DE3247345A1 - Einrichtung zur kontinuierlichen ablagerung einer trockensubstanzschicht auf der oberflaeche eines auf hohe temperatur gebrachten substrats - Google Patents

Einrichtung zur kontinuierlichen ablagerung einer trockensubstanzschicht auf der oberflaeche eines auf hohe temperatur gebrachten substrats

Info

Publication number
DE3247345A1
DE3247345A1 DE19823247345 DE3247345A DE3247345A1 DE 3247345 A1 DE3247345 A1 DE 3247345A1 DE 19823247345 DE19823247345 DE 19823247345 DE 3247345 A DE3247345 A DE 3247345A DE 3247345 A1 DE3247345 A1 DE 3247345A1
Authority
DE
Germany
Prior art keywords
fan
nozzle
nozzles
substrate
glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE19823247345
Other languages
German (de)
English (en)
Other versions
DE3247345C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Otto 1227 Carouge Baumberger
Reinhard 4803 Vordenwald Kalbskopf
Serge 84100 Orange Masson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Societa Italiana Vetro SIV SpA
Original Assignee
Societa Italiana Vetro SIV SpA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Societa Italiana Vetro SIV SpA filed Critical Societa Italiana Vetro SIV SpA
Publication of DE3247345A1 publication Critical patent/DE3247345A1/de
Application granted granted Critical
Publication of DE3247345C2 publication Critical patent/DE3247345C2/de
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/453—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Metallurgy (AREA)
  • Surface Treatment Of Glass (AREA)
  • Chemical Vapour Deposition (AREA)
  • Carbon Steel Or Casting Steel Manufacturing (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Aerodynamic Tests, Hydrodynamic Tests, Wind Tunnels, And Water Tanks (AREA)
  • Nozzles (AREA)
  • Coating With Molten Metal (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Sampling And Sample Adjustment (AREA)
DE19823247345 1981-12-22 1982-12-17 Einrichtung zur kontinuierlichen ablagerung einer trockensubstanzschicht auf der oberflaeche eines auf hohe temperatur gebrachten substrats Granted DE3247345A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH821181A CH643469A5 (fr) 1981-12-22 1981-12-22 Installation pour deposer en continu, sur la surface d'un substrat porte a haute temperature, une couche d'une matiere solide.

Publications (2)

Publication Number Publication Date
DE3247345A1 true DE3247345A1 (de) 1983-06-30
DE3247345C2 DE3247345C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1992-01-23

Family

ID=4336860

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19823247345 Granted DE3247345A1 (de) 1981-12-22 1982-12-17 Einrichtung zur kontinuierlichen ablagerung einer trockensubstanzschicht auf der oberflaeche eines auf hohe temperatur gebrachten substrats

Country Status (23)

Country Link
US (1) US4446815A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS58114726A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
KR (1) KR890000873B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
AU (1) AU551974B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
BE (1) BE895412A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
BR (1) BR8207390A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
CA (1) CA1197375A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
CH (1) CH643469A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
CS (1) CS235977B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DD (1) DD204907A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE3247345A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DK (1) DK161808C (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
ES (1) ES518406A0 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
FR (1) FR2518429B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
GB (1) GB2113120B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
IT (1) IT1155007B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
LU (1) LU84539A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
MX (1) MX157630A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
NL (1) NL8204898A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
PL (1) PL133525B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
SE (1) SE451112B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
TR (1) TR21862A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
ZA (1) ZA829305B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102014117492A1 (de) * 2014-11-28 2016-06-02 Aixtron Se Vorrichtung zum Abscheiden einer Schicht auf einem Substrat
DE102021133627A1 (de) 2021-12-17 2023-06-22 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein Vorrichtung zum Beschichten eines bandförmigen Substrates mit einer Parylene-Schicht

