DE19927046A1 - Keramik-Metall-Substrat, insbesondere Mehrfachsubstrat - Google Patents
Keramik-Metall-Substrat, insbesondere MehrfachsubstratInfo
- Publication number
- DE19927046A1 DE19927046A1 DE19927046A DE19927046A DE19927046A1 DE 19927046 A1 DE19927046 A1 DE 19927046A1 DE 19927046 A DE19927046 A DE 19927046A DE 19927046 A DE19927046 A DE 19927046A DE 19927046 A1 DE19927046 A1 DE 19927046A1
- Authority
- DE
- Germany
- Prior art keywords
- ceramic
- metal
- substrate according
- metal substrate
- edge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 160
- 239000002184 metal Substances 0.000 title claims abstract description 160
- 239000000758 substrate Substances 0.000 title claims abstract description 134
- 239000000919 ceramic Substances 0.000 claims abstract description 35
- 230000003313 weakening effect Effects 0.000 claims description 47
- 238000001465 metallisation Methods 0.000 claims description 30
- 238000000034 method Methods 0.000 claims description 12
- 239000011888 foil Substances 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 2
- 238000012544 monitoring process Methods 0.000 claims 1
- 229910000679 solder Inorganic materials 0.000 claims 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 6
- 238000002844 melting Methods 0.000 description 6
- 230000008018 melting Effects 0.000 description 6
- 239000011889 copper foil Substances 0.000 description 4
- 239000004020 conductor Substances 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052574 oxide ceramic Inorganic materials 0.000 description 2
- 239000011224 oxide ceramic Substances 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
- 239000005751 Copper oxide Substances 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910000431 copper oxide Inorganic materials 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 230000005496 eutectics Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000013532 laser treatment Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
- H01L21/4803—Insulating or insulated parts, e.g. mountings, containers, diamond heatsinks
- H01L21/481—Insulating layers on insulating parts, with or without metallisation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/0006—Working by laser beam, e.g. welding, cutting or boring taking account of the properties of the material involved
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/352—Working by laser beam, e.g. welding, cutting or boring for surface treatment
- B23K26/359—Working by laser beam, e.g. welding, cutting or boring for surface treatment by providing a line or line pattern, e.g. a dotted break initiation line
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/361—Removing material for deburring or mechanical trimming
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B37/00—Joining burned ceramic articles with other burned ceramic articles or other articles by heating
- C04B37/02—Joining burned ceramic articles with other burned ceramic articles or other articles by heating with metallic articles
- C04B37/021—Joining burned ceramic articles with other burned ceramic articles or other articles by heating with metallic articles in a direct manner, e.g. direct copper bonding [DCB]
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- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/373—Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
- H01L23/3735—Laminates or multilayers, e.g. direct bond copper ceramic substrates
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- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
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- H01L24/93—Batch processes
- H01L24/95—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
- H01L24/97—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
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- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
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- H05K1/02—Details
- H05K1/0271—Arrangements for reducing stress or warp in rigid printed circuit boards, e.g. caused by loads, vibrations or differences in thermal expansion
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- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/16—Composite materials, e.g. fibre reinforced
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B23K2103/16—Composite materials, e.g. fibre reinforced
- B23K2103/166—Multilayered materials
- B23K2103/172—Multilayered materials wherein at least one of the layers is non-metallic
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
- B23K2103/52—Ceramics
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- C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
