DE19855108A1 - Mikrolithographisches Reduktionsobjektiv, Projektionsbelichtungsanlage und -Verfahren - Google Patents
Mikrolithographisches Reduktionsobjektiv, Projektionsbelichtungsanlage und -VerfahrenInfo
- Publication number
- DE19855108A1 DE19855108A1 DE19855108A DE19855108A DE19855108A1 DE 19855108 A1 DE19855108 A1 DE 19855108A1 DE 19855108 A DE19855108 A DE 19855108A DE 19855108 A DE19855108 A DE 19855108A DE 19855108 A1 DE19855108 A1 DE 19855108A1
- Authority
- DE
- Germany
- Prior art keywords
- lens
- lens group
- refractive power
- lenses
- microlithographic projection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 230000009467 reduction Effects 0.000 title description 2
- 230000005499 meniscus Effects 0.000 claims description 16
- 210000001015 abdomen Anatomy 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 238000001393 microlithography Methods 0.000 claims description 6
- 238000012937 correction Methods 0.000 description 11
- 238000013461 design Methods 0.000 description 7
- 210000001624 hip Anatomy 0.000 description 6
- 230000004075 alteration Effects 0.000 description 4
- 230000000875 corresponding effect Effects 0.000 description 3
- 238000003384 imaging method Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 210000001747 pupil Anatomy 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 238000003702 image correction Methods 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 238000013507 mapping Methods 0.000 description 2
- 230000000873 masking effect Effects 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 206010073261 Ovarian theca cell tumour Diseases 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 201000009310 astigmatism Diseases 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 230000004313 glare Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000002040 relaxant effect Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 208000001644 thecoma Diseases 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
- G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (13)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19855108A DE19855108A1 (de) | 1998-11-30 | 1998-11-30 | Mikrolithographisches Reduktionsobjektiv, Projektionsbelichtungsanlage und -Verfahren |
| KR1019990039313A KR100671317B1 (ko) | 1998-11-30 | 1999-09-14 | 마이크로리소그래피 축소 대물렌즈, 투영 노광 장치 및 투영 노광 방법 |
| US09/416,105 US6349005B1 (en) | 1998-11-30 | 1999-10-12 | Microlithographic reduction objective, projection exposure equipment and process |
| EP99121205A EP1006389A3 (de) | 1998-11-30 | 1999-10-23 | Mikrolithographisches Reduktionsobjektiv, Projektionsbelichtungsanlage und -Verfahren |
| EP06003699A EP1686405A1 (de) | 1998-11-30 | 1999-10-23 | Mikrolithographisches Reduktionsobjektiv mit fünf Linsengruppen |
| JP11317966A JP2000171706A (ja) | 1998-11-30 | 1999-11-09 | マイクロリソグラフィ用縮小対物レンズ，投影露光装置及び投影露光方法 |
| TW088119509A TW480347B (en) | 1998-11-30 | 1999-11-09 | Microlithographic reduction objective, projection exposure equipment and process |
| PCT/EP1999/009235 WO2000033138A1 (de) | 1998-11-30 | 1999-11-27 | Hochaperturiges projektionsobjektiv mit minimalem blendenfehler |
