JPS5646530A - Preparation of resist pattern - Google Patents

Preparation of resist pattern

Info

Publication number
JPS5646530A
JPS5646530A JP12285979A JP12285979A JPS5646530A JP S5646530 A JPS5646530 A JP S5646530A JP 12285979 A JP12285979 A JP 12285979A JP 12285979 A JP12285979 A JP 12285979A JP S5646530 A JPS5646530 A JP S5646530A
Authority
JP
Japan
Prior art keywords
solvent
resist
resist pattern
developing
readily soluble
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12285979A
Other languages
Japanese (ja)
Other versions
JPS6230492B2 (en
Inventor
Yoshitake Onishi
Shigeyoshi Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP12285979A priority Critical patent/JPS5646530A/en
Publication of JPS5646530A publication Critical patent/JPS5646530A/en
Publication of JPS6230492B2 publication Critical patent/JPS6230492B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To lessen the reducing of the film and pin hole defects by applying positive type resist on a substrate and curing it, then, removing the component which is readily soluble relatively by using solvent, and performing exposing and developing treatments. CONSTITUTION:Resist which becomes readily soluble to solvent by the irradiation of radiations such as an electron beam and the like, i.e., positive resist, is applied on a substrate, and heated and cured as required. Thereafter, the component which is readily soluble relatively is removed by using developing solvent or solvent having approximately the same solubility as said developing solvent. Then, heating and curing are performed as required. Thereafter, exposing and developing treatments are performed. By using this method in preparing a resist pattern by the positive type resist, the reducing of the film can be lessened, the shape of the resist pattern can be improved, and the pin hole defects can be greatly reduced.
JP12285979A 1979-09-25 1979-09-25 Preparation of resist pattern Granted JPS5646530A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12285979A JPS5646530A (en) 1979-09-25 1979-09-25 Preparation of resist pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12285979A JPS5646530A (en) 1979-09-25 1979-09-25 Preparation of resist pattern

Publications (2)

Publication Number Publication Date
JPS5646530A true JPS5646530A (en) 1981-04-27
JPS6230492B2 JPS6230492B2 (en) 1987-07-02

Family

ID=14846398

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12285979A Granted JPS5646530A (en) 1979-09-25 1979-09-25 Preparation of resist pattern

Country Status (1)

Country Link
JP (1) JPS5646530A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59155921A (en) * 1983-02-25 1984-09-05 Fujitsu Ltd Formation of resist pattern
JPS6046026A (en) * 1983-08-23 1985-03-12 Sanyo Electric Co Ltd Forming method of resist pattern
JPS63114127A (en) * 1986-10-31 1988-05-19 Hitachi Ltd Forming method for pattern
JPH01227149A (en) * 1988-03-08 1989-09-11 Sanyo Electric Co Ltd Pattern forming method
JPH02196241A (en) * 1989-01-25 1990-08-02 Rohm Co Ltd Resist pattern forming method

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59155921A (en) * 1983-02-25 1984-09-05 Fujitsu Ltd Formation of resist pattern
JPS6046026A (en) * 1983-08-23 1985-03-12 Sanyo Electric Co Ltd Forming method of resist pattern
JPS63114127A (en) * 1986-10-31 1988-05-19 Hitachi Ltd Forming method for pattern
JPH01227149A (en) * 1988-03-08 1989-09-11 Sanyo Electric Co Ltd Pattern forming method
JPH02196241A (en) * 1989-01-25 1990-08-02 Rohm Co Ltd Resist pattern forming method
JPH0579982B2 (en) * 1989-01-25 1993-11-05 Rohm Kk

Also Published As

Publication number Publication date
JPS6230492B2 (en) 1987-07-02

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