WO2002052303A2 - Projektionsobjektiv - Google Patents
Projektionsobjektiv Download PDFInfo
- Publication number
- WO2002052303A2 WO2002052303A2 PCT/EP2001/014846 EP0114846W WO02052303A2 WO 2002052303 A2 WO2002052303 A2 WO 2002052303A2 EP 0114846 W EP0114846 W EP 0114846W WO 02052303 A2 WO02052303 A2 WO 02052303A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- lens
- refractive power
- lens group
- lenses
- projection
- Prior art date
Links
- 230000005499 meniscus Effects 0.000 claims description 12
- 239000011521 glass Substances 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims description 3
- 238000001393 microlithography Methods 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000005286 illumination Methods 0.000 abstract description 9
- 230000000694 effects Effects 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 6
- 229910001634 calcium fluoride Inorganic materials 0.000 description 6
- 230000004075 alteration Effects 0.000 description 5
- 238000003384 imaging method Methods 0.000 description 5
- 238000001459 lithography Methods 0.000 description 5
- 102100032986 CCR4-NOT transcription complex subunit 8 Human genes 0.000 description 4
- 101000942586 Homo sapiens CCR4-NOT transcription complex subunit 8 Proteins 0.000 description 4
- 206010065042 Immune reconstitution inflammatory syndrome Diseases 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 210000001015 abdomen Anatomy 0.000 description 3
- 201000009310 astigmatism Diseases 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 206010010071 Coma Diseases 0.000 description 2
- 238000005056 compaction Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 206010073261 Ovarian theca cell tumour Diseases 0.000 description 1
- OYLGJCQECKOTOL-UHFFFAOYSA-L barium fluoride Chemical compound [F-].[F-].[Ba+2] OYLGJCQECKOTOL-UHFFFAOYSA-L 0.000 description 1
- 229910001632 barium fluoride Inorganic materials 0.000 description 1
- 239000005331 crown glasses (windows) Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000008092 positive effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 210000002784 stomach Anatomy 0.000 description 1
- 208000001644 thecoma Diseases 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
- G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/22—Telecentric objectives or lens systems
Definitions
- the fourth lens group LG4 through which a second waist is formed, consists of the lenses L15-L18.
- the lens L15 is bent towards the object.
- the lens L19, the lens group LG5 adjoining it, has lens surfaces which are bent and approximately parallel to the image.
- the difference in the radii is less than 3% based on the smaller radius. In particular, the absolute radius difference is less than 4mm.
- the refractive power of this lens L19 is, with f ⁇ > 4000, very low.
- This lens arrangement 19 shown in FIG. 4 can be subdivided into six lens groups LG1-LG6.
- the first lens group begins with a negative lens Ll, followed by the four positive lenses L2 - L5. This first lens group has positive refractive power.
- the second lens group begins with a meniscus lens L6 of negative refractive power, which is curved toward the object. This negative lens is followed by two further negative lenses L 7 and L 8.
- the following lens L9 is a meniscus lens with positive refractive power, which has a convex lens surface on the object side and is therefore curved toward the lens.
- the last lens of the second lens group is a meniscus lens of negative refractive power which is curved toward the image and is aspherized on the convex lens surface arranged on the image side. This second lens group has negative refractive power.
