DE2546957C3 - Verfahren zur Reinigung von Halogensilanen - Google Patents
Verfahren zur Reinigung von HalogensilanenInfo
- Publication number
- DE2546957C3 DE2546957C3 DE2546957A DE2546957A DE2546957C3 DE 2546957 C3 DE2546957 C3 DE 2546957C3 DE 2546957 A DE2546957 A DE 2546957A DE 2546957 A DE2546957 A DE 2546957A DE 2546957 C3 DE2546957 C3 DE 2546957C3
- Authority
- DE
- Germany
- Prior art keywords
- halosilanes
- trichlorosilane
- boron
- halosilane
- silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 title claims description 21
- 238000004140 cleaning Methods 0.000 title claims description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 21
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 claims description 17
- 239000005052 trichlorosilane Substances 0.000 claims description 17
- 238000009835 boiling Methods 0.000 claims description 15
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 10
- 229910052796 boron Inorganic materials 0.000 claims description 10
- 150000004760 silicates Chemical class 0.000 claims description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 6
- 238000004821 distillation Methods 0.000 claims description 4
- 239000012535 impurity Substances 0.000 claims description 4
- 238000000746 purification Methods 0.000 claims description 4
- 239000007858 starting material Substances 0.000 claims description 4
- 239000007791 liquid phase Substances 0.000 claims description 3
- 239000000741 silica gel Substances 0.000 claims description 3
- 229910002027 silica gel Inorganic materials 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 description 15
- 239000010703 silicon Substances 0.000 description 15
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 12
- 150000001638 boron Chemical class 0.000 description 6
- 229910052739 hydrogen Inorganic materials 0.000 description 6
- 239000001257 hydrogen Substances 0.000 description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- -1 trichlorosilane Chemical class 0.000 description 5
- 150000001639 boron compounds Chemical class 0.000 description 4
- 238000000354 decomposition reaction Methods 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 description 4
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical group [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910000077 silane Inorganic materials 0.000 description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- 239000005909 Kieselgur Substances 0.000 description 1
- 229910004028 SiCU Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- NIMPFLPHNFUHNK-UHFFFAOYSA-N [Si].Cl[SiH](Cl)Cl Chemical compound [Si].Cl[SiH](Cl)Cl NIMPFLPHNFUHNK-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000003463 adsorbent Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000004508 fractional distillation Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000004857 zone melting Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/04—Hydrides of silicon
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G17/00—Compounds of germanium
- C01G17/04—Halides of germanium
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
Priority Applications (12)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2546957A DE2546957C3 (de) | 1975-10-20 | 1975-10-20 | Verfahren zur Reinigung von Halogensilanen |
| GB37432/76A GB1556830A (en) | 1975-10-20 | 1976-09-09 | Purification of halogenosilanes and halogenogermanes |
| NL7610374A NL7610374A (nl) | 1975-10-20 | 1976-09-17 | Werkwijze voor het zuiveren van halogeensilanen. |
| DK426476A DK426476A (da) | 1975-10-20 | 1976-09-22 | Fremgangsmade til rensning af halogensilaner |