| DE59913116T DE59913116D1 (de) | 1998-11-30 | 1999-11-27 | Hochaperturiges projektionsobjektiv mit minimalem blendenfehler |
| KR1020017006765A KR100603496B1 (ko) | 1998-11-30 | 1999-11-27 | 최소 조리개 오차를 갖는 대구경 투영 렌즈 |
| EP99961020A EP1141781B1 (de) | 1998-11-30 | 1999-11-27 | Hochaperturiges projektionsobjektiv mit minimalem blendenfehler |
| JP2000585717A JP2002531878A (ja) | 1998-11-30 | 1999-11-27 | 最少絞り収差を有する大開口数の投影レンズ |
| US09/917,504 US20030007253A1 (en) | 1998-11-30 | 2001-07-27 | Large-apertured projection lens with minimal diaphragm error |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19855108A DE19855108A1 (de) | 1998-11-30 | 1998-11-30 | Mikrolithographisches Reduktionsobjektiv, Projektionsbelichtungsanlage und -Verfahren |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE19855108A1 true DE19855108A1 (de) | 2000-05-31 |
Family
ID=7889445
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19855108A Withdrawn DE19855108A1 (de) | 1998-11-30 | 1998-11-30 | Mikrolithographisches Reduktionsobjektiv, Projektionsbelichtungsanlage und -Verfahren |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US6349005B1 (https=) |
| EP (2) | EP1006389A3 (https=) |
| JP (1) | JP2000171706A (https=) |
| KR (1) | KR100671317B1 (https=) |
| DE (1) | DE19855108A1 (https=) |
| TW (1) | TW480347B (https=) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1291719A1 (de) * | 2001-09-05 | 2003-03-12 | Carl Zeiss Semiconductor Manufacturing Technologies Ag | Projektionsbelichtungsanlage |
| WO2003075097A3 (de) * | 2002-03-01 | 2003-11-13 | Zeiss Carl Smt Ag | Refraktives projektionsobjektiv mit einer taille |
| US6806942B2 (en) | 2002-05-14 | 2004-10-19 | Carl Zeiss Smt Ag | Projection exposure system |
| US6891683B2 (en) | 2002-03-01 | 2005-05-10 | Carl Zeiss Smt Ag | Refractive projection objective with a waist |
| US7190527B2 (en) | 2002-03-01 | 2007-03-13 | Carl Zeiss Smt Ag | Refractive projection objective |
| DE102008001497A1 (de) | 2007-05-07 | 2008-11-13 | Carl Zeiss Smt Ag | Projektionsbelichtungsanlage für die Halbleiterlithographie und Subsystem einer Projektionsbelichtungsanlage |
| US7869122B2 (en) | 2004-01-14 | 2011-01-11 | Carl Zeiss Smt Ag | Catadioptric projection objective |
| US8199400B2 (en) | 2004-01-14 | 2012-06-12 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
| US8913316B2 (en) | 2004-05-17 | 2014-12-16 | Carl Zeiss Smt Gmbh | Catadioptric projection objective with intermediate images |
Families Citing this family (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1195095A (ja) | 1997-09-22 | 1999-04-09 | Nikon Corp | 投影光学系 |
| US6700645B1 (en) | 1998-01-22 | 2004-03-02 | Nikon Corporation | Projection optical system and exposure apparatus and method |
| US6635914B2 (en) * | 2000-09-08 | 2003-10-21 | Axon Technologies Corp. | Microelectronic programmable device and methods of forming and programming the same |
| WO2001023933A1 (en) | 1999-09-29 | 2001-04-05 | Nikon Corporation | Projection optical system |
| WO2001023935A1 (en) | 1999-09-29 | 2001-04-05 | Nikon Corporation | Projection exposure method and apparatus and projection optical system |
| EP1094350A3 (en) | 1999-10-21 | 2001-08-16 | Carl Zeiss | Optical projection lens system |