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002553149A JP2004524554A (ja) | 2000-12-22 | 2001-12-15 | 投射対物レンズ |
EP01989598A EP1344112A2 (de) | 2000-12-22 | 2001-12-15 | Projektionsobjektiv |
US10/094,565 US6954316B2 (en) | 2000-12-22 | 2002-03-08 | Projection objective |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10065944 | 2000-12-22 | ||
DE10065944.6 | 2000-12-22 | ||
DE10126946A DE10126946A1 (de) | 2000-11-02 | 2001-06-01 | Projektionsobjektiv |
DE10126946.3 | 2001-06-01 |
Related Child Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10/094,565 Continuation-In-Part US6954316B2 (en) | 2000-12-22 | 2002-03-08 | Projection objective |
US10/094,565 Continuation US6954316B2 (en) | 2000-12-22 | 2002-03-08 | Projection objective |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2002052303A2 true WO2002052303A2 (de) | 2002-07-04 |
WO2002052303A3 WO2002052303A3 (de) | 2002-10-31 |
Family
ID=26008138
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2001/014846 WO2002052303A2 (de) | 2000-12-22 | 2001-12-15 | Projektionsobjektiv |
Country Status (4)
Country | Link |
---|---|
US (1) | US6954316B2 (de) |
EP (1) | EP1344112A2 (de) |
JP (1) | JP2004524554A (de) |
WO (1) | WO2002052303A2 (de) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2005001543A1 (ja) * | 2003-06-26 | 2005-01-06 | Nikon Corporation | 投影光学系、露光装置、およびデバイス製造方法 |
JP2009104184A (ja) * | 2002-07-04 | 2009-05-14 | Nikon Corp | 投影光学系、露光装置、およびデバイス製造方法 |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10064685A1 (de) * | 2000-12-22 | 2002-07-04 | Zeiss Carl | Lithographieobjektiv mit einer ersten Linsengruppe, bestehend ausschließlich aus Linsen positiver Brechkraft |
WO2005033800A1 (de) * | 2003-09-09 | 2005-04-14 | Carl Zeiss Smt Ag | Lithographie-objektiv und projektionsbelichtungsanlage mit mindestens einem solchen lithographie-objektiv |
US8208198B2 (en) | 2004-01-14 | 2012-06-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
US6906866B2 (en) * | 2003-10-15 | 2005-06-14 | Carl Zeiss Smt Ag | Compact 1½-waist system for sub 100 nm ArF lithography |
US20080151365A1 (en) | 2004-01-14 | 2008-06-26 | Carl Zeiss Smt Ag | Catadioptric projection objective |
KR20170129271A (ko) | 2004-05-17 | 2017-11-24 | 칼 짜이스 에스엠티 게엠베하 | 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈 |
CN101387736B (zh) * | 2007-09-13 | 2012-05-23 | 鸿富锦精密工业(深圳)有限公司 | 投影镜头 |
TWI390244B (zh) * | 2009-06-12 | 2013-03-21 | Largan Precision Co Ltd | 攝影鏡頭 |
DE102015218328B4 (de) * | 2015-09-24 | 2019-01-17 | Carl Zeiss Smt Gmbh | Optisches System zur Feldabbildung und/oder Pupillenabbildung |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19833481A1 (de) * | 1997-07-24 | 1999-05-27 | Nikon Corp | Optisches Projektionssystem, dieses verwendende Belichtungsvorrichtung und Belichtungsverfahren |
US5930049A (en) * | 1996-10-01 | 1999-07-27 | Nikon Corporation | Projection optical system and method of using such system for manufacturing devices |
EP1006387A2 (de) * | 1998-11-30 | 2000-06-07 | Carl Zeiss | Projektionsobjektiv für die Mikrolithographie |
EP1006389A2 (de) * | 1998-11-30 | 2000-06-07 | Carl Zeiss | Mikrolithographisches Reduktionsobjektiv, Projektionsbelichtungsanlage und -Verfahren |
EP1006388A2 (de) * | 1998-11-30 | 2000-06-07 | Carl Zeiss | Reduktions-Projektionsobjektiv der Mikrolithographie |
WO2000070407A1 (de) * | 1999-05-14 | 2000-11-23 | Carl Zeiss | Projektionsobjektiv für die mikrolithographie |
EP1094350A2 (de) * | 1999-10-21 | 2001-04-25 | Carl Zeiss | Optisches Projektionslinsensystem |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE68916451T2 (de) | 1988-03-11 | 1994-11-17 | Matsushita Electric Ind Co Ltd | Optisches Projektionssystem. |
US5164750A (en) * | 1990-11-08 | 1992-11-17 | Yoshi Adachi | Aspheric surface topographer |
