ATE178997T1 - Behandlung eines photoresists zwecks verbesserter auflösung - Google Patents

Behandlung eines photoresists zwecks verbesserter auflösung

Info

Publication number
ATE178997T1
ATE178997T1 AT94308449T AT94308449T ATE178997T1 AT E178997 T1 ATE178997 T1 AT E178997T1 AT 94308449 T AT94308449 T AT 94308449T AT 94308449 T AT94308449 T AT 94308449T AT E178997 T1 ATE178997 T1 AT E178997T1
Authority
AT
Austria
Prior art keywords
photoresist layer
tacky
sheet
support sheet
circuit board
Prior art date
Application number
AT94308449T
Other languages
English (en)
Inventor
Charles T Conrad
Original Assignee
Morton Int Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Morton Int Inc filed Critical Morton Int Inc
Application granted granted Critical
Publication of ATE178997T1 publication Critical patent/ATE178997T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/161—Coating processes; Apparatus therefor using a previously coated surface, e.g. by stamping or by transfer lamination
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/11—Treatments characterised by their effect, e.g. heating, cooling, roughening
    • H05K2203/1105—Heating or thermal processing not related to soldering, firing, curing or laminating, e.g. for shaping the substrate or during finish plating

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
AT94308449T 1992-12-18 1994-11-16 Behandlung eines photoresists zwecks verbesserter auflösung ATE178997T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/992,934 US5391458A (en) 1992-12-18 1992-12-18 Photoresist processing for improved resolution having a bake step to remove the tackiness of the laminated photosensitive layer prior to contact imagewise exposure
EP94308449A EP0713146B1 (de) 1992-12-18 1994-11-16 Behandlung eines Photoresists zwecks verbesserter Auflösung

Publications (1)

Publication Number Publication Date
ATE178997T1 true ATE178997T1 (de) 1999-04-15

Family

ID=26137386

Family Applications (1)

Application Number Title Priority Date Filing Date
AT94308449T ATE178997T1 (de) 1992-12-18 1994-11-16 Behandlung eines photoresists zwecks verbesserter auflösung

Country Status (5)

Country Link
US (1) US5391458A (de)
EP (1) EP0713146B1 (de)
AT (1) ATE178997T1 (de)
DE (1) DE69417901T2 (de)
ES (1) ES2132349T3 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5714079A (en) * 1995-06-12 1998-02-03 Eastman Kodak Company Method for making a thin gauge metallic article with electrical insulation on one side
JPH09171953A (ja) * 1995-12-20 1997-06-30 Sony Corp 基板加熱装置、基板加熱方法および半導体集積回路装置、フォトマスクならびに液晶表示装置
US5993945A (en) * 1996-05-30 1999-11-30 International Business Machines Corporation Process for high resolution photoimageable dielectric
US6022670A (en) * 1997-05-08 2000-02-08 International Business Machines Corporation Process for high resolution photoimageable dielectric
US6027858A (en) * 1997-06-06 2000-02-22 International Business Machines Corporation Process for tenting PTH's with PID dry film
TWI306955B (en) * 2006-03-09 2009-03-01 Au Optronics Corp Method for fabricating color filters
JP2011003692A (ja) * 2009-06-18 2011-01-06 Oki Semiconductor Co Ltd ウェハの裏面エッチング方法
JP5718342B2 (ja) * 2009-10-16 2015-05-13 エンパイア テクノロジー ディベロップメント エルエルシー 半導体ウェーハにフィルムを付加する装置および方法ならびに半導体ウェーハを処理する方法
CN109426070A (zh) * 2017-08-25 2019-03-05 京东方科技集团股份有限公司 光刻胶组合物、金属图案以及阵列基板的制备方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4530896A (en) * 1970-03-03 1985-07-23 Shipley Company Inc. Photosensitive laminate
US3703373A (en) * 1970-06-15 1972-11-21 Eastman Kodak Co Processes and elements for preparation of photomechanical images
US3953309A (en) * 1972-12-14 1976-04-27 Dynachem Corporation Polymerization compositions and processes having polymeric binding agents
US4241165A (en) * 1978-09-05 1980-12-23 Motorola, Inc. Plasma development process for photoresist
DE3131448A1 (de) * 1981-08-07 1983-02-24 Basf Ag, 6700 Ludwigshafen Fuer die herstellung von photoresistschichten geeignete photopolymerisierbare aufzeichnungsmasse
DE3236560A1 (de) * 1982-10-02 1984-04-05 Hoechst Ag, 6230 Frankfurt Lichtempfindliches schichtuebertragungsmaterial und verfahren zur herstellung einer photoresistschablone
US4897337A (en) * 1983-01-19 1990-01-30 Tokyo Shibaura Denki Kabushiki Kaisha Method and apparatus for forming resist pattern
DE3565013D1 (en) * 1984-02-10 1988-10-20 Ciba Geigy Ag Process for the preparation of a protection layer or a relief pattern
DE3447357A1 (de) * 1984-12-24 1986-07-03 Basf Ag, 6700 Ludwigshafen Trockenfilmresist und verfahren zur herstellung von resistmustern
US4780392A (en) * 1985-08-02 1988-10-25 Hoechst Celanese Corporation Radiation-polymerizable composition and element containing a photopolymerizable acrylic monomer
US4725254A (en) * 1986-11-24 1988-02-16 Allied Corporation Method for manufacturing a center electrode for a spark plug
JP2750431B2 (ja) * 1987-12-16 1998-05-13 日本合成化学工業株式会社 画像形成方法
US4889790A (en) * 1988-02-26 1989-12-26 Morton Thiokol, Inc. Method of forming a conformable mask on a printed circuit board
US4945032A (en) * 1988-03-31 1990-07-31 Desoto, Inc. Stereolithography using repeated exposures to increase strength and reduce distortion
JPH0820733B2 (ja) * 1988-08-11 1996-03-04 富士写真フイルム株式会社 ドライフイルムレジスト用光重合性組成物
JP2901686B2 (ja) * 1990-02-28 1999-06-07 株式会社きもと 画像形成材料及び画像形成方法

Also Published As

Publication number Publication date
EP0713146A1 (de) 1996-05-22
EP0713146B1 (de) 1999-04-14
DE69417901T2 (de) 1999-08-12
US5391458A (en) 1995-02-21
DE69417901D1 (de) 1999-05-20
ES2132349T3 (es) 1999-08-16

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Legal Events

Date Code Title Description
REN Ceased due to non-payment of the annual fee