| US6590715B2 (en) * | 1999-12-21 | 2003-07-08 | Carl-Zeiss-Stiftung | Optical projection system |
| JP2001343582A (ja) * | 2000-05-30 | 2001-12-14 | Nikon Corp | 投影光学系、当該投影光学系を備えた露光装置、及び当該露光装置を用いたマイクロデバイスの製造方法 |
| JP3413160B2 (ja) * | 2000-06-15 | 2003-06-03 | キヤノン株式会社 | 照明装置及びそれを用いた走査型露光装置 |
| WO2002052303A2 (de) * | 2000-12-22 | 2002-07-04 | Carl Zeiss Smt Ag | Projektionsobjektiv |
| DE10064685A1 (de) * | 2000-12-22 | 2002-07-04 | Zeiss Carl | Lithographieobjektiv mit einer ersten Linsengruppe, bestehend ausschließlich aus Linsen positiver Brechkraft |
| JP2002244034A (ja) | 2001-02-21 | 2002-08-28 | Nikon Corp | 投影光学系および該投影光学系を備えた露光装置 |
| JP2002323652A (ja) | 2001-02-23 | 2002-11-08 | Nikon Corp | 投影光学系，該投影光学系を備えた投影露光装置および投影露光方法 |
| JP2002323653A (ja) | 2001-02-23 | 2002-11-08 | Nikon Corp | 投影光学系，投影露光装置および投影露光方法 |
| DE10138847A1 (de) * | 2001-08-15 | 2003-02-27 | Zeiss Carl | Blende für eine Integratoreinheit |
| US7154676B2 (en) * | 2002-03-01 | 2006-12-26 | Carl Zeiss Smt A.G. | Very-high aperture projection objective |
| WO2003075096A2 (de) * | 2002-03-01 | 2003-09-12 | Carl Zeiss Smt Ag | Refraktives projektionsobjektiv |
| DE10210899A1 (de) * | 2002-03-08 | 2003-09-18 | Zeiss Carl Smt Ag | Refraktives Projektionsobjektiv für Immersions-Lithographie |
| WO2005059617A2 (en) | 2003-12-15 | 2005-06-30 | Carl Zeiss Smt Ag | Projection objective having a high aperture and a planar end surface |
| CN100370313C (zh) * | 2005-05-20 | 2008-02-20 | 清华大学 | 傅里叶变换光学系统及体全息存储傅里叶变换光学系统 |
| US7952803B2 (en) * | 2006-05-15 | 2011-05-31 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| CN101587230B (zh) * | 2009-04-09 | 2010-12-29 | 上海微电子装备有限公司 | 一种投影物镜 |
| CN102486569B (zh) * | 2010-12-01 | 2014-06-18 | 上海微电子装备有限公司 | 一种投影物镜系统 |
| CN102540416B (zh) * | 2010-12-10 | 2014-09-17 | 上海微电子装备有限公司 | 大视场大工作距投影光刻物镜 |
| CN102540415B (zh) * | 2010-12-10 | 2014-06-18 | 上海微电子装备有限公司 | 一种投影光刻物镜 |
| CN102981249B (zh) * | 2012-09-21 | 2015-01-28 | 中国科学院光电技术研究所 | 一种投影光学系统 |
| US10702057B2 (en) | 2015-07-07 | 2020-07-07 | Colgate-Palmolive Company | Oral care implement and monofilament bristle for use with the same |
| CN109581622B (zh) * | 2017-09-29 | 2020-12-04 | 上海微电子装备（集团）股份有限公司 | 一种投影物镜 |
| CN115542675B (zh) * | 2021-06-30 | 2025-08-12 | 上海微电子装备（集团）股份有限公司 | 投影光刻物镜及光刻机 |
| CN116954028A (zh) * | 2022-04-12 | 2023-10-27 | 上海微电子装备（集团）股份有限公司 | 光刻投影物镜及光刻机 |
Family Cites Families (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US337647A (en) | 1886-03-09 | Band-saw mill | ||
| DD299017A7 (de) | 1988-09-02 | 1992-03-26 | Jenoptik Carl Zeiss Jena Gmbh,De | Projektionsobjektiv |
| US5105075A (en) | 1988-09-19 | 1992-04-14 | Canon Kabushiki Kaisha | Projection exposure apparatus |
| SU1659955A1 (ru) | 1989-07-31 | 1991-06-30 | Конструкторское бюро точного электронного машиностроения | Проекционный объектив с увеличением - 1/5 @ |
| US5469299A (en) * | 1990-05-15 | 1995-11-21 | Olympus Optical Co., Ltd. | Objective lens system |
| JP3041939B2 (ja) * | 1990-10-22 | 2000-05-15 | 株式会社ニコン | 投影レンズ系 |
| DE4124311A1 (de) | 1991-07-23 | 1993-01-28 | Zeiss Carl Fa | Anordnung zur kohaerenzreduktion und strahlformung eines laserstrahls |
| US6285443B1 (en) | 1993-12-13 | 2001-09-04 | Carl-Zeiss-Stiftung | Illuminating arrangement for a projection microlithographic apparatus |