- C04B2237/30—Composition of layers of ceramic laminates or of ceramic or metallic articles to be joined by heating, e.g. Si substrates
- C04B2237/32—Ceramic
- C04B2237/34—Oxidic
- C04B2237/343—Alumina or aluminates
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- C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
- C04B2237/30—Composition of layers of ceramic laminates or of ceramic or metallic articles to be joined by heating, e.g. Si substrates
- C04B2237/32—Ceramic
- C04B2237/36—Non-oxidic
- C04B2237/366—Aluminium nitride
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- C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
- C04B2237/30—Composition of layers of ceramic laminates or of ceramic or metallic articles to be joined by heating, e.g. Si substrates
- C04B2237/40—Metallic
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- C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
- C04B2237/50—Processing aspects relating to ceramic laminates or to the joining of ceramic articles with other articles by heating
- C04B2237/86—Joining of two substrates at their largest surfaces, one surface being complete joined and covered, the other surface not, e.g. a small plate joined at it's largest surface on top of a larger plate
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- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48225—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/48227—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
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- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
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- H01L2224/4911—Disposition the connectors being bonded to at least one common bonding area, e.g. daisy chain
- H01L2224/49113—Disposition the connectors being bonded to at least one common bonding area, e.g. daisy chain the connectors connecting different bonding areas on the semiconductor or solid-state body to a common bonding area outside the body, e.g. converging wires
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- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
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- H01L2924/0132—Binary Alloys
- H01L2924/01322—Eutectic Alloys, i.e. obtained by a liquid transforming into two solid phases
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- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0306—Inorganic insulating substrates, e.g. ceramic, glass
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- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
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- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
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- H05K2201/09036—Recesses or grooves in insulating substrate
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- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
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- H05K2203/30—Details of processes not otherwise provided for in H05K2203/01 - H05K2203/17
- H05K2203/302—Bending a rigid substrate; Breaking rigid substrates by bending
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- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0044—Mechanical working of the substrate, e.g. drilling or punching
- H05K3/0052—Depaneling, i.e. dividing a panel into circuit boards; Working of the edges of circuit boards
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Optics & Photonics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Materials Engineering (AREA)
- Geometry (AREA)
- Manufacturing & Machinery (AREA)
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- Organic Chemistry (AREA)
- Structure Of Printed Boards (AREA)
- Casings For Electric Apparatus (AREA)
- Laminated Bodies (AREA)
Abstract
Description
- - Oxidieren einer Kupferfolie derart, daß sich eine gleichmäßige Kupferoxidschicht ergibt;
- - Auflegen des Kupferfolie auf die Keramikschicht;
- - Erhitzen des Verbundes auf eine Prozeßtemperatur zwischen etwa 1065 bis 1083°C, z. B. auf ca. 1071°C;
- - Abkühlen auf Raumtemperatur.
- 1. Abbrechen der die Metallflächen 3'' bzw. 4'' aufweisenden Ränder;
- 2. Abbrechen der die Metallflächen 3''' bzw. 4''' aufweisenden Ränder;
- 3. Sukzessives Abbrechen der bei dieser Ausführungsform jeweils drei Einzelsubstrate aufweisenden und sich in der X-Achse erstreckenden Reihen oder Streifen entlang der Sollbruchlinien 7, und zwar beginnend beispielsweise von den in der Fig. 17 oberen Rand des Mehrfachsubstrates 1c.
