GB1283898A - Etching process - Google Patents
Etching processInfo
- Publication number
- GB1283898A GB1283898A GB29168/71A GB2916871A GB1283898A GB 1283898 A GB1283898 A GB 1283898A GB 29168/71 A GB29168/71 A GB 29168/71A GB 2916871 A GB2916871 A GB 2916871A GB 1283898 A GB1283898 A GB 1283898A
- Authority
- GB
- United Kingdom
- Prior art keywords
- areas
- exposed
- etching
- area
- resist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- ing And Chemical Polishing (AREA)
Abstract
1283898 Etching NATIONAL CASH REGISTER CO 22 June 1971 [8 July 1970] 29168/71 Heading B6J A method of etching a relief pattern on a surface, e.g. a tool steel printing cylinder, whilst avoiding undercutting comprises applying to said surface a first photoresist layer, exposing it through a mask and removing the unexposed resist portions to leave an area or areas of exposed resist corresponding with said pattern, applying to the said area or areas and to the remaining uncovered portions of the surface a second photoresist layer and exposing this layer through a mask, removing the exposed portions of said second layer to leave an area or areas of unexposed resist covering and extending beyond the edges of said area or areas of exposed resist, etching, e.g. using a mixture of ferrous and ferric chloride sprayed at 45 p.s.i.g. and 130‹ F. for 3 minutes, the uncovered portions of the surface, removing the unexposed resist, e.g. by immersion in caustic soda at 130‹ F. for 60-90 seconds, etching again, e.g. for 6 minutes, and removing said exposed resist, e.g. by immersion in an acidic solution of xylene, methylene chloride and methyl cellosolve acetate. The photoresist may be exposed by ultra-violet light.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US5315170A | 1970-07-08 | 1970-07-08 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1283898A true GB1283898A (en) | 1972-08-02 |
Family
ID=21982268
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB29168/71A Expired GB1283898A (en) | 1970-07-08 | 1971-06-22 | Etching process |
Country Status (8)
Country | Link |
---|---|
BE (1) | BE769537A (en) |
CA (1) | CA947562A (en) |
CH (1) | CH550672A (en) |
DE (1) | DE2133230A1 (en) |
FR (1) | FR2100332A5 (en) |
GB (1) | GB1283898A (en) |
IT (1) | IT943517B (en) |
ZA (1) | ZA714171B (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2192254A (en) * | 1986-07-02 | 1988-01-06 | Nippon Tenshashi Kk | Metal roller |
CN112430814A (en) * | 2020-12-14 | 2021-03-02 | 浙江一益医疗器械有限公司 | Needle tube etching method |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4123272A (en) * | 1977-05-17 | 1978-10-31 | E. I. Du Pont De Nemours And Company | Double-negative positive-working photohardenable elements |
ES2666820T3 (en) * | 2013-11-25 | 2018-05-08 | Akk Gmbh | Template for surface structuring by acid etching |
-
1971
- 1971-03-30 CA CA109,145A patent/CA947562A/en not_active Expired
- 1971-06-22 GB GB29168/71A patent/GB1283898A/en not_active Expired
- 1971-06-25 ZA ZA714171A patent/ZA714171B/en unknown
- 1971-07-03 DE DE19712133230 patent/DE2133230A1/en active Pending
- 1971-07-05 BE BE769537A patent/BE769537A/en unknown
- 1971-07-06 IT IT7277/71A patent/IT943517B/en active
- 1971-07-07 FR FR7124769A patent/FR2100332A5/fr not_active Expired
- 1971-07-08 CH CH1007471A patent/CH550672A/en not_active IP Right Cessation
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2192254A (en) * | 1986-07-02 | 1988-01-06 | Nippon Tenshashi Kk | Metal roller |
GB2192254B (en) * | 1986-07-02 | 1990-03-21 | Nippon Tenshashi Kk | Metal roller |
CN112430814A (en) * | 2020-12-14 | 2021-03-02 | 浙江一益医疗器械有限公司 | Needle tube etching method |
CN112430814B (en) * | 2020-12-14 | 2023-02-17 | 浙江一益医疗器械有限公司 | Needle tube etching method |
Also Published As
Publication number | Publication date |
---|---|
DE2133230A1 (en) | 1972-01-13 |
FR2100332A5 (en) | 1972-03-17 |
CA947562A (en) | 1974-05-21 |
IT943517B (en) | 1973-04-10 |
BE769537A (en) | 1971-11-16 |
ZA714171B (en) | 1972-03-29 |
CH550672A (en) | 1974-06-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
GB1522580A (en) | Metallizing a substrate | |
SE7507761L (en) | WAY TO TREAT PRINTING PLATES. | |
MY140694A (en) | Pattern forming method and treating agent therefor | |
GB1283898A (en) | Etching process | |
GB1501194A (en) | Photoresist process | |
JPS5339075A (en) | Step and repeat exposure method of masks | |
DE69417901D1 (en) | Treatment of a photoresist for improved resolution | |
JPS53147531A (en) | Forming method for thin film pattern | |
JPS54141573A (en) | Mask for exposure | |
GB1453253A (en) | Photomasking method | |
JPS55135837A (en) | Manufacture of photomask | |
JPS56137632A (en) | Pattern forming | |
GB1282126A (en) | Method of forming a pattern on a metal roll surface | |
JPS51114931A (en) | Photoresist pattern formation method | |
JPS5758317A (en) | Method for forming pattern | |
JPS5396678A (en) | Method and apparatus for mask pattern exposure | |
JPS5217530A (en) | Method for masking an inorganic coating | |
JPS53135578A (en) | Mark protection method | |
GB721873A (en) | Process for deep-etching of metal photo-mechanical printing plates | |
JPS5656633A (en) | Manufacture of semiconductor element | |
JPS5255866A (en) | Etching method | |
JPS56144539A (en) | Formation of fine pattern | |
JPS56137622A (en) | Forming of cross pattern electrode | |
JPS5381079A (en) | Mask forming method | |
FR1594635A (en) |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PCNP | Patent ceased through non-payment of renewal fee |