| DE19520563A1 (de) | 1995-06-06 | 1996-12-12 | Zeiss Carl Fa | Beleuchtungseinrichtung für ein Projektions-Mikrolithographie-Gerät |
| ES1027924Y (es) | 1994-05-06 | 1995-04-01 | Medina Manuel Sierra | Chaleco de seguridad autoinchable para motoristas. |
| EP0687956B2 (de) | 1994-06-17 | 2005-11-23 | Carl Zeiss SMT AG | Beleuchtungseinrichtung |
| DE4421053A1 (de) | 1994-06-17 | 1995-12-21 | Zeiss Carl Fa | Beleuchtungseinrichtung |
| JPH08179204A (ja) * | 1994-11-10 | 1996-07-12 | Nikon Corp | 投影光学系及び投影露光装置 |
| JP3500745B2 (ja) | 1994-12-14 | 2004-02-23 | 株式会社ニコン | 投影光学系、投影露光装置及び投影露光方法 |
| JP3454390B2 (ja) | 1995-01-06 | 2003-10-06 | 株式会社ニコン | 投影光学系、投影露光装置及び投影露光方法 |
| JP3819048B2 (ja) | 1995-03-15 | 2006-09-06 | 株式会社ニコン | 投影光学系及びそれを備えた露光装置並びに露光方法 |
| JP3402850B2 (ja) | 1995-05-09 | 2003-05-06 | キヤノン株式会社 | 投影露光装置及びそれを用いたデバイスの製造方法 |
| JP3624973B2 (ja) | 1995-10-12 | 2005-03-02 | 株式会社ニコン | 投影光学系 |
| DE19548805A1 (de) * | 1995-12-27 | 1997-07-03 | Zeiss Carl Fa | REMA-Objektiv für Mikrolithographie-Projektionsbelichtungsanlagen |
| JP3750123B2 (ja) | 1996-04-25 | 2006-03-01 | 株式会社ニコン | 投影光学系 |
| JPH1048517A (ja) * | 1996-08-07 | 1998-02-20 | Nikon Corp | 投影光学系 |
| JPH1079345A (ja) | 1996-09-04 | 1998-03-24 | Nikon Corp | 投影光学系及び露光装置 |
| US5852490A (en) * | 1996-09-30 | 1998-12-22 | Nikon Corporation | Projection exposure method and apparatus |
| DE19653983A1 (de) * | 1996-12-21 | 1998-06-25 | Zeiss Carl Fa | REMA-Objektiv für Mikrolithographie-Projektionsbelichtungsanlagen |
| DE19818444A1 (de) * | 1997-04-25 | 1998-10-29 | Nikon Corp | Abbildungsoptik, Projektionsoptikvorrichtung und Projektionsbelichtungsverfahren |
| JP3925576B2 (ja) * | 1997-07-24 | 2007-06-06 | 株式会社ニコン | 投影光学系、該光学系を備えた露光装置、及び該装置を用いたデバイスの製造方法 |
| JPH11133301A (ja) * | 1997-08-29 | 1999-05-21 | Nikon Corp | 投影光学系、露光装置及び半導体デバイスの製造方法 |
| JPH1195095A (ja) * | 1997-09-22 | 1999-04-09 | Nikon Corp | 投影光学系 |
| JPH11214293A (ja) * | 1998-01-22 | 1999-08-06 | Nikon Corp | 投影光学系及び該光学系を備えた露光装置並びにデバイス製造方法 |
| JP2000056219A (ja) * | 1998-08-11 | 2000-02-25 | Nikon Corp | 投影光学系 |
| JP2000066075A (ja) * | 1998-08-17 | 2000-03-03 | Nikon Corp | 光学系及びその製造方法、並びに前記光学系を備えた露光装置 |
| JP2000121933A (ja) * | 1998-10-13 | 2000-04-28 | Nikon Corp | 投影光学系及びそれを備えた露光装置並びにデバイス製造方法 |
-
1998
- 1998-11-30 DE DE19855108A patent/DE19855108A1/de not_active Withdrawn
-
1999
- 1999-09-14 KR KR1019990039313A patent/KR100671317B1/ko not_active Expired - Fee Related
- 1999-10-12 US US09/416,105 patent/US6349005B1/en not_active Expired - Lifetime
- 1999-10-23 EP EP99121205A patent/EP1006389A3/de not_active Ceased
- 1999-10-23 EP EP06003699A patent/EP1686405A1/de not_active Withdrawn
- 1999-11-09 TW TW088119509A patent/TW480347B/zh not_active IP Right Cessation
- 1999-11-09 JP JP11317966A patent/JP2000171706A/ja active Pending
Cited By (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009037251A (ja) * | 2001-09-05 | 2009-02-19 | Carl Zeiss Smt Ag | 投影露光設備 |
| US7408621B2 (en) | 2001-09-05 | 2008-08-05 | Carl Zeiss Smt Ag | Projection exposure system |
| EP1291719A1 (de) * | 2001-09-05 | 2003-03-12 | Carl Zeiss Semiconductor Manufacturing Technologies Ag | Projektionsbelichtungsanlage |
