DE2251048C2 - Photopolymerisierbare Masse und deren Verwendung - Google Patents

Photopolymerisierbare Masse und deren Verwendung

Info

Publication number
DE2251048C2
DE2251048C2 DE2251048A DE2251048A DE2251048C2 DE 2251048 C2 DE2251048 C2 DE 2251048C2 DE 2251048 A DE2251048 A DE 2251048A DE 2251048 A DE2251048 A DE 2251048A DE 2251048 C2 DE2251048 C2 DE 2251048C2
Authority
DE
Germany
Prior art keywords
ethylenically unsaturated
reducing agent
photosensitizer
photopolymerizable
radicals
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE2251048A
Other languages
German (de)
English (en)
Other versions
DE2251048A1 (de
Inventor
Edward Charles Dart
Josef Runcorn Cheshire Nemcek
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Imperial Chemical Industries Ltd
Original Assignee
Imperial Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Imperial Chemical Industries Ltd filed Critical Imperial Chemical Industries Ltd
Publication of DE2251048A1 publication Critical patent/DE2251048A1/de
Anticipated expiration legal-status Critical
Application granted granted Critical
Publication of DE2251048C2 publication Critical patent/DE2251048C2/de
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/01—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to unsaturated polyesters
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/124—Carbonyl compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/908—Dental utility
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S525/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S525/92—Polyurethane having terminal ethylenic unsaturation
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S525/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S525/921—Polyester having terminal ethylenic unsaturation other than polyesterurethanes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
DE2251048A 1971-10-18 1972-10-18 Photopolymerisierbare Masse und deren Verwendung Expired - Lifetime DE2251048C2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB4836571 1971-10-18
GB980772*[A GB1408265A (en) 1971-10-18 1972-03-02 Photopolymerisable composition

Publications (2)

Publication Number Publication Date
DE2251048A1 DE2251048A1 (de) 1973-05-10
DE2251048C2 true DE2251048C2 (de) 1993-01-28

Family

ID=26243188

Family Applications (2)

Application Number Title Priority Date Filing Date
DE2251048A Expired - Lifetime DE2251048C2 (de) 1971-10-18 1972-10-18 Photopolymerisierbare Masse und deren Verwendung
DE2266023A Expired DE2266023C2 (enExample) 1971-10-18 1972-10-18

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE2266023A Expired DE2266023C2 (enExample) 1971-10-18 1972-10-18

Country Status (16)

Country Link
US (1) US4071424B1 (enExample)
JP (1) JPS5410986B2 (enExample)
AT (1) AT331507B (enExample)
BE (1) BE789950A (enExample)
CA (1) CA984210A (enExample)
CH (1) CH593305A5 (enExample)
DE (2) DE2251048C2 (enExample)
DK (1) DK147708C (enExample)
ES (1) ES407740A1 (enExample)
FR (1) FR2156760B1 (enExample)
GB (1) GB1408265A (enExample)
HK (1) HK57478A (enExample)
IT (1) IT969627B (enExample)
NL (1) NL165570C (enExample)
NO (1) NO142915C (enExample)
SE (1) SE412396C (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2751057A1 (de) * 1976-11-15 1978-05-24 Sybron Corp Photopolymerisierbare dental-wiederherstellungsmasse

Families Citing this family (199)

* Cited by examiner, † Cited by third party
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GB1412754A (en) * 1971-12-29 1975-11-05 Ici Ltd Photopolymerisable composition
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US4089763A (en) 1973-04-24 1978-05-16 Imperial Chemical Industries Limited Method of repairing teeth using a composition which is curable by irradiation with visible light
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DE2722264C2 (de) * 1977-05-17 1984-06-28 Merck Patent Gmbh, 6100 Darmstadt Verwendung von substituierten Oxyalkylphenonen als Photosensibilisatoren
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DE3069349D1 (en) * 1979-06-18 1984-11-08 Eastman Kodak Co Co-initiator compositions for photopolymerization containing 3-acyl-substituted coumarins, photopolymerizable composition and photographic element
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DE3029276A1 (de) * 1980-08-01 1982-02-18 Etablissement Dentaire Ivoclar, Schaan Photopolymerisierbare masse, insbesondere fuer dentalzwecke
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DK147708B (da) 1984-11-19
NL165570C (nl) 1983-02-16
DE2251048A1 (de) 1973-05-10
IT969627B (it) 1974-04-10
DE2266023C2 (enExample) 1989-07-20
SE412396C (sv) 1984-03-19
BE789950A (fr) 1973-04-11
CH593305A5 (enExample) 1977-11-30
AT331507B (de) 1976-08-25
ATA891072A (de) 1975-11-15
JPS4849875A (enExample) 1973-07-13
ES407740A1 (es) 1976-02-01
CA984210A (en) 1976-02-24
FR2156760B1 (enExample) 1979-01-26
NL165570B (nl) 1980-11-17
US4071424A (en) 1978-01-31
US4071424B1 (en) 1995-07-18
DK147708C (da) 1990-04-09
NL7214074A (enExample) 1973-04-24
SE412396B (sv) 1980-03-03
GB1408265A (en) 1975-10-01
NO142915B (no) 1980-08-04
HK57478A (en) 1978-10-06
FR2156760A1 (enExample) 1973-06-01
JPS5410986B2 (enExample) 1979-05-11

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