KR100671317B1 - 마이크로리소그래피 축소 대물렌즈, 투영 노광 장치 및 투영 노광 방법 - Google Patents

마이크로리소그래피 축소 대물렌즈, 투영 노광 장치 및 투영 노광 방법 Download PDF

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Publication number
KR100671317B1
KR100671317B1 KR1019990039313A KR19990039313A KR100671317B1 KR 100671317 B1 KR100671317 B1 KR 100671317B1 KR 1019990039313 A KR1019990039313 A KR 1019990039313A KR 19990039313 A KR19990039313 A KR 19990039313A KR 100671317 B1 KR100671317 B1 KR 100671317B1
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KR
South Korea
Prior art keywords
lens
lens group
refractive power
projection objective
microlithographic projection
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Expired - Fee Related
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KR1019990039313A
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English (en)
Korean (ko)
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KR20000034926A (ko
Inventor
슈스터 칼-하인츠
바이에 헬무트
빌헬름 울리히
그레고르 클렘
알로이즈 헤르코머
게르하르트 퓌터
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칼 짜이스 에스엠테 아게
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1019990039313A 1998-11-30 1999-09-14 마이크로리소그래피 축소 대물렌즈, 투영 노광 장치 및 투영 노광 방법 Expired - Fee Related KR100671317B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19855108A DE19855108A1 (de) 1998-11-30 1998-11-30 Mikrolithographisches Reduktionsobjektiv, Projektionsbelichtungsanlage und -Verfahren
DE19855108.8 1999-09-04

Publications (2)

Publication Number Publication Date
KR20000034926A KR20000034926A (ko) 2000-06-26
KR100671317B1 true KR100671317B1 (ko) 2007-01-18

Family

ID=7889445

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019990039313A Expired - Fee Related KR100671317B1 (ko) 1998-11-30 1999-09-14 마이크로리소그래피 축소 대물렌즈, 투영 노광 장치 및 투영 노광 방법

Country Status (6)

Country Link
US (1) US6349005B1 (https=)
EP (2) EP1006389A3 (https=)
JP (1) JP2000171706A (https=)
KR (1) KR100671317B1 (https=)
DE (1) DE19855108A1 (https=)
TW (1) TW480347B (https=)

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JPH1195095A (ja) 1997-09-22 1999-04-09 Nikon Corp 投影光学系
US6700645B1 (en) 1998-01-22 2004-03-02 Nikon Corporation Projection optical system and exposure apparatus and method
US6635914B2 (en) * 2000-09-08 2003-10-21 Axon Technologies Corp. Microelectronic programmable device and methods of forming and programming the same
WO2001023933A1 (en) 1999-09-29 2001-04-05 Nikon Corporation Projection optical system
WO2001023935A1 (en) 1999-09-29 2001-04-05 Nikon Corporation Projection exposure method and apparatus and projection optical system
EP1094350A3 (en) 1999-10-21 2001-08-16 Carl Zeiss Optical projection lens system
US6590715B2 (en) * 1999-12-21 2003-07-08 Carl-Zeiss-Stiftung Optical projection system
JP2001343582A (ja) * 2000-05-30 2001-12-14 Nikon Corp 投影光学系、当該投影光学系を備えた露光装置、及び当該露光装置を用いたマイクロデバイスの製造方法
JP3413160B2 (ja) * 2000-06-15 2003-06-03 キヤノン株式会社 照明装置及びそれを用いた走査型露光装置
WO2002052303A2 (de) * 2000-12-22 2002-07-04 Carl Zeiss Smt Ag Projektionsobjektiv
DE10064685A1 (de) * 2000-12-22 2002-07-04 Zeiss Carl Lithographieobjektiv mit einer ersten Linsengruppe, bestehend ausschließlich aus Linsen positiver Brechkraft
JP2002244034A (ja) 2001-02-21 2002-08-28 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
JP2002323652A (ja) 2001-02-23 2002-11-08 Nikon Corp 投影光学系，該投影光学系を備えた投影露光装置および投影露光方法
JP2002323653A (ja) 2001-02-23 2002-11-08 Nikon Corp 投影光学系，投影露光装置および投影露光方法
DE10138847A1 (de) * 2001-08-15 2003-02-27 Zeiss Carl Blende für eine Integratoreinheit
DE10143385C2 (de) 2001-09-05 2003-07-17 Zeiss Carl Projektionsbelichtungsanlage
US7154676B2 (en) * 2002-03-01 2006-12-26 Carl Zeiss Smt A.G. Very-high aperture projection objective
US7190527B2 (en) 2002-03-01 2007-03-13 Carl Zeiss Smt Ag Refractive projection objective
WO2003075096A2 (de) * 2002-03-01 2003-09-12 Carl Zeiss Smt Ag Refraktives projektionsobjektiv
DE10229249A1 (de) 2002-03-01 2003-09-04 Zeiss Carl Semiconductor Mfg Refraktives Projektionsobjektiv mit einer Taille
AU2003208872A1 (en) * 2002-03-01 2003-09-16 Carl Zeiss Smt Ag Refractive projection lens with a middle part
DE10210899A1 (de) * 2002-03-08 2003-09-18 Zeiss Carl Smt Ag Refraktives Projektionsobjektiv für Immersions-Lithographie
DE10221386A1 (de) 2002-05-14 2003-11-27 Zeiss Carl Smt Ag Projektionsbelichtungssystem
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
WO2005059617A2 (en) 2003-12-15 2005-06-30 Carl Zeiss Smt Ag Projection objective having a high aperture and a planar end surface
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR20160085375A (ko) 2004-05-17 2016-07-15 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
CN100370313C (zh) * 2005-05-20 2008-02-20 清华大学 傅里叶变换光学系统及体全息存储傅里叶变换光学系统
US7952803B2 (en) * 2006-05-15 2011-05-31 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE102008001497A1 (de) 2007-05-07 2008-11-13 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Halbleiterlithographie und Subsystem einer Projektionsbelichtungsanlage
CN101587230B (zh) * 2009-04-09 2010-12-29 上海微电子装备有限公司 一种投影物镜
CN102486569B (zh) * 2010-12-01 2014-06-18 上海微电子装备有限公司 一种投影物镜系统
CN102540416B (zh) * 2010-12-10 2014-09-17 上海微电子装备有限公司 大视场大工作距投影光刻物镜
CN102540415B (zh) * 2010-12-10 2014-06-18 上海微电子装备有限公司 一种投影光刻物镜
CN102981249B (zh) * 2012-09-21 2015-01-28 中国科学院光电技术研究所 一种投影光学系统
US10702057B2 (en) 2015-07-07 2020-07-07 Colgate-Palmolive Company Oral care implement and monofilament bristle for use with the same
CN109581622B (zh) * 2017-09-29 2020-12-04 上海微电子装备（集团）股份有限公司 一种投影物镜
CN115542675B (zh) * 2021-06-30 2025-08-12 上海微电子装备（集团）股份有限公司 投影光刻物镜及光刻机
CN116954028A (zh) * 2022-04-12 2023-10-27 上海微电子装备（集团）股份有限公司 光刻投影物镜及光刻机

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Also Published As

Publication number Publication date
EP1006389A2 (de) 2000-06-07
DE19855108A1 (de) 2000-05-31
KR20000034926A (ko) 2000-06-26
JP2000171706A (ja) 2000-06-23
EP1006389A3 (de) 2002-03-20
US6349005B1 (en) 2002-02-19
EP1686405A1 (de) 2006-08-02
TW480347B (en) 2002-03-21

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