方案
JPS5397047A (en) Photosensitive resin composition
JPS5652751A (en) Photomask correcting method
JPS6364771B2 (es)