| US7457043B2 (en) | 2001-09-05 | 2008-11-25 | Carl Zeiss Smt Ag | Projection exposure system |
| WO2003075097A3 (de) * | 2002-03-01 | 2003-11-13 | Zeiss Carl Smt Ag | Refraktives projektionsobjektiv mit einer taille |
| US6891683B2 (en) | 2002-03-01 | 2005-05-10 | Carl Zeiss Smt Ag | Refractive projection objective with a waist |
| US7190527B2 (en) | 2002-03-01 | 2007-03-13 | Carl Zeiss Smt Ag | Refractive projection objective |
| US7382540B2 (en) | 2002-03-01 | 2008-06-03 | Carl Zeiss Smt Ag | Refractive projection objective |
| US6806942B2 (en) | 2002-05-14 | 2004-10-19 | Carl Zeiss Smt Ag | Projection exposure system |
| US8208198B2 (en) | 2004-01-14 | 2012-06-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
| US8730572B2 (en) | 2004-01-14 | 2014-05-20 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
| US8199400B2 (en) | 2004-01-14 | 2012-06-12 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
| US9772478B2 (en) | 2004-01-14 | 2017-09-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective with parallel, offset optical axes |
| US8208199B2 (en) | 2004-01-14 | 2012-06-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
| US8289619B2 (en) | 2004-01-14 | 2012-10-16 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
| US8339701B2 (en) | 2004-01-14 | 2012-12-25 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
| US8355201B2 (en) | 2004-01-14 | 2013-01-15 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
| US8416490B2 (en) | 2004-01-14 | 2013-04-09 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
| US7869122B2 (en) | 2004-01-14 | 2011-01-11 | Carl Zeiss Smt Ag | Catadioptric projection objective |
| US8804234B2 (en) | 2004-01-14 | 2014-08-12 | Carl Zeiss Smt Gmbh | Catadioptric projection objective including an aspherized plate |
| US8908269B2 (en) | 2004-01-14 | 2014-12-09 | Carl Zeiss Smt Gmbh | Immersion catadioptric projection objective having two intermediate images |
| US8913316B2 (en) | 2004-05-17 | 2014-12-16 | Carl Zeiss Smt Gmbh | Catadioptric projection objective with intermediate images |
| US9019596B2 (en) | 2004-05-17 | 2015-04-28 | Carl Zeiss Smt Gmbh | Catadioptric projection objective with intermediate images |
| US9134618B2 (en) | 2004-05-17 | 2015-09-15 | Carl Zeiss Smt Gmbh | Catadioptric projection objective with intermediate images |
| US9726979B2 (en) | 2004-05-17 | 2017-08-08 | Carl Zeiss Smt Gmbh | Catadioptric projection objective with intermediate images |
| DE102008001497A1 (de) | 2007-05-07 | 2008-11-13 | Carl Zeiss Smt Ag | Projektionsbelichtungsanlage für die Halbleiterlithographie und Subsystem einer Projektionsbelichtungsanlage |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1006389A2 (de) | 2000-06-07 |
| KR100671317B1 (ko) | 2007-01-18 |
| KR20000034926A (ko) | 2000-06-26 |
| JP2000171706A (ja) | 2000-06-23 |
| EP1006389A3 (de) | 2002-03-20 |
| US6349005B1 (en) | 2002-02-19 |
| EP1686405A1 (de) | 2006-08-02 |
| TW480347B (en) | 2002-03-21 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8127 | New person/name/address of the applicant |
Owner name: CARL ZEISS SMT AG, 73447 OBERKOCHEN, DE |
|
| 8141 | Disposal/no request for examination |