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EP0173715B1 (en) * 1984-02-13 1992-04-22 SCHMITT, Jerome J. III Method and apparatus for the gas jet deposition of conducting and dielectric thin solid films and products produced thereby
JPS6169961A (ja) * 1984-09-13 1986-04-10 Agency Of Ind Science & Technol 霧化薄膜作製装置用ノズル
AT386762B (de) * 1985-05-08 1988-10-10 Zimmer Johannes Verfahren und vorrichtung zum impraegnierenden und/oder beschichtenden auftragen auf eine warenbahn
US5160543A (en) * 1985-12-20 1992-11-03 Canon Kabushiki Kaisha Device for forming a deposited film
US4928627A (en) * 1985-12-23 1990-05-29 Atochem North America, Inc. Apparatus for coating a substrate
US5391232A (en) * 1985-12-26 1995-02-21 Canon Kabushiki Kaisha Device for forming a deposited film
AT396340B (de) * 1986-11-17 1993-08-25 Zimmer Johannes Verfahren und vorrichtung zum impraegnierenden und/oder beschichtenden auftragen fluessiger, gegebenenfalls verschaeumter substanzen
US4793282A (en) * 1987-05-18 1988-12-27 Libbey-Owens-Ford Co. Distributor beam for chemical vapor deposition on glass
JPH0647073B2 (ja) * 1988-07-08 1994-06-22 忠弘 大見 プロセス装置用ガス供給配管装置
US5313982A (en) * 1988-07-08 1994-05-24 Tadahiro Ohmi Gas supply piping device for a process apparatus
US5906688A (en) * 1989-01-11 1999-05-25 Ohmi; Tadahiro Method of forming a passivation film
US5591267A (en) * 1988-01-11 1997-01-07 Ohmi; Tadahiro Reduced pressure device
GB8824102D0 (en) * 1988-10-14 1988-11-23 Pilkington Plc Apparatus for coating glass
US5789086A (en) * 1990-03-05 1998-08-04 Ohmi; Tadahiro Stainless steel surface having passivation film
US5136975A (en) * 1990-06-21 1992-08-11 Watkins-Johnson Company Injector and method for delivering gaseous chemicals to a surface
US6379466B1 (en) * 1992-01-17 2002-04-30 Applied Materials, Inc. Temperature controlled gas distribution plate
GB9300400D0 (en) * 1993-01-11 1993-03-03 Glaverbel A device and method for forming a coating by pyrolysis
US5599387A (en) * 1993-02-16 1997-02-04 Ppg Industries, Inc. Compounds and compositions for coating glass with silicon oxide
US5863337A (en) * 1993-02-16 1999-01-26 Ppg Industries, Inc. Apparatus for coating a moving glass substrate
US5356718A (en) 1993-02-16 1994-10-18 Ppg Industries, Inc. Coating apparatus, method of coating glass, compounds and compositions for coating glasss and coated glass substrates
DE4325011A1 (de) * 1993-07-28 1995-03-02 Herlitz Michael Erweiterung von Entspiegelung wie bei Brillengläsern üblich auf Autoglasscheiben sowie weitere Kraftfahrzeuge und Verkehrsmittel, sowie alle anderen Silikat- und Kunststoffscheiben
US5425810A (en) * 1994-05-11 1995-06-20 Internation Business Machines Corporation Removable gas injectors for use in chemical vapor deposition of aluminium oxide
US6200389B1 (en) 1994-07-18 2001-03-13 Silicon Valley Group Thermal Systems Llc Single body injector and deposition chamber
TW359943B (en) * 1994-07-18 1999-06-01 Silicon Valley Group Thermal Single body injector and method for delivering gases to a surface
US6022414A (en) * 1994-07-18 2000-02-08 Semiconductor Equipment Group, Llc Single body injector and method for delivering gases to a surface
FR2724923B1 (fr) * 1994-09-27 1996-12-20 Saint Gobain Vitrage Technique de depot de revetements par pyrolyse de composition de gaz precurseur(s)
TW356554B (en) * 1995-10-23 1999-04-21 Watkins Johnson Co Gas injection system for semiconductor processing
US5698262A (en) * 1996-05-06 1997-12-16 Libbey-Owens-Ford Co. Method for forming tin oxide coating on glass
US6055927A (en) * 1997-01-14 2000-05-02 Applied Komatsu Technology, Inc. Apparatus and method for white powder reduction in silicon nitride deposition using remote plasma source cleaning technology
US5938851A (en) * 1997-04-14 1999-08-17 Wj Semiconductor Equipment Group, Inc. Exhaust vent assembly for chemical vapor deposition systems
US6103015A (en) * 1998-01-19 2000-08-15 Libbey-Owens-Ford Co. Symmetrical CVD coater with lower upstream exhaust toe
US20010040230A1 (en) * 1999-11-30 2001-11-15 Woo Sik Yoo Compact gate valve
US6302965B1 (en) * 2000-08-15 2001-10-16 Applied Materials, Inc. Dispersion plate for flowing vaporizes compounds used in chemical vapor deposition of films onto semiconductor surfaces
US6698718B2 (en) 2001-08-29 2004-03-02 Wafermasters, Inc. Rotary valve
JP4124046B2 (ja) * 2003-07-10 2008-07-23 株式会社大阪チタニウムテクノロジーズ 金属酸化物被膜の成膜方法および蒸着装置
DE102006043543B4 (de) * 2006-09-12 2012-05-10 Innovent E.V. Homogenisator für der Beschichtung von Oberflächen dienende Gasströme
DE102006043542B4 (de) * 2006-09-12 2012-05-16 Innovent E.V. Verfahren zum Beschichten von Oberflächen
JP2008169437A (ja) * 2007-01-11 2008-07-24 Mitsubishi Heavy Ind Ltd 製膜装置
WO2009143142A2 (en) * 2008-05-19 2009-11-26 E. I. Du Pont De Nemours And Company Apparatus and method of vapor coating in an electronic device
US20100212591A1 (en) * 2008-05-30 2010-08-26 Alta Devices, Inc. Reactor lid assembly for vapor deposition
WO2010065695A2 (en) * 2008-12-04 2010-06-10 Veeco Instruments Inc. Chemical vapor deposition flow inlet elements and methods
US8931431B2 (en) * 2009-03-25 2015-01-13 The Regents Of The University Of Michigan Nozzle geometry for organic vapor jet printing
TR201903701T4 (tr) 2011-03-23 2019-04-22 Pilkington Group Ltd İnce film kaplamaların çöktürülmesi için düzenek ve bu düzeneğin kullanılması için çöktürme usulü.
WO2013008895A1 (ja) 2011-07-12 2013-01-17 旭硝子株式会社 積層膜付きガラス基板の製造方法
WO2013008897A1 (ja) 2011-07-12 2013-01-17 旭硝子株式会社 積層膜付きガラス基板の製造方法
CN104310796A (zh) * 2014-09-26 2015-01-28 蓝思科技（长沙）有限公司 一种玻璃材料表面as膜方法及其装置
US11588140B2 (en) * 2018-01-12 2023-02-21 Universal Display Corporation Organic vapor jet print head for depositing thin film features with high thickness uniformity