| FR7628523A FR2328659A1 (fr) | 1975-10-20 | 1976-09-22 | Procede de purification d'halogenosilanes |
| US05/732,269 US4112057A (en) | 1975-10-20 | 1976-10-14 | Process for purifying halogenosilanes |
| IT51774/76A IT1069277B (it) | 1975-10-20 | 1976-10-18 | Procedimento ed impianto per la depurazione di alogenosilani |
| CA263,603A CA1079679A (en) | 1975-10-20 | 1976-10-18 | Process for purifying halogenosilanes and halogenogermanes |
| BE171593A BE847392A (fr) | 1975-10-20 | 1976-10-18 | Procede de purification d'halogenosilanes, |
| NO763550A NO763550L (enExample) | 1975-10-20 | 1976-10-19 | |
| SE7611604A SE7611604L (sv) | 1975-10-20 | 1976-10-19 | Forfarande for rening av halogensilaner |
| JP51126009A JPS5250996A (en) | 1975-10-20 | 1976-10-20 | Refining process for silane halide |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2546957A DE2546957C3 (de) | 1975-10-20 | 1975-10-20 | Verfahren zur Reinigung von Halogensilanen |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| DE2546957A1 DE2546957A1 (de) | 1977-04-21 |
| DE2546957B2 DE2546957B2 (de) | 1980-02-21 |
| DE2546957C3 true DE2546957C3 (de) | 1980-10-23 |
Family
ID=5959600
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE2546957A Expired DE2546957C3 (de) | 1975-10-20 | 1975-10-20 | Verfahren zur Reinigung von Halogensilanen |
Country Status (12)
| Country | Link |
|---|---|
| US (1) | US4112057A (enExample) |
| JP (1) | JPS5250996A (enExample) |
| BE (1) | BE847392A (enExample) |
| CA (1) | CA1079679A (enExample) |
| DE (1) | DE2546957C3 (enExample) |
| DK (1) | DK426476A (enExample) |
| FR (1) | FR2328659A1 (enExample) |
| GB (1) | GB1556830A (enExample) |
| IT (1) | IT1069277B (enExample) |
| NL (1) | NL7610374A (enExample) |
| NO (1) | NO763550L (enExample) |
| SE (1) | SE7611604L (enExample) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0054650B1 (de) * | 1980-12-24 | 1986-01-29 | Hüls Troisdorf Aktiengesellschaft | Verfahren zum Reinigen von Chlorsilanen |
| WO1983003244A1 (en) * | 1982-03-18 | 1983-09-29 | Gen Electric | Purification of silicon halides |
| US4755370A (en) * | 1982-03-18 | 1988-07-05 | General Electric Company | Purification of silicon halides |
| US4713230A (en) * | 1982-09-29 | 1987-12-15 | Dow Corning Corporation | Purification of chlorosilanes |
| CA1207127A (en) | 1982-09-29 | 1986-07-08 | Dow Corning Corporation | Purification of chlorosilanes |
| JP2532313B2 (ja) * | 1991-06-07 | 1996-09-11 | 株式会社 半導体エネルギー研究所 | 高圧容器 |
| JP2564731B2 (ja) * | 1992-05-12 | 1996-12-18 | 株式会社 半導体エネルギー研究所 | 反応性気体が充填された高圧容器の作製方法 |
| DE102007014107A1 (de) * | 2007-03-21 | 2008-09-25 | Evonik Degussa Gmbh | Aufarbeitung borhaltiger Chlorsilanströme |
| DE112008002299T5 (de) | 2007-08-29 | 2010-07-22 | Dynamic Engineering, Inc., Sturgis | Verfahren zur Herstellung von Trichlorsilan |
| US20090060819A1 (en) * | 2007-08-29 | 2009-03-05 | Bill Jr Jon M | Process for producing trichlorosilane |
| JP4659798B2 (ja) | 2007-09-05 | 2011-03-30 | 信越化学工業株式会社 | トリクロロシランの製造方法 |
| JP4714198B2 (ja) | 2007-09-05 | 2011-06-29 | 信越化学工業株式会社 | クロロシラン類の精製方法 |
| JP4714196B2 (ja) * | 2007-09-05 | 2011-06-29 | 信越化学工業株式会社 | トリクロロシランの製造方法および多結晶シリコンの製造方法 |
| JP4714197B2 (ja) | 2007-09-05 | 2011-06-29 | 信越化学工業株式会社 | トリクロロシランの製造方法および多結晶シリコンの製造方法 |
| DE102007050199A1 (de) * | 2007-10-20 | 2009-04-23 | Evonik Degussa Gmbh | Entfernung von Fremdmetallen aus anorganischen Silanen |
| DE102008002537A1 (de) * | 2008-06-19 | 2009-12-24 | Evonik Degussa Gmbh | Verfahren zur Entfernung von Bor enthaltenden Verunreinigungen aus Halogensilanen sowie Anlage zur Durchführung des Verfahrens |