KR100213181B1 (ko) * | 1992-07-31 | 1999-08-02 | 윤종용 | 투영광학장치 |
JP3291818B2 (ja) * | 1993-03-16 | 2002-06-17 | 株式会社ニコン | 投影露光装置、及び該装置を用いる半導体集積回路製造方法 |
JP3360387B2 (ja) * | 1993-11-15 | 2002-12-24 | 株式会社ニコン | 投影光学系及び投影露光装置 |
JPH08179204A (ja) | 1994-11-10 | 1996-07-12 | Nikon Corp | 投影光学系及び投影露光装置 |
JP3500745B2 (ja) * | 1994-12-14 | 2004-02-23 | 株式会社ニコン | 投影光学系、投影露光装置及び投影露光方法 |
JP3454390B2 (ja) | 1995-01-06 | 2003-10-06 | 株式会社ニコン | 投影光学系、投影露光装置及び投影露光方法 |
JP3819048B2 (ja) | 1995-03-15 | 2006-09-06 | 株式会社ニコン | 投影光学系及びそれを備えた露光装置並びに露光方法 |
JP3624973B2 (ja) * | 1995-10-12 | 2005-03-02 | 株式会社ニコン | 投影光学系 |
US6018424A (en) * | 1996-12-11 | 2000-01-25 | Raytheon Company | Conformal window design with static and dynamic aberration correction |
JP3823436B2 (ja) | 1997-04-03 | 2006-09-20 | 株式会社ニコン | 投影光学系 |
DE19818444A1 (de) | 1997-04-25 | 1998-10-29 | Nikon Corp | Abbildungsoptik, Projektionsoptikvorrichtung und Projektionsbelichtungsverfahren |
US5990926A (en) | 1997-07-16 | 1999-11-23 | Nikon Corporation | Projection lens systems for excimer laser exposure lithography |
US6075650A (en) * | 1998-04-06 | 2000-06-13 | Rochester Photonics Corporation | Beam shaping optics for diverging illumination, such as produced by laser diodes |
US5986824A (en) | 1998-06-04 | 1999-11-16 | Nikon Corporation | Large NA projection lens system with aplanatic lens element for excimer laser lithography |
US5969803A (en) | 1998-06-30 | 1999-10-19 | Nikon Corporation | Large NA projection lens for excimer laser lithographic systems |
US6298084B1 (en) | 1998-11-24 | 2001-10-02 | Motorola, Inc. | Bad frame detector and turbo decoder |
EP1242843B1 (de) * | 1999-12-29 | 2006-03-22 | Carl Zeiss SMT AG | Projektionsobjektiv mit benachbart angeordneten asphärischen linsenoberflächen |
EP1344111A1 (de) * | 2000-12-22 | 2003-09-17 | Carl Zeiss SMT AG | Objektiv mit mindestens einer asphärischen linse |
DE10152528A1 (de) | 2001-10-24 | 2003-05-08 | Delphi Tech Inc | Radar-Sicherungssystem |
-
2001
- 2001-12-15 WO PCT/EP2001/014846 patent/WO2002052303A2/de active Application Filing
- 2001-12-15 EP EP01989598A patent/EP1344112A2/de not_active Withdrawn
- 2001-12-15 JP JP2002553149A patent/JP2004524554A/ja active Pending
-
2002
- 2002-03-08 US US10/094,565 patent/US6954316B2/en not_active Expired - Fee Related
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5930049A (en) * | 1996-10-01 | 1999-07-27 | Nikon Corporation | Projection optical system and method of using such system for manufacturing devices |
DE19833481A1 (de) * | 1997-07-24 | 1999-05-27 | Nikon Corp | Optisches Projektionssystem, dieses verwendende Belichtungsvorrichtung und Belichtungsverfahren |
EP1006387A2 (de) * | 1998-11-30 | 2000-06-07 | Carl Zeiss | Projektionsobjektiv für die Mikrolithographie |
EP1006389A2 (de) * | 1998-11-30 | 2000-06-07 | Carl Zeiss | Mikrolithographisches Reduktionsobjektiv, Projektionsbelichtungsanlage und -Verfahren |
EP1006388A2 (de) * | 1998-11-30 | 2000-06-07 | Carl Zeiss | Reduktions-Projektionsobjektiv der Mikrolithographie |
WO2000070407A1 (de) * | 1999-05-14 | 2000-11-23 | Carl Zeiss | Projektionsobjektiv für die mikrolithographie |
EP1094350A2 (de) * | 1999-10-21 | 2001-04-25 | Carl Zeiss | Optisches Projektionslinsensystem |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009104184A (ja) * | 2002-07-04 | 2009-05-14 | Nikon Corp | 投影光学系、露光装置、およびデバイス製造方法 |
WO2005001543A1 (ja) * | 2003-06-26 | 2005-01-06 | Nikon Corporation | 投影光学系、露光装置、およびデバイス製造方法 |
Also Published As
Publication number | Publication date |
---|---|
US20030048547A1 (en) | 2003-03-13 |
EP1344112A2 (de) | 2003-09-17 |
US6954316B2 (en) | 2005-10-11 |
WO2002052303A3 (de) | 2002-10-31 |
JP2004524554A (ja) | 2004-08-12 |
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