IT1069277B - Procedimento ed impianto per la depurazione di alogenosilani - Google Patents

Procedimento ed impianto per la depurazione di alogenosilani

Info

Publication number
IT1069277B
IT1069277B IT51774/76A IT5177476A IT1069277B IT 1069277 B IT1069277 B IT 1069277B IT 51774/76 A IT51774/76 A IT 51774/76A IT 5177476 A IT5177476 A IT 5177476A IT 1069277 B IT1069277 B IT 1069277B
Authority
IT
Italy
Prior art keywords
halogenosilans
purification
plant
Prior art date
Application number
IT51774/76A
Other languages
English (en)
Original Assignee
Wacker Chemitronic
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wacker Chemitronic filed Critical Wacker Chemitronic
Application granted granted Critical
Publication of IT1069277B publication Critical patent/IT1069277B/it

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/08Compounds containing halogen
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/04Hydrides of silicon
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/08Compounds containing halogen
    • C01B33/107Halogenated silanes
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01GCOMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G17/00Compounds of germanium
    • C01G17/04Halides of germanium

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
IT51774/76A 1975-10-20 1976-10-18 Procedimento ed impianto per la depurazione di alogenosilani IT1069277B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2546957A DE2546957C3 (de) 1975-10-20 1975-10-20 Verfahren zur Reinigung von Halogensilanen

Publications (1)

Publication Number Publication Date
IT1069277B true IT1069277B (it) 1985-03-25

Family

ID=5959600

Family Applications (1)

Application Number Title Priority Date Filing Date
IT51774/76A IT1069277B (it) 1975-10-20 1976-10-18 Procedimento ed impianto per la depurazione di alogenosilani

Country Status (12)

Country Link
US (1) US4112057A (it)
JP (1) JPS5250996A (it)
BE (1) BE847392A (it)
CA (1) CA1079679A (it)
DE (1) DE2546957C3 (it)
DK (1) DK426476A (it)
FR (1) FR2328659A1 (it)
GB (1) GB1556830A (it)
IT (1) IT1069277B (it)
NL (1) NL7610374A (it)
NO (1) NO763550L (it)
SE (1) SE7611604L (it)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0054650B1 (de) * 1980-12-24 1986-01-29 Hüls Troisdorf Aktiengesellschaft Verfahren zum Reinigen von Chlorsilanen
US4755370A (en) * 1982-03-18 1988-07-05 General Electric Company Purification of silicon halides
EP0105328A4 (en) * 1982-03-18 1984-09-19 Gen Electric CLEANING OF SILICONE HALIDES.
US4713230A (en) * 1982-09-29 1987-12-15 Dow Corning Corporation Purification of chlorosilanes
CA1207127A (en) 1982-09-29 1986-07-08 Dow Corning Corporation Purification of chlorosilanes
JP2532313B2 (ja) * 1991-06-07 1996-09-11 株式会社 半導体エネルギー研究所 高圧容器
JP2564731B2 (ja) * 1992-05-12 1996-12-18 株式会社 半導体エネルギー研究所 反応性気体が充填された高圧容器の作製方法
DE102007014107A1 (de) * 2007-03-21 2008-09-25 Evonik Degussa Gmbh Aufarbeitung borhaltiger Chlorsilanströme
WO2009029794A1 (en) 2007-08-29 2009-03-05 Dynamic Engineering, Inc. Process for producing trichlorosilane
US20090060819A1 (en) * 2007-08-29 2009-03-05 Bill Jr Jon M Process for producing trichlorosilane
JP4714196B2 (ja) * 2007-09-05 2011-06-29 信越化学工業株式会社 トリクロロシランの製造方法および多結晶シリコンの製造方法
JP4714197B2 (ja) 2007-09-05 2011-06-29 信越化学工業株式会社 トリクロロシランの製造方法および多結晶シリコンの製造方法
JP4659798B2 (ja) 2007-09-05 2011-03-30 信越化学工業株式会社 トリクロロシランの製造方法
JP4714198B2 (ja) 2007-09-05 2011-06-29 信越化学工業株式会社 クロロシラン類の精製方法
DE102007050199A1 (de) * 2007-10-20 2009-04-23 Evonik Degussa Gmbh Entfernung von Fremdmetallen aus anorganischen Silanen
DE102008002537A1 (de) 2008-06-19 2009-12-24 Evonik Degussa Gmbh Verfahren zur Entfernung von Bor enthaltenden Verunreinigungen aus Halogensilanen sowie Anlage zur Durchführung des Verfahrens
DE102008041334A1 (de) * 2008-08-19 2010-02-25 Evonik Degussa Gmbh Herstellung von Silizium durch Umsetzung von Siliziumoxid und Siliziumcarbid gegebenenfalls in Gegenwart einer zweiten Kohlenstoffquelle
WO2010037694A2 (de) 2008-09-30 2010-04-08 Evonik Degussa Gmbh Herstellung von solar-silicium aus siliciumdioxid
US20100124525A1 (en) * 2008-11-19 2010-05-20 Kuyen Li ZERO-HEAT-BURDEN FLUIDIZED BED REACTOR FOR HYDRO-CHLORINATION OF SiCl4 and M.G.-Si
KR20100073304A (ko) * 2008-12-23 2010-07-01 삼성전자주식회사 대기정화장치 및 그의 대기정화방법
JP5542026B2 (ja) 2010-10-27 2014-07-09 信越化学工業株式会社 クロロシラン類の精製方法
WO2013089014A1 (ja) * 2011-12-16 2013-06-20 東亞合成株式会社 高純度クロロポリシランの製造方法
WO2015142942A2 (en) * 2014-03-18 2015-09-24 Matheson Tri-Gas, Inc. Reduction of sici4 in the presence of bc13
EP4065512B1 (de) 2019-11-27 2024-03-20 Wacker Chemie AG Verfahren zur entfernung einer verunreinigung aus einem chlorsilangemisch

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1028543B (de) * 1954-12-17 1958-04-24 Siemens Ag Verfahren zum Reinigen von mit Wasser Gel bildenden Halogeniden, insbesondere des Germaniums oder Siliciums, vorzugsweise fuer die Herstellung von Halbleiterstoffen
US2812235A (en) * 1955-09-16 1957-11-05 Bell Telephone Labor Inc Method of purifying volatile compounds of germanium and silicon
DE1073460B (de) * 1958-01-11 1960-01-21 LICENTIA Patent-Verwaltungs-G.m.b.H., Frankfurt/M Verfahren zum Reinigen von Silan oder chlorierten Silanen
DE1134973B (de) * 1958-07-15 1962-08-23 Wacker Chemie Gmbh Verfahren zur Herstellung von hochreinen Siliciumhalogeniden
GB877477A (en) * 1958-10-28 1961-09-13 Westinghouse Electric Corp Improvements in or relating to the purification of halosilanes
US3540861A (en) * 1968-02-07 1970-11-17 Union Carbide Corp Purification of silicon compounds

Also Published As

Publication number Publication date
DE2546957A1 (de) 1977-04-21
FR2328659A1 (fr) 1977-05-20
GB1556830A (en) 1979-11-28
NL7610374A (nl) 1977-04-22
DE2546957B2 (de) 1980-02-21
CA1079679A (en) 1980-06-17
FR2328659B1 (it) 1978-12-15
BE847392A (fr) 1977-04-18
US4112057A (en) 1978-09-05
DK426476A (da) 1977-04-21
NO763550L (it) 1977-04-21
SE7611604L (sv) 1977-04-21
DE2546957C3 (de) 1980-10-23
JPS5632247B2 (it) 1981-07-27
JPS5250996A (en) 1977-04-23

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