| RU2394762C2 (ru) * | 2008-07-14 | 2010-07-20 | Общество с ограниченной ответственностью "Институт по проектированию производств органического синтеза" | Способ получения трихлорсилана |
| DE102008041334A1 (de) | 2008-08-19 | 2010-02-25 | Evonik Degussa Gmbh | Herstellung von Silizium durch Umsetzung von Siliziumoxid und Siliziumcarbid gegebenenfalls in Gegenwart einer zweiten Kohlenstoffquelle |
| NZ591317A (en) | 2008-09-30 | 2013-02-22 | Evonik Degussa Gmbh | Production of solar-grade silicon from silicon dioxide |
| US20100124525A1 (en) * | 2008-11-19 | 2010-05-20 | Kuyen Li | ZERO-HEAT-BURDEN FLUIDIZED BED REACTOR FOR HYDRO-CHLORINATION OF SiCl4 and M.G.-Si |
| KR20100073304A (ko) * | 2008-12-23 | 2010-07-01 | 삼성전자주식회사 | 대기정화장치 및 그의 대기정화방법 |
| JP5542026B2 (ja) | 2010-10-27 | 2014-07-09 | 信越化学工業株式会社 | クロロシラン類の精製方法 |
| WO2013089014A1 (ja) * | 2011-12-16 | 2013-06-20 | 東亞合成株式会社 | 高純度クロロポリシランの製造方法 |
| WO2015142942A2 (en) * | 2014-03-18 | 2015-09-24 | Matheson Tri-Gas, Inc. | Reduction of sici4 in the presence of bc13 |
| US12291458B2 (en) | 2019-11-27 | 2025-05-06 | Wacker Chemie Ag | Method for removing an impurity from a chlorosilane mixture |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1028543B (de) * | 1954-12-17 | 1958-04-24 | Siemens Ag | Verfahren zum Reinigen von mit Wasser Gel bildenden Halogeniden, insbesondere des Germaniums oder Siliciums, vorzugsweise fuer die Herstellung von Halbleiterstoffen |
| US2812235A (en) * | 1955-09-16 | 1957-11-05 | Bell Telephone Labor Inc | Method of purifying volatile compounds of germanium and silicon |
| NL235008A (enExample) * | 1958-01-11 | |||
| DE1134973B (de) * | 1958-07-15 | 1962-08-23 | Wacker Chemie Gmbh | Verfahren zur Herstellung von hochreinen Siliciumhalogeniden |
| GB877477A (en) * | 1958-10-28 | 1961-09-13 | Westinghouse Electric Corp | Improvements in or relating to the purification of halosilanes |
| US3540861A (en) * | 1968-02-07 | 1970-11-17 | Union Carbide Corp | Purification of silicon compounds |
-
1975
- 1975-10-20 DE DE2546957A patent/DE2546957C3/de not_active Expired
-
1976
- 1976-09-09 GB GB37432/76A patent/GB1556830A/en not_active Expired
- 1976-09-17 NL NL7610374A patent/NL7610374A/xx not_active Application Discontinuation
- 1976-09-22 FR FR7628523A patent/FR2328659A1/fr active Granted
- 1976-09-22 DK DK426476A patent/DK426476A/da not_active Application Discontinuation
- 1976-10-14 US US05/732,269 patent/US4112057A/en not_active Expired - Lifetime
- 1976-10-18 IT IT51774/76A patent/IT1069277B/it active
- 1976-10-18 BE BE171593A patent/BE847392A/xx unknown
- 1976-10-18 CA CA263,603A patent/CA1079679A/en not_active Expired
- 1976-10-19 NO NO763550A patent/NO763550L/no unknown
- 1976-10-19 SE SE7611604A patent/SE7611604L/xx unknown
- 1976-10-20 JP JP51126009A patent/JPS5250996A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| CA1079679A (en) | 1980-06-17 |
| NO763550L (enExample) | 1977-04-21 |
| JPS5632247B2 (enExample) | 1981-07-27 |
| GB1556830A (en) | 1979-11-28 |
| DK426476A (da) | 1977-04-21 |
| US4112057A (en) | 1978-09-05 |
| DE2546957B2 (de) | 1980-02-21 |
| JPS5250996A (en) | 1977-04-23 |
| SE7611604L (sv) | 1977-04-21 |
| DE2546957A1 (de) | 1977-04-21 |
| IT1069277B (it) | 1985-03-25 |
| FR2328659A1 (fr) | 1977-05-20 |
| FR2328659B1 (enExample) | 1978-12-15 |
| NL7610374A (nl) | 1977-04-22 |
| BE847392A (fr) | 1977-04-18 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OD | Request for examination | ||
| C3 | Grant after two publication steps (3rd publication) | ||
| 8339 | Ceased/non-payment of the annual fee |