- 4. Brechen der einzelnen, so erhaltenen Streifen mit jeweils drei Einzelsubstraten entlang der in den einzelnen Streifen nur noch sehr kurzen Sollbruchlinien 8 in die Einzelsubstrate.
Claims (26)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19927046A DE19927046B4 (de) | 1999-06-14 | 1999-06-14 | Keramik-Metall-Substrat als Mehrfachsubstrat |
EP00112228.2A EP1061783B2 (de) | 1999-06-14 | 2000-06-07 | Keramik-Metall-Substrat, insbesondere Mehrfachsubstrat |
US09/589,149 US6638592B1 (en) | 1999-06-14 | 2000-06-08 | Ceramic/metal substrate, especially composite substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19927046A DE19927046B4 (de) | 1999-06-14 | 1999-06-14 | Keramik-Metall-Substrat als Mehrfachsubstrat |
Publications (2)
Publication Number | Publication Date |
---|---|
DE19927046A1 true DE19927046A1 (de) | 2000-12-28 |
DE19927046B4 DE19927046B4 (de) | 2007-01-25 |
Family
ID=7911160
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19927046A Expired - Lifetime DE19927046B4 (de) | 1999-06-14 | 1999-06-14 | Keramik-Metall-Substrat als Mehrfachsubstrat |
Country Status (3)
Country | Link |
---|---|
US (1) | US6638592B1 (de) |
EP (1) | EP1061783B2 (de) |
DE (1) | DE19927046B4 (de) |
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WO2017144334A1 (de) | 2016-02-26 | 2017-08-31 | Heraeus Deutschland GmbH & Co. KG | Kupfer-keramik-verbund |
EP3210951A1 (de) | 2016-02-26 | 2017-08-30 | Heraeus Deutschland GmbH & Co. KG | Kupfer-keramik-verbund |
EP3210957A1 (de) | 2016-02-26 | 2017-08-30 | Heraeus Deutschland GmbH & Co. KG | Kupfer-keramik-verbund |
WO2017144333A1 (de) | 2016-02-26 | 2017-08-31 | Heraeus Deutschland GmbH & Co. KG | Kupfer-keramik-verbund |
DE102016203112A1 (de) | 2016-02-26 | 2017-08-31 | Heraeus Deutschland GmbH & Co. KG | Kupfer-Keramik-Verbund |
WO2017144330A1 (de) | 2016-02-26 | 2017-08-31 | Heraeus Deutschland GmbH & Co. KG | Kupfer-keramik-verbund |
WO2017144331A1 (de) | 2016-02-26 | 2017-08-31 | Heraeus Deutschland GmbH & Co. KG | Kupfer-keramik-verbund |
DE202016008307U1 (de) | 2016-02-26 | 2017-07-10 | Heraeus Deutschland GmbH & Co. KG | Kupfer-Keramik-Verbund |
WO2017144329A1 (de) | 2016-02-26 | 2017-08-31 | Heraeus Deutschland GmbH & Co. KG | Kupfer-keramik-verbund |
DE102016203030A1 (de) | 2016-02-26 | 2017-08-31 | Heraeus Deutschland GmbH & Co. KG | Kupfer-Keramik-Verbund |
EP3210956A1 (de) | 2016-02-26 | 2017-08-30 | Heraeus Deutschland GmbH & Co. KG | Kupfer-keramik-verbund |
DE202016008371U1 (de) | 2016-02-26 | 2017-09-11 | Heraeus Deutschland GmbH & Co. KG | Kupfer-Keramik-Verbund |
DE202016008370U1 (de) | 2016-02-26 | 2017-09-11 | Heraeus Deutschland GmbH & Co. KG | Kupfer-Keramik-Verbund |
DE202016008286U1 (de) | 2016-02-26 | 2017-06-21 | Heraeus Deutschland GmbH & Co. KG | Kupfer-Keramik-Verbund |
DE202016008287U1 (de) | 2016-02-26 | 2017-06-21 | Heraeus Deutschland GmbH & Co. KG | Kupfer-Keramik-Verbund |
EP3584828A1 (de) * | 2016-12-22 | 2019-12-25 | Rogers Germany GmbH | Trägersubstrat für elektrische bauteile und verfahren zur herstellung eines trägersubstrats |
WO2018114884A1 (de) * | 2016-12-22 | 2018-06-28 | Rogers Germany Gmbh | Trägersubstrat für elektrische bauteile und verfahren zur herstellung eines trägersubstrats |
DE102017215048A1 (de) * | 2017-08-29 | 2019-02-28 | Conti Temic Microelectronic Gmbh | Schaltungsträger für Leistungselektronik und Leistungselektronikmodul mit einem Schaltungsträger |
US11129273B2 (en) | 2018-02-28 | 2021-09-21 | Rogers Germany Gmbh | Metal-ceramic substrate and method for producing a metal-ceramic substrate |
US12058816B2 (en) | 2019-05-20 | 2024-08-06 | Rogers Germany Gmbh | Method for producing a metal-ceramic substrate, and metal-ceramic substrate produced using such a method |
WO2021180639A1 (de) | 2020-03-10 | 2021-09-16 | Rogers Germany Gmbh | Elektronikmodul und verfahren zur herstellung eines elektronikmoduls |
DE102020214040A1 (de) | 2020-11-09 | 2021-12-02 | Vitesco Technologies Germany Gmbh | Schaltungsträger für eine elektrische Schaltung, leistungselektrische Schaltung mit einem Schaltungsträger |
WO2024133728A1 (de) | 2022-12-23 | 2024-06-27 | Rogers Germany Gmbh | Verfahren zur herstellung eines metall-keramik-substrats, keramikelement sowie metallschicht für ein solches verfahren und metall-keramik-substrat hergestellt mit einem solchen verfahren |
Also Published As
Publication number | Publication date |
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EP1061783B2 (de) | 2019-12-25 |
EP1061783B1 (de) | 2013-11-20 |
EP1061783A2 (de) | 2000-12-20 |
EP1061783A3 (de) | 2005-11-30 |
US6638592B1 (en) | 2003-10-28 |
DE19927046B4 (de) | 2007-01-25 |
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