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2123274A1 (en) * 1971-04-16 1972-11-02 Aktiengesellschaft Brown, Boveri & Cie., Baden (Schweiz) Oxydic semiconductor film - on glass substrate by vapour deposition through coaxial nozzles
US3850679A (en) * 1972-12-15 1974-11-26 Ppg Industries Inc Chemical vapor deposition of coatings
US3888649A (en) * 1972-12-15 1975-06-10 Ppg Industries Inc Nozzle for chemical vapor deposition of coatings
FR2288068A1 (fr) * 1974-10-15 1976-05-14 Boussois Sa Procede et dispositif pour deposer par pulverisation d'un liquide une couche mince a la surface d'un materiau en feuille, notamment pour le traitement a chaud d'une feuille de verre
GB1507996A (en) * 1975-06-11 1978-04-19 Pilkington Brothers Ltd Coating glass
GB2044137A (en) * 1979-02-14 1980-10-15 Italiana Vetrosiv Spa Soc Process for continuously depositing a layer of a solid material on the surface of a substrate heated to a high temperature and installation for carrying out said process
EP0023471A1 (fr) * 1979-07-31 1981-02-04 SOCIETA ITALIANA VETRO - SIV SpA Procédé pour déposer sur un substrat de verre un revêtement adhérent d'oxyde d'étain
EP0029809A1 (fr) * 1979-11-21 1981-06-03 SOCIETA ITALIANA VETRO - SIV SpA Buse pour déposer en continu sur un substrat une couche d'une matière solide
GB2068937A (en) * 1980-01-31 1981-08-19 Bfg Glassgroup Coating hot glass with metals or metal compounds, especially oxides

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Publication number Priority date Publication date Assignee Title
US4088471A (en) * 1974-06-14 1978-05-09 Pilkington Brothers Limited Apparatus for coating glass
GB1524326A (en) * 1976-04-13 1978-09-13 Bfg Glassgroup Coating of glass
GB1516032A (en) * 1976-04-13 1978-06-28 Bfg Glassgroup Coating of glass

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2123274A1 (en) * 1971-04-16 1972-11-02 Aktiengesellschaft Brown, Boveri & Cie., Baden (Schweiz) Oxydic semiconductor film - on glass substrate by vapour deposition through coaxial nozzles
US3850679A (en) * 1972-12-15 1974-11-26 Ppg Industries Inc Chemical vapor deposition of coatings
US3888649A (en) * 1972-12-15 1975-06-10 Ppg Industries Inc Nozzle for chemical vapor deposition of coatings
FR2288068A1 (fr) * 1974-10-15 1976-05-14 Boussois Sa Procede et dispositif pour deposer par pulverisation d'un liquide une couche mince a la surface d'un materiau en feuille, notamment pour le traitement a chaud d'une feuille de verre
GB1507996A (en) * 1975-06-11 1978-04-19 Pilkington Brothers Ltd Coating glass
GB2044137A (en) * 1979-02-14 1980-10-15 Italiana Vetrosiv Spa Soc Process for continuously depositing a layer of a solid material on the surface of a substrate heated to a high temperature and installation for carrying out said process
EP0023471A1 (fr) * 1979-07-31 1981-02-04 SOCIETA ITALIANA VETRO - SIV SpA Procédé pour déposer sur un substrat de verre un revêtement adhérent d'oxyde d'étain
EP0029809A1 (fr) * 1979-11-21 1981-06-03 SOCIETA ITALIANA VETRO - SIV SpA Buse pour déposer en continu sur un substrat une couche d'une matière solide
GB2068937A (en) * 1980-01-31 1981-08-19 Bfg Glassgroup Coating hot glass with metals or metal compounds, especially oxides

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102014117492A1 (de) * 2014-11-28 2016-06-02 Aixtron Se Vorrichtung zum Abscheiden einer Schicht auf einem Substrat
DE102021133627A1 (de) 2021-12-17 2023-06-22 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein Vorrichtung zum Beschichten eines bandförmigen Substrates mit einer Parylene-Schicht

Also Published As

Publication number Publication date
DE3247345C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1992-01-23
MX157630A (es) 1988-12-07
CA1197375A (en) 1985-12-03
DK562382A (da) 1983-06-23
FR2518429B1 (fr) 1985-12-13
DK161808B (da) 1991-08-19
ES8400998A1 (es) 1983-12-01
SE451112B (sv) 1987-09-07
KR890000873B1 (ko) 1989-04-12
GB2113120B (en) 1985-11-20
DD204907A5 (de) 1983-12-14
AU551974B2 (en) 1986-05-15
ZA829305B (en) 1983-09-28
ES518406A0 (es) 1983-12-01
IT8224840A1 (it) 1984-06-17
AU9146982A (en) 1985-04-26
NL8204898A (nl) 1983-07-18
IT8224840A0 (it) 1982-12-17
BE895412A (fr) 1983-06-20
GB2113120A (en) 1983-08-03
DK161808C (da) 1992-01-20
IT1155007B (it) 1987-01-21
BR8207390A (pt) 1983-10-18
SE8207254L (sv) 1983-06-23
CH643469A5 (fr) 1984-06-15
TR21862A (tr) 1985-10-01
FR2518429A1 (fr) 1983-06-24
LU84539A1 (fr) 1984-03-07
JPS58114726A (ja) 1983-07-08
PL133525B1 (en) 1985-06-29
SE8207254D0 (sv) 1982-12-20
JPH0435558B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1992-06-11
KR840002670A (ko) 1984-07-16
CS235977B2 (en) 1985-05-15
US4446815A (en) 1984-05-08
PL239652A1 (en) 1